| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/08/1997 | EP0610392B1 Methods for treating a work surface |
| 01/08/1997 | CN1139958A Coated body, its method of production and its use |
| 01/08/1997 | CN1139819A Electrolyte, making process and semicondoctor device |
| 01/07/1997 | US5592581 Heat treatment apparatus |
| 01/07/1997 | US5592004 Ultraviolet radiation erasable |
| 01/07/1997 | US5591681 Method for achieving a highly reliable oxide film |
| 01/07/1997 | US5591680 Semiconductors |
| 01/07/1997 | US5591494 Nitriding from a silane, nitrogen-containing organosilane, and nitrogen containing gas |
| 01/07/1997 | US5591493 Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
| 01/07/1997 | US5591492 Process for forming and etching a film to effect specific crystal growth from activated species |
| 01/07/1997 | US5591486 Method for forming a film on a substrate by activating a reactive gas |
| 01/07/1997 | US5591485 Method and apparatus for producing nickel shell molds |
| 01/07/1997 | US5591484 Chemical vapor deposition using amino-borane compounds |
| 01/07/1997 | US5591483 Process for the preparation of metal nitride coatings from single source precursors |
| 01/07/1997 | US5591269 Vacuum processing apparatus |
| 01/07/1997 | US5591268 Plasma process with radicals |
| 01/07/1997 | US5591267 Reduced pressure device |
| 01/07/1997 | US5590695 Manifold systems for high purity chemical delivery systems |
| 01/03/1997 | WO1997000336A1 Oriented niobate ferroelectric thin films for electrical and optical devices and method of making such films |
| 01/02/1997 | EP0751237A1 Segmented substrate for arc-jet diamond deposition |
| 01/02/1997 | EP0750688A1 Batch loading system for cvd |
| 01/02/1997 | DE19536131C1 Vehicle diversity antenna plate with multiple connection elements e.g. for FM reception |
| 01/02/1997 | DE19523444A1 Scratch- and corrosion-resistant coating prodn. on plastics etc. without heating |
| 01/02/1997 | DE19523442A1 Production of transparent quartz-like coating on a metal surface |
| 01/02/1997 | DE19523208A1 Wärmeübertrager, insbesondere Verdampfer für eine Kraftfahrzeug-Klimaanlage Heat exchanger, in particular an evaporator for an automotive air-conditioning |
| 01/02/1997 | DE19522865A1 Material with improved short-wavelength ultraviolet absorption |
| 01/01/1997 | CN1139462A Dents for reed in high-speed weaving machine, and method of manufacturing same |
| 01/01/1997 | CN1139460A Epitaxial reactor, susceptor and gas-flow system |
| 12/31/1996 | US5589737 Plasma processor for large workpieces |
| 12/31/1996 | US5589425 Process of selective area chemical vapor deposition of metal films |
| 12/31/1996 | US5589421 Method of manufacturing annealed films |
| 12/31/1996 | US5589233 Single chamber CVD process for thin film transistors |
| 12/31/1996 | US5589232 Method of making a wear component by plasma jet CVD |
| 12/31/1996 | US5589231 Halogen-activated chemical vapor deposition of diamond |
| 12/31/1996 | US5589224 Apparatus for full wafer deposition |
| 12/31/1996 | US5589223 Process for producing cermet cutting tools having both longitudinal and granular crystal structures |
| 12/31/1996 | US5589110 Container for liquid metal organic compound |
| 12/31/1996 | US5589003 Shielded substrate support for processing chamber |
| 12/31/1996 | US5589001 Apparatus for forming a film on a wafer |
| 12/31/1996 | US5588827 Passive gas substrate thermal conditioning apparatus and method |
| 12/27/1996 | WO1996042105A1 Method for forming salicides |
| 12/27/1996 | WO1996041901A1 Use of plasma polymer layer sequences as functional layers in material transport or heat exchanger systems |
| 12/27/1996 | WO1996041897A2 Durable plasma treatment apparatus and method |
| 12/27/1996 | EP0750340A1 Nitrogen gas supply system |
| 12/27/1996 | EP0749474A1 Microfabricated capsules for isolation of cell transplants |
| 12/27/1996 | EP0749354A1 Regulation of pyrocarbon coating |
| 12/27/1996 | EP0749352A1 Microfabricated particle filter |
| 12/27/1996 | EP0737256A4 Microwave plasma reactor |
| 12/27/1996 | EP0536384B1 Method of coating a substrate in a fluidized bed |
| 12/27/1996 | CA2222123A1 Method for forming salicides |
| 12/25/1996 | CN1138881A Oxide coated cutting tool |
| 12/25/1996 | CN1138746A Treatment unit of gas heat-transfer plasma |
| 12/25/1996 | CN1138635A Method and appts. for low temp plating diamond thin film |
| 12/24/1996 | US5587233 Composite body and its use |
| 12/24/1996 | US5587210 Growing and releasing diamonds |
| 12/24/1996 | US5587207 Apparatus providing homogeneous concentrated plasma column in cylindrical reaction tube in which substrate holders are configured to act as liner confining arc in channel |
| 12/24/1996 | US5587205 Plasma processing method and an apparatus for carrying out the same |
| 12/24/1996 | US5587124 Method of making synthetic diamond film with reduced bowing |
| 12/24/1996 | US5587019 Apparatus for use in epitaxial crystal growth |
| 12/24/1996 | US5587013 Methods of synthesizing and polishing a flat diamond film and free-standing diamond film |
| 12/19/1996 | WO1996041368A1 Multilayer high vertical aspect ratio thin film structures |
| 12/19/1996 | WO1996041366A1 Plasma processing system with reduced particle contamination |
| 12/19/1996 | WO1996041109A1 Passive gas substrate thermal conditioning apparatus and method |
| 12/19/1996 | WO1996041040A1 Etchant for aluminium alloys |
| 12/19/1996 | WO1996041036A2 Method and apparatus for silicon deposition in a fluidized-bed reactor |
| 12/19/1996 | WO1996041035A1 Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same |
| 12/19/1996 | WO1996041034A1 Electrically tunable coatings |
| 12/19/1996 | WO1996040690A1 Metal complex source reagents for chemical vapor deposition |
| 12/19/1996 | WO1996040448A1 Process for the chemical vapor deposition of titanium and titanium nitride |
| 12/19/1996 | WO1996040446A1 Erosion resistant diamond-like nanocomposite coatings for optical components |
| 12/19/1996 | WO1996040420A1 Micromachined porous membranes with bulksupport |
| 12/19/1996 | WO1996040308A1 Treatments to reduce thrombogeneticity in heart valves made from titanium and its alloys |
| 12/19/1996 | WO1996039943A1 Diamond-like nanocomposite corrosion resistant coatings |
| 12/19/1996 | DE19622322A1 Vapour phase growth appts. |
| 12/19/1996 | DE19521716A1 Process tube for making semiconductor wafers |
| 12/19/1996 | DE19521344A1 Stofftransport- oder Wärmetauschersysteme mit Funktionsflächen mit definiert einstellbarem Benetzungsverhalten Mass transfer or heat exchange systems with functional surfaces with defined adjustable wetting behavior |
| 12/19/1996 | CA2224068A1 Electrically tunable coatings |
| 12/19/1996 | CA2223677A1 Metal complex source reagents for chemical vapor deposition |
| 12/19/1996 | CA2195878A1 Etchant for aluminium alloys |
| 12/18/1996 | EP0749148A2 Plasma processing apparatus |
| 12/18/1996 | EP0748881A1 Thin-film vapor deposition apparatus |
| 12/18/1996 | EP0748260A1 Ion beam process for deposition of highly abrasion-resistant coatings |
| 12/18/1996 | EP0748259A1 Highly abrasion-resistant, flexible coatings for soft substrates |
| 12/18/1996 | EP0728069A4 Abrasion wear resistant coated substrate product |
| 12/18/1996 | EP0644954B1 Semiconductor wafer processing cvd reactor |
| 12/17/1996 | US5585176 High bonding strength between diamond coating and substrate surface |
| 12/17/1996 | US5585149 CVD method for forming a photoconductive hydrogenated a-Si layer |
| 12/17/1996 | US5585148 Process for forming a deposited film using a light transmissive perforated diffusion plate |
| 12/17/1996 | US5584971 Treatment apparatus control method |
| 12/17/1996 | US5584963 Reaction chamber having reactive gas introducing means and vacuum evacuation pipe, also means for introducing anhydrous hydrogen fluoride gas, interhalogen compound gas, carrier gas connected to chamber and/or pipe |
| 12/17/1996 | US5584936 Susceptor for semiconductor wafer processing |
| 12/17/1996 | US5584934 Method and apparatus for preventing distortion of horizontal quartz tube caused by high temperature |
| 12/17/1996 | US5584933 Process for plasma deposition and plasma CVD apparatus |
| 12/12/1996 | WO1996039548A1 Process for plasma enhanced anneal of titanium nitride |
| 12/12/1996 | WO1996039248A1 Fluidized bed with uniform heat distribution and multiple port nozzle |
| 12/12/1996 | WO1996033098A3 Gas-impermeable, chemically inert container structure and method of producingthe same |
| 12/12/1996 | CA2222227A1 Process for plasma enhanced anneal of titanium nitride |
| 12/11/1996 | EP0747934A1 Apparatus for supporting substrates in processing chambers |
| 12/11/1996 | EP0747928A1 Electrode designs for controlling uniformity profiles in plasma processing reactors |
| 12/11/1996 | EP0747505A2 Apparatus and method for depositing a substance with temperature control |