| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 02/29/1996 | WO1996006206A1 Method for the deposition of diamond film on the electroless-plated nickel layer |
| 02/29/1996 | WO1996005942A1 Abrasive article having a diamond-like coating layer and method |
| 02/29/1996 | CA2196674A1 Abrasive article having a diamond-like coating layer and method |
| 02/28/1996 | EP0698674A2 Chemical vapor deposition apparatus and method for exclusion of deposition and contamination from the backside and periphery of the wafers |
| 02/28/1996 | EP0698673A1 Gas-based substrate deposition protection |
| 02/28/1996 | EP0698584A2 Coated quartz glass component |
| 02/28/1996 | EP0698296A1 Preparation of nucleated silicon surfaces |
| 02/28/1996 | EP0616649A4 Apparatus and method for delivery of involatile reagents. |
| 02/28/1996 | CN1031146C Apparatus and arrangement for coating truncated spheric substrate |
| 02/27/1996 | US5494742 Magnetic recording medium having improved running time and corrosion resistance |
| 02/27/1996 | US5494713 Anodic oxidation, sealing pores, silicon-containing coating film by chemical vapor deposition |
| 02/27/1996 | US5494712 Oxidizing with excess oxygen, vapor depositing a polysilicate |
| 02/27/1996 | US5494704 Heating substrate coated with platinum and excess aluminum to diffuse metal into substrate to form aluminide with trace platinum |
| 02/27/1996 | US5494524 Vertical heat treatment device for semiconductor |
| 02/27/1996 | US5494522 Plasma process system and method |
| 02/27/1996 | US5494521 Apparatus and method for vapor growth |
| 02/27/1996 | US5494494 Integrated module multi-chamber CVD processing system and its method for processing substrates |
| 02/27/1996 | US5494439 Si/SiC composite material and method for making Si/SiC composite material |
| 02/27/1996 | US5493987 Chemical vapor deposition reactor and method |
| 02/27/1996 | CA2156996A1 Manufacturing method for plastic forming molds |
| 02/22/1996 | WO1996005333A1 Jet plasma deposition process and apparatus |
| 02/22/1996 | WO1996005153A1 Method for carburizing ceramic sliding material |
| 02/22/1996 | WO1996005112A1 Carbon film-coated plastic container manufacturing apparatus and method |
| 02/22/1996 | WO1996005111A1 Carbon film-coated plastic container |
| 02/22/1996 | WO1996000314A3 Reactor and process for coating flat substrates |
| 02/22/1996 | DE4437269C1 Cleaning workpiece surfaces |
| 02/22/1996 | DE4429505A1 Wear resistance promoting coating of tools for the ceramics industry |
| 02/22/1996 | CA2196301A1 Jet plasma deposition process and apparatus |
| 02/21/1996 | EP0697715A1 UV-enhanced dry stripping of silicon nitride films |
| 02/21/1996 | EP0697467A1 Method and apparatus for cleaning a deposition chamber |
| 02/21/1996 | EP0697376A1 Single body injector and method for delivering gases to a surface |
| 02/21/1996 | EP0617741B1 Nucleation enhancement for chemical vapor deposition of diamond |
| 02/21/1996 | CN1031088C Process for forming functional deposited film |
| 02/21/1996 | CN1031072C Large area murowave plasma apparatus |
| 02/20/1996 | US5492770 Film including mixed phase of copper or gold component |
| 02/20/1996 | US5492737 Adjustable controllers of electrical resistance in connectors between electrodes and ground also control stress in films deposited from plasma in reactor |
| 02/20/1996 | US5492736 Fluorine doped silicon oxide process |
| 02/20/1996 | US5492735 Process for plasma deposition |
| 02/20/1996 | US5492734 Method of forming deposition film |
| 02/20/1996 | US5492725 Heating vapors of metal compounds containing partially hydrogenated nitrogen heterocyclic groups yields metal films on semiconductor substrates |
| 02/20/1996 | US5492724 Method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor |
| 02/20/1996 | US5492718 Fluid delivery apparatus and method having an infrared feedline sensor |
| 02/20/1996 | US5492597 Removing exposed parts of tungsten silicide films by reaction with nitrogen trifluoride plasma when making semiconductors |
| 02/20/1996 | US5492569 Method of automatically cleaning a vacuum vapor deposition tank |
| 02/15/1996 | WO1996004652A1 Process for manufacturing optical data storage disk stamper |
| 02/15/1996 | DE4427714A1 Composite structure used for electronic components |
| 02/15/1996 | DE19528551A1 Forming thin film with predetermined foil resistance |
| 02/15/1996 | CA2195109A1 Process for manufacturing optical data storage disk stamper |
| 02/14/1996 | EP0696653A1 Method of chemical vapor deposition and reactor therefor |
| 02/14/1996 | EP0696472A1 Method and apparatus for supply of liquid raw material gas |
| 02/14/1996 | CN1116571A Coated cutting tool |
| 02/13/1996 | US5491112 Method and arrangement for treating silicon plates |
| 02/13/1996 | US5491028 Formed from oxygen and acetylene in a combustion flame in the presence of a deposition promoter |
| 02/13/1996 | US5491005 Gold thin film vapor growing method |
| 02/13/1996 | US5491002 Multilayer CVD diamond films |
| 02/13/1996 | US5490881 Maintaining uniformity of deposited film thickness in plasma-enhanced chemical vapor deposition |
| 02/07/1996 | EP0695922A1 Heating apparatus for semiconductor wafers or substrates |
| 02/07/1996 | EP0695816A1 Method of making synthetic diamond film with reduced bowing |
| 02/07/1996 | EP0695730A2 Fibre-reinforced carbon and graphite articles and method for the production thereof |
| 02/07/1996 | EP0695622A2 Method and apparatus for plasma modification of flat porous articles |
| 02/07/1996 | EP0695376A1 Magnetic roller gas gate employing transonic sweep gas flow |
| 02/07/1996 | EP0677595A4 Device for the vacuum-plasma treatment of articles. |
| 02/07/1996 | EP0647163A4 A plasma cleaning method for removing residues in a plasma treatment chamber. |
| 02/07/1996 | EP0573424B1 Method for making coreless refractory fibres and whiskers |
| 02/06/1996 | US5489449 Coated particles of inorganic or metallic materials and processes of producing the same |
| 02/06/1996 | US5489446 Device for forming silicon oxide film |
| 02/06/1996 | US5489422 Process for coating carbon fiber reinforced carbon |
| 02/06/1996 | US5489339 Microelectronic processing machine |
| 02/06/1996 | US5488967 Method and apparatus for feeding gas into a chamber |
| 02/06/1996 | US5488925 Gas handling device assembly used for a CVD apparatus |
| 02/06/1996 | CA2155145A1 Fiber-reinforced carbon and graphite articles and method for the production thereof |
| 02/01/1996 | WO1996002934A1 Method of and apparatus for microwave-plasma production |
| 02/01/1996 | WO1996002685A1 Diamond-phase carbon tubes and cvd process for their production |
| 02/01/1996 | DE19526223A1 Pyrolytisch beschichtete Verglasungsscheibe Pyrolytic coated glazing panel |
| 01/31/1996 | EP0694630A1 Protective treatment of metal substrates |
| 01/31/1996 | EP0693975A1 Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization |
| 01/31/1996 | EP0495095B1 Process for forming crack-free pyrolytic boron nitride on a carbon structure and article |
| 01/30/1996 | US5487945 Diamond films on nondiamond substrates |
| 01/30/1996 | US5487923 Corrosion resistant layers formed by vapor deposition |
| 01/30/1996 | US5487920 Bombardment with plasma for adhesion of coating with silicon polymer formed by plasma polymerization and treatment with n2o and co2 |
| 01/30/1996 | US5487787 Apparatus and method for plasma deposition |
| 01/30/1996 | US5487786 Plasma chemical vapor deposition device capable of suppressing generation of polysilane powder |
| 01/30/1996 | US5487785 Plasma treatment apparatus |
| 01/30/1996 | US5487784 Formation of tin oxide films on glass substrates |
| 01/30/1996 | US5487783 Method and apparatus for preventing rupture and contamination of an ultra-clean APCVD reactor during shutdown |
| 01/30/1996 | US5487625 Oxide coated cutting tool |
| 01/30/1996 | US5487358 Apparatus for growing silicon epitaxial layer |
| 01/30/1996 | US5487357 Depositing nitrogen, phosphorous, arsenic or antimony in thin films |
| 01/30/1996 | US5487356 Lanthium metal manganate formed on a substrate with vapor phase |
| 01/27/1996 | CA2152969A1 Method for vacuum plasma protective treatment of metal substrates |
| 01/25/1996 | WO1996002067A1 Integrated circuit capacitors and process for making the same |
| 01/25/1996 | WO1996001913A1 Monocrystalline diamond film production by chemical vapor deposition |
| 01/25/1996 | WO1996001682A1 Membrane reparation and pore size reduction using interfacial ozone assisted chemical vapor deposition |
| 01/25/1996 | DE4425626A1 Method and appts. for plasma coating components with metal and polymer layers |
| 01/25/1996 | DE19526514A1 Schutzüberzüge für optische Komponenten Protective coatings for optical components |
| 01/25/1996 | DE19518927A1 Wear-resistant composite ceramic coating for sintered carbide or ceramic cutting tool inserts |
| 01/25/1996 | CA2191888A1 Membrane reparation and pore size reduction using interfacial ozone assisted chemical vapor deposition |
| 01/24/1996 | EP0693769A2 Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter |
| 01/24/1996 | EP0693580A1 Oxide thin film having quartz crystal structure and process for producing the same |
| 01/24/1996 | EP0693575A1 Method for forming diamond film |