| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/11/1998 | EP0827817A1 Coated chain saw nose sprocket |
| 03/11/1998 | EP0734464B1 Porous substrate densification method |
| 03/11/1998 | CN1175489A Guide bush and method of forming hard carbon film over inner surface of guide bush |
| 03/11/1998 | CN1037701C Boron nitride crucible and process for producing same |
| 03/10/1998 | US5726294 Metalorganic chemical vapor deposition method for depositing F-series metal or nitrogen and metal amides for use in MOCVD |
| 03/10/1998 | US5725932 Ceramic-based substrate for coating diamond and method for preparing substrate for coating |
| 03/10/1998 | US5725912 Method of manufacturing an electric heating film of semiconductor |
| 03/10/1998 | US5725907 Metal material formed with fluorocarbon film, process for preparing the material and apparatus made with use of the material |
| 03/10/1998 | US5725904 Liquid methyltin halide compositions |
| 03/10/1998 | US5725740 Eliminating free exposed titanium from an edge of a substrate having sequentially sputtered layers of titanium and titanium nitride thereon |
| 03/10/1998 | US5725675 Silicon carbide constant voltage gradient gas feedthrough |
| 03/10/1998 | US5725673 Semiconductor wafer process chamber with susceptor back coating |
| 03/10/1998 | US5725672 Apparatus for the high speed, low pressure gas jet deposition of conducting and dielectric thin sold films |
| 03/10/1998 | US5725573 Medical implants made of metal alloys bearing cohesive diamond like carbon coatings |
| 03/05/1998 | WO1998008998A1 Plasma cvd system with an array of microwave plasma electrodes and plasma cvd process |
| 03/05/1998 | WO1998008780A1 Unibody crucible and effusion source employing such a crucible |
| 03/05/1998 | DE19638100C1 Apparatus to produce vaporous reaction product from solid particles |
| 03/05/1998 | DE19635736A1 Diamantähnliche Beschichtung Diamond-like coating |
| 03/05/1998 | DE19634795A1 Plasma-CVD-Anlage mit einem Array von Mikrowellen-Plasmaelektroden und Plasma-CVD-Verfahren Plasma CVD system having an array of microwave plasma electrodes and the plasma CVD method |
| 03/05/1998 | CA2264017A1 Plasma cvd system with an array of microwave plasma electrodes and plasma cvd process |
| 03/04/1998 | EP0827182A2 Surface wave plasma processing apparatus |
| 03/04/1998 | EP0826791A2 Method of forming interlayer insulating film |
| 03/04/1998 | EP0826233A1 Slip free vertical rack design |
| 03/04/1998 | EP0826131A1 Unibody crucible |
| 03/04/1998 | EP0760021B1 Tool, process for producing the tool and use of the tool |
| 03/04/1998 | EP0708688A4 Method for the improved microwave deposition of thin films |
| 03/04/1998 | EP0695376A4 Magnetic roller gas gate employing transonic sweep gas flow |
| 03/04/1998 | EP0584252B1 A PROCESS FOR DEPOSITING A SIOx FILM HAVING REDUCED INTRINSIC STRESS AND/OR REDUCED HYDROGEN CONTENT |
| 03/03/1998 | US5723386 Method of manufacturing a semiconductor device capable of rapidly forming minute wirings without etching of the minute wirings |
| 03/03/1998 | US5723382 Method of making a low-resistance contact to silicon having a titanium silicide interface, an amorphous titanium nitride barrier layer and a conductive plug |
| 03/03/1998 | US5723361 Thin films of ABO3 with excess A-site and B-site modifiers and method of fabricating integrated circuits with same |
| 03/03/1998 | US5723172 Method for forming a protective coating on glass |
| 03/03/1998 | US5723171 Integrated circuit electrode structure and process for fabricating same |
| 03/03/1998 | US5722184 Porous absorptive grains |
| 02/26/1998 | WO1998007895A1 Method of forming hard carbon film on inner circumferential surface of guide bush |
| 02/26/1998 | DE19735990A1 CVD of thin stable zirconium nitride film |
| 02/26/1998 | DE19735961A1 Method for forming a hard carbon film on the inner surface of a guide bush |
| 02/26/1998 | DE19634334C1 Reflection coating on surface of optical reflectors |
| 02/25/1998 | EP0825638A2 Method of manufacturing fine structures |
| 02/25/1998 | EP0825637A2 Epitaxial barrel reactor with a cooling system and method of operating it |
| 02/25/1998 | EP0825279A1 Method and apparatus for purging the back side of a substrate |
| 02/25/1998 | EP0825278A1 Method for reducing contaminants in plasma chambers |
| 02/25/1998 | EP0824605A1 Diamond coated body and method of its production |
| 02/25/1998 | EP0755231A4 Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys |
| 02/25/1998 | EP0740757A4 Chemical refill system for high purity chemicals |
| 02/24/1998 | US5721021 Method of depositing titanium-containing conductive thin film |
| 02/24/1998 | US5720818 Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck |
| 02/24/1998 | US5720808 Applying inductive coupling discharge at given frequency to starting gas containing carbon to form plasma of gas, applying positive bias voltage to form diamond film |
| 02/24/1998 | CA2041427C Boron nitride boat and process for producing it |
| 02/19/1998 | WO1998006675A1 Method of depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass |
| 02/19/1998 | WO1998006510A1 Coating of glass |
| 02/19/1998 | WO1998002027A3 Method for producing diamond films using a vapour-phase synthesis system |
| 02/19/1998 | DE19734736A1 Pyrolytic boron nitride container with IR transmission profile |
| 02/19/1998 | CA2234545A1 Coating of glass |
| 02/18/1998 | EP0824266A2 Substrate processing apparatus |
| 02/18/1998 | CN1173948A Thin-film semiconductor device, its method for making the same, liquid crystal display equipment and method for making the same |
| 02/18/1998 | CN1173550A Plasma treatment appts. |
| 02/17/1998 | US5718976 Erosion resistant diamond-like nanocomposite coatings for optical components |
| 02/17/1998 | US5718967 Plasma polymerized organosilicon compounds; liquid crystal display devices |
| 02/17/1998 | US5718948 Cemented carbide body for rock drilling mineral cutting and highway engineering |
| 02/17/1998 | US5718813 Enhanced reactive DC sputtering system |
| 02/17/1998 | US5718769 Plasma processing apparatus |
| 02/17/1998 | US5718762 Method for vapor-phase growth |
| 02/17/1998 | US5718574 Heat treatment apparatus |
| 02/17/1998 | US5718541 Cutting tool for machining titanium and titanium alloys |
| 02/12/1998 | WO1998005803A1 Surface treatment apparatus, surface treatment method using the apparatus, and surface treatment nozzle used for the apparatus and method |
| 02/12/1998 | WO1997045209A3 Chambers for promoting surface adhesion under vacuum and methods of using same |
| 02/11/1998 | EP0823493A1 Apparatus for plasma enhanced chemical vapour deposition of polycrystalline diamond |
| 02/11/1998 | EP0823492A2 Zone heating system with feedback control |
| 02/11/1998 | EP0823491A2 Gas injection system for CVD reactors |
| 02/11/1998 | EP0823279A2 Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors |
| 02/11/1998 | EP0822995A1 Modification of surfaces of polymers, metal or ceramic |
| 02/10/1998 | US5717294 For processing a target surface of a substrate |
| 02/10/1998 | US5717234 Ferroelectric layer of mixed oxide of barium, stronium and titanium is sandwhiched between top and bottom electrodes of oxides of barium, stronium and ruthenium; excellent film uniformity, high density, and high deposition rate |
| 02/10/1998 | US5716908 Process for controlling crystalline orientation of oxide superconductive film |
| 02/10/1998 | US5716870 Method for producing titanium thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
| 02/10/1998 | US5716720 Multilayer |
| 02/10/1998 | US5716683 Testing plastic container comprising multilayer protective coatings containing polyepoxides undercoatings and metal oxide inorganic overcoatings; gas impervious, shelf life, chemical resistance |
| 02/10/1998 | US5716495 Cleaning method |
| 02/10/1998 | US5716485 Electrode designs for controlling uniformity profiles in plasma processing reactors |
| 02/10/1998 | US5716170 Diamond coated cutting member and method of making the same |
| 02/05/1998 | WO1998005061A1 Method for manufacturing semiconductor device |
| 02/05/1998 | WO1998005057A1 Magnetron |
| 02/05/1998 | WO1998004758A1 Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces |
| 02/05/1998 | DE19732432A1 Titanium nitride film formation by CVD |
| 02/05/1998 | DE19632393A1 High rate plasma-assisted nano-structure layer deposition |
| 02/04/1998 | EP0822585A2 Stress control by fluorination of silica film |
| 02/04/1998 | EP0822572A1 Method and apparatus for plasma treatment of a surface |
| 02/04/1998 | EP0822269A1 Diamond |
| 02/04/1998 | EP0822268A1 Process for depositing adherent diamond thin films |
| 02/04/1998 | EP0821799A1 Fabrication of silica-based optical devices and opto-electronic devices |
| 02/04/1998 | EP0821744A1 Vapour phase chemical infiltration process for densifying porous substrates disposed in annular stacks |
| 02/04/1998 | EP0660886B1 Growing a nitrogen doped epitaxial ii-vi compound layer on a single crystal substrate |
| 02/04/1998 | CN1172173A Method for growth of semispherical silicon crystal |
| 02/03/1998 | US5715361 Rapid thermal processing high-performance multizone illuminator for wafer backside heating |
| 02/03/1998 | US5714406 Method for forming film on semiconductor substrate by thermal CVD method |
| 02/03/1998 | US5714391 Method of manufacturing a compound semiconductor thin film for a photoelectric or solar cell device |
| 02/03/1998 | US5714306 Processing method and apparatus |
| 02/03/1998 | US5714202 Synthetic diamond overlays for gas turbine engine parts having thermal barrier coatings |
| 02/03/1998 | US5714194 Chemical vapor deposition of lead titanate and mixed oxide of lead, zirconium and titanium dielectrics on a substrate |