Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/1997
02/25/1997US5605574 Semiconductor wafer support apparatus and method
02/20/1997WO1997006565A1 Process for preparing thin-film transistor, process for preparing active matrix substrate, and liquid crystal display
02/20/1997WO1997006556A1 Process for generating a spacer in a structure
02/20/1997WO1997006288A1 Process chamber with inner support
02/20/1997WO1997005994A1 Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions
02/20/1997WO1996029441A3 High growth rate homoepitaxial diamond film deposition at high temperatures by microwave plasma-assisted chemical vapor deposition
02/20/1997DE19530518A1 Metal carbonitride hard coating
02/20/1997DE19530517A1 Metal carbonitride hard coating
02/19/1997EP0758688A1 Apparatuses for deposition or etching
02/19/1997EP0758409A1 Multi-frequency inductive method and apparatus for the processing of material
02/19/1997EP0749352A4 Microfabricated particle filter
02/18/1997US5604153 Forming fine aluminum lines in a dimension of about 100 angstroms by chemical deposition of a dialkyl aluminum hydride on a selectively hydrogenated, irradiated and oxidized substrate surface
02/18/1997US5604151 Chemical vapor deposition-produced silicon carbide having improved properties
02/18/1997US5604037 Useful as integral dielectric heat sink for electronic systems in spacecraft, aircraft and supercomputers
02/18/1997US5603988 Exposing heated substrate to vapor phase titanium and/or tantalum silylamido compound to cleave nitrogen-silicon bonds
02/18/1997US5603771 Chemical vapor deposition apparatus activated by a microwave plasma
02/18/1997US5603169 Bubbler for solid metal-organic percursors
02/13/1997WO1997005757A1 Diamond electronic packages featuring bonded metal
02/13/1997WO1997005299A1 Product with a metallic base body provided with cooling channels and its manufacture
02/13/1997WO1997005298A1 Titanium-based films formed by chemical vapor deposition
02/13/1997WO1997004906A1 Method of producing metal quantum dots
02/12/1997EP0757918A2 Gas recovery unit
02/12/1997EP0757884A1 Method of forming a fluorinated silicon oxide layer using plasma chemical vapor deposition
02/12/1997CN1142673A Membrane forming material and circuit layout forming method
02/12/1997CN1142421A Coated cutting insert
02/11/1997US5601902 Moisture-resistant
02/11/1997US5601883 Microwave enhanced CVD method for coating plastic with carbon films
02/11/1997US5601695 Etchant for aluminum alloys
02/11/1997US5601653 Apparatus for performing plasma process on semiconductor wafers and the like and method of performing plasma process
02/11/1997US5601651 Flow control valve for use in fabrication of semiconductor devices
02/06/1997WO1997004478A2 Plasma treatment apparatus for large area substrates
02/06/1997WO1997004143A1 Cvd-coated titanium based carbonitride cutting tool insert
02/05/1997EP0757117A1 Method and apparatus for deposition of material on a semiconductor wafer
02/05/1997EP0746419A4 Method and apparatus for coating glassware
02/04/1997US5599739 Barrier layer treatments for tungsten plug
02/04/1997US5599404 Stability
02/04/1997US5599397 Semiconductor wafer process chamber with suspector back coating
02/04/1997US5599387 Compounds and compositions for coating glass with silicon oxide
02/04/1997US5599371 Method of using precision burners for oxidizing halide-free, silicon-containing compounds
02/04/1997US5599369 Hood for metal-oxide vapor coating glass containers
02/04/1997US5599144 Low friction flute tungsten carbon microdrill
01/1997
01/30/1997WO1997003495A1 Electrostatic chuck assembly
01/30/1997WO1997003476A1 ELECTROCATALYTIC STRUCTURE COMPRISING A MATRIX OF SiOxCyHz HAVING DISPERSED THEREIN PARTICLES OF CATALYTIC MATERIAL
01/30/1997WO1997003236A2 System and method for thermal processing of a semiconductor substrate
01/30/1997WO1997003225A1 Programmable ultraclean electromagnetic substrate rotation apparatus and method for microelectronics manufacturing equipment
01/30/1997WO1997003224A1 A plasma enhanced chemical processing reactor and method
01/30/1997WO1997003223A1 Gas distribution apparatus
01/30/1997WO1997003029A1 Glazing including a conductive and/or low-emissive layer
01/30/1997CA2199622A1 Glazing including a conductive and/or low-emissive layer
01/29/1997EP0755460A1 Process to produce diamond films
01/29/1997EP0755327A1 Barrier films having carbon-coated surfaces
01/29/1997EP0755231A1 Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys
01/29/1997EP0605534B1 Apparatus for rapid plasma treatments and method
01/29/1997CN1141602A Using laser for fabricating coatings substrate
01/28/1997US5597625 Low pressure growth of cubic boron nitride films
01/28/1997US5597624 Optical fibers
01/28/1997US5597623 Vapor deposition of films on substrate
01/28/1997US5597609 Process and apparatus for the continuous or semi-continuous coating of eyeglass lenses
01/28/1997US5597439 Process gas inlet and distribution passages
01/28/1997US5597272 Coated hard alloy tool
01/28/1997US5597064 Electric contact materials, production methods thereof and electric contacts used these
01/28/1997CA2086401C Method for manufacturing ultrathin inorganic membranes
01/23/1997WO1997002368A1 Process for the preparation of magnesium oxide films using organomagnesium compounds
01/23/1997DE19606226A1 Vapour phase esp. MOCVD growth appts.
01/22/1997EP0755066A1 Electrostatic chuck
01/22/1997EP0754248A1 An improved module in an integrated delivery system for chemical vapors from liquid sources
01/21/1997US5596478 Apparatus for neutralizing charged body
01/21/1997US5595793 Vapor deposition by microwaves for optical fibers
01/21/1997US5595792 Method and apparatus for producing magnetic recording medium
01/21/1997US5595784 Semiconductor films, silicides, metallization
01/21/1997US5595612 Improved adhesion of steels to boride, carbide and nitride coatings
01/21/1997US5595606 Shower head and film forming apparatus using the same
01/21/1997US5595604 Wafer supporting boat
01/21/1997US5595603 Apparatus for the controlled delivery of vaporized chemical precursor to an LPCVD reactor
01/21/1997US5595602 Diffuser for uniform gas distribution in semiconductor processing and method for using the same
01/21/1997US5595600 Low temperature selective growth of silicon or silicon alloys
01/21/1997CA1338864C Process for producing thallium type superconducting thin film
01/16/1997WO1997001656A1 Plasmapolymer surface coating, coating process therefor and heat exchanger coated therewith
01/16/1997WO1997001655A1 A scalable helicon wave plasma processing device with a non-cylindrical source chamber
01/16/1997WO1996037639A3 Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities
01/15/1997EP0753881A1 Plasma etching apparatus utilising plasma confinement
01/15/1997EP0753603A2 Coated cutting insert
01/15/1997EP0753602A1 Oxide coated cutting tool
01/15/1997EP0753599A1 Method and apparatus for producing corrosion and wear resistant protective coatings on iron based substrates
01/15/1997EP0753481A1 Hydrophilic diamond particles and method of producing the same
01/15/1997EP0753082A1 Pcvd process and device for coating domed substrates
01/15/1997EP0721514A4 Magnetically enhanced multiple capacitive plasma generation apparatus and related method
01/15/1997EP0665814B1 Precursors and processes for making metal oxides
01/14/1997US5594280 Method of forming a thin film and apparatus of forming a metal thin film utilizing temperature controlling means
01/14/1997US5593782 Encapsulated electroluminescent phosphor and method for making same
01/14/1997US5593741 Method and apparatus for forming silicon oxide film by chemical vapor deposition
01/14/1997US5593740 Method and apparatus for making carbon-encapsulated ultrafine metal particles
01/14/1997US5593719 Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys
01/14/1997US5593541 Semiconductors
01/14/1997US5593497 Method for forming a deposited film
01/08/1997EP0752483A1 Method for coating metal or plastic articles
01/08/1997EP0752293A2 Diamond coated article and process for its production
01/08/1997EP0752288A1 Composite diamond wire die
01/08/1997EP0752018A1 Surface treatment techniques
01/08/1997EP0751844A1 Diamond-coated body with integral chip former