Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
02/1998
02/03/1998US5714011 Heating to dissociate nitrigen trifluoride, mixing with inert gas and flowing over substances to be cleaned to form volatile reaction products, evacuating wastes using vacuum or mechanical pumping
02/03/1998US5714010 Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same
02/03/1998US5714009 Apparatus for generating large distributed plasmas by means of plasma-guided microwave power
02/03/1998US5713133 Methods of preparing cemented metal carbide substrates for deposition of adherent diamond coatings and products made therefrom
01/1998
01/29/1998WO1998003292A1 Tool, especially for machining
01/28/1998EP0821085A1 Apparatus for introducing gas into a rapid thermal processing chamber
01/28/1998EP0821084A1 Multi-zone gas flow control in a process chamber
01/28/1998EP0821079A1 CVD-Process and device for interior coating of hollow bodies
01/28/1998EP0821078A1 Modified platinum aluminide diffusion coating and cvd coating method
01/28/1998EP0821077A2 Object coated with carbon film and method of manufacturing the same
01/28/1998EP0821076A1 A method of aluminising a superalloy
01/28/1998EP0821075A1 Platinum modified aluminide diffusion coating and method
01/28/1998EP0821026A1 Continuous cvd equipment for films and continuous cvd process
01/28/1998EP0820852A1 Method and apparatus for controlling the functioning of a surface treatment system for a moving solid substrate
01/28/1998EP0820424A1 Method for the chemical vapour infiltration of a material consisting of carbon and silicon and/or boron
01/28/1998EP0725768B1 Chemical vapour infiltration process of a material within a fibrous substrate with creation of a temperature gradient in the latter
01/28/1998CN1171497A Member having sliding contact surface, compressor and rotary compressor
01/28/1998CN1037198C Synthesis diamond film with double cathode glow discharge
01/28/1998CN1037158C Method for preparing carbon membranes, capable of controlling aperture
01/27/1998US5712724 Gallium phosphide
01/27/1998US5712702 Method and apparatus for determining chamber cleaning end point
01/27/1998US5712001 Chemical vapor deposition process for producing oxide thin films
01/27/1998US5712000 Large-scale, low pressure plasma-ion deposition of diamondlike carbon films
01/27/1998US5711850 Plasma processing apparatus
01/27/1998US5711816 Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same
01/27/1998US5711815 Film forming apparatus and film forming method
01/27/1998US5711814 Method of and apparatus for forming film with rotary electrode
01/27/1998US5711811 Method and equipment for growing thin films
01/27/1998US5711780 Mold for molding optical element
01/27/1998US5711354 Level control systems for high purity chemical delivery systems
01/23/1998CA2211149A1 Platinum aluminising single crystal superalloys
01/22/1998WO1998002598A1 Coated cutting insert
01/22/1998WO1998002241A1 Electrically assisted synthesis of particles and films with precisely controlled characteristics
01/22/1998WO1998002027A2 Method for producing diamond films using a vapour-phase synthesis system
01/22/1998DE19731181A1 Production of thin silicon carbide films on polymeric base materials
01/22/1998CA2259691A1 Electrically assisted synthesis of particles and films with precisely controlled characteristics
01/21/1998EP0820087A2 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
01/21/1998EP0819780A2 Inductively coupled HDP-CVD reactor
01/21/1998EP0819779A1 Processes for the scrubbing of noxious substances from an exhaust gas
01/21/1998EP0819184A1 Enhanced adherence of diamond coatings employing pretreatment process
01/21/1998EP0819105A1 Chemical vapour infiltration method with variable infiltration parameters
01/21/1998EP0785868A4 Glass coating method and glass coated thereby
01/21/1998EP0689618A4 Method and apparatus for the combustion chemical vapor deposition of films and coatings
01/21/1998CN1171137A Pressure gredient CVI/CVD apparatus, process and product
01/21/1998CN1170784A Method and apparatus for aiming barrel reactor nozzle
01/21/1998CN1170776A Method and producing diamond film coated hard alloy cutter
01/21/1998CN1170775A Equipment for treating bottom materials
01/20/1998US5710852 Optical waveguide for fiber-optic amplifiers for the wavelength region around 1550 nm
01/20/1998US5710407 Rapid thermal processing apparatus for processing semiconductor wafers
01/20/1998US5710079 Method and apparatus for forming dielectric films
01/20/1998US5709936 Composite coating for low friction and wear applications and method thereof
01/20/1998US5709772 Non-plasma halogenated gas flow to prevent metal residues
01/20/1998US5709757 For use in manufacturing semiconductor wafers
01/20/1998US5709753 Parylene deposition apparatus including a heated and cooled dimer crucible
01/20/1998US5709726 Device for forming a pyrolytic coating on a hot glass substrate
01/20/1998US5709543 Vertical heat treatment apparatus
01/15/1998WO1998001899A1 Cleaning gas
01/15/1998WO1998001601A1 Plasma chamber with separate process gas and cleaning gas injection ports
01/15/1998WO1998001600A1 Guide bush and method of forming film on guide bush
01/15/1998WO1998001599A1 Microwave applicator for an electron cyclotron resonance plasma source
01/15/1998WO1998001378A1 A wafer transfer system and method of using the same
01/15/1998DE19615534C1 Coated wear body used for cutting tools
01/14/1998EP0818807A2 Dual vertical thermal processing furnace
01/14/1998EP0818802A2 Gas injection slit nozzle for a plasma process reactor
01/14/1998EP0818801A2 Plasma treating apparatus
01/14/1998EP0818622A1 Using a coated fuel injector and method of making
01/14/1998EP0818565A2 Gas supplying apparatus and vapor-phase growth plant
01/14/1998EP0818560A2 Construction of a film on a semiconductor wafer
01/14/1998EP0818559A2 Chamber for constructing a film on a semiconductor wafer
01/14/1998EP0818558A1 Components peripheral to the pedestal in the gas flow path within a chemical vapor deposition chamber
01/14/1998CN1170442A Apparatus for use with CVE/CVD processes
01/14/1998CN1170048A Method and apparatus for forming a coating on the surface of at least one substrate
01/13/1998US5708755 Rapid thermal heating apparatus and method
01/13/1998US5708556 For supporting a wafer
01/13/1998US5707717 Articles having diamond-like protective film
01/13/1998US5707692 Vapor deposition from plasma, magnetism and supporting
01/13/1998US5707452 Coaxial microwave applicator for an electron cyclotron resonance plasma source
01/13/1998US5707451 Method and apparatus for cleaning a throttle valve
01/13/1998US5707415 Method of vaporizing reactants in a packed-bed, column, film evaporator
01/13/1998US5707409 Abrasive article having a diamond-like coating layer and method for making same
01/08/1998WO1998000577A1 Method and apparatus for flowing gases into a manifold at high potential
01/08/1998WO1998000576A1 Apparatus and method for high density plasma chemical vapor deposition
01/08/1998WO1998000575A1 Method for densifying and refurbishing brakes
01/08/1998WO1998000432A1 Platinum source compositions for chemical vapor deposition of platinum
01/08/1998DE19727253A1 Multiple or single junction photovoltaic device especially solar cell
01/08/1998DE19702388A1 Forming aluminium@ plug by selective chemical vapour deposition
01/08/1998DE19635735C1 Holder clamp for coating small components
01/07/1998EP0817258A2 Method for manufacturing an interconnection structure in a semiconductor device
01/07/1998EP0817251A1 Method of forming a doped silicon oxide film
01/07/1998EP0816531A1 Alumina coated tool and production method thereof
01/07/1998EP0816530A1 A method of purifying an organo-metallic compound
01/07/1998EP0815953A2 Method for depositing substituted fluorocarbon polymeric layers
01/07/1998EP0815589A2 Process for fabricating layered superlattice materials and making electronic devices including same
01/07/1998EP0815587A1 Uv radiation process for making electronic devices having low-leakage-current and low-polarization fatigue
01/07/1998EP0815586A1 Integrated circuits having mixed layered superlattice materials and precursor solutions for use in a process of making the same
01/07/1998EP0815284A1 Method and apparatus for plasma deposition on a double-sided substrate
01/07/1998EP0815283A1 Plasma chamber
01/07/1998EP0741909A4 Methods for improving semiconductor processing
01/07/1998EP0662025B1 Coated grinding tools and methods for their preparation
01/07/1998CN1169757A Method for depositing hard protective coating