Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/1997
03/27/1997DE19634974A1 Preßform und unter ihrer Verwendung geformtes Glassubstrat für einen Computerspeicher Compression mold and molded using them glass substrate for a computer memory
03/27/1997DE19629877C1 CVD for internal coating of hollow articles with barrier film
03/26/1997EP0764969A2 Microwave plasma processing apparatus and microwave plasma processing method
03/26/1997EP0764726A1 Method for tuning barrel reactor purge system
03/26/1997EP0764346A1 High vertical aspect ratio thin film structures
03/26/1997EP0764221A1 Apparatus for deposition of thin-film, solid state batteries
03/25/1997US5615385 Method and apparatus for zero extension and bit shifting to preserve register parameters in a microprocessor utilizing register renaming
03/25/1997US5614272 Method for making small dimensional diamond-coated graphite articles
03/25/1997US5614258 Process of diamond growth from C70
03/25/1997US5614257 Low temperature, high pressure silicon deposition method
03/25/1997US5614252 Integrated circuits
03/25/1997US5614249 Leak detection system for a gas manifold of a chemical vapor deposition apparatus
03/25/1997US5614247 Apparatus for chemical vapor deposition of aluminum oxide
03/25/1997US5614140 Methods for fabricating diamond film and solid fiber composite structure
03/25/1997US5614026 Showerhead for uniform distribution of process gas
03/25/1997US5614018 Doped barium strontium titanate layer
03/20/1997WO1997010688A1 Method and apparatus for plasma cvd
03/20/1997WO1997010287A1 Method for obtaining a floor covering and product thus obtained
03/20/1997WO1997010147A1 Production of packaging material using chemical deposition
03/20/1997WO1997004478A3 Plasma treatment apparatus for large area substrates
03/20/1997DE19522923A1 Mfr. of crystalline, amorphous and epitaxial semiconductor layers on substrate
03/20/1997CA2231341A1 Method for obtaining a floor covering and product thus obtained
03/19/1997EP0763149A1 Method and apparatus for low temperature deposition of cvd and pecvd films
03/19/1997EP0763148A2 Reactor and process for coating flat substrates
03/19/1997EP0763147A1 Method and apparatus for producing thin films
03/19/1997EP0763146A1 LOW TEMPERATURE PLASMA-ENHANCED FORMATION OF TiN FILMS
03/19/1997EP0763145A1 Cold end glassware coating apparatus
03/19/1997EP0763144A1 Carbon-coated barrier films whith increased concentration
03/19/1997EP0530297B1 A process for the surface treatment of powder particles
03/19/1997CN2249757Y Chemical reaction chamber by HF induction heating
03/18/1997US5612229 Solar cells with reflecting layer with high conversion efficiency and high productive efficiency forming thin films by sputtering
03/18/1997US5612132 Chemical vapor deposition-produced silicon carbide having improved properties
03/18/1997US5611898 Reaction chamber having in situ oxygen generation
03/18/1997US5611883 Repairing crack or chip defects
03/18/1997US5611865 Alignment of a shadow frame and large flat substrates on a heated support
03/18/1997US5611864 Microwave plasma processing apparatus and processing method using the same
03/18/1997US5611863 Semiconductor processing apparatus and cleaning method thereof
03/18/1997US5611862 Method and apparatus for manufacturing head drums coated with diamond-like carbon coating film using high-frequency plasma
03/18/1997US5611685 Substrate heat treatment apparatus
03/13/1997WO1997009737A1 Wafer support system
03/13/1997WO1997009645A1 A method and apparatus for the construction of photosensitive waveguides
03/13/1997WO1997009463A1 Coated turning insert
03/13/1997WO1997009321A1 Method for the selective hydrogenation of vinyl oxirane to butylene oxide
03/13/1997CA2231373A1 A method and apparatus for the construction of photosensitive waveguides
03/12/1997EP0762518A2 Improvements in or relating to semiconductor devices
03/12/1997EP0762484A1 Method of forming an epitaxial layer with minimal autodoping
03/12/1997EP0762480A1 In-situ wafer temperature control apparatus for single wafer tools
03/12/1997EP0761841A1 Method for forming film
03/12/1997EP0761623A2 Diamond assembly
03/12/1997EP0760712A1 Method and apparatus for producing high purity and unagglomerated submicron particles
03/12/1997EP0644951B1 Method of nucleating tungsten on titanium nitride by cvd without silane
03/11/1997US5610762 Apparatus and method of making reflex molds
03/11/1997US5610106 Plasma enhanced chemical vapor deposition of titanium nitride using ammonia
03/11/1997US5609955 Diamond film and mixed diamond and non-diamond particle composite compositions
03/11/1997US5609737 Semiconductors
03/11/1997US5609721 Semiconductor device manufacturing apparatus and its cleaning method
03/11/1997US5609691 Plasma CVD apparatus for forming a thin film of uniform thickness
03/11/1997US5609690 Vacuum plasma processing apparatus and method
03/11/1997US5609688 Apparatus for producing semiconductor device
03/11/1997CA2021955C Method of producing finely divided particles or powder, vapour or fine droplets, and apparatus therefor
03/06/1997WO1997008743A1 Low mass susceptor
03/06/1997WO1997008361A1 Surface treatment apparatus using gas jet
03/06/1997WO1997008360A1 Method for forming a metallic or ceramic deposition coating
03/06/1997WO1997008356A2 Modified metalorganic chemical vapor deposition of group iii-v thin layers
03/06/1997WO1997003236A3 System and method for thermal processing of a semiconductor substrate
03/06/1997DE19532645A1 Verfahren zur selektiven Hydrierung von Vinyloxiran zu Butylenoxid Process for the selective hydrogenation of vinyloxirane to butylene oxide
03/06/1997DE19532385A1 Electrically conducting solid used for protecting (optical) glass fibres
03/06/1997DE19532100A1 Magnetic field-assisted plasma treatment appts.
03/05/1997EP0760400A2 Process for producing bismuth compounds, and bismuth compounds
03/05/1997EP0760022A1 Apparatus and method for delivery of reactant gases
03/05/1997EP0760021A1 Tool, process for producing the tool and use of the tool
03/05/1997EP0515373B1 Method of coating steel substrate using low temperature plasma processes and priming
03/05/1997CN1144573A Stabilized amorphous silicon and devices containing same
03/05/1997CN1144503A Barrier films having carbon-coated surfaces
03/04/1997US5607725 CVD method for coating a glass substrate
03/04/1997US5607724 Low temperature high pressure silicon deposition method
03/04/1997US5607723 Method for making continuous thin diamond film
03/04/1997US5607722 Process for titanium nitride deposition using five-and six-coordinate titanium complexes
03/04/1997US5607560 Diamond crystal forming method
03/04/1997US5607515 Method of cleaning CVD apparatus
03/04/1997US5607511 Method and apparatus for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers
03/04/1997US5607264 Tool with diamond cutting edge having vapor deposited metal oxide layer and a method of making and using such tool
03/04/1997US5607009 Method of heating and cooling large area substrates and apparatus therefor
03/04/1997US5607002 Chemical refill system for high purity chemicals
03/04/1997CA2076334C Ambient-free processing system
02/1997
02/27/1997WO1997007546A1 Metal insulator semiconductor structure with polarization-compatible buffer layer
02/27/1997WO1997007537A1 Method of producing semiconductor device
02/27/1997WO1997007429A1 Self-assembled monolayer directed patterning of surfaces
02/27/1997WO1997007264A1 Treatment of cemented carbide substrate to receive cvd diamond film
02/27/1997WO1997007260A1 Composite body and process for its production
02/27/1997WO1997007259A1 Method and apparatus for cold wall chemical vapor deposition
02/27/1997CA2228608A1 Metal insulator semiconductor structure with polarization-compatible buffer layer
02/27/1997CA2225373A1 Treatment of cemented carbide substrate to receive cvd diamond film
02/26/1997EP0759481A1 Method of depositing a stable fluorinated TEOS film
02/25/1997US5606056 Carbon nitride and its synthesis
02/25/1997US5605867 Method of manufacturing insulating film of semiconductor device and apparatus for carrying out the same
02/25/1997US5605742 Metal material formed with fluorocarbon film, process for preparing the material and apparatus made with use of the material
02/25/1997US5605724 Method of forming a metal conductor and diffusion layer
02/25/1997US5605714 Treatments to reduce thrombogeneticity in heart valves made from titanium and its alloys
02/25/1997US5605576 High frequency magnetron plasma apparatus