| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/10/1997 | US5637351 Low temperature vacuum deposition |
| 06/10/1997 | US5637180 Plasma processing method and plasma generator |
| 06/10/1997 | US5637153 Supplying cleaning gas containing chlorine trifluoride to interior of reaction tube and exhaust piping system to remove film deposited on inner wall surface by etching |
| 06/10/1997 | US5637145 Method of vapor phase epitaxial growth |
| 06/10/1997 | US5636963 Method of handling wafers in a vacuum processing apparatus |
| 06/05/1997 | WO1997020340A1 Method and device for treating semiconductor with treating gas while substrate is heated |
| 06/05/1997 | WO1997020083A1 Coated cutting insert and method of making it |
| 06/05/1997 | WO1997020082A1 Coated turning insert and method of making it |
| 06/05/1997 | WO1997020081A1 Coated milling insert and method of making it |
| 06/05/1997 | WO1997019778A2 Cutting tool, process for coating a cutting tool, and use thereof |
| 06/05/1997 | DE19615740A1 Diamond-coated composite structure for electronics |
| 06/04/1997 | EP0777262A1 Wafer heater assembly |
| 06/04/1997 | EP0776991A1 Plasma annealing of thin films |
| 06/04/1997 | EP0776990A1 Substrate support apparatus for a deposition chamber |
| 06/04/1997 | EP0776989A1 Method of making a coloured coating |
| 06/04/1997 | EP0776988A2 Temperature regulation apparatus |
| 06/04/1997 | EP0554246B1 Cvd of metal films from beta-diketonate complexes |
| 06/04/1997 | CN1035071C Method of pretreating metallic works |
| 06/03/1997 | US5635287 Pane provided with a functional film |
| 06/03/1997 | US5635258 Method of forming a boron-doped diamond film by chemical vapor deposition |
| 06/03/1997 | US5635256 Passivating and removing via gas-assisted vaporization the cobalt binder matrix from the surface of a tungsten carbide cutting tool prior to chemical vapor deposition of diamond;wear resistance; toughness; hardness |
| 06/03/1997 | US5635254 Plasma spraying method for forming diamond and diamond-like coatings |
| 06/03/1997 | US5635247 Depositing alumina coating on substrate, wet blasting, heat treating to convert to alpha-alumina |
| 06/03/1997 | US5635245 Vapor deposition of an optically transparent interlayer which bonds to glass substrate followed by deposition of an outer diamond-like carbon layer |
| 06/03/1997 | US5635244 Clamping a wafer edge using a clamp having an overhang separated from the wafer surface a distance such as to prevent contacting the deposited material |
| 06/03/1997 | US5635243 Forming a coating on a substrate by radiating to immobilize, diffuse, vaporize and react constiuent elements or alter its physical structure (carbide to diamond on steel); cutting tool inserts |
| 06/03/1997 | US5635242 Method and apparatus for preventing rupture and contamination of an ultra-clean APCVD reactor during shutdown |
| 06/03/1997 | US5635241 Method for producing thin film and apparatus therefor |
| 06/03/1997 | US5635144 Generating plasma within vessel made of material which becomes part of thin film, introducing gas which reacts with vessel to produce reaction product that reacts at surface to form thin film |
| 06/03/1997 | US5634973 Semiconductor having substrate selectively coated with epitaxial layer patterned by masking with group iiib oxide layer wherein epitaxial growth does not occur on mask |
| 06/03/1997 | US5634370 Composite diamond wire die |
| 06/03/1997 | US5634266 Method of making a dielectric chuck |
| 05/28/1997 | EP0776037A2 Low temperature integrated metallization process and apparatus |
| 05/28/1997 | DE19543748A1 Schneidwerkzeug, Verfahren zur Beschichtung eines Schneidwerkzeuges und Verwendung des Schneidwerkzeuges Cutter method for coating a cutting tool and use of the cutting tool |
| 05/27/1997 | US5633211 Semiconductor device and process |
| 05/27/1997 | US5633088 Diamond film and solid particle composite structure and methods for fabricating same |
| 05/27/1997 | US5633087 Synthetic diamond wear component and method |
| 05/27/1997 | US5633073 Heating until eutectic forms between conductive connector and metal layer to form an electrical connection |
| 05/27/1997 | US5633036 Heating silicon substrate having silicon dioxide regions, forming nuclei from silicon source gas, converting to titanium silicide, etching to remove, growing layer of silicide on silicon from titanium and silicon source gases |
| 05/27/1997 | US5632910 Multilayer resist pattern forming method |
| 05/27/1997 | US5632879 Process for forming inorganic skin film |
| 05/27/1997 | US5632873 Two piece anti-stick clamp ring |
| 05/27/1997 | US5632868 Providing feed gas of oxygen supplemented with carbon dioxide, carbon monoxide or mixtures, applying voltage to produce ozone not contaminated with chromium compounds |
| 05/27/1997 | US5632821 Post treatment method for in-situ cleaning |
| 05/27/1997 | US5632820 Thermal treatment furnace in a system for manufacturing semiconductors |
| 05/27/1997 | US5632797 Method of providing vaporized halide-free, silicon-containing compounds |
| 05/22/1997 | WO1997018583A1 VERY THIN PECVD SiO2 FOR RESISTOR PROTECTION IN 0.5 MICRON AND 0.35 MICRON TECHNOLOGIES |
| 05/22/1997 | WO1997018344A1 Surface treatment method and device therefor |
| 05/22/1997 | WO1997018343A1 Method and device for sterilising, deodorising and protecting the inner surfaces of containers and tubes |
| 05/21/1997 | EP0774778A2 Plasma etch with trifluoroacetic acid and derivatives |
| 05/21/1997 | EP0774533A1 Method for depositing Si-O containing coatings |
| 05/21/1997 | EP0774532A2 Process for the production of a diamond layer with homogensed thickness profile, diamond windows and membranes thus produced |
| 05/21/1997 | EP0650465A4 Conversion of fullerenes to diamond. |
| 05/21/1997 | EP0633997A4 A rapid thermal processing apparatus for processing semiconductor wafers. |
| 05/21/1997 | EP0411079B1 Method for the deposition of at least one thickness of at least one decorative material to an object, and decorative object obtained by such method |
| 05/21/1997 | CN1150461A Carbon-coated barrier film with increased concentration of tetrahedral equal carbon |
| 05/21/1997 | CN1150240A Gas recovery unit |
| 05/20/1997 | US5631496 Covering layer of boron-doped, amorphous hydrogenous carbon |
| 05/20/1997 | US5631174 Preventing the formation of stringers causing short circuiting |
| 05/20/1997 | US5631046 Improved adhesion of interconnect layers |
| 05/20/1997 | US5630881 Thin-film forming apparatus with magnetic bearings and a non-contact seal and drive |
| 05/20/1997 | US5630878 Liquid material-vaporizing and supplying apparatus |
| 05/20/1997 | CA2120092C Triangular deposition chamber for a vapor deposition system |
| 05/14/1997 | EP0773167A1 Carbon film-coated plastic container manufacturing apparatus and method |
| 05/14/1997 | EP0773166A1 Carbon film-coated plastic container |
| 05/14/1997 | EP0772875A1 Process for manufacturing optical data storage disk stamper |
| 05/14/1997 | EP0772699A1 Diamond-phase carbon tubes and cvd process for their production |
| 05/14/1997 | EP0670055B1 Method of deposition |
| 05/14/1997 | EP0667043B1 Process for sealing high-temperature fuel cells and fuel cells sealed according to this process |
| 05/14/1997 | EP0568696B1 PRODUCTION OF CLEAN, WELL-ORDERED CdTe SURFACES USING LASER ABLATION |
| 05/14/1997 | CN1149761A Crystal wafer temmperature on-site controller for single wafer tool |
| 05/13/1997 | US5629267 Superconducting element having an intermediate layer with multiple fluorite blocks |
| 05/13/1997 | US5629245 Making film by forming on substrate with uneven upper surface a silicon oxide or nitride layer by chemical vapor deposition with carbon-free silicon material, forming second silicon oxide layer by plasma cvd with organic silane |
| 05/13/1997 | US5629229 Metalorganic chemical vapor deposition of (Ba1-x Srx)RuO3 /(Ba1-x Srx)TIO3 /(Ba1-x Srx)TiO3 /(Ba1- Srx)RuO3 capacitors for high dielectric materials |
| 05/13/1997 | US5629086 Substrate is stainless steel, nickel, aluminum or alloy of ni or al; intermediate layer is mainly composed of carbon, ruthenium, silicon or germanium or is layer of ru, si or ge mixed with carbon, nitrogen and/or oxygen with gradient |
| 05/13/1997 | US5629054 Method for continuously forming a functional deposit film of large area by micro-wave plasma CVD method |
| 05/13/1997 | US5629053 Method for manufacturing microcrystalline cubic boron-nitride-layers |
| 05/13/1997 | US5629043 Silicon nitride film formation method |
| 05/13/1997 | US5628920 Organic layer for subsequent coating with a cover layer which is harder than the organic layer and process for surface treatment of an organic layer |
| 05/13/1997 | US5628881 High temperature reaction method |
| 05/13/1997 | US5628869 Plasma enhanced chemical vapor reactor with shaped electrodes |
| 05/13/1997 | US5628839 Components of apparatus for film making and method for manufacturing the same |
| 05/13/1997 | US5628829 Method and apparatus for low temperature deposition of CVD and PECVD films |
| 05/13/1997 | US5628828 Processing method and equipment for processing a semiconductor device having holder/carrier with flattened surface |
| 05/13/1997 | US5628824 Efficiency |
| 05/09/1997 | WO1997016692A1 Modification of metal surfaces |
| 05/09/1997 | WO1997016580A1 Method of forming diamond-like carbon film (dlc), dlc film formed thereby, use of the same, field emitter array and field emitter cathodes |
| 05/09/1997 | WO1996041897A3 Durable plasma treatment apparatus and method |
| 05/07/1997 | EP0771887A1 Gas recovery unit |
| 05/07/1997 | EP0771886A1 Method for depositing amorphous SiNC coatings |
| 05/07/1997 | EP0771469A1 Method of and apparatus for microwave-plasma production |
| 05/07/1997 | DE19645033A1 Verfahren zur Bildung eines Metalldrahtes A method of forming a metal wire |
| 05/07/1997 | DE19540543A1 Apparatus for coating a substrate by means of a chemical vapour deposition process |
| 05/06/1997 | US5627435 Hollow cathode array and method of cleaning sheet stock therewith |
| 05/06/1997 | US5627089 Atmosphere pressure chemical vapor deposition; forming gate electrode having sloped sides |
| 05/06/1997 | US5626963 Cutting tool |
| 05/06/1997 | US5626924 Method of forming oxide film |
| 05/06/1997 | US5626922 Plasma processing method |
| 05/06/1997 | US5626908 Method for producing silicon nitride based member coated with film of diamond |
| 05/06/1997 | US5626775 Plasma etch with trifluoroacetic acid and derivatives |