| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/24/1996 | CN1127425A Method for cleaning vacuum processing chamber which process by bromide gas |
| 07/23/1996 | US5539303 Method for monitoring atmospheric pressure glow discharge plasma using current pulse-count and/or Lissajous figure |
| 07/23/1996 | US5539176 Method and apparatus of synthesizing diamond in vapor phase |
| 07/23/1996 | US5539154 Fluorinated silicon nitride films |
| 07/23/1996 | US5538911 Vapor deposition of a diamond film on a semiconductor, followed by depositing a semiconductor film and a metal film; doping the diamond film after masking and forming an electrode arrangement |
| 07/23/1996 | US5538765 Discharging voltage across cathodes and anodes, plasma gases formed from jets to form diamonds |
| 07/23/1996 | US5538758 Cooling a substrate and applying poly-p-xylene and heating |
| 07/18/1996 | WO1996021945A1 Nitrogen gas supply system |
| 07/18/1996 | WO1996021757A1 Rotatable susceptor with integrated ferromagnetic element |
| 07/18/1996 | WO1996021751A1 Apparatus for generating plasma by plasma-guided microwave power |
| 07/18/1996 | WO1996021749A1 High density flash evaporator |
| 07/18/1996 | CA2206828A1 Rotatable susceptor with integrated ferromagnetic element |
| 07/17/1996 | EP0721999A2 Deposition chamber and apparatus thereof |
| 07/17/1996 | EP0721998A1 Method and apparatus for vapour deposition of diamond film |
| 07/17/1996 | EP0721656A1 Process for producing microcrystalline films and uses thereof |
| 07/17/1996 | EP0721514A1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method |
| 07/16/1996 | US5536857 Tri-tert-butoxysilyloxytitanium tri-tert-butoxide |
| 07/16/1996 | US5536330 Method of purging and pumping vacuum chamber to ultra-high vacuum |
| 07/16/1996 | US5536323 Apparatus for flash vaporization delivery of reagents |
| 07/16/1996 | US5536322 Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device |
| 07/16/1996 | US5536321 For vapor deposition; oxygen-free atmosphere |
| 07/16/1996 | US5536320 Processing apparatus |
| 07/16/1996 | US5536319 For vapor deposition; oxygen-free atmosphere |
| 07/16/1996 | US5536317 Parylene deposition apparatus including a quartz crystal thickness/rate controller |
| 07/16/1996 | US5535906 Multi-phase DC plasma processing system |
| 07/11/1996 | WO1996020943A1 Liquid precursor for cubic-phase passivating/buffer film |
| 07/11/1996 | WO1996020903A1 Chemical vapor deposition of mullite coatings and powders |
| 07/11/1996 | WO1996020898A2 Precision burners for oxidizing halide-free, silicon-containing compounds |
| 07/11/1996 | WO1996020897A1 Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
| 07/11/1996 | CA2209561A1 Chemical vapor deposition of mullite coatings and powders |
| 07/11/1996 | CA2208066A1 Precision burners for oxidizing halide-free, silicon-containing compounds |
| 07/11/1996 | CA2208031A1 Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
| 07/10/1996 | EP0721019A2 Low temperature deposition of silicon dioxide using organosilanes |
| 07/10/1996 | EP0720665A1 Method for obtaining diamond and diamond-like films |
| 07/10/1996 | EP0597073B1 Organic group v compounds containing boron |
| 07/10/1996 | CN1126374A Semiconductor device and process for fabricating the same |
| 07/09/1996 | US5534751 Plasma etching apparatus utilizing plasma confinement |
| 07/09/1996 | US5534311 Production of structures by electrostatically-focused deposition |
| 07/09/1996 | US5534110 Clamping a wafer in a plasma reacion chamber |
| 07/09/1996 | US5534107 Using fluorine in the presence of ultraviolet radiation to produce fluorine and chlorine or bromine as a second gas for etching |
| 07/09/1996 | US5534074 Vertical boat for holding semiconductor wafers |
| 07/09/1996 | US5534073 Semiconductor producing apparatus comprising wafer vacuum chucking device |
| 07/09/1996 | US5534072 Integrated module multi-chamber CVD processing system and its method for processing subtrates |
| 07/09/1996 | US5534070 Plasma CVD process using a very-high-frequency and plasma CVD apparatus |
| 07/09/1996 | US5534069 Preventing build-up of dangerous materials in exhaust pumps of vapor deposition apparatus, oxidation of aluminum and alkylaluminum compounds |
| 07/09/1996 | US5534068 Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement |
| 07/09/1996 | US5534066 Controlling and monitoring concentration of a gas for microelectronics |
| 07/09/1996 | US5534056 Composite media with selectable radiation-transmission properties |
| 07/04/1996 | WO1996020298A1 Method of producing boron-doped monocrystalline silicon carbide |
| 07/04/1996 | WO1996020293A1 Layer-depositing device |
| 07/04/1996 | DE19547571A1 Drahtziehwerkzeuge Wire drawing dies |
| 07/04/1996 | DE19521223A1 Mfr of metal substrate, providing workpiece with hard cover layer |
| 07/03/1996 | EP0720244A1 Superconducting oxide-metal composites |
| 07/03/1996 | EP0720212A2 Method of manufacturing semiconductor devices |
| 07/03/1996 | EP0720205A1 Deposited film forming apparatus and electrode for use in it |
| 07/03/1996 | EP0719877A1 Process for forming silicon oxide coatings |
| 07/03/1996 | EP0719746A2 Densification of porous articles by plasma enhanced chemical vapor infiltration |
| 07/03/1996 | EP0719575A2 Vertical vaporizer for halide-free, silicon-containing compounds |
| 07/02/1996 | US5532193 Lower temperature, borosilicate glass |
| 07/02/1996 | US5532190 Plasma treatment method in electronic device manufacture |
| 07/02/1996 | US5532071 Oxidation |
| 07/02/1996 | US5531862 Method of and apparatus for removing foreign particles |
| 07/02/1996 | US5531834 Plasma film forming method and apparatus and plasma processing apparatus |
| 07/02/1996 | US5531184 Method for producing synthetic diamond thin film, the thin film and device using it |
| 07/02/1996 | US5531183 Vaporization sequence for multiple liquid precursors used in semiconductor thin film applications |
| 07/02/1996 | US5531060 Method of producing interiorly sterile packages possessing superior barrier properties |
| 07/01/1996 | CA2164563A1 Vertical vaporizer for halide-free, silicon-containing compounds |
| 06/27/1996 | WO1996019910A1 High frequency induction plasma method and apparatus |
| 06/27/1996 | WO1996019825A1 Apparatus for surface conditioning |
| 06/27/1996 | CA2207655A1 Plasma treatment apparatus and methods |
| 06/26/1996 | EP0718642A1 Diffractive optics |
| 06/26/1996 | EP0718418A1 Process for the production of a graded layer |
| 06/26/1996 | EP0718417A1 Multilayer material |
| 06/26/1996 | EP0718256A2 Ceramic sliding member and process of fabricating the same |
| 06/26/1996 | EP0717785A1 Device with miniaturized photoionic head for the treatment of a material |
| 06/26/1996 | EP0625218B1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions |
| 06/26/1996 | EP0417306B1 Method of producing thin film |
| 06/26/1996 | CN1125267A Apparatus for rapid plasma treatments and method |
| 06/25/1996 | US5529951 Method of forming polycrystalline silicon layer on substrate by large area excimer laser irradiation |
| 06/25/1996 | US5529815 Apparatus and method for forming diamond coating |
| 06/25/1996 | US5529633 Apparatus for depositing a substance on a rotating surface |
| 06/25/1996 | US5529631 Apparatus for the continuous surface treatment of sheet material |
| 06/25/1996 | US5529630 Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals |
| 06/20/1996 | WO1996018756A1 A PA-CVD PROCESS FOR DEPOSITION OF A SOLID METAL-CONTAINING FILM ONTO A SUBSTRATE CONTAINING AT LEAST 50 % of Fe or WC |
| 06/19/1996 | EP0717456A2 Electrode and method for its production |
| 06/19/1996 | EP0717127A2 Plasma processing method and apparatus |
| 06/19/1996 | EP0717126A2 Apparatus for low pressure chemical vapor deposition |
| 06/18/1996 | US5528617 Semiconductor laser with alinp or algainp burying layer |
| 06/18/1996 | US5527747 Increasing the thickness by vapor depositing carbon compound on a preform made of diamond particles, ceramic fibers or powders |
| 06/18/1996 | US5527731 Surface treating method and apparatus therefor |
| 06/18/1996 | US5527629 Subjecting surface to electricial discharg; exposure to silane |
| 06/18/1996 | US5527596 Abrasion wear resistant coated substrate product |
| 06/18/1996 | US5527572 Vapor deposited radiation reflective layer |
| 06/18/1996 | US5527567 Reacting alkyls, alkoxides, beta-diketonates or metallocenes of each individual element to be deposited and oxygen |
| 06/18/1996 | US5527559 Method of depositing a diamond film on a graphite substrate |
| 06/18/1996 | US5527417 Photo-assisted CVD apparatus |
| 06/18/1996 | US5527396 Deposited film forming apparatus |
| 06/18/1996 | US5527393 Vapor-phase deposition apparatus and vapor-phase deposition method |
| 06/18/1996 | US5527392 Substrate temperature control apparatus for CVD reactors |
| 06/18/1996 | US5527391 Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method |