| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/11/1996 | EP0747504A1 Spinning holder for cutting tool inserts for arc-jet diamond deposition |
| 12/11/1996 | EP0747503A1 Reactant gas injector for chemical vapor deposition apparatus |
| 12/11/1996 | EP0747502A1 Improved adhesion layer for tungsten deposition |
| 12/11/1996 | EP0746874A1 Chemical vapor deposition chamber |
| 12/11/1996 | EP0746563A1 Method for the deposition of nickel and/or nickel oxide from the gas phase, and novel nickel compounds having stable vaporisation characteristics |
| 12/11/1996 | EP0746419A1 Method and apparatus for coating glassware |
| 12/10/1996 | US5584045 Polycrystalline diamond tool and method for producing same |
| 12/10/1996 | US5583205 Metalorganic chemical vapor deposition method for depositing f-series metal or nitrogen and metal amides for use in mocvd |
| 12/10/1996 | US5582866 For cleaning semiconductor substrates |
| 12/10/1996 | US5582863 Process for forming a reflective surface |
| 12/10/1996 | US5582648 For formation of amorphous silicon film on substrate, the film being used as photosensitive member for electrography |
| 12/10/1996 | US5582647 Material supplying apparatus |
| 12/10/1996 | CA2607846A1 Glazing panel having solar screening properties and a process for making such a panel |
| 12/08/1996 | CA2154048A1 Wafer support structure for a wafer backplane with a curved surface |
| 12/05/1996 | WO1996030938A3 Process for fabricating layered superlattice materials and making electronic devices including same |
| 12/05/1996 | WO1996020898A3 Precision burners for oxidizing halide-free, silicon-containing compounds |
| 12/04/1996 | EP0746009A1 Multi-layer susceptor for rapid thermal process reactors |
| 12/04/1996 | EP0745605A2 Liquid methyltin halide compositions |
| 12/04/1996 | EP0745149A1 Plasma modification of lumen surface of artificial tubing |
| 12/04/1996 | CN1137296A Apparatus for heating or cooling wafers |
| 12/03/1996 | US5581116 Semiconductor device manufactured by selectively controlling growth of an epitaxial layer without a mask |
| 12/03/1996 | US5580830 Modified reaction chamber and improved gas flushing method in rapid thermal processing apparatus |
| 12/03/1996 | US5580822 Chemical vapor deposition method |
| 12/03/1996 | US5580697 Reacting a solid substrate with a photosensitive nitrenogenic compound, e.g. a tetrafluorophenyl azide; photolithography |
| 12/03/1996 | US5580658 Copper-carbon composite material with graded function and method for manufacturing the same |
| 12/03/1996 | US5580421 Apparatus for surface conditioning |
| 12/03/1996 | US5580388 Multi-layer susceptor for rapid thermal process reactors |
| 12/03/1996 | US5580385 Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
| 12/03/1996 | US5580384 Method and apparatus for chemical coating on opposite surfaces of workpieces |
| 12/03/1996 | US5580380 Electrically biasing projections; exposure to hydrocarbon plasma |
| 12/03/1996 | US5580364 Method of producing a coated glass substrate exhibiting reflected color |
| 12/03/1996 | US5579718 Slit valve door |
| 12/03/1996 | CA2175953A1 Liquid methyltin halide compositions |
| 12/03/1996 | CA1338754C Metal oxide material |
| 11/28/1996 | WO1996037763A1 Semiconductor substrate processing system and method providing shielded optical pyrometry |
| 11/28/1996 | WO1996037744A1 Apparatus and method for batch thermal conditioning of substrates |
| 11/28/1996 | WO1996037639A2 Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities |
| 11/27/1996 | EP0744779A2 A manufacturing method of compound semiconductor thinfilms and photoelectric device or solar cell using the same compound semiconductor thinfilms |
| 11/27/1996 | EP0744768A1 Device comprising films of beta-C3N4 |
| 11/27/1996 | EP0744474A1 Chemical vapor deposition reactor and method of producing oxide superconductive conductor using the same |
| 11/27/1996 | EP0642600B1 Device for producing a plasma polymer protection layer on workpieces, in particular headlamp reflectors |
| 11/27/1996 | EP0463079B1 Zinc oxyfluoride transparent conductor |
| 11/27/1996 | CN1033384C Preparing method for ferroelectric film of bismuth titanate |
| 11/26/1996 | US5578532 Wafer surface protection in a gas deposition process |
| 11/26/1996 | US5578132 Apparatus for heat treating semiconductors at normal pressure and low pressure |
| 11/26/1996 | US5578131 Fluoropolymers |
| 11/26/1996 | US5578130 Apparatus and method for depositing a film |
| 11/26/1996 | CA2124052C Liquid indium source |
| 11/21/1996 | WO1996036441A1 COATING OF TiO2 PIGMENT BY GAS-PHASE AND SURFACE REACTIONS |
| 11/20/1996 | EP0743379A1 Apparatus for vapor-phase epitaxial growth |
| 11/20/1996 | EP0743377A1 Apparatus for chemical surface treatment of flat substrate using active gas |
| 11/20/1996 | EP0743376A2 Light-receiving member, process for its production and its use in electrophotographic apparatus and method |
| 11/20/1996 | EP0743375A2 Method of producing diamond-like-carbon coatings |
| 11/20/1996 | EP0742848A1 Plasma treatment and apparatus in electronic device manufacture |
| 11/20/1996 | EP0742847A1 A method of depositing tungsten nitride using a source gas comprising silicon |
| 11/20/1996 | EP0616703B1 Particles suitable for use as carrier particles in electrophotography |
| 11/20/1996 | CN1136365A Electric lamp coated with an interference film |
| 11/20/1996 | CN1136292A Diamond-coated tools and process for making |
| 11/20/1996 | CN1136088A Manufacture of diamond film with Baji-tube as base coating |
| 11/19/1996 | US5577263 Chemical vapor deposition of fine grained rhenium on carbon based substrates |
| 11/19/1996 | US5576629 Plasma monitoring and control method and system |
| 11/19/1996 | US5576076 Process for creating a deposit of silicon oxide on a traveling solid substrate |
| 11/19/1996 | US5576071 Injecting hydrogen gas to react with carbon in layer |
| 11/19/1996 | US5576060 CVD process of forming hydrogenated a-Si films |
| 11/19/1996 | US5576059 Using a preheat ring barrier; low pressure vapor deposition |
| 11/19/1996 | US5576058 Batch loading system for CVD |
| 11/19/1996 | US5575886 Method for fabricating semiconductor device with chemical-mechanical polishing process for planarization of interlayer insulation films |
| 11/19/1996 | US5575856 Thermal cycle resistant seal and method of sealing for use with semiconductor wafer processing apparatus |
| 11/19/1996 | US5575855 Apparatus for forming a deposited film |
| 11/19/1996 | US5575854 Semiconductor treatment apparatus |
| 11/19/1996 | US5575853 Vacuum exhaust system for processing apparatus |
| 11/13/1996 | EP0742579A2 A method and apparatus for concentrating plasma on a substrate surface during processing |
| 11/13/1996 | EP0742290A1 Chemical vapor deposition (CVD) of silicon dioxide films using oxygen-silicon source reactants and a free radical promoter |
| 11/13/1996 | EP0741909A1 Methods for improving semiconductor processing |
| 11/13/1996 | EP0601151B1 Process for regulating a hot cathode glow discharge |
| 11/13/1996 | CN1135454A System of coveying liquid at special speed using supersonic vibrator |
| 11/12/1996 | US5574379 System for measuring electromagnetic properties |
| 11/12/1996 | US5574247 CVD reactor apparatus |
| 11/12/1996 | US5573981 Method of removing residual charges of an electrostatic chuck used in a layer deposition process |
| 11/12/1996 | US5573742 From alkylaluminum and ammonia, deposited on graphite substrate, antenna windows |
| 11/12/1996 | US5573597 Plasma processing system with reduced particle contamination |
| 11/12/1996 | US5573595 Methods and apparatus for generating plasma |
| 11/07/1996 | WO1996035228A1 Slip free vertical rack design |
| 11/07/1996 | WO1996035091A1 Unibody crucible |
| 11/07/1996 | WO1996034994A1 Chemical vapor deposition method and apparatus |
| 11/07/1996 | DE19516446A1 Prodn. of semiconductor constructional element used for solar cell |
| 11/06/1996 | EP0741196A1 Method for depositing a silicium oxide layer |
| 11/06/1996 | EP0741195A1 Composite diamond layer, method of its making and its use |
| 11/06/1996 | EP0740757A1 Chemical refill system for high purity chemicals |
| 11/06/1996 | EP0495065B1 Method for depositing a transparent antistatic thin film on the surface of a shaped object of which at least the surface portion is made of a styrene polymer or copolymer, to provide said object with lasting antistatic properties without altering its appearance |
| 11/05/1996 | US5571749 Method and apparatus for forming deposited film |
| 11/05/1996 | US5571616 Ultrasmooth adherent diamond film coated article and method for making same |
| 11/05/1996 | US5571615 Ultrasmooth adherent diamond film coated article and method for making same |
| 11/05/1996 | US5571578 Plasma chemical vapor deposition, perfluoroalkane, oxygen |
| 11/05/1996 | US5571577 Method and apparatus for plasma treatment of a surface |
| 11/05/1996 | US5571576 Method of forming a fluorinated silicon oxide layer using plasma chemical vapor deposition |
| 11/05/1996 | US5571572 Vapor deposition, injection and pressurization |
| 11/05/1996 | US5571571 Silicon oxide films |
| 11/05/1996 | US5571561 Coated filaments |
| 11/05/1996 | US5571331 Vacuum treatment apparatus |