| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/09/1997 | EP0783041A1 Method and apparatus for purging barrel reactors |
| 07/09/1997 | EP0632850B1 Composite body and its use |
| 07/09/1997 | EP0428733B1 Device for forming tungsten film |
| 07/09/1997 | CN1153909A Thermostable polarizers |
| 07/08/1997 | US5646489 Plasma generator with mode restricting means |
| 07/08/1997 | US5646050 Increasing stabilized performance of amorphous silicon based devices produced by highly hydrogen diluted lower temperature plasma deposition |
| 07/08/1997 | US5645947 Silicon-containing deposited film |
| 07/08/1997 | US5645900 Composite layer of diamond crystallites and hard amorphous film affixed to substrate via interlayer |
| 07/08/1997 | US5645897 Process and device for surface-modification by physico-chemical reactions of gases or vapors on surfaces, using highly-charged ions |
| 07/08/1997 | US5645885 Process for producing a multilayered thin ferroelectric film |
| 07/08/1997 | US5645684 Microelectromechanical systems, electronic circuits and mechanical devices integrated on the same chip |
| 07/08/1997 | US5645645 Method and apparatus for plasma treatment of a surface |
| 07/08/1997 | US5645642 Method for in-situ liquid flow rate estimation and verification |
| 07/08/1997 | US5645638 Method and apparatus for preparing crystalline thin-films for solid-state lasers |
| 07/08/1997 | US5645625 In a degassing module permeable to gas but impervious to liquid |
| 07/03/1997 | WO1997023663A1 A plasma cleaning method for removing residues in a plasma process chamber |
| 07/03/1997 | WO1997023662A1 Diamond coated body and method of its production |
| 07/03/1997 | WO1997023426A1 A method of manufacturing germanium doped glasses and a use of the method |
| 07/03/1997 | WO1997019778A3 Cutting tool, process for coating a cutting tool, and use thereof |
| 07/02/1997 | EP0782176A2 Deposited-film forming process and deposited-film forming apparatus |
| 07/02/1997 | EP0782173A2 Apparatus for coating a substrate by means of a chemical vapour deposition process |
| 07/02/1997 | EP0781859A1 Coating process |
| 07/02/1997 | EP0781739A1 Jig for heat treatment and process for fabricating the jig |
| 07/02/1997 | EP0781736A2 Ferroelectric thin film, substrate provided with ferroelectric thin film, device having capacitor structure and method for manufacturing ferroelectric thin film |
| 07/02/1997 | EP0781599A2 Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
| 07/02/1997 | EP0781257A1 Glazing including a conductive and/or low-emissive layer |
| 07/02/1997 | CN1153226A Method for applying low-stress non-metal film on surface of large shaped parts |
| 07/01/1997 | US5644089 Synthetic diamond wear component and method |
| 07/01/1997 | US5643856 Preparartion of superconducting oxides and oxide-metal composites |
| 07/01/1997 | US5643839 Method for producing semiconductor device |
| 07/01/1997 | US5643641 Surface treatment of polymer substrates, carbon, vaporization and reaction to modify surface structure |
| 07/01/1997 | US5643640 Fluorine doped plasma enhanced phospho-silicate glass, and process |
| 07/01/1997 | US5643639 Plasma treatment method for treatment of a large-area work surface apparatus and methods |
| 07/01/1997 | US5643638 Plasma CVD method of producing a gradient layer |
| 07/01/1997 | US5643637 Providing a plasma reactor with grounded electrode and forming a coating, powering a plasma reactor, passing silane and helium gas or hydrocarbon and argon or hydrogen to ionize to form a semiconductors |
| 07/01/1997 | US5643633 Uniform tungsten silicide films produced by chemical vapor depostiton |
| 07/01/1997 | US5643632 Tungsten chemical vapor deposition process for suppression of volcano formation |
| 07/01/1997 | US5643483 Ceramic heater made of fused silica glass having roughened surface |
| 07/01/1997 | US5643435 Treatment of substrates with oxygen and electrolytes for semiconductors |
| 07/01/1997 | US5643423 Method for producing an abrasion resistant coated substrate product |
| 07/01/1997 | US5643394 Plasma reactor having gas distribution apparatus including disk surrounded by annular member with gap therebetween comprising elongate thin slit nozzle, spacers between disk and annular so gap is of equal width over circumference |
| 07/01/1997 | US5643365 Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces |
| 07/01/1997 | US5642632 Knitting parts coated with non-electrolytic nickel alloy plating layer including dispersed minute silicon particles each having coating of hard carbon film; durability |
| 06/26/1997 | WO1997022992A1 Method of forming dielectric films with reduced metal contamination |
| 06/26/1997 | WO1997022732A1 Reactor having an array of heating filaments and a filament force regulator |
| 06/26/1997 | WO1997022731A1 Conformal pure and doped aluminum coatings and a methodology and apparatus for their preparation |
| 06/25/1997 | EP0780491A1 Process for reducing substrate damage during PECVD |
| 06/25/1997 | EP0780490A1 Methods and apparatus for reducing residues in semiconductor processing chambers |
| 06/25/1997 | EP0780489A1 Method and apparatus for coating a substrate with diamond film |
| 06/25/1997 | EP0780488A1 Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein |
| 06/25/1997 | EP0779941A1 Etchant for aluminium alloys |
| 06/25/1997 | EP0779940A1 Method for the deposition of diamond film on the electroless-plated nickel layer |
| 06/25/1997 | EP0779939A1 Process for depositing pyrocarbon coatings in a fluidized bed |
| 06/25/1997 | CN1152627A Method for regulating barrel-shape reactor cleaning system |
| 06/24/1997 | US5641581 Semiconductor device |
| 06/24/1997 | US5641559 Gas-tight laminated plastic film containing polymer of organosilicic compound |
| 06/24/1997 | US5641545 Method to deposit highly conformal CVD films |
| 06/24/1997 | US5641540 Stabilizing the reaction by forming a chemical intermediate complexes with chlorine, ammonia or trimethylamine |
| 06/24/1997 | US5641358 Modular parylene deposition apparatus having vapor deposition chamber extension |
| 06/19/1997 | WO1997022142A1 Thin film semiconductor device, method for manufacturing thin film semiconductor device, liquid crystal display, method for manufacturing liquid crystal display, electronic apparatus, method for manufacturing electronic apparatus, and method for depositing thin film |
| 06/19/1997 | WO1997022141A1 Method of manufacturing thin film semiconductor device, and thin film semiconductor device |
| 06/19/1997 | WO1997022136A1 HF-PLASMA COATING CHAMBER OR PECVD COATING CHAMBER, ITS USE AND METHOD OF PLATING CDs USING THE CHAMBER |
| 06/19/1997 | WO1997021848A1 Film or coating deposition and powder formation |
| 06/19/1997 | CA2240625A1 Film or coating deposition and powder formation |
| 06/18/1997 | EP0779648A2 Vacuum processing method and apparatus |
| 06/18/1997 | EP0779644A2 Plasma processing apparatus |
| 06/18/1997 | EP0779643A2 Plasma display panel suitable for high-quality display and production method |
| 06/18/1997 | EP0778902A1 Jet plasma deposition process and apparatus |
| 06/18/1997 | EP0778838A1 Formation of a metalorganic compound for growing epitaxial semiconductor layers |
| 06/18/1997 | EP0778837A1 Preparation of metalorganic compounds |
| 06/18/1997 | CN1152034A Engine with metal-ceramic composite film |
| 06/17/1997 | USRE35538 A hard constituent comprising a carbide, nitride and/or carbonitride of a metal of groups 4, 5 or 6b on the periodic table and a binder metal of cobalt, nickel or iron |
| 06/17/1997 | US5640663 Electrophotographic method using a cleaning blade to remove residual toner |
| 06/17/1997 | US5639699 For repairing a bump defect of a phase-shifting mask |
| 06/17/1997 | US5639551 On diamond substrate; by vapor deposition; cutting tool |
| 06/17/1997 | US5639519 Method for igniting low pressure inductively coupled plasma |
| 06/17/1997 | US5639341 Dry etching with less particles |
| 06/17/1997 | US5639309 Plasma processing apparatus adjusted for a batch-processing of a plurality of wafers with plasma gases |
| 06/17/1997 | US5639234 Treatment system and treatment apparatus |
| 06/12/1997 | WO1997021332A1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced |
| 06/12/1997 | WO1997021330A1 Process depending on plasma discharges sustained by inductive coupling |
| 06/12/1997 | WO1997020982A1 Diamond-like-carbon coated aramid fibers having improved mechanical properties |
| 06/12/1997 | WO1997020981A1 Capacitively coupled rf diamond-like-carbon reactor |
| 06/12/1997 | WO1997020963A1 Process for the preparation of aluminum oxide film using dialkylaluminum alkoxide |
| 06/12/1997 | CA2239088A1 Diamond-like-carbon coated aramid fibers having improved mechanical properties |
| 06/11/1997 | EP0778496A2 Method and apparatus for depositing antireflective coating |
| 06/11/1997 | EP0778359A1 Reduction of particulate contamination in wafer processing |
| 06/11/1997 | EP0778358A1 Method and apparatus for thin films formation by CVD |
| 06/11/1997 | EP0778278A1 Alkoxyformoxysilanes, process for their preparation and their use |
| 06/11/1997 | EP0778089A1 Device for producing a polymer coating inside hollow plastic articles |
| 06/11/1997 | EP0777552A1 Abrasive article having a diamond-like coating layer and method |
| 06/11/1997 | EP0611331B1 Chemical vapor deposition of diamond films using water-based plasma discharges |
| 06/11/1997 | CN1151620A Multicontact for antenna window |
| 06/11/1997 | CN1151610A Method for forming metal wire |
| 06/11/1997 | CN1035120C Knitting parts for knitting machine and surface coating method thereof |
| 06/10/1997 | US5637538 Method and apparatus for processing a specimen |
| 06/10/1997 | US5637531 Method of making a crystalline multilayer structure at two pressures the second one lower than first |
| 06/10/1997 | US5637358 Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet |
| 06/10/1997 | US5637353 Vapor electrodepositing a protective coatings |
| 06/10/1997 | US5637352 From organometallic adduct |