C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1997
11/11/1997	US5685912 Pressure control system for semiconductor manufacturing equipment
11/06/1997	WO1997041276A1 Low temperature chemical vapor deposition and etching apparatus and method
11/06/1997	WO1997041275A1 Surface alloyed high temperature alloys
11/06/1997	DE19716107A1 Carbon@ film formation
11/05/1997	EP0805490A1 Process for overcoming selectivity loss
11/05/1997	EP0805476A2 Plasma enhanced chemical vapour deposition processes and apparatus
11/05/1997	EP0804631A1 Method of depositing thin group iiia metal films
11/05/1997	EP0619694B1 Method of monitoring atmospheric pressure glow discharge plasma
11/05/1997	CN1163945A Method for manufacturing thin film, and deposition apparatus
11/05/1997	CN1163944A Deposit film forming apparatus and method
11/04/1997	US5683940 Method of depositing a reflow SiO2 film
11/04/1997	US5683797 Inorganic membranes
11/04/1997	US5683771 Blood collection tube assembly
11/04/1997	US5683759 Plasma deposition of diamond, heat exchanging, substrate mounted on rotating mandrel
11/04/1997	US5683606 Ceramic heaters and heating devices using such ceramic heaters
11/04/1997	US5683548 Inductively coupled plasma reactor and process
11/04/1997	US5683539 Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling
11/04/1997	US5683518 Rapid thermal processing apparatus for processing semiconductor wafers
11/04/1997	US5683517 Plasma reactor with programmable reactant gas distribution
11/04/1997	US5683516 Single body injector and method for delivering gases to a surface
11/04/1997	US5683173 Cooling chamber for a rapid thermal heating apparatus
11/04/1997	US5683072 Thin film forming equipment
11/01/1997	CA2201686A1 Gas injector for plasma enhanced chemical vapor deposition
10/1997
10/30/1997	WO1997040207A1 Diamond-like nanocomposite compositions
10/30/1997	DE19713807A1 Efficient semiconductor device production by CVD
10/30/1997	DE19605136A1 Plasma processing apparatus for high or ultra-high vacuum operation
10/29/1997	EP0803896A2 Plasma processing system and protective member used for the same
10/29/1997	EP0803589A1 Method of manufacturing optical waveguide having no void
10/29/1997	EP0803588A1 Vapor phase growth method and growth apparatus
10/29/1997	EP0802988A1 Method of forming diamond-like carbon film (dlc), dlc film formed thereby, use of the same, field emitter array and field emitter cathodes
10/29/1997	EP0802892A1 Chemical vapor deposition of mullite coatings and powders
10/29/1997	EP0712530B1 Substrate having a carbon rich coating
10/29/1997	EP0528986B1 Materials for chemical vapor deposition processes
10/29/1997	CN1163581A Pulsed ion beam assisted deposition
10/28/1997	US5681651 Tungsten carbide formed on sintered hard alloy
10/28/1997	US5681614 Hydrophobic treatment method involving delivery of a liquid process agent to a process space
10/28/1997	US5681613 Filtering technique for CVD chamber process gases
10/28/1997	US5681511 Vapor infiltrating silicon carbide layer over inorganic fiber by hydrogen and an alkyl chlorosilane to form a thick film impermeable to helium gas
10/28/1997	US5681394 Photo-excited processing apparatus and method for manufacturing a semiconductor device by using the same
10/28/1997	US5681393 Plasma processing apparatus
10/23/1997	WO1997039607A1 Plasma treatment device
10/23/1997	WO1997039066A1 Goniochromatic gloss pigments based on coated silicon dioxide platelets
10/23/1997	WO1997039065A1 Gloss pigment based on reduced titanium dioxide-coated silicon dioxide platelets
10/23/1997	WO1997038850A1 Highly durable and abrasion-resistant dielectric coatings for lenses
10/22/1997	EP0802265A1 Method of making a diamond-coated composite body
10/22/1997	EP0801606A1 Cleaning method
10/22/1997	EP0515377B1 Low temperature plasma technology for corrosion protection of steel
10/22/1997	CN1162527A Laminate and method for preparing same
10/22/1997	CA2202697A1 Vapor phase growth method and growth apparatus
10/21/1997	US5680001 Comprising alternate layers of silicon dioxide inorganic coatings, also including boron oxide and phosphorus oxide; durability
10/21/1997	US5679815 Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same
10/21/1997	US5679448 Method of coating the surface of a substrate and a coating material
10/21/1997	US5679446 First layer having first thickness and low intrinsic stress, second layer having second thickness and high intrinsic stress
10/21/1997	US5679413 Highly abrasion-resistant, flexible coatings for soft substrates
10/21/1997	US5679412 Conducting reactive gases to surface of base polymer layer, supplying electromagnetic energy to create plasma which causes reaction of the gases to form inorganic compound as barrier layer on surface
10/21/1997	US5679411 Method for producing a corrosion and wear resistant coating on iron materials
10/21/1997	US5679409 Method for lubricating glass molds, plungers and the like
10/21/1997	US5679405 Method for preventing substrate backside deposition during a chemical vapor deposition operation
10/21/1997	US5679404 Providing cooling block having surface that is cooled by heat exchange, spacing bottom of substrate from cooling block by gap, providing gas in gap, depositing substance on substrate surface, heat flowing to cooling block
10/21/1997	US5679215 Method of in situ cleaning a vacuum plasma processing chamber
10/21/1997	US5679165 Apparatus for manufacturing semiconductor device
10/21/1997	US5679164 Molybdenum cylinder used to guide source gas; barrel within and spaced from cylinder; axially extending separation plate; flange
10/21/1997	US5679159 Spinning substrate holder for cutting tool inserts for improved arc-jet diamond deposition
10/21/1997	US5678989 Heat treatment method using a vertical processing tube
10/16/1997	WO1997038151A1 Substrate with a superhard coating containing boron and nitrogen and method of making the same
10/16/1997	WO1997038150A1 Boron and nitrogen containing coating and method for making
10/16/1997	WO1997038145A1 Coating substrate
10/16/1997	WO1997037768A1 MODIFYING SOLID CRYSTALLIZATION KINETICS FOR A-Si FILMS
10/16/1997	DE19651759A1 Low-leakage-current thin film prodn. with low-pressure chemical
10/16/1997	DE19649409A1 Diamond film fine processing method
10/16/1997	DE19622402C1 Substrate induction heating apparatus especially for CVD
10/16/1997	DE19614637A1 Goniochromatische Glanzpigmente auf der Basis von beschichteten Siliciumdioxidplättchen Goniochromatic luster pigments based on coated silicon dioxide platelets
10/16/1997	DE19614636A1 Glanzpigmente auf Basis reduzierter titandioxidbeschichteter Siliciumdioxidplättchen Luster pigments based on titanium dioxide-coated silicon dioxide platelets reduced
10/16/1997	DE19614328A1 Coating and/or machining of previously treated workpiece surfaces
10/16/1997	CA2248701A1 Boron and nitrogen containing coating and method for making
10/16/1997	CA2248692A1 Substrate with a superhard coating containing boron and nitrogen and method of making the same
10/15/1997	EP0801148A1 Method and apparatus for forming amorphous silicon and polysilicon films with improved step coverage
10/15/1997	EP0801146A1 Method for deposition of mixed organic-inorganic film
10/15/1997	EP0801144A1 Element with a wear resistant layer, and process for the manufacture of such an element
10/15/1997	EP0800592A1 Method of producing boron-doped monocrystalline silicon carbide
10/15/1997	EP0800550A1 Composite media with selectable radiation-transmission properties
10/15/1997	EP0800490A2 Precision burners for oxidizing halide-free, silicon-containing compounds
10/15/1997	EP0800489A1 Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
10/15/1997	EP0591398B1 Chemically active isolation passageway for deposition chambers
10/14/1997	US5677372 Diamond reinforced composite material
10/14/1997	US5677235 Supplying disilane process gas to targets in heated, depressurized reaction vessel
10/14/1997	US5677061 Pyrocarbon and process for depositing pyrocarbon coatings
10/14/1997	US5677015 Chemical vapor deposition using a mixed gas comprising a cyclopentane tantalum azide and a nitrogen containing gas
10/14/1997	US5677010 Method for producing a polymer coating inside hollow plastic articles
10/14/1997	US5677002 Chemical vapor deposition of tantalum- or niobium-containing coatings
10/14/1997	US5676869 Vertical heat treatment apparatus
10/14/1997	US5676759 Plasma dry cleaning of semiconductor processing chambers
10/14/1997	US5676758 CVD apparatus
10/09/1997	WO1997037375A1 Solid state temperature controlled substrate holder
10/09/1997	WO1997037348A1 Process for manufacturing optical data storage disk stamper
10/09/1997	WO1997037059A1 Showerhead for uniform distribution of process gas
10/09/1997	WO1997037058A1 Process for forming pyrolytic sibn coatings
10/09/1997	WO1997037057A1 Deposition method and precursor therefor
10/09/1997	WO1997037056A1 Flow-stabilized wet scrubber system for treatment of process gases from semiconductor manufacturing operations
10/09/1997	WO1997037054A1 Barrier films having vapor coated evoh surfaces

1 ... 615 616 617 618 619 620 621 622 623 624 625 626 627 628 629 630 631 632 633 634 635 ... 719