Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/1998
01/07/1998CN1169694A Glass coating method and glass coated thereby
01/06/1998US5705283 Tungsten-copper composite material with rhenium protective layer, and its preparation
01/06/1998US5705271 Good adhesion and wear resistance, tools
01/06/1998US5705267 Protective layer of silicon oxide
01/06/1998US5705263 Coated cutting tool
01/06/1998US5705262 Surface treatment of carbonaceous material for making a subsequent deposit of diamond adherent and diamond-covered pieces obtained
01/06/1998US5705235 Decompounding gaseous compound in focus of laser beam
01/06/1998US5705224 Mixing hydride gas, adsorption and applying pulsation of light from flash lamp and decomposition
01/06/1998US5705080 Plasma-inert cover and plasma cleaning process
01/06/1998US5705008 Needle punching
01/06/1998US5704986 Semiconductor substrate dry cleaning method
01/06/1998US5704984 Chemical vapor deposition apparatus with a heat radiation structure
01/06/1998US5704983 Methods and apparatus for depositing barrier coatings
01/06/1998US5704982 Technique for depositing coatings by pyrolysis/decomposition of precursor gas or gases
01/06/1998US5704981 Processing apparatus for substrates to be processed
01/06/1998US5704975 Metalorganic vapor phase epitaxial growth, hcl
01/06/1998US5704214 Vacuum exhaust system for sucking and discharging exhaust gas
01/06/1998CA2027657C Method for preparing laminates of znse and zns
01/02/1998DE19625977A1 CVD of poorly conductive or non-conductive thin film, used to produce e.g. ceramic
12/1997
12/31/1997CN1169094A Plasma source
12/31/1997CN1036860C Process for forming metal deposiled film contg. aluminium as main component by using alkyl aluminium hydride
12/30/1997US5702808 Al2 O2 -coated cutting tool preferably for near net shape machining
12/30/1997US5702770 Applying a barrier film to interior wall of plastic substrate
12/30/1997US5702764 Method for the preparation of pyrolytic boron nitride-clad double-coated article
12/30/1997US5702532 MOCVD reactor system for indium antimonide epitaxial material
12/30/1997US5702531 Apparatus for forming a thin film
12/30/1997US5702530 Distributed microwave plasma reactor for semiconductor processing
12/30/1997US5702529 Method of making doped semiconductor film having uniform impurity concentration on semiconductor substrate and apparatus for making the same
12/29/1997EP0814497A2 Device structure with layer for facilitating passivation of surface states
12/29/1997EP0814177A2 Vaporizer apparatus and film deposition apparatus therewith
12/29/1997EP0814176A2 Method and apparatus for depositing diamond film
12/29/1997EP0814175A2 CVD of metals using iodide precursor
12/29/1997EP0814062A1 Process for producing a thin film of a metal fluoride on a substrate
12/29/1997EP0813923A1 Guide bush and method for forming a hard carbon film on an internal circumferential surface of said bush
12/29/1997EP0706425A4 Selective plasma deposition
12/29/1997EP0680384A4 Microwave energized process for the preparation of high quality semiconductor material.
12/29/1997EP0667921A4 Microwave apparatus for depositing thin films.
12/24/1997WO1997048836A1 Hard graphite-like material bonded by diamond-like framework
12/24/1997WO1997048662A1 Densification of a porous structure (iii)
12/24/1997WO1997048661A1 Densification of a porous structure (ii)
12/24/1997WO1997048660A1 Densification of a porous structure (i)
12/24/1997WO1997048552A1 Diamond film deposition
12/24/1997WO1997048499A1 GaAs SUBSTRATE WITH A PASSIVATING EPITAXIAL GALLIUM SULFIDE FILM AND METHODS FOR FORMING SAME
12/24/1997CN1168489A Light receiving member having surface protective layer with specific outermost surface and process for production thereof
12/24/1997CN1168422A Microwave plasma processing apparatus and method therefor
12/24/1997CN1168421A Preparation of insulating layer on the surface of non-corrosive steel and alloy
12/24/1997CA2249288A1 Diamond film deposition
12/23/1997US5701578 Providing sintered substrate that includes hard grains bonded by metallic binder, annealing to reduce stress, resintering, adherently depositing coating
12/23/1997US5700992 Zigzag heating device with downward directed connecting portions
12/23/1997US5700741 Plasma purge method for plasma process particle control
12/23/1997US5700738 Forming adhesion layer on front of silicon substrate, forming silicon oxide film on side and rear of silicon substrate, forming metal film on adhesion layer while feeding inactive gas
12/23/1997US5700719 Semiconductor device and method for producing the same
12/23/1997US5700569 Wear resistance
12/23/1997US5700526 Insulator deposition using focused ion beam
12/23/1997US5700520 Increasing pressure within single substrate chemical vapor deposition chamber greatly increases rate of deposition
12/23/1997US5700518 Fabrication method for diamond-coated cemented carbide cutting tool
12/23/1997US5700517 Process for the densification of a porous structure by boron nitride
12/23/1997US5700326 Microwave plasma processing apparatus
12/23/1997CA2121423C Process for barrier coating of plastic objects
12/18/1997WO1997047789A1 Diamond film and process for preparing the same
12/18/1997WO1997047785A1 Cutting tool and manufacturing method therefor
12/18/1997WO1997047783A1 Methodology and apparatus for in-situ doping of aluminum coatings
12/18/1997WO1997047370A1 Microfabricated filter and method of making same
12/18/1997DE19622701A1 Cantilever chip for atomic force microscopy
12/17/1997EP0813227A2 RF plasma processors
12/17/1997EP0812932A2 Production of diamond film
12/17/1997EP0549585B1 Binder enriched cvd and pvd coated cutting tool
12/17/1997CN1167914A Polygonal planar multipass cell, system and apparatus including same, and method of use
12/16/1997US5698473 From high energy plasma and densified in presence of oxygen to form highly planar interlevel dielectric
12/16/1997US5698328 Substrate is positioned between carbon cathode and anode, applying direct current between anode and cathode to form hydrogen plasma, adding dopant, transporting carbon from cathode to anode substrate, depositing doped diamond film
12/16/1997US5698272 Method for lubrication of diamond-like carbon surfaces
12/16/1997US5698262 Method for forming tin oxide coating on glass
12/16/1997US5698261 Feeding gas-vapor mixture of trichloromethylsilane and hydrogen into reactor, decomposing mixture on heated substrate to form silicon carbide layer, separating, recovering, recycling decomposition products
12/16/1997US5698062 Plasma treatment apparatus and method
12/16/1997US5698037 Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing
12/16/1997US5698036 Plasma processing apparatus
12/16/1997US5698035 Corrosion/shock and electrical resistance; improve thermoconductivity; consists of atleast one of zrconium bromide and titanium bromide, boron nitride and aluminum nitride
12/16/1997US5698022 Metal oxide chemical vapor deposition
12/11/1997WO1997047049A1 Series of layers and substrate-buffer system, and process for the production thereof
12/11/1997WO1997046842A1 Vertical heat treatment device
12/11/1997WO1997046730A1 Temperature controlling method and apparatus for a plasma processing chamber
12/11/1997WO1997046484A1 Method for forming conformal diamond-type carbon coatings, hard diamond-type carbon coating and porous filtration element using the same
12/11/1997DE19622823A1 Verbundwerkstoff und Verfahren zu seiner Herstellung Composite material and process for its preparation
12/10/1997EP0812013A2 Multilayer coating for microelectronic devices
12/10/1997EP0811709A2 Method and apparatus for enhancing the efficiency of radiant energy sources used in rapid thermal processing of substrates by energy reflection
12/10/1997EP0811704A1 Surface modification of magnetic heads
12/10/1997EP0811703A2 Apparatus for treatment of a substrate
12/10/1997EP0811702A2 Method and apparatus for depositing a layer by CVD
12/10/1997EP0811413A2 Evacuation system
12/10/1997EP0811367A2 Glass container particularly for storing pharmaceutical or diagnostic solutions
12/10/1997EP0811084A1 Process of diamond growth from c 70?
12/10/1997EP0811082A1 Cvd diamond burrs for odontological and related uses
12/10/1997EP0799557A4 High frequency induction plasma method and apparatus
12/10/1997CN1167508A High density flash evaporator
12/10/1997CA2207154A1 Inductively coupled source for deriving substantially uniform plasma flux
12/09/1997US5696428 Apparatus and method using optical energy for specifying and quantitatively controlling chemically-reactive components of semiconductor processing plasma etching gas
12/09/1997US5696384 Composition for formation of electrode pattern
12/09/1997US5695832 Vacuum deposition; forming plasma
12/09/1997US5695831 CVD method for forming a metallic film on a wafer
12/09/1997US5695830 Surface oxidation; vapor deposition of aluminum chloride andaluminum nitride