Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1996
11/05/1996US5571329 Gas flow system for CVD reactor
11/05/1996US5571236 Diamond wire drawing die
11/05/1996US5571010 Heat treatment method and apparatus
10/1996
10/31/1996WO1996034131A1 Articles with diamond coating formed thereon by vapor-phase synthesis
10/31/1996WO1996034122A1 Processing for forming nitride, carbide and oxide protective coatings
10/31/1996DE19616830A1 Dimethylaluminiumhydrid-Zusammensetzung, Verfahren zu deren Herstellung sowie Verfahren zur Verminderung der Viskosität von Dimethylaluminiumhydrid Dimethylaluminum composition, to processes for their preparation and process for reducing the viscosity of dimethylaluminum
10/31/1996DE19604334C1 Producing hard carbonitride coatings
10/31/1996DE19528746C1 Lateral silicon di:oxide spacer prodn. in semiconductor structure
10/31/1996DE19515802A1 Reactor for plasma deposition of semiconductor material on substrates with electrodes
10/31/1996DE19515801A1 Zinc oxide CVD coating process used in solar cell manufacture
10/31/1996DE19515799A1 Process for plasma coating substrates with semiconductor
10/31/1996DE19515069A1 Prodn. of inorganic layers e.g. on glass, ceramic
10/30/1996EP0740311A2 Dielectric material having a low dielectric loss factor for high-frequency use
10/30/1996EP0739655A1 Process for plasma coating a plastic object with multifunctional layers
10/30/1996EP0739250A1 Using lasers to fabricate coatings on substrates
10/30/1996CN1134604A Producing method for semiconductor device
10/30/1996CN1134470A Coated cutting insert
10/29/1996US5569506 Magnetic recording disk and disk drive with improved head-disk interface
10/29/1996US5569502 Film formation apparatus and method for forming a film
10/29/1996US5569501 Plasma-enhanced chemical vapor deposition from a mixture of a hydrocarbon and helium
10/29/1996US5569499 Method for reforming insulating film
10/29/1996US5569497 Protective coating of plastic substrates via plasma-polymerization
10/29/1996US5569350 Mechanism and method for mechanically removing a substrate
10/29/1996US5569329 Fluidized bed with uniform heat distribution and multiple port nozzle
10/24/1996WO1996033507A1 Diamond thin film electron emitter
10/24/1996WO1996033429A1 Fabrication of silica-based optical devices and opto-electronic devices
10/24/1996WO1996033295A1 Vapour phase chemical infiltration process for densifying porous substrates disposed in annular stacks
10/24/1996WO1996033293A1 Modification of surfaces of polymers, metal or ceramic
10/24/1996WO1996033098A2 Gas-impermeable, chemically inert container structure and method of producingthe same
10/24/1996WO1996032846A1 Microwave cvd method for deposition of robust barrier coatings
10/24/1996CA2218854A1 Fabrication of silica-based optical devices and opto-electronic devices
10/24/1996CA2218578A1 Microwave cvd method for deposition of robust barrier coatings
10/23/1996EP0738789A2 Susceptor and baffle therefor
10/23/1996EP0738788A2 Thin-Film vapor deposition apparatus
10/23/1996EP0738787A1 Method of making a metal object covered with diamond
10/23/1996EP0738697A1 Plasma fluorine resistant alumina ceramic materials and methods of making thereof
10/23/1996EP0738336A1 Oxide coated cutting tool
10/23/1996EP0587724B1 Integrated delivery module for chemical vapor from non-gaseous sources for semiconductor processing
10/23/1996CN1133900A Method for improving quality of titanium nitride layer including carbon and oxygen
10/22/1996US5567658 Method for minimizing peeling at the surface of spin-on glasses
10/22/1996US5567526 Cemented tungsten carbide substrates having adherent diamond films coated thereon
10/22/1996US5567522 Wear resistance, bonding strength
10/22/1996US5567483 Radio frenquency generating a gas flow of ammonia and nitrogen for low temperature vapor deposition
10/22/1996US5567476 Depositing layers of silicon nitride and amorphous silicon films; different deposition rates
10/22/1996US5567255 Solid annular gas discharge electrode
10/22/1996US5567243 Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
10/22/1996US5567242 Apparatus for depositing diamond coating in reactor equipped with a bowl-shaped substrate
10/22/1996US5567241 Method and apparatus for the improved microwave deposition of thin films
10/22/1996US5567152 Heat processing apparatus
10/22/1996CA2069227C Process for fabricating micromachines
10/17/1996WO1996032360A1 Method for the chemical vapour infiltration of a material consisting of carbon and silicon and/or boron
10/17/1996DE19514083A1 Rapid thermal processing reactor operation
10/17/1996CA2217702A1 Method for the chemical vapour infiltration of a material consisting of carbon and silicon and/or boron
10/16/1996EP0738003A2 Method of forming silicon oxide layer for semiconductor devices using low pressure chemical vapor deposition (LPCVD)
10/16/1996EP0738002A2 Stabilization of sheet resistance of electrical conductors
10/16/1996EP0737258A1 Process for deposition of diamondlike, electrically conductive and electron-emissive carbon-based films
10/16/1996EP0737256A1 Microwave plasma reactor
10/16/1996EP0737255A1 Flexible, corrosion-resistant coated aluminium-based strip-------
10/16/1996EP0706318A4 Method of pretreating metal surfaces for subsequent polymer coating
10/16/1996EP0688305A4 Coatings on glass
10/16/1996CN1133349A Forming method for lead phthalic and lanthanum phthalic film
10/15/1996US5565414 Shows superconductivity at boiling point of liquid helium
10/15/1996US5565382 Process for forming tungsten silicide on semiconductor wafer using dichlorosilane gas
10/15/1996US5565249 Method for producing diamond by a DC plasma jet
10/15/1996US5565248 Placing vaporizer containing inert inorganic material inside container, forming plasma of the material, coating interior
10/15/1996US5565247 Process for forming a functional deposited film
10/15/1996US5565036 Apparatus and method for igniting plasma in a process module
10/15/1996US5565031 Method for low temperature selective growth of silicon or silicon alloys
10/10/1996WO1996031687A1 Method and composite for protection of thermal barrier coating with an impermeable barrier coating
10/10/1996WO1996031447A1 Chemical vapour infiltration method with variable infiltration parameters
10/09/1996EP0736881A2 Electrical resistance device with CrSi resistance layer
10/09/1996EP0736615A2 Coated cutting insert
10/09/1996EP0736614A2 Method and apparatus for producing semiconductor device
10/09/1996EP0736613A1 Cyclone evaporator
10/09/1996EP0736612A2 Process for coating solar collectors
10/09/1996EP0736110A1 Process and device for producing three-dimensional structures by the optically stimulated separation of material from a fluid compound
10/09/1996CN1132930A Plasma treating device
10/09/1996CN1132803A Film forming method and device
10/09/1996CN1132800A Plasma processing method and plasma processing apparatus
10/09/1996CN1132799A Method for synthesizing Beta-C3N4 superhard film material using radio-freq chemical gas-phase sedimentation
10/08/1996US5563105 PECVD method of depositing fluorine doped oxide using a fluorine precursor containing a glass-forming element
10/08/1996US5563092 Method of producing a substrate for an amorphous semiconductor
10/08/1996US5562952 Plasma-CVD method and apparatus
10/08/1996US5562947 Vapor deposition of semiconductors
10/08/1996US5562841 Methods and apparatus for treating a work surface
10/08/1996US5562776 Apparatus for microwave plasma enhanced physical/chemical vapor deposition
10/08/1996US5562775 Plasma downstream processing
10/08/1996US5562774 Coated quartz glass component
10/08/1996US5562771 Apparatus for manufacturing microcrystal particles and manufacturing method for the microcrystal particles
10/08/1996US5562769 Microelectronics with diamond layer single crystal structure semiconductors
10/08/1996US5562132 Bulk containers for high purity chemical delivery systems
10/03/1996WO1996030938A2 Process for fabricating layered superlattice materials and making electronic devices including same
10/03/1996WO1996030557A1 Enhanced adherence of diamond coatings employing pretreatment process
10/02/1996EP0735574A1 Improved slit valve door
10/02/1996EP0735160A1 Process and apparatus for microwave assisted low temperature CVD of silica layers
10/02/1996EP0734464A1 Porous substrate densification method
10/02/1996EP0734463A1 Gas diffuser plate assembly and rf electrode
10/02/1996EP0734462A1 Use of an excited gas forming apparatus
10/02/1996EP0734461A1 Use of an excited gas forming apparatus
10/02/1996EP0712447A4 Welded susceptor assembly
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