| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/09/1997 | US5666023 Device for producing a plasma, enabling microwave propagation and absorption zones to be dissociated having at least two parallel applicators defining a propogation zone and an exciter placed relative to the applicator |
| 09/09/1997 | US5665640 Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
| 09/09/1997 | US5665608 Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control |
| 09/09/1997 | US5665435 Photodegrading perfluorinated alkyl iodides to produce free radicals; anchoring, decomposing, chemisorption |
| 09/09/1997 | US5665431 Titanium carbonitride coated stratified substrate and cutting inserts made from the same |
| 09/09/1997 | US5665430 Chemical vapor deposition method for depositing diamond using a high temperature vacuum substrate mount |
| 09/09/1997 | US5665424 Reacting a silane and carbon source in enclosed chamber; carbiding |
| 09/09/1997 | US5665280 Blood collection tube assembly |
| 09/09/1997 | US5665214 Automatic film deposition control method and system |
| 09/09/1997 | US5665167 Plasma treatment apparatus having a workpiece-side electrode grounding circuit |
| 09/09/1997 | US5665166 Plasma processing apparatus |
| 09/09/1997 | US5665165 Seal and a chamber having a seal |
| 09/09/1997 | US5664759 Valved coupling for ultra high purity gas distribution systems |
| 09/09/1997 | CA2019023C Nickel foam |
| 09/07/1997 | CA2199347A1 Amorphous carbon film, formation process therof, and semiconductor device making use of the film |
| 09/04/1997 | WO1997032057A1 METHOD FOR FORMING Ti1-xAlxN COATINGS |
| 09/04/1997 | WO1997032056A1 Chemical vapor deposition of metal sulfide films from metal thiocarboxylate complexes with monodentate or multidentate ligands |
| 09/04/1997 | DE19638171C1 Controlled silicon oxide CVD as inter-metal dielectric |
| 09/03/1997 | EP0792956A2 Radiant heating apparatus and method |
| 09/03/1997 | EP0792954A2 Method for growing single-crystalline semiconductor film and apparatus used therefor |
| 09/03/1997 | EP0792951A1 Vacuum chamber made of aluminum or its alloy, and surface treatment and material for the vacuum chamber |
| 09/03/1997 | EP0792947A2 Process using an inductively coupled plasma reactor |
| 09/03/1997 | EP0792572A1 An apparatus for generation of a linear arc discharge for plasma processing |
| 09/03/1997 | EP0792571A1 Method and device for measuring ion flow in a plasma |
| 09/03/1997 | EP0792386A1 Method and apparatus for depositing a substance with temperature control |
| 09/03/1997 | EP0792385A2 Apparatus for use with cvi/cvd processes |
| 09/03/1997 | EP0792384A1 Pressure gradient cvi/cvd apparatus, process and product |
| 09/03/1997 | EP0792383A1 Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same |
| 09/03/1997 | EP0792382A1 Apparatus for the relative vacuum deposition of a material on bulk parts |
| 09/03/1997 | EP0731909A4 Sensors employing interference of electromagnetic waves passing through waveguides having functionalized surfaces |
| 09/03/1997 | CN1158493A Method and apparatus for purging barrel reactors |
| 09/03/1997 | CN1158492A Susceptor and baffle therefor |
| 09/02/1997 | US5663391 1,1,1,5,5,5-hexafluoro-2,4-pentanedione |
| 09/02/1997 | US5663001 Aluminum surfaces |
| 09/02/1997 | US5663000 Hard multilayer film formed material of titanium and carbon/silicon |
| 09/02/1997 | US5662999 Carbon film |
| 09/02/1997 | US5662877 Process for forming diamond-like thin film |
| 09/02/1997 | US5662838 Liquid vaporizing apparatus |
| 09/02/1997 | US5662469 Method of thermal processing |
| 09/02/1997 | US5662143 To control the process and purge gases to a semiconductor chamber |
| 08/28/1997 | WO1997031391A1 Chemical vapor deposition method and chemical vapor deposition apparatus |
| 08/28/1997 | WO1997031134A1 A susceptor for a device for epitaxially growing objects and such a device |
| 08/28/1997 | WO1997030797A1 Improved fine powders and method for manufacturing |
| 08/28/1997 | DE19645912C1 Plasma CVD reactor |
| 08/27/1997 | EP0791949A2 Plasma processing method and apparatus |
| 08/27/1997 | EP0791670A2 Ultra high purity gas distribution component with integral valved coupling and methods for its use |
| 08/27/1997 | EP0791669A1 Method for etching inside of cvd reaction chamber |
| 08/27/1997 | EP0791668A2 Apparatus and method for depositing diamond film |
| 08/27/1997 | EP0791082A2 Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment |
| 08/27/1997 | CN1158131A Metalogranic compounds |
| 08/27/1997 | CN1158007A Semiconductor integrated circuit device and method for manufacturing the same |
| 08/26/1997 | US5661115 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds |
| 08/26/1997 | US5661093 Method for the stabilization of halogen-doped films through the use of multiple sealing layers |
| 08/26/1997 | US5660936 Fine grain diamond tool and method of manufacture |
| 08/26/1997 | US5660895 Reacting with nitrous oxide or elemental oxygen |
| 08/26/1997 | US5660894 Process for depositing diamond by chemical vapor deposition |
| 08/26/1997 | US5660881 Increasing the bonding strength with carbide substrate, reducing the cobalt concentration on outer layer by heating to evaporate and etching |
| 08/26/1997 | US5660740 Treatment apparatus control method |
| 08/26/1997 | US5660694 Vapor deposition on target material while controlling direct current potential |
| 08/26/1997 | US5660680 Method for fabrication of high vertical aspect ratio thin film structures |
| 08/26/1997 | US5660611 Method for producing glass thin film |
| 08/26/1997 | US5660528 Liquid delivery system at specified rate using ultrasonic vibrators |
| 08/24/1997 | CA2176423A1 Apparatus and method for depositing diamond film |
| 08/21/1997 | WO1997030188A1 Method for depositing fluorine doped silicon dioxide films |
| 08/21/1997 | DE19611538C1 Apparatus for coating substrates with use of a filamentless ion source |
| 08/20/1997 | EP0790642A2 Method and apparatus for removing contaminant particles from surfaces in semiconductor processing equipment |
| 08/20/1997 | EP0790635A2 Chemical vapor deposition system including dedicated cleaning gas injection |
| 08/20/1997 | EP0789981A1 Thermal reactor optimization |
| 08/20/1997 | EP0789671A1 The combinatorial synthesis of novel materials |
| 08/20/1997 | EP0640244B1 Plasma treatment apparatus and method in which a uniform electric field is induced by a dielectric window |
| 08/20/1997 | CN1157641A Diamond-phase carbon tubes and CVD process for their production |
| 08/20/1997 | CN1035704C Method and apparatus for forming film |
| 08/19/1997 | US5658833 Placing at ends of row of production wafers; forces reactant gases to flow uniformly through furnace |
| 08/19/1997 | US5658828 Method for forming an aluminum contact through an insulating layer |
| 08/19/1997 | US5658710 Surface treatment by diffusing a gas to nitrogenation and carbonization with silicon substrate |
| 08/19/1997 | US5658703 Electrophotographic photosensitive member and process for production thereof |
| 08/19/1997 | US5658614 Platinum aluminide CVD coating method |
| 08/19/1997 | US5658391 Method of chamber cleaning in MOCVD application |
| 08/19/1997 | US5658389 Thin film forming method and apparatus |
| 08/19/1997 | US5657786 Device for controlling the flow of process gas from a source |
| 08/14/1997 | WO1997029218A1 Device and process for coating substrates |
| 08/14/1997 | WO1997029149A1 Continuous cvd equipment for films and continuous cvd process |
| 08/14/1997 | WO1997029112A1 Volatile magnesium alkylaluminum alkoxide and deposition of magnesium aluminate film using same |
| 08/14/1997 | WO1997028886A1 Liquid cooled trap patent application |
| 08/14/1997 | DE19605245A1 Producing crystallisation centres on the surface of substrate |
| 08/14/1997 | CA2217543A1 An apparatus and process for continuously processing a film by cvd technique |
| 08/13/1997 | EP0789386A2 Method of fabricating an abrupt hetero interface by organometallic vapor phase growth |
| 08/13/1997 | EP0789092A2 Blood collection tube assembly |
| 08/13/1997 | EP0788727A1 Process for manufacturing electrical circuit bases |
| 08/13/1997 | EP0720665B1 Method for obtaining diamond and diamond-like films |
| 08/13/1997 | EP0683825B1 Method for thin film deposition on a substrate using remote cold nitrogen plasma |
| 08/13/1997 | EP0674607B1 Amorphous boron carbide coating |
| 08/13/1997 | CN1156996A Preparation of metalorganic compounds for growing epitaxial semiconductor layers |
| 08/13/1997 | CN1156897A Method and apparatus for manufacturing semiconductor device |
| 08/13/1997 | CN1156765A Metal organic chemistry vapour phase deposition process for preparing metal and alloy film |
| 08/13/1997 | CN1035631C Method and apparatus for preparing continuous carbofrax fibre |
| 08/12/1997 | US5656363 Layer construction with an organic layer and a transparent cover layer which is harder than the organic layer and process for its production |
| 08/12/1997 | US5656338 Liquid solution of TiBr4 in Br2 used as a precursor for the chemical vapor deposition of titanium or titanium nitride |
| 08/12/1997 | US5656337 Method of forming a dielectric layer |
| 08/12/1997 | US5656334 Preventing deposition in interior of container by preheating the container surface |