| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/09/1997 | US5695819 Method of enhancing step coverage of polysilicon deposits |
| 12/09/1997 | US5695818 Contacting membrane with gas stream containing pyrolysable carbon molecules larger than pore size of the hollow fibers while heating for pyrolysis, then purging and cooling improves permselectivity in gas separation |
| 12/09/1997 | US5695568 Chemical vapor deposition chamber |
| 12/09/1997 | US5695566 Apparatus and method for plasma-processing |
| 12/09/1997 | US5695565 Wear resistance; lubricity |
| 12/09/1997 | US5695564 Multichamber system wherein transfer units and desired number of process units each with separate inert gas supply and exhaust systems are connected via interconnection units |
| 12/07/1997 | CA2206232A1 Method and apparatus for depositing diamond film |
| 12/04/1997 | WO1997046057A1 Plasma treatment apparatus and plasma treatment method |
| 12/04/1997 | WO1997045857A1 Apparatus for plasma jet treatment of substrates |
| 12/04/1997 | WO1997045856A1 Method for treating articles with a plasma jet |
| 12/04/1997 | WO1997045855A1 Highly tetrahedral amorphous carbon films and methods for their production |
| 12/04/1997 | WO1997045834A1 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production |
| 12/04/1997 | WO1997045364A1 Graphite thin film, method for manufacturing the same, and secondary battery and capacitor using the same |
| 12/04/1997 | WO1997045209A2 Chambers for promoting surface adhesion under vacuum and methods of using same |
| 12/04/1997 | DE19621858A1 Schichtenfolge sowie Substrat-Puffer-System und Verfahren zur Herstellung derselben Layer sequence substrate and buffer system and process for producing same |
| 12/04/1997 | CA2256418A1 Chambers for promoting surface adhesion under vacuum and methods of using same |
| 12/03/1997 | EP0810640A1 Thin film semiconductor device, method for manufacturing thin film semiconductor device, liquid crystal display, method for manufacturing liquid crystal display, electronic apparatus, method for manufacturing electronic apparatus, and method for depositing thin film |
| 12/03/1997 | EP0810300A1 Process for producing an aluminium film |
| 12/03/1997 | EP0810299A2 Apparatus for coating plastic films |
| 12/03/1997 | CN1166864A Method of forming diamond-like carbon film (DLC), DLC film formed thereby, use of the same, field emitter array and field emitter cathodes |
| 12/03/1997 | CN1166540A Method and apparatus for producing silicon carbide by chemical vapour-deposition |
| 12/03/1997 | CN1166535A 密封装置 Sealing device |
| 12/02/1997 | US5693581 Feeding gaseous mixture containing boron trihalide and ammonia to furnace, heating, adding hydrocarbon gas source to codeposit boron nitride and carbon, controlling flow of hydrocarbon gas to control concentration of carbon |
| 12/02/1997 | US5693579 Semiconductor manufacturing method and semiconductor device manufacturing apparatus |
| 12/02/1997 | US5693408 Forming multiple layers by plasma activated chemical vapor deposition and non-plasma activated chemical vapor deposition in sequence, of compounds selected from nitrides, carbides, carbonitrides and oxides |
| 12/02/1997 | US5693377 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds |
| 12/02/1997 | US5693376 Applying pulsed voltage differential to accelerate plasma generated in space between cylindrical electrode and cylindrical target inside it |
| 12/02/1997 | US5693368 Heating aluminum alkyl halide to clean surface and deposit aluminum which forms alloy with metal substrate |
| 12/02/1997 | US5693238 Method for improving the rate of a plasma enhanced vacuum treatment |
| 12/02/1997 | US5693189 Method and apparatus for supply of liquid raw material gas |
| 12/02/1997 | US5693139 Doping compound semiconductor single crystal layer by alternate introduction of source gases while growth chamber is being evacuated continuously |
| 11/27/1997 | WO1997044820A1 Low-pressure processing device |
| 11/27/1997 | WO1997044818A1 Method and apparatus for misted liquid source deposition of thin films with increased yield |
| 11/27/1997 | WO1997044503A1 Method and apparatus for treating inside surfaces of containers |
| 11/27/1997 | WO1997044141A1 Method and apparatus for dual-frequency plasma-enhanced cvd |
| 11/27/1997 | DE19721677A1 Electric power transmission and distribution cable |
| 11/26/1997 | EP0809282A1 A method for treating a substrate surface, a method for producing an at least partially metallized substrate and a substrate having a treated surface |
| 11/26/1997 | EP0809274A1 Apparatus and method for manufacturing an electronic device |
| 11/26/1997 | EP0808918A2 Plasma processing apparatus and processing method |
| 11/26/1997 | EP0808917A1 Apparatus and method for controlling the temperature of a wall of a reaction chamber |
| 11/26/1997 | EP0808916A2 Vaporizer apparatus |
| 11/26/1997 | EP0808915A2 Chemical vapor deposition and sputtering method and apparatus |
| 11/26/1997 | EP0808873A2 Sanitary container and production process thereof |
| 11/25/1997 | US5691258 Two phase HfB2 -SiB4 material |
| 11/25/1997 | US5691235 Method of depositing tungsten nitride using a source gas comprising silicon |
| 11/25/1997 | US5691010 High frequency voltage in vacuum |
| 11/25/1997 | US5691009 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds |
| 11/25/1997 | US5691007 Process for depositing barrier film on three-dimensional articles |
| 11/25/1997 | US5690997 Producing a carbon-loaded composite |
| 11/25/1997 | US5690743 Liquid material supply apparatus and method |
| 11/25/1997 | US5690742 Susceptor for an epitaxial growth apparatus |
| 11/25/1997 | US5690727 Thin films of ABO3 with excess B-site modifiers and method of fabricating integrated circuits with same |
| 11/25/1997 | US5690050 Plasma treating apparatus and plasma treating method |
| 11/25/1997 | CA2099833C Highly polishable, highly thermally conductive silicon carbide, method of preparation, and applications thereof |
| 11/20/1997 | WO1997043346A1 Plate-like titanium dioxide pigment |
| 11/20/1997 | WO1997043068A1 Diamond coated cutting member and method of making the same |
| 11/20/1997 | DE19629456C1 Tool, in particular, for cutting materials |
| 11/20/1997 | CA2252838A1 Diamond coated cutting member and method of making the same |
| 11/20/1997 | CA2226509A1 Plateletlike titanium dioxide pigment |
| 11/19/1997 | EP0807965A2 Method of manufacturing layered ferroelectric Bi containing film |
| 11/19/1997 | EP0807960A1 Deposition ring anti-rotation apparatus |
| 11/19/1997 | EP0807953A1 Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 11/19/1997 | EP0807952A2 Plasma reactor with heated source of a polymer-hardening precursor material |
| 11/19/1997 | EP0807951A2 Magnetic neutral line discharged plasma type surface cleaning apparatus |
| 11/19/1997 | EP0807694A1 Deposition chamber and method for low dielectric constant film |
| 11/19/1997 | EP0807693A2 Synthetic diamond wear component and method |
| 11/19/1997 | EP0807315A1 Multi-phase dc plasma processing system |
| 11/18/1997 | US5689614 Rapid thermal heating apparatus and control therefor |
| 11/18/1997 | US5689123 III-V aresenide-nitride semiconductor materials and devices |
| 11/18/1997 | US5688980 Organometallic lead precursor, in-situ synthesis thereof, lead-titanium based thin film using the same, and preparation method therefor |
| 11/18/1997 | US5688979 Organometallic zirconium precursor, in-situ synthesis thereof, lead-titanium based thin film using the same, and preparation method therefor |
| 11/18/1997 | US5688565 Integrated circuits |
| 11/18/1997 | US5688557 Synthetic diamond coating on substrates formed by vapor deposition |
| 11/18/1997 | US5688556 Barrier films having vapor coated EVOH surfaces |
| 11/18/1997 | US5688550 Method of forming polysilicon having a desired surface roughness |
| 11/18/1997 | US5688382 Vacuum deposition with microwaves for targets, magnets on targets, ionizing material and sputtering |
| 11/18/1997 | US5688359 Muffle etch injector assembly |
| 11/18/1997 | US5688331 Resistance heated stem mounted aluminum susceptor assembly |
| 11/18/1997 | US5688116 Heat treatment process |
| 11/13/1997 | WO1997042648A1 Recessed coil for generating a plasma |
| 11/13/1997 | WO1997042357A1 Method for forming tin oxide coating on glass |
| 11/13/1997 | WO1997042356A1 Chemical vapor deposition of fluorocarbon polymer thin films |
| 11/13/1997 | DE19618564A1 Plättchenförmiges Titandioxidpigment Flaky titanium dioxide pigment |
| 11/13/1997 | CA2225961A1 Method for forming tin oxide coating on glass |
| 11/12/1997 | EP0806496A1 Method and apparatus for aiming a barrel reactor nozzle |
| 11/12/1997 | EP0806495A2 Metal-organic chemical vapor-phase deposition process |
| 11/12/1997 | EP0806126A1 Methods and apparatus for generating plasma |
| 11/12/1997 | CN1164848A Glazing including conductive and/or low-emissive layer |
| 11/12/1997 | CN1164812A Ultra high purity gas distribution component with integral valved coupling and methods for its use |
| 11/12/1997 | CN1164758A Valved coupling for ultra high purity gas distribution systems |
| 11/11/1997 | US5686355 Vapor deposition, heating silane gas |
| 11/11/1997 | US5686349 Fabrication of a thin film transistor and production of a liquid crystal display apparatus |
| 11/11/1997 | US5686195 Process for an improved laminate of ZnSe and ZnS |
| 11/11/1997 | US5686157 Multilayer barrier coating of polyvinylidene chloride |
| 11/11/1997 | US5686152 Metal initiated nucleation of diamond |
| 11/11/1997 | US5686151 Method of forming a metal oxide film |
| 11/11/1997 | US5685941 Inductively coupled plasma reactor with top electrode for enhancing plasma ignition |
| 11/11/1997 | US5685916 Dry cleaning of semiconductor processing chambers |
| 11/11/1997 | US5685914 Focus ring for semiconductor wafer processing in a plasma reactor |
| 11/11/1997 | US5685913 Plasma processing apparatus and method |