Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/1996
10/02/1996DE19600946A1 Verfahren zur Verbesserung der Qualität einer Titannitridschicht, die Kohlenstoff und Sauerstoff enthält Includes methods for improving the quality of a titanium nitride layer, the carbon and oxygen
10/02/1996DE19547017A1 Selective face growth of cpd. semiconductor layer
10/02/1996DE19513614C1 Bipolar pulsed plasma CVD of carbon@ layer on parts with complicated geometry
10/02/1996DE19512323A1 Operating element for welding unit, esp. electrode holder or nozzle
10/02/1996CN1132407A Surface treatment method and system
10/02/1996CN1132267A Method of growing diamond film on large area of monocrystalline silicon
10/01/1996US5561735 Rapid thermal processing apparatus and method
10/01/1996US5561682 Semiconductor optical device and method for fabricating the same
10/01/1996US5561612 For presetting and controlling a lamp heating system
10/01/1996US5561087 Variations in temperature between central and edges portions
10/01/1996US5560839 Etching to selectively remove portion of cobalt binder, cleaning surface, etching in second solution to remove surface carbide grains, cleaning, depositing diamond film
10/01/1996US5560779 Apparatus for synthesizing diamond films utilizing an arc plasma
10/01/1996US5560778 Apparatus for forming a dielectric layer
10/01/1996US5560777 Apparatus for making a semiconductor
09/1996
09/26/1996WO1996029728A1 Integrated circuits having mixed layered superlattice materials and precursor solutions for use in a process of making the same
09/26/1996WO1996029726A1 Uv radiation process for making electronic devices having low-leakage-current and low-polarization fatigue
09/26/1996WO1996029446A1 Chemical vapor deposition of levitated objects
09/26/1996WO1996029445A1 Chemical vapor deposition of rhenium on carbon substrates
09/26/1996WO1996029441A2 High growth rate homoepitaxial diamond film deposition at high temperatures by microwave plasma-assisted chemical vapor deposition
09/26/1996DE19545050A1 Plasma-aided layer pptn. of functional layers on substrate
09/26/1996CA2214833A1 Integrated circuits having mixed layered superlattice materials and precursor solutions for use in a process of making the same
09/26/1996CA2214563A1 Uv radiation process for making electronic devices having low-leakage-current and low-polarization fatigue
09/25/1996EP0734064A2 Material for forming wiring layer and wiring forming method
09/25/1996EP0734053A1 Improvements in or relating to electrostatic chucks for holding substrates in process chambers
09/25/1996EP0734052A1 Improvements in or relating to electrostatic holding systems for holding substrates in processing chambers
09/25/1996EP0733723A1 Thermal barrier coating system
09/25/1996EP0733721A1 Process and apparatus for producing oxide films and chemical vapor deposition
09/25/1996EP0733130A1 Apparatus for heating or cooling wafers
09/25/1996EP0605703A4 Methods and apparatus for externally treating a container with application of internal bias gas.
09/25/1996EP0601166A4 Methods and apparatus for depositing barrier coatings.
09/25/1996EP0576559B1 Interfacial plasma bars for photovoltaic deposition apparatus
09/24/1996US5559260 Precursors and processes for making metal oxides
09/24/1996US5558946 Multilayered thin ferroelectric film
09/24/1996US5558910 Uniform tungsten silicide films produced by chemical vapor deposition
09/24/1996US5558789 Method of applying a laser beam creating micro-scale surface structures prior to deposition of film for increased adhesion
09/24/1996US5558722 Plasma processing apparatus
09/24/1996US5558721 Vapor phase growth system and a gas-drive motor
09/24/1996US5558719 Plasma processing apparatus
09/24/1996US5558717 CVD Processing chamber
09/24/1996US5558687 Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
09/19/1996WO1996028587A1 Plasma chamber
09/19/1996WO1996028586A1 Plasma enhanced chemical vapor deposition of titanium nitride using ammonia
09/19/1996WO1996028585A1 Showerhead discharge assembly for delivery of source reagent vapor to a substrate, and cvd process
09/19/1996WO1996028270A1 Guide bush and method for forming a hard carbon film on an internal circumferential surface of said bush
09/19/1996DE19510853A1 Semiconductor prodn. esp. gas phase epitaxy appts.
09/18/1996EP0732732A2 Method of removing native silicon oxide by sputtering
09/18/1996EP0732429A1 Method of growing multilayer crystal films by metal organic vapor phase epitaxy
09/18/1996EP0732422A2 Ferroelectric thin-film coated substrate, method for its manufacture and nonvolatile memory comprising such a substrate
09/18/1996EP0732421A1 Method of making a graphite system
09/18/1996EP0731975A1 Stacked-type component and method for the manufacture of same
09/18/1996EP0731974A1 Method for the manufacture of a capacitor and capacitor obtained
09/18/1996EP0731909A1 Sensors employing interference of electromagnetic waves passing through waveguides having functionalized surfaces
09/18/1996EP0731751A1 Diamond-coated tools and process for making
09/18/1996CN1131204A Deposited film forming apparatus and electrode for use in it
09/17/1996US5556530 Flat panel display having improved electrode array
09/17/1996US5556501 Silicon scavenger in an inductively coupled RF plasma reactor
09/17/1996US5556476 Controlling edge deposition on semiconductor substrates
09/17/1996US5556475 Microwave plasma reactor
09/17/1996US5556474 Plasma processing apparatus
09/17/1996US5556473 Poly-p-xylylene
09/17/1996US5556275 Heat treatment apparatus
09/17/1996US5556204 Method and apparatus for detecting the temperature of a sample
09/12/1996WO1996027690A1 Method and apparatus for plasma deposition on a double-sided substrate
09/12/1996DE19507206A1 Flexible prodn. of microstructures on large surfaces
09/11/1996EP0731497A2 Diluted nitrogen trifluoride thermal cleaning process
09/11/1996EP0731493A2 Method for formation of a polycrystalline semiconductor film
09/11/1996EP0731190A1 Process for the formation of carbon coatings
09/11/1996EP0730679A1 An epitaxial reactor, susceptor and gas-flow system
09/11/1996EP0730671A1 Method and device for feeding precursors into a chemical vapour deposition chamber
09/11/1996EP0730670A1 Coated body, its method of production and its use
09/11/1996EP0730564A1 Method for densifying a porous structure using boron nitride, and porous structure densified with boron nitride
09/11/1996EP0616729B1 Semiconductor device and microwave process for its manufacture
09/11/1996CN1130924A Method of depositing thin group III A metal films
09/11/1996CN1130561A Method for manufacturing plastic forming dies
09/11/1996CN1032769C Depositing device by chemical and gas phase process with dual direct current plasma
09/11/1996CN1032768C Low temp. deposition fine-particle diamond film by microwave method
09/10/1996US5555154 CVD Raw Material for oxide-system dielectric thin film and capacitor produced by CVD method using the CVD raw material
09/10/1996US5554570 Method of forming insulating film
09/10/1996US5554418 Method of forming passivation film
09/10/1996US5554415 Vaporization with lasers; coating
09/10/1996US5554257 Cleaning or etching semiconductors by reacting gases in vacuum; explosion, combustion, projecting
09/10/1996US5554255 Method of and apparatus for a direct voltage arc discharge enhanced reactive treatment of objects
09/10/1996US5554249 Magnetron plasma processing system
09/10/1996US5554226 Heat treatment processing apparatus and cleaning method thereof
09/10/1996US5554222 Ionization deposition apparatus
09/10/1996US5554220 Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities
09/10/1996US5553395 Bubbler for solid metal organic source material and method of producing saturated carrying gas
09/06/1996WO1996027032A1 Chemical vapor deposition utilizing a precursor
09/04/1996EP0730298A2 A dielectric, a manufacturing method thereof, and semiconductor device using the same
09/04/1996EP0730266A2 Apparatus for plasma-processing a disk substrate and method of manufacturing a magnetic disk
09/04/1996EP0730048A1 Method for vapor-phase growth of single crystal silicon
09/04/1996EP0730044A2 Boron-aluminum nitride coating and method of producing same
09/04/1996EP0730043A1 Multilayer system comprising a diamond layer, an interphase and a metallic substrate
09/04/1996EP0729394A1 Making quantum dot particles of uniform size
09/04/1996EP0668938B1 Tool and process for coating a basic tool component
09/03/1996US5552675 High temperature reaction apparatus
09/03/1996US5552220 Thermostructural composite materials
09/03/1996US5552181 Method for supplying liquid material and process for forming thin films using the liquid material supplying method
09/03/1996US5552124 Stationary focus ring for plasma reactor
09/03/1996US5552027 Working electrode for electrochemical enzymatic sensor systems