Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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03/27/1997 | DE19634974A1 Preßform und unter ihrer Verwendung geformtes Glassubstrat für einen Computerspeicher Compression mold and molded using them glass substrate for a computer memory |
03/27/1997 | DE19629877C1 CVD for internal coating of hollow articles with barrier film |
03/26/1997 | EP0764969A2 Microwave plasma processing apparatus and microwave plasma processing method |
03/26/1997 | EP0764726A1 Method for tuning barrel reactor purge system |
03/26/1997 | EP0764346A1 High vertical aspect ratio thin film structures |
03/26/1997 | EP0764221A1 Apparatus for deposition of thin-film, solid state batteries |
03/25/1997 | US5615385 Method and apparatus for zero extension and bit shifting to preserve register parameters in a microprocessor utilizing register renaming |
03/25/1997 | US5614272 Method for making small dimensional diamond-coated graphite articles |
03/25/1997 | US5614258 Process of diamond growth from C70 |
03/25/1997 | US5614257 Low temperature, high pressure silicon deposition method |
03/25/1997 | US5614252 Integrated circuits |
03/25/1997 | US5614249 Leak detection system for a gas manifold of a chemical vapor deposition apparatus |
03/25/1997 | US5614247 Apparatus for chemical vapor deposition of aluminum oxide |
03/25/1997 | US5614140 Methods for fabricating diamond film and solid fiber composite structure |
03/25/1997 | US5614026 Showerhead for uniform distribution of process gas |
03/25/1997 | US5614018 Doped barium strontium titanate layer |
03/20/1997 | WO1997010688A1 Method and apparatus for plasma cvd |
03/20/1997 | WO1997010287A1 Method for obtaining a floor covering and product thus obtained |
03/20/1997 | WO1997010147A1 Production of packaging material using chemical deposition |
03/20/1997 | WO1997004478A3 Plasma treatment apparatus for large area substrates |
03/20/1997 | DE19522923A1 Mfr. of crystalline, amorphous and epitaxial semiconductor layers on substrate |
03/20/1997 | CA2231341A1 Method for obtaining a floor covering and product thus obtained |
03/19/1997 | EP0763149A1 Method and apparatus for low temperature deposition of cvd and pecvd films |
03/19/1997 | EP0763148A2 Reactor and process for coating flat substrates |
03/19/1997 | EP0763147A1 Method and apparatus for producing thin films |
03/19/1997 | EP0763146A1 LOW TEMPERATURE PLASMA-ENHANCED FORMATION OF TiN FILMS |
03/19/1997 | EP0763145A1 Cold end glassware coating apparatus |
03/19/1997 | EP0763144A1 Carbon-coated barrier films whith increased concentration |
03/19/1997 | EP0530297B1 A process for the surface treatment of powder particles |
03/19/1997 | CN2249757Y Chemical reaction chamber by HF induction heating |
03/18/1997 | US5612229 Solar cells with reflecting layer with high conversion efficiency and high productive efficiency forming thin films by sputtering |
03/18/1997 | US5612132 Chemical vapor deposition-produced silicon carbide having improved properties |
03/18/1997 | US5611898 Reaction chamber having in situ oxygen generation |
03/18/1997 | US5611883 Repairing crack or chip defects |
03/18/1997 | US5611865 Alignment of a shadow frame and large flat substrates on a heated support |
03/18/1997 | US5611864 Microwave plasma processing apparatus and processing method using the same |
03/18/1997 | US5611863 Semiconductor processing apparatus and cleaning method thereof |
03/18/1997 | US5611862 Method and apparatus for manufacturing head drums coated with diamond-like carbon coating film using high-frequency plasma |
03/18/1997 | US5611685 Substrate heat treatment apparatus |
03/13/1997 | WO1997009737A1 Wafer support system |
03/13/1997 | WO1997009645A1 A method and apparatus for the construction of photosensitive waveguides |
03/13/1997 | WO1997009463A1 Coated turning insert |
03/13/1997 | WO1997009321A1 Method for the selective hydrogenation of vinyl oxirane to butylene oxide |
03/13/1997 | CA2231373A1 A method and apparatus for the construction of photosensitive waveguides |
03/12/1997 | EP0762518A2 Improvements in or relating to semiconductor devices |
03/12/1997 | EP0762484A1 Method of forming an epitaxial layer with minimal autodoping |
03/12/1997 | EP0762480A1 In-situ wafer temperature control apparatus for single wafer tools |
03/12/1997 | EP0761841A1 Method for forming film |
03/12/1997 | EP0761623A2 Diamond assembly |
03/12/1997 | EP0760712A1 Method and apparatus for producing high purity and unagglomerated submicron particles |
03/12/1997 | EP0644951B1 Method of nucleating tungsten on titanium nitride by cvd without silane |
03/11/1997 | US5610762 Apparatus and method of making reflex molds |
03/11/1997 | US5610106 Plasma enhanced chemical vapor deposition of titanium nitride using ammonia |
03/11/1997 | US5609955 Diamond film and mixed diamond and non-diamond particle composite compositions |
03/11/1997 | US5609737 Semiconductors |
03/11/1997 | US5609721 Semiconductor device manufacturing apparatus and its cleaning method |
03/11/1997 | US5609691 Plasma CVD apparatus for forming a thin film of uniform thickness |
03/11/1997 | US5609690 Vacuum plasma processing apparatus and method |
03/11/1997 | US5609688 Apparatus for producing semiconductor device |
03/11/1997 | CA2021955C Method of producing finely divided particles or powder, vapour or fine droplets, and apparatus therefor |
03/06/1997 | WO1997008743A1 Low mass susceptor |
03/06/1997 | WO1997008361A1 Surface treatment apparatus using gas jet |
03/06/1997 | WO1997008360A1 Method for forming a metallic or ceramic deposition coating |
03/06/1997 | WO1997008356A2 Modified metalorganic chemical vapor deposition of group iii-v thin layers |
03/06/1997 | WO1997003236A3 System and method for thermal processing of a semiconductor substrate |
03/06/1997 | DE19532645A1 Verfahren zur selektiven Hydrierung von Vinyloxiran zu Butylenoxid Process for the selective hydrogenation of vinyloxirane to butylene oxide |
03/06/1997 | DE19532385A1 Electrically conducting solid used for protecting (optical) glass fibres |
03/06/1997 | DE19532100A1 Magnetic field-assisted plasma treatment appts. |
03/05/1997 | EP0760400A2 Process for producing bismuth compounds, and bismuth compounds |
03/05/1997 | EP0760022A1 Apparatus and method for delivery of reactant gases |
03/05/1997 | EP0760021A1 Tool, process for producing the tool and use of the tool |
03/05/1997 | EP0515373B1 Method of coating steel substrate using low temperature plasma processes and priming |
03/05/1997 | CN1144573A Stabilized amorphous silicon and devices containing same |
03/05/1997 | CN1144503A Barrier films having carbon-coated surfaces |
03/04/1997 | US5607725 CVD method for coating a glass substrate |
03/04/1997 | US5607724 Low temperature high pressure silicon deposition method |
03/04/1997 | US5607723 Method for making continuous thin diamond film |
03/04/1997 | US5607722 Process for titanium nitride deposition using five-and six-coordinate titanium complexes |
03/04/1997 | US5607560 Diamond crystal forming method |
03/04/1997 | US5607515 Method of cleaning CVD apparatus |
03/04/1997 | US5607511 Method and apparatus for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers |
03/04/1997 | US5607264 Tool with diamond cutting edge having vapor deposited metal oxide layer and a method of making and using such tool |
03/04/1997 | US5607009 Method of heating and cooling large area substrates and apparatus therefor |
03/04/1997 | US5607002 Chemical refill system for high purity chemicals |
03/04/1997 | CA2076334C Ambient-free processing system |
02/27/1997 | WO1997007546A1 Metal insulator semiconductor structure with polarization-compatible buffer layer |
02/27/1997 | WO1997007537A1 Method of producing semiconductor device |
02/27/1997 | WO1997007429A1 Self-assembled monolayer directed patterning of surfaces |
02/27/1997 | WO1997007264A1 Treatment of cemented carbide substrate to receive cvd diamond film |
02/27/1997 | WO1997007260A1 Composite body and process for its production |
02/27/1997 | WO1997007259A1 Method and apparatus for cold wall chemical vapor deposition |
02/27/1997 | CA2228608A1 Metal insulator semiconductor structure with polarization-compatible buffer layer |
02/27/1997 | CA2225373A1 Treatment of cemented carbide substrate to receive cvd diamond film |
02/26/1997 | EP0759481A1 Method of depositing a stable fluorinated TEOS film |
02/25/1997 | US5606056 Carbon nitride and its synthesis |
02/25/1997 | US5605867 Method of manufacturing insulating film of semiconductor device and apparatus for carrying out the same |
02/25/1997 | US5605742 Metal material formed with fluorocarbon film, process for preparing the material and apparatus made with use of the material |
02/25/1997 | US5605724 Method of forming a metal conductor and diffusion layer |
02/25/1997 | US5605714 Treatments to reduce thrombogeneticity in heart valves made from titanium and its alloys |
02/25/1997 | US5605576 High frequency magnetron plasma apparatus |