| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/18/1996 | US5527390 Treatment system including a plurality of treatment apparatus |
| 06/18/1996 | US5527386 Electromagnetic material for blocking passage of radiation below a spectral cut off point comprising carrier and dispersed therein, a silicon particulate |
| 06/18/1996 | US5526951 Fabrication method for digital micro-mirror devices using low temperature CVD |
| 06/18/1996 | US5526768 Method for providing a silicon and diamond substrate having a carbon to silicon transition layer and apparatus thereof |
| 06/13/1996 | WO1996018208A1 Plasma processor for large workpieces |
| 06/13/1996 | WO1996017973A1 Reactor for the vapor phase deposition (cvd) of thin layers |
| 06/13/1996 | WO1996017972A1 Gas removal device |
| 06/13/1996 | WO1996017970A2 Chemical vapor deposition method of growing oxide films with giant magnetoresistance |
| 06/13/1996 | WO1996017969A2 Method and equipment for growing thin films |
| 06/13/1996 | DE19544498A1 Thin protective coating prodn. in any colour by plasma-assisted CVD |
| 06/12/1996 | EP0716162A1 Ferroelectric thin film, ferroelectric thin film covering substrate and manufacturing method of ferroelectric thin film |
| 06/12/1996 | CN1032021C Method and apparatus for continuously forming functional deposited films with large area by microwave plasma CVD method |
| 06/11/1996 | US5525815 Diamond film structure with high thermal conductivity |
| 06/11/1996 | US5525550 Process for forming thin films by plasma CVD for use in the production of semiconductor devices |
| 06/11/1996 | US5525406 Coatings on glass |
| 06/11/1996 | US5525379 Forming inorganic dielectric film using helicon wave plasma chemical vapor deposition |
| 06/11/1996 | US5525160 Film deposition processing device having transparent support and transfer pins |
| 06/11/1996 | US5525159 Plasma process apparatus |
| 06/11/1996 | US5525157 Gas injectors for reaction chambers in CVD systems |
| 06/06/1996 | WO1996017107A1 Method and apparatus for growing thin films |
| 06/06/1996 | WO1996017106A1 Apparatus for growing thin films |
| 06/06/1996 | WO1996017105A1 Process for producing an oxide layer |
| 06/06/1996 | WO1996017104A1 A method of depositing tungsten nitride using a source gas comprising silicon |
| 06/06/1996 | WO1996017103A1 Method of depositing metal films |
| 06/05/1996 | EP0715342A2 Single-wafer heat-treatment apparatus and method of manufacturing reactor vessel used for same |
| 06/05/1996 | EP0714999A1 Method for sublimating a solid material and a device for implementing the method |
| 06/05/1996 | EP0714998A2 CVD processing chamber |
| 06/05/1996 | EP0714997A1 Process for manufacturing layers of diamond doped with boron |
| 06/05/1996 | EP0714455A1 Method for depositing diamond-like carbon films on a substrate |
| 06/05/1996 | CN1123847A Hot wire process for growing diamond |
| 06/04/1996 | US5524017 Quantum well semiconductor laser |
| 06/04/1996 | US5523616 Semiconductor device having laminated tight and coarse insulating layers |
| 06/04/1996 | US5523126 Method of continuously forming a large area functional deposited film by microwave PCVD |
| 06/04/1996 | US5523124 Process for producing a silicon oxide deposit on the surface of a metallic or metallized polymer substrate using corona discharge at pressures up to approximately atmospheric |
| 06/04/1996 | US5523121 Smooth surface CVD diamond films and method for producing same |
| 06/04/1996 | US5522937 Welded susceptor assembly |
| 06/04/1996 | US5522936 Thin film deposition apparatus |
| 06/04/1996 | US5522935 Plasma CVD apparatus for manufacturing a semiconductor device |
| 06/04/1996 | US5522934 Plasma processing apparatus using vertical gas inlets one on top of another |
| 06/04/1996 | US5522933 Particle-free microchip processing |
| 06/04/1996 | US5522932 Corrosion-resistant apparatus |
| 06/04/1996 | US5522911 Device and method for forming a coating by pyrolysis |
| 06/04/1996 | US5522412 Vacuum treatment apparatus and a cleaning method therefor |
| 06/04/1996 | US5522343 Thin film formation apparatus |
| 05/30/1996 | WO1996016531A1 An apparatus for generation of a linear arc discharge for plasma processing |
| 05/30/1996 | WO1996016203A1 Process for preparing micromechanical components having free-standing microstructures or membranes |
| 05/30/1996 | WO1996016202A1 Packing element, in particular for shutting-off and regulating means, and process for producing the same |
| 05/30/1996 | WO1996016201A1 Packing element, in particular for shutting-off and regulating means, and process for producing the same |
| 05/30/1996 | WO1996016200A1 Packing element, in particular for shutting-off and regulating means, and process for producing the same |
| 05/30/1996 | WO1996016199A1 Silicon carbide carrier for wafer processing in vertical furnaces |
| 05/30/1996 | WO1996016198A1 Apparatus for the relative vacuum deposition of a material on bulk parts |
| 05/30/1996 | WO1996016114A1 Composite media with selectable radiation-transmission properties |
| 05/30/1996 | DE4442370A1 Verfahren zur Abscheidung metallischer Schichten auf Substratkörpern und Verbundkörper aus einem Substratkörper und mindestens einer Oberflächenschicht A process for the deposition of metallic layers onto substrate bodies and composite body comprising a substrate body and at least one surface layer |
| 05/30/1996 | DE19543723A1 Verfahren zur Herstellung einkristalliner Diamantfilme A process for producing single-crystal diamond films |
| 05/30/1996 | DE19543722A1 Verfahren zur Herstellung von Substraten zur Bildung einkristalliner Diamantfilme durch chemisches Aufdampfen Process for the preparation of substrates for forming a single-crystal diamond films by chemical vapor deposition |
| 05/30/1996 | CA2207587A1 Composite media with selectable radiation-transmission properties |
| 05/29/1996 | EP0713927A1 Fluorine doped silicon oxide coating process |
| 05/29/1996 | EP0713542A1 Crystalline multilayer structure and manufacturing method thereof |
| 05/29/1996 | EP0713538A1 Method of rapidly densifying a porous structure |
| 05/29/1996 | EP0713429A1 Hydrophilic films by plasma polymerisation |
| 05/29/1996 | CN1123542A Coatings on glass |
| 05/29/1996 | CN1123341A Gaseous ion film-plating method and device thereof |
| 05/28/1996 | US5520969 Method for in-situ liquid flow rate estimation and verification |
| 05/28/1996 | US5520858 Liquid vaporizing apparatus |
| 05/28/1996 | US5520743 Processing apparatus with means for rotating an object mounting means and a disk body located in the mounting means differently relative to each other |
| 05/28/1996 | US5520742 Thermal processing apparatus with heat shielding member |
| 05/28/1996 | US5520741 Apparatus for producing a plasma polymer protective layer on workpieces, in particular headlamp reflectors |
| 05/28/1996 | US5520740 Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same |
| 05/28/1996 | US5520142 Decompression container |
| 05/23/1996 | WO1996015545A1 Inductive plasma reactor |
| 05/23/1996 | WO1996015295A1 Vacuum chamber made of aluminum or its alloy, and surface treatment and material for the vacuum chamber |
| 05/23/1996 | WO1996015288A2 Apparatus for use with cvi/cvd processes |
| 05/23/1996 | WO1996015287A2 Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment |
| 05/23/1996 | WO1996015286A1 Al2O3-COATED CUTTING TOOL PREFERABLY FOR NEAR NET SHAPE MACHINING |
| 05/23/1996 | WO1996015285A1 Pressure gradient cvi/cvd apparatus, process and product |
| 05/23/1996 | WO1996012048A3 Conformal titanium-based films and method for their preparation |
| 05/23/1996 | WO1996010659A3 An epitaxial reactor, susceptor and gas-flow system |
| 05/23/1996 | DE4445177A1 Verfahren zur Herstellung polykristalliner Siliziumschichten mit einstellbaren Schichtspannungen A process for producing polycrystalline silicon layers with adjustable layer stresses |
| 05/23/1996 | DE4441313A1 Dichtungselement, insbesondere für Absperr- und Regelorgane und Verfahren zu seiner Herstellung Sealing element, in particular for isolating and control system and method for its manufacture |
| 05/23/1996 | DE4441134A1 Dichtungselement, insbesondere für Absperr- und Regelorgane und Verfahren zu seiner Herstellung Sealing element, in particular for isolating and control system and method for its manufacture |
| 05/23/1996 | DE4441132A1 Dichtungselement, insbesondere für Absperr- und Regelorgane und Verfahren zu seiner Herstellung Sealing element, in particular for isolating and control system and method for its manufacture |
| 05/23/1996 | CA2205087A1 Pressure gradient cvi/cvd apparatus, process and product |
| 05/23/1996 | CA2202074A1 Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment |
| 05/22/1996 | EP0712943A1 Method for making non-collapsible intravascular prosthesis (stent) |
| 05/22/1996 | EP0712941A1 Diamond sinter, high-pressure phase boron nitride sinter, and processes for producing those sinters |
| 05/22/1996 | EP0712530A1 Substrate having a carbon rich coating |
| 05/22/1996 | EP0712447A1 Welded susceptor assembly |
| 05/22/1996 | EP0712409A1 Organometallic complexes of aluminium, gallium and indium |
| 05/22/1996 | EP0521078B1 An improved hot filament chemical vapor deposition reactor |
| 05/22/1996 | CN1122849A Vapor growth apparatus and vapor growth method capable of growing a compound semicondcutor layer having an evenness and an interfacial sharpness in units of atomic layers with good productivity |
| 05/21/1996 | US5519234 Ferroelectric dielectric memory cell can switch at least giga cycles and has low fatigue - has high dielectric constant and low leakage current |
| 05/21/1996 | US5518952 Method of coating a piezoelectric substrate with a semiconducting material |
| 05/21/1996 | US5518831 Plasma vapor deposition to polymerize organosilicon compound |
| 05/21/1996 | US5518780 Method of making hard, transparent amorphous hydrogenated boron nitride films |
| 05/21/1996 | US5518766 Diamond |
| 05/21/1996 | US5518759 High growth rate plasma diamond deposition process and method of controlling same |
| 05/21/1996 | US5518549 Susceptor and baffle therefor |
| 05/21/1996 | US5518547 Method and apparatus for reducing particulates in a plasma tool through steady state flows |
| 05/21/1996 | US5518536 Alkaline earth metal-heptane dionate compounds |
| 05/21/1996 | US5517943 Vacuum CVD apparatus |