Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/1997
10/09/1997WO1997037053A1 Barrier films having vapor coated high energy surfaces
10/09/1997CA2250543A1 Process for manufacturing optical data storage disk stamper
10/08/1997EP0800206A2 Method of simultaneously forming a contact/via plug and an interconnect
10/08/1997EP0799907A1 Liquid material vaporizer apparatus and gas ejection device
10/08/1997EP0799906A1 Semiconductor device
10/08/1997EP0799557A1 High frequency induction plasma method and apparatus
10/08/1997EP0799494A1 Apparatus for surface conditioning
10/08/1997EP0614497B1 Apparatus and method for treating a wafer of semiconductor material
10/08/1997CN2264191Y Multistation gas-phase synthetizing diamond film appts.
10/08/1997CN1161476A Process for producing light-receiving member, electrophotographic apparatus having light-receiving member, and electrophotographic method using light-receiving member
10/08/1997CN1161386A Apparatus and method for plasma processing
10/08/1997CN1036079C Apparatus for rapid plasma treatments
10/08/1997CN1036078C Microwave enhanced CVD method for depositing carbon
10/07/1997US5675028 Used for metal organic chemical vapor deposition of gallium, indium and aluminum nitrides on semiconductor substrates
10/07/1997US5674786 Method of heating and cooling large area glass substrates
10/07/1997US5674620 Passivated cobalt matrix holding tungsten carbide to improve adhesion by preventing reaction between cobalt and diamond
10/07/1997US5674599 Coating of inorganic buffer layer on plastic substrate, the stress of buffer layer is maintained at a preferential range; switching element for flat panel display for office automation equipments and television; high reliability
10/07/1997US5674574 Vapor delivery system for solid precursors and method regarding same
10/07/1997US5674573 Irradiation of hydrocarbon gas plasma generated in first vacuum vessel onto substrate within second vessel at lower pressure due to gas flow resistance between vessels
10/07/1997US5674572 Enhanced adherence of diamond coatings employing pretreatment process
10/07/1997US5674564 Alumina-coated sintered body
10/07/1997US5674563 Method for ferroelectric thin film production
10/07/1997US5674320 Susceptor for a device for epitaxially growing objects and such a device
10/07/1997US5674304 Method of heat-treating a glass substrate
10/07/1997US5673750 Vacuum processing method and apparatus
10/07/1997CA2039345C Process for shaping preforms in the manufacture of thermostructural composite material components, especially web-like components or panels
10/07/1997CA2033389C Diamond-coated bodies and process for preparation thereof
10/02/1997WO1997036462A1 Device and method for plasma treatment
10/02/1997WO1997036461A1 Device and method for plasma treatment
10/02/1997WO1997036320A1 Vapor phase growth apparatus and vapor phase growth method
10/02/1997WO1997036022A1 Plasma producing method and apparatus including an inductively-coupled plasma source
10/02/1997DE19709980A1 Coated cemented carbide tool for cast iron milling
10/02/1997DE19611923A1 Golf club, used especially as pitch wedge
10/01/1997EP0798777A2 Method of metallizing submicronie (e.g. micronie) contact holes in semiconductor body
10/01/1997EP0798401A2 Laminate and method for preparing same
10/01/1997EP0797838A1 Method and apparatus for plasma processing
10/01/1997EP0797753A1 Rapid thermal processing apparatus and method
10/01/1997EP0797689A1 Gas removal device
10/01/1997EP0797688A1 Method for deposition of diamondlike carbon films
10/01/1997EP0797480A1 Fluidized bed with uniform heat distribution and multiple port nozzle
10/01/1997EP0649479A4 Method and apparatus for coating a glass substrate.
10/01/1997CN1161106A Process for preparing thin-film transistor, process for preparing active matrix substrate, and liquid crystal display
09/1997
09/30/1997US5672430 CVD diamond radiation detector
09/30/1997US5672411 Insulating boards and method of manufacturing the same
09/30/1997US5672395 Heating, pressure
09/30/1997US5672388 Membrane reparation and poer size reduction using interfacial ozone assisted chemical vapor deposition
09/30/1997US5672385 Titanium nitride film-MOCVD method incorporating use of tetrakisdialkylaminotitanium as a source gas
09/30/1997US5672383 Plasma enhanced chemical vapor deposition
09/30/1997US5672382 Composite powder particle, composite body and method of preparation
09/30/1997US5672204 Apparatus for vapor-phase epitaxial growth
09/30/1997CA2110647C Vapour generator for chemical vapour deposition systems
09/25/1997WO1997035045A1 Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition
09/24/1997EP0797249A1 Single step process for blanket-selective CVD metal deposition
09/24/1997EP0797241A2 Substrate processing apparatus
09/24/1997EP0796930A1 Use of a layer containing elementary carbon on cutting tools
09/24/1997EP0796355A1 Apparatus for generating plasma by plasma-guided microwave power
09/24/1997CN1160089A Method and apparatus for large area high-speed thermal filament chemical vapor deposition of diamond
09/24/1997CN1035956C Coating method, workpiece with hard coating and use thereof
09/23/1997USRE35614 Process for improved quality of CVD copper films
09/23/1997US5671323 Zigzag heating device with downward directed connecting portions
09/23/1997US5671117 Electrostatic chuck
09/23/1997US5670793 Depositing pure silicon, then impurity layer at interface; heat treatment
09/23/1997US5670421 Process for forming multilayer wiring
09/23/1997US5670420 Ion-implanting an insulating film in the surface of an oxide film; corrosion and oxidation resistance
09/23/1997US5670224 Modified silicon oxide barrier coatings produced by microwave CVD deposition on polymeric substrates
09/23/1997US5670218 Method for forming ferroelectric thin film and apparatus therefor
09/23/1997US5669976 CVD method and apparatus therefor
09/23/1997US5669975 Plasma producing method and apparatus including an inductively-coupled plasma source
09/23/1997US5669583 Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof
09/23/1997CA2112103C Methods and apparatus for externally treating a container with application of internal bias gas
09/19/1997CA2173676A1 Diamond film deposition
09/18/1997WO1997034320A1 Method and apparatus for fabricating silicon dioxide and silicon glass layers in integrated circuits
09/17/1997EP0795897A2 Low pressure CVD system
09/17/1997EP0795626A1 Method for suppressing detrimental effects of conductive deposits on interior surfaces of a plasma reactor
09/17/1997EP0795625A1 Thin film deposition method and gas sensor made by the method
09/17/1997EP0795622A1 Amorphous multi-layered structure and method of making the same
09/17/1997EP0795042A1 Process for producing an oxide layer
09/17/1997EP0794821A1 Process and device for transforming a liquid stream into a gas stream
09/17/1997EP0707665B1 Diamond coated body
09/17/1997CN1159863A Process for manufacturing optical data storage disk stamper
09/16/1997US5668054 Process for fabricating tantalum nitride diffusion barrier for copper matallization
09/16/1997US5667852 Plasma jet CVD method of depositing diamond or diamond-like films
09/16/1997US5667622 In-situ wafer temperature control apparatus for single wafer tools
09/16/1997US5667592 Process chamber sleeve with ring seals for isolating individual process modules in a common cluster
09/16/1997US5667344 CVD diamond cutting tools with oriented crystal grain boundaries
09/12/1997WO1997033114A1 A method and apparatus for aligning and supporting semiconductor process gas delivery and regulation components
09/12/1997WO1997033013A1 Misted precursor deposition apparatus and method with improved mist and mist flow
09/12/1997WO1997032672A1 Method for bulk coating using a plasma process
09/12/1997WO1997015699A3 Method and apparatus for the deposition of parylene af4 onto semiconductor wafers
09/11/1997DE19649684C1 Titanium mono:phosphide layer formation
09/11/1997DE19636525A1 Coating a carrier with layer of synthetic diamond phase
09/11/1997DE19608885A1 Heating silicon@ substrates in precipitation reactor
09/10/1997EP0794569A2 Amorphous carbon film, formation process thereof, and semiconductor device making use of the film
09/10/1997EP0794568A2 Blanket-selective deposition of cvd aluminum and reflectivity improvement using a self-aligning ultra-thin layer
09/10/1997EP0794014A1 Process and apparatus for high frequency plasma polymerization
09/10/1997EP0793855A1 Plasma processor for large workpieces
09/10/1997EP0793736A1 Process for preparing micromechanical components having free-standing microstructures or membranes
09/10/1997EP0793735A1 Packing element, in particular for shutting-off and regulating means, and process for producing the same
09/10/1997EP0493609B1 Method and device for manufacturing diamond
09/10/1997CN1158912A Deposited-film forming process and deposited-film forming apparatus