Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/1996
09/03/1996US5552017 Plasma etching a single wafer
09/03/1996US5551985 Method and apparatus for cold wall chemical vapor deposition
09/03/1996US5551984 Vertical heat treatment apparatus with a circulation gas passage
09/03/1996US5551983 Method and apparatus for depositing a substance with temperature control
09/03/1996US5551982 Semiconductor wafer process chamber with susceptor back coating
09/03/1996US5551959 Abrasive article having a diamond-like coating layer and method for making same
09/03/1996US5551309 For transferring liquid chemicals to a chemical application station
08/1996
08/29/1996WO1996026306A1 Process of diamond growth from c¿70?
08/29/1996WO1996026303A1 Cvd diamond burrs for odontological and related uses
08/29/1996WO1996017969A3 Method and equipment for growing thin films
08/29/1996DE19506579A1 Forming titanium nitride layer on substrate using CVD
08/29/1996CA2213316A1 Process of diamond growth from c70
08/28/1996EP0728850A2 Quasi hot wall reaction chamber
08/28/1996EP0728069A1 Abrasion wear resistant coated substrate product
08/28/1996EP0728044A1 Process and apparatus for water-based plasma cvd of diamond films
08/28/1996EP0324809B1 Process for determining the edge layer condition of objects
08/28/1996CN1032659C Preparation of nano-meter silicon films
08/27/1996US5549975 Coated tool and cutting process
08/27/1996US5549937 Method of plasma-activated reactive deposition of electrically conducting multicomponent material from a gas phase
08/27/1996US5549935 Adhesion promotion of fluorocarbon films
08/27/1996US5549756 Optical pyrometer for a thin film deposition system
08/27/1996US5549604 Non-Stick electroconductive amorphous silica coating
08/22/1996WO1996025243A1 Process for producing a layer system on substrates and the layer system produced by the said method
08/22/1996DE19505449A1 Verfahren zur Herstellung eines Schichtsystems auf Substraten und das mit diesem Verfahren hergestellte Schichtsystem A method for producing a layer system on substrates, and the layer system produced by this method
08/21/1996EP0727826A2 A method for forming a thin semiconductor film and a plasma CVD apparatus to be used in this method
08/21/1996EP0727510A2 Improved Alumina coated cemented carbide body
08/21/1996EP0727509A2 Multilayered alumina coated cemented carbide body
08/21/1996EP0727508A1 Method and apparatus for treatment of substrate surfaces
08/21/1996EP0727507A2 Apparatus and method for making free standing diamond
08/21/1996EP0586441B1 Apparatus for the treatment of a solid body
08/21/1996EP0536355B1 Process for applying a coating to a substrate
08/20/1996US5547898 Method for p-doping of a light-emitting device
08/20/1996US5547897 Photo-assisted nitrogen doping of II-VI semiconductor compounds during epitaxial growth using an amine
08/20/1996US5547723 Plastic articles of reduced gas transmission and method therefor
08/20/1996US5547717 Vapor deposition of carbon using liquid hydrocarbon
08/20/1996US5547716 Hard protective coatings
08/20/1996US5547708 Chemical vapor deposition method for forming a deposited film with the use of liquid raw material
08/20/1996US5547706 Optical thin films and method for their production
08/20/1996US5547539 Plasma processing apparatus and method
08/20/1996US5547512 Continuous atomspheric pressure CVD coating of fibers
08/16/1996CA2167993A1 Apparatus and method for making free standing diamond
08/15/1996WO1996025023A1 Method of forming a fluorinated silicon oxide layer using plasma chemical vapor deposition
08/15/1996WO1996017970A3 Chemical vapor deposition method of growing oxide films with giant magnetoresistance
08/14/1996EP0725768A1 Chemical vapour infiltration process of a material within a fibrous substrate with creation of a temperature gradient in the latter
08/14/1996EP0725767A1 Vapor phase chemical infiltration process of a material into a porous substrate at controlled surface temperature
08/14/1996EP0711455A4 Shadow clamp
08/14/1996DE19605254A1 Multi-stage CVD process for semiconductor device mfr.
08/14/1996CN1128898A Semiconductor device and method for mfg. same
08/13/1996US5545613 Mixing a metal with a copper oxide; oxidation
08/13/1996US5545490 Surface coated cutting tool
08/13/1996US5545443 Method for producing a transparent conductive ZnO film by incorporating a boron or aluminum containing material
08/13/1996US5545436 CVD method and apparatus for making silicon oxide films
08/13/1996US5545387 Positioning starter filaments in reaction chambers, heating, injecting silicon-containing gas to deposit polycrystalline silicon on filaments, passing gas with entrained silicon powder into contact with cooled wall of powder catcher
08/13/1996US5545030 Diamond film and solid non-diamond particle composite compositions
08/13/1996US5544618 Apparatus for depositing a coating on a substrate
08/08/1996WO1996024153A1 Multi-phase dc plasma processing system
08/08/1996WO1996023914A1 DEVICE FOR HEAT SHIELDING WHEN SiC IS GROWN BY CVD
08/08/1996WO1996023564A1 Process and device for causing a liquid stream to flow into a gas stream
08/08/1996WO1996015288A3 Apparatus for use with cvi/cvd processes
08/08/1996WO1996015287A3 Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment
08/08/1996DE19510439C1 Composite used as material for cutting tools
08/08/1996DE19502944A1 Verfahren und Vorrichtung zur Überführung eines Flüssigkeitsstromes in einen Gasstrom Method and apparatus for converting a liquid flow into a gas stream
08/07/1996EP0725164A2 Method and apparatus for generating plasma, and semiconductor processing methods
08/07/1996EP0725163A2 Line plasma vapor phase deposition apparatus and method
08/07/1996EP0724772A1 Electric lamp coated with an interference film
08/07/1996CN1128301A Composite impregnation-plating method
08/07/1996CN1128300A Method for applying aluminum coating to fabricated catalytic exhaust system component
08/07/1996CN1128193A Laser process
08/06/1996US5543634 Glow-discharging hydrogenated silicon nitride and a metal oxide on surface; solar cells
08/06/1996US5543210 Diamond layer, chromium carbide, nitride, or carbonitride layer; wear resistance
08/06/1996US5543184 Method of reducing particulates in a plasma tool through steady state flows
08/06/1996US5543176 CVD of Al2 O3 layers on cutting inserts
08/06/1996US5543127 Dilute solution of a hydride in liquid nitrogen
08/01/1996DE19602634A1 Plasma chemical vapour deposition appts.
08/01/1996DE19502862A1 FET-based sensors for detection of biologically active substances
08/01/1996DE19502187A1 Appts. for low-pressure plasma treatment and plasma powder coating
07/1996
07/31/1996EP0724286A1 A method of forming a thin film of silicon oxide for a semiconductor device
07/31/1996EP0724026A1 Process for reactive coating
07/31/1996EP0724024A1 Thermally stable polarizers
07/31/1996EP0723987A2 Moulded articles containing polyacetylene
07/31/1996EP0723943A1 Method for making a tantala/silicia interference filter on a vitreous substate and an electric lamp made thereby
07/31/1996EP0723601A1 A method for chemical vapor deposition of titanium nitride films at low temperatures
07/31/1996EP0723600A1 Process for the preparation of silicon carbide films using single organosilicon compounds
07/31/1996CN1128054A Diamond coated body
07/31/1996CA2168180A1 Thermostable polarizers
07/30/1996US5541238 Composites
07/30/1996US5541003 Articles having diamond-like protective thin film
07/30/1996US5540959 Mist particles
07/30/1996US5540904 Isotopically-pure carbon-12 or carbon-13 polycrystalline diamond possessing enhanced thermal conductivity
07/30/1996US5540800 Inductively coupled high density plasma reactor for plasma assisted materials processing
07/30/1996US5540782 Heat treating apparatus having heat transmission-preventing plates
07/30/1996US5540781 Plasma CVD process using a very-high-frequency and plasma CVD apparatus
07/30/1996US5540777 Aluminum oxide LPCVD system
07/30/1996US5540772 Misted deposition apparatus for fabricating an integrated circuit
07/30/1996US5540059 Method and apparatus for supplying gaseous raw material
07/30/1996US5539998 High purity bulk chemical delivery system
07/28/1996CA2167957A1 Method of making a tantala/silica interference filter on a vitreous substrate and an electric lamp made thereby
07/24/1996EP0723214A1 Computer-controlled chemical dispenser with alternative operating modes
07/24/1996EP0722909A1 Device for splitting a gas stream into several partial gas streams
07/24/1996EP0414797B1 Contactless heating of thin filaments