Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/1996
04/16/1996US5508066 Method for forming a thin film
04/16/1996US5508063 Reacting dihalotrialkoxytantalum compound with methylmetal compound yields trialkyldialkoxytantalum compound, simplicity, efficiency
04/16/1996US5507987 Method of making a free-standing diamond film with reduced bowing
04/16/1996US5507874 Performing in situ electrical or mechanical removal of contaminant particles in closed chamber while maintaining under controlled subatmospheric environment
04/16/1996US5507639 Heat treatment apparatus and method thereof
04/11/1996WO1996010659A2 An epitaxial reactor, susceptor and gas-flow system
04/10/1996EP0705917A1 Method for making high thermal conducting diamond
04/10/1996EP0705916A1 Diamond film structure with high thermal conductivity
04/10/1996EP0705915A1 Electron emissive film
04/10/1996EP0705914A1 Method for applying aluminum coating to fabricated catalytic exhaust system component
04/10/1996EP0705913A1 Method for manufacturing plastic forming dies
04/10/1996EP0705350A1 Apparatus and method for depositing diamond and refractory materials
04/10/1996EP0705149A1 Method for producing a polymer coating inside hollow plastic articles
04/09/1996US5506389 Thermal processing furnace and fabrication method thereof
04/09/1996US5506038 Abrasion wear resistant coated substrate product
04/09/1996US5505782 Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor proccessing
04/09/1996US5505781 Hydrophobic processing apparatus including a liquid delivery system
04/09/1996US5505780 High-density plasma-processing tool with toroidal magnetic field
04/09/1996US5505779 Integrated module multi-chamber CVD processing system and its method for processing substrates
04/09/1996US5505778 Using thermally excited molecular beam to prevent flying of contaminant caused by heating source of sample by hermetic separation of heating source from sample
04/09/1996CA2027680C Method and means for controlled-profile coating of glass containers
04/07/1996CA2157741A1 Method for applying aluminum coating to fabricated catalytic exhaust system component
04/04/1996WO1996010102A1 Composite body, use of this composite body and process for its preparation
04/03/1996EP0704885A2 Method of depositing fluorine doped oxide
04/03/1996EP0704554A1 Wafer supporting boat
04/03/1996EP0704553A1 Electrochemical generation of silane
04/03/1996EP0704552A1 Plasma processing method and plasma generator
04/03/1996EP0704551A1 Method of processing a substrate in a vacuum processing chamber
04/03/1996EP0704549A1 Method for deposition of aluminides containing easily oxidized metals
04/03/1996EP0704548A1 Method for cleaning substrate and depositing protective coating
04/03/1996EP0511294B1 Heating apparatus for semiconductor wafers or substrates
04/03/1996CN1119868A Rare earth compounds and their preparation
04/02/1996US5504195 Rare earth metal complexes with beta-diketone ligands and polyether or polyamine compounds; metal oxide precursors
04/02/1996US5503963 Process for manufacturing optical data storage disk stamper
04/02/1996US5503942 Inorganic skin film
04/02/1996US5503913 Tool with wear-resistant cutting edge made of cubic boron nitride or polycrystalline cubic boron nitride, a method of manufacturing the tool and its use
04/02/1996US5503881 Method of processing a semiconductor wafer
04/02/1996US5503875 Film forming method wherein a partial pressure of a reaction byproduct in a processing container is reduced temporarily
04/02/1996US5503874 Alternated coating an aluminum layer from aluminum alkyl halide precursor and a metal oxide layer from metal beta diketonate precursor, heating to diffuse, reacting with metal substrate
04/02/1996US5503678 Vertical low pressure CVD apparatus with an adjustable nozzle
04/02/1996US5503677 Process and device for coating the inner surface of greatly arched, essentially dome-shaped substrates by CVD
04/02/1996US5503676 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber
04/02/1996US5503650 Method for producing a glass thin film with controlloing an oxide vapor of an additive
04/02/1996CA1338202C Chemical vapor deposition of oxide films containing alkaline earth metals from metal-organic sources
03/1996
03/28/1996WO1996009641A1 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber
03/28/1996DE4434428A1 Verbundkörper, Verwendung dieses Verbundkörpers und Verfahren zu seiner Herstellung Composite body using this composite and process for its preparation
03/28/1996DE19530318A1 Magnetic recording media prodn.
03/27/1996EP0703187A2 Method and apparatus for generating ozone and methods of its use
03/26/1996US5502442 Method of forming a durable wideband anti-reflection coating for infrared windows
03/26/1996US5502381 Stress sensor using magnetostriction thin film
03/26/1996US5502227 Liquid indium source
03/26/1996US5502001 Method of forming light beam and method of fabricating semiconductor integrated circuits
03/26/1996US5501909 Polycrystalline diamond substrate and process for producing the same
03/26/1996US5501877 Patterned deposition of thin films
03/26/1996US5501870 Method and apparatus for hydrophobic treatment
03/26/1996US5501740 Microwave plasma reactor
03/26/1996US5501739 Apparatus and method for forming thin film
03/21/1996WO1996008587A1 Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same
03/21/1996DE4432813A1 Chemical-vapour-deposition of monocrystal silicon-carbide film
03/20/1996EP0702392A2 Plasma reactor
03/20/1996EP0702098A1 Corrosion-resistant aluminum article for semiconductor processing equipment
03/19/1996US5500539 Method of depositing diamond and diamond light emitting device
03/19/1996US5500388 Heat treatment process for wafers
03/19/1996US5500256 Dry process apparatus using plural kinds of gas
03/19/1996US5500249 Uniform tungsten silicide films produced by chemical vapor deposition
03/19/1996US5500047 Apparatus for adsorbing atomic hydrogen on surface
03/19/1996US5499602 Apparatus for manfuacturing a semiconductor layer using rapid thermal processing
03/19/1996US5499601 Method for vapor phase synthesis of diamond
03/14/1996WO1996007771A1 Process for depositing pyrocarbon coatings in a fluidized bed
03/14/1996WO1996007661A1 Formation of a metalorganic compound for growing epitaxial semiconductor layers
03/14/1996WO1996007660A1 Metalorganic compounds
03/13/1996EP0701273A2 Process for sputtering silicides in the fabrication of high-density integrated circuits
03/13/1996EP0701006A1 Diamond-coated composite cutting tool and method of making
03/13/1996EP0700720A1 Plastic articles of reduced gas transmission and method therefor
03/13/1996CN1118587A Safety document and process for producing the same
03/12/1996US5498768 Process for forming multilayer wiring
03/12/1996US5498758 Stearic acid
03/12/1996US5498446 Method and apparatus for producing high purity and unagglomerated submicron particles
03/12/1996US5498442 Fluidized bed reactor and method for forming a metal carbide coating on a substrate containing graphite or carbon
03/12/1996US5498292 Heating device used for a gas phase growing mechanism or heat treatment mechanism
03/12/1996US5498291 Arrangement for coating or etching substrates
03/12/1996US5497727 Cooling element for a semiconductor fabrication chamber
03/07/1996WO1996007071A1 Rapid thermal processing apparatus and method
03/07/1996WO1996006958A1 Hydrogen fluoride dopant source in the preparation of conductive coated substrate
03/07/1996DE4430777A1 Refuse chute for refuse drums or dust bins with closable inlet and outlet with lock
03/06/1996EP0699777A1 Method and apparatus of forming thin films
03/06/1996EP0699776A1 Wafer and method of producing a wafer
03/06/1996CN1118175A Knitting parts for knitting machine and surface coating method therefor
03/05/1996US5496674 Magnetic core with molybdenum oxide or tungsten oxide shells for electrophotographic process
03/05/1996US5496638 Diamond tools for rock drilling, metal cutting and wear part applications
03/05/1996US5496596 Vapor deposition, void-free
03/05/1996US5496595 Method for forming film by plasma CVD
03/05/1996US5496594 Chemical vapor deposition apparatus and method wherein a corona discharge is generated inside a perforated cage which surrounds the substrate
03/05/1996US5496586 Chemical vapor deposition of a coating from reaction gases
03/05/1996US5496583 Hydrogen fluoride dopant source in the preparation of conductive coated substrate
03/05/1996US5496582 Including luminescent layer comprising host material to which luminescent center element is added; forming host material by chemical vapor deposition to react gas of cyclopentadienyl alkaline earth compound with gas of group 6a compound
03/05/1996US5496410 Plasma processing apparatus and method of processing substrates by using same apparatus
03/05/1996US5496409 Particle contamination apparatus for semiconductor wafer processing
03/05/1996US5496408 Mass flow controllers, vapor deposition onto semiconductor substrates
02/1996
02/29/1996WO1996006453A1 Electric lamp coated with an interference film