| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/17/1996 | WO1996014448A1 Method for depositing a hard protective coating |
| 05/15/1996 | EP0711847A1 Arc assisted CVD method and apparatus |
| 05/15/1996 | EP0711846A1 Titanium nitride deposited by chemical vapor deposition |
| 05/15/1996 | EP0711455A1 Shadow clamp |
| 05/15/1996 | EP0619847B1 Method of coating metal using low temperature plasma and electrodeposition |
| 05/15/1996 | EP0594676A4 Diamond membranes for x-ray lithography |
| 05/15/1996 | EP0536394B1 Method of producing polycrystalline silicon rods for semiconductors and thermal decomposition furnace therefor |
| 05/15/1996 | DE19501733C1 Gas flow distributor |
| 05/15/1996 | CN1122379A Passivation of metallic product of super alloy based on nickel and iron |
| 05/15/1996 | CN1122378A Laser chemical gas-phase deposition process of diamond film |
| 05/14/1996 | US5517594 Thermal reactor optimization |
| 05/14/1996 | US5516588 Aluminum oxide layer on cutting tools, combustion chamber linings, movable parts |
| 05/14/1996 | US5516367 Chemical vapor deposition chamber with a purge guide |
| 05/14/1996 | US5516366 Supply control system for semiconductor process gasses |
| 05/14/1996 | US5516363 Specially doped precursor solutions for use in methods of producing doped ABO3 -type average perovskite thin-film capacitors |
| 05/14/1996 | US5516283 Apparatus for processing a plurality of circular wafers |
| 05/14/1996 | US5515986 Plasma treatment apparatus and method for operating same |
| 05/09/1996 | WO1996013623A1 Method and apparatus for depositing a substance with temperature control |
| 05/09/1996 | WO1996013622A1 Platinum aluminide cvd coating method |
| 05/09/1996 | DE4439924A1 Carbon@ cladding layer for electrostatic spraying |
| 05/09/1996 | DE4439056A1 Appts. for chemical vapour deposition on fibres |
| 05/09/1996 | CA2204164A1 Method and apparatus for depositing a substance with temperature control |
| 05/08/1996 | EP0711100A1 Plasma production device, allowing a dissociation between microwave propagation and absorption zones |
| 05/08/1996 | EP0710977A1 Surface treatment method and system |
| 05/08/1996 | EP0630422B1 Process for producing thin films of inorganic oxides of controlled stoichiometry |
| 05/08/1996 | EP0628091B1 A method of coating a piezoelectric substrate with a semi-conducting material and a method of producing a droplet ejector arrangement including the coating method |
| 05/08/1996 | CN1121963A Method for forming diamond film |
| 05/07/1996 | US5514822 Precursors and processes for making metal oxides |
| 05/07/1996 | US5514453 Method of manufacturing a composite |
| 05/07/1996 | US5514439 Wafer support fixtures for rapid thermal processing |
| 05/07/1996 | US5514425 Plasma vapor deposition on bottom of tapered groove, etching undesired film from sidewalls, integrated circuits |
| 05/07/1996 | US5514410 Pyrocarbon and process for depositing pyrocarbon coatings |
| 05/07/1996 | US5514276 Permselective hollow fiber fluid separation membranes having plasma-polymerized lumen-side coatings |
| 05/07/1996 | US5514217 Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof |
| 05/02/1996 | WO1996012831A1 Chemical vapour deposition |
| 05/02/1996 | DE4438992A1 Method and appts. for application of antistatic transparent surface coatings on electrically insulating products |
| 05/02/1996 | DE4438777A1 Verfahren zur Herstellung elektrischer Schaltungsträger A process for producing electrical circuit carriers |
| 05/01/1996 | EP0710055A1 Plasma reactors for processing semi-conductor wafers |
| 05/01/1996 | EP0709875A1 A processing chamber gas distribution manifold |
| 05/01/1996 | EP0709489A1 Method and apparatus for vapor phase growth |
| 05/01/1996 | EP0709488A1 Method and apparatus for thin film growth |
| 05/01/1996 | EP0709487A1 Aerosol process for the manufacture of planar waveguides |
| 05/01/1996 | EP0709486A1 Substrate processing reactors |
| 05/01/1996 | EP0709485A1 Plastic container with barrier coating and process for its production |
| 05/01/1996 | EP0709484A1 Coated tungsten carbide-based cemented carbide blade member |
| 05/01/1996 | EP0709483A2 Multilayer material |
| 05/01/1996 | EP0708983A1 Chemical vapor deposition process for fabricating layered superlattice materials |
| 05/01/1996 | EP0708688A1 Method for the improved microwave deposition of thin films |
| 05/01/1996 | CN1121537A Coated hard alloy blade member |
| 04/30/1996 | US5512873 Highly-oriented diamond film thermistor |
| 04/30/1996 | US5512515 Reacting mixture of tri(or di-)alkyl aluminum compounds, copper complexes and mono-, di- or tri-silanes near heated substrate surface yields smooth, uniform thin film |
| 04/30/1996 | US5512510 Method of manufacturing amorphous silicon electrophotographic photosensitive member |
| 04/30/1996 | US5512330 Vaporizing and pyrolyzing dimeric paraxylene to form monomeric paraxylene, polymerizing to form parylene film, upon bombardment with ion beam parylene film is converted into diamond-like carbon coating |
| 04/30/1996 | US5512320 Batch heating, cooling |
| 04/30/1996 | US5512318 Surface roughning for improved adhesion of coating and surface |
| 04/30/1996 | US5512155 Film forming apparatus |
| 04/30/1996 | US5512102 Microwave enhanced CVD system under magnetic field |
| 04/25/1996 | WO1996012392A1 Process for manufacturing electrical circuit bases |
| 04/25/1996 | WO1996012386A1 Thermal reactor optimization |
| 04/25/1996 | WO1996012055A1 Apparatus for growing metal oxides using organometallic vapor phase epitaxy |
| 04/25/1996 | WO1996012051A1 Process for separating metal coatings |
| 04/25/1996 | WO1996012048A2 Conformal titanium-based films and method for their preparation |
| 04/25/1996 | WO1996011878A1 The combinatorial synthesis of novel materials |
| 04/25/1996 | WO1996011802A1 Glass coating method and glass coated thereby |
| 04/25/1996 | WO1996011797A1 Wafer support fixtures for rapid thermal processing |
| 04/25/1996 | DE4438791A1 Deposition of metal layers on polyimide substrates |
| 04/25/1996 | CA2203172A1 Process for manufacturing electrical circuit bases |
| 04/25/1996 | CA2203024A1 Process for plating metal coatings |
| 04/25/1996 | CA2202387A1 Conformal titanium-based films and method for their preparation |
| 04/25/1996 | CA2202286A1 The combinatorial synthesis of novel materials |
| 04/25/1996 | CA2201905A1 Apparatus for growing metal oxides using organometallic vapor phase epitaxy |
| 04/24/1996 | EP0708478A1 Plasma guard for use in a vacuum process chamber |
| 04/24/1996 | EP0708477A1 Controlling edge deposition on semiconductor substrates |
| 04/24/1996 | EP0708065A1 Plasma fluorine resistant polycristalline alumina ceramic material and method of making |
| 04/24/1996 | EP0708062A1 Pyrolytic coating technique of gaseous precursor compositions |
| 04/24/1996 | EP0707665A1 Diamond coated body |
| 04/24/1996 | EP0665903B1 Apparatus for chemical vapour phase deposition activated by a microwave plasma |
| 04/24/1996 | CN1121303A Spiral wave plasma processing method and device |
| 04/24/1996 | CN1121260A Production of semiconductor unit |
| 04/23/1996 | US5510297 Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor |
| 04/23/1996 | US5510186 Cladding, diamond like carbon and semiconductor layers; hardness; wear resistance |
| 04/23/1996 | US5510157 Method of producing diamond of controlled quality |
| 04/23/1996 | US5510155 Method to reduce gas transmission |
| 04/23/1996 | US5510151 Establishing enclosed film-forming chamber by curving and projecting moving substrate web to form cylindrical wall, feeding raw material gas into resulting space to deposit film on inner face of wall |
| 04/23/1996 | US5510146 Low pressure process |
| 04/23/1996 | US5510088 Low temperature plasma film deposition using dielectric chamber as source material |
| 04/23/1996 | US5510007 Reacting solid precursor material including silicon in electrochemical cell with generated hydrogen ions to form silane, depositing silicon, alloy or compound from silane |
| 04/23/1996 | US5509189 Method for making an electrochemical cell |
| 04/18/1996 | WO1996011289A1 Low surface energy coatings |
| 04/18/1996 | DE19505720C1 Coating a substrate with a film of amorphous, hydrogen-free carbon |
| 04/17/1996 | EP0707344A2 Semiconductor device using a polysilicium thin film and production thereof |
| 04/17/1996 | EP0707337A1 Solid annular gas discharge electrode |
| 04/17/1996 | EP0706425A1 Selective plasma deposition |
| 04/17/1996 | EP0706318A1 Method of pretreating metal surfaces for subsequent polymer coating |
| 04/17/1996 | EP0643619B1 Pyrolytic deposition in a fluidized bed |
| 04/17/1996 | EP0489914B1 Method of forming titanium nitride coating and pan made by this method |
| 04/16/1996 | US5508368 Ion beam process for deposition of highly abrasion-resistant coatings |
| 04/16/1996 | US5508092 Abrasion wear resistant coated substrate product |
| 04/16/1996 | US5508071 CVD diamond coating annulus components and method of their fabrication |
| 04/16/1996 | US5508067 From a precursor gas mixture of a silane, a nitrogen-containing organosilane and a nitrogen-containing gas under pressure at low temperature |