| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 05/12/1998 | US5749966 Process for depositing diamond and refractory materials |
| 05/12/1998 | US5749389 Purgeable connection for gas supply cabinet |
| 05/07/1998 | WO1998019334A1 Heat treatment apparatus |
| 05/07/1998 | WO1998018977A1 Coating for components and process for producing the same |
| 05/07/1998 | DE19748278A1 Apparatus for a plasma CVD process |
| 05/07/1998 | DE19700867A1 Semiconductor processing apparatus for film growing on wafer surface |
| 05/06/1998 | EP0840370A1 Low temperature aluminum reflow for multilevel metallization |
| 05/06/1998 | EP0840366A2 Method of forming a phosphorus doped silica glass film |
| 05/06/1998 | EP0840365A2 High pressure plasma oxide etch process |
| 05/06/1998 | EP0840363A1 Method for fabricating a conductive diffusion barrier layer by PECVD |
| 05/06/1998 | EP0840362A1 Fabrication of tungsten gate electrodes by means of tungsten carbonyl |
| 05/06/1998 | EP0839930A1 Apparatus for vacuum line cleaning in substrate processing equipment |
| 05/06/1998 | EP0839929A1 Method and apparatus for minimizing deposition in an exhaust line |
| 05/06/1998 | EP0839928A1 Remote plasma CVD method |
| 05/06/1998 | EP0839927A2 Method of forming films comprising TiN and Al |
| 05/06/1998 | EP0839404A1 Electrostatic chuck assembly |
| 05/06/1998 | EP0839218A1 Method for forming tin oxide coating on glass |
| 05/06/1998 | EP0839217A1 A plasma enhanced chemical processing reactor and method |
| 05/06/1998 | EP0674722B1 Protective film for articles and method |
| 05/06/1998 | CN1181172A Plasma processing device and method |
| 05/06/1998 | CN1181055A The combinatorial Synthesis of novel materials |
| 05/05/1998 | USRE35785 Low-pressure chemical vapor deposition process for depositing high-density highly-conformal, titanium nitride films of low bulk resistivity |
| 05/05/1998 | US5747818 Thermoelectric cooling in gas-assisted FIB system |
| 05/05/1998 | US5747384 Process of forming a refractory metal thin film |
| 05/05/1998 | US5747362 Method of manufacturing a semiconductor device in which a layer of material is deposited on the surface of a semiconductor wafer from a process gas |
| 05/05/1998 | US5747119 Vapor deposition method and apparatus |
| 05/05/1998 | US5747118 Plasma enhanced chemical transport process for forming diamond films |
| 05/05/1998 | US5747116 Method of forming an electrical contact to a silicon substrate |
| 05/05/1998 | US5747113 Vapor deposition on substrate, rotation for multilayer element |
| 05/05/1998 | US5747096 Infiltration, decomposition, carbonization |
| 05/05/1998 | US5746875 Gas injection slit nozzle for a plasma process reactor |
| 05/05/1998 | US5746834 Method and apparatus for purging barrel reactors |
| 05/05/1998 | US5746591 Semiconductor furnace for reducing particulates in a quartz tube and boat |
| 05/05/1998 | US5746512 Method for reducing crack of polysilicon in a quartz tube and boat |
| 05/04/1998 | CA2189492A1 Apparatus for destroying hazardous compounds in a gas stream |
| 04/30/1998 | WO1998017838A1 Coated material and method of manufacturing the same |
| 04/30/1998 | WO1998017599A1 Densification of substrates arranged in ring-shaped stacks by chemical infiltration in vapour phase with temperature gradient |
| 04/30/1998 | WO1998017477A1 Passivation of ink-jet printheads |
| 04/30/1998 | DE19644692A1 Beschichtung sowie ein Verfahren zu deren Herstellung Coating and a method for their preparation |
| 04/30/1998 | DE19644153A1 Multistage low pressure plasma cleaning process |
| 04/30/1998 | CA2268729A1 Densification of substrates arranged in ring-shaped stacks by chemical infiltration in vapour phase with temperature gradient |
| 04/29/1998 | EP0838843A2 Parallel-plate electrode plasma reactor having inductive antenna and adjustable radial distribution of plasma ion density |
| 04/29/1998 | EP0838839A2 Plasma processing apparatus |
| 04/29/1998 | EP0838836A2 Thermoelectric cooling in gas-assisted focused ion beam (FIB) system |
| 04/29/1998 | EP0838536A2 Method and apparatus for depositing highly oriented and reflective crystalline layers |
| 04/29/1998 | EP0838535A1 Interference layer system |
| 04/29/1998 | EP0838097A1 ELECTROCATALYTIC STRUCTURE COMPRISING A MATRIX OF SiOxCyHz HAVING DISPERSED THEREIN PARTICLES OF CATALYTIC MATERIAL |
| 04/29/1998 | EP0838084A1 Multilayer high vertical aspect ratio thin film structures |
| 04/29/1998 | EP0837911A1 Plate-like titanium dioxide pigment |
| 04/28/1998 | US5744403 Uniform thickness |
| 04/28/1998 | US5744378 Method for fabricating a semiconductor device having multilevel interconnections |
| 04/28/1998 | US5744377 Aluminum, connectors |
| 04/28/1998 | US5744214 Metal carbide |
| 04/28/1998 | US5744196 Low temperature deposition of silicon dioxide using organosilanes |
| 04/28/1998 | US5744192 Exposing copper receiving surface to volatile copper hexafluoroacetylacetonate trimethylvinylsilane, simultaneously exposing surface to water vapor; addition of water increases electroconductivity |
| 04/28/1998 | US5744049 Radio frequency, semiconductor etching |
| 04/28/1998 | US5743967 Low pressure CVD apparatus |
| 04/28/1998 | US5743966 Unwinding of plastic film in the presence of a plasma |
| 04/28/1998 | US5743961 Thermal spray coating apparatus |
| 04/28/1998 | US5743643 Rapid thermal heating apparatus and method |
| 04/28/1998 | CA2120996C Apparatus and method of making reflex molds |
| 04/23/1998 | WO1998016667A1 Chemical vapor deposition of aluminum oxide |
| 04/23/1998 | DE19652821C1 Wear and corrosion resistant low friction medical scissors |
| 04/22/1998 | EP0837495A1 Vapor phase growth apparatus and vapor phase growth method |
| 04/22/1998 | EP0837489A2 Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 04/22/1998 | EP0837155A1 Forming TiN thin films using remote activated species generation |
| 04/22/1998 | EP0836654A1 Process for the preparation of magnesium oxide films using organomagnesium compounds |
| 04/22/1998 | EP0745149B1 Plasma modification of lumen surface of artificial tubing |
| 04/22/1998 | EP0662868B1 Method for synthesizing diamond and products produced thereby |
| 04/21/1998 | US5741547 Injecting gaseous titanium organometallic compound and ammonia or phenylhydrazine through shower-head type gas delivery vapor deposition reactor |
| 04/21/1998 | US5741546 Method of depositing titanium nitride films on semiconductor wafers |
| 04/21/1998 | US5741544 Articles using specialized vapor deposition processes |
| 04/21/1998 | US5741364 Thin film formation apparatus |
| 04/21/1998 | US5741363 Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition |
| 04/21/1998 | US5740941 Sheet material with coating |
| 04/16/1998 | WO1998015671A1 Composite body, production process and use |
| 04/16/1998 | WO1998015670A1 Post treated diamond coated body |
| 04/16/1998 | WO1998015669A1 Method and apparatus for plasma deposition of a thin film onto the interior surface of a container |
| 04/16/1998 | WO1998015504A1 Reactive ion etching of silica structures |
| 04/16/1998 | DE19744837A1 Low dielectric constant insulating film production |
| 04/16/1998 | DE19712320C1 Substrate support e.g. for coating apparatus |
| 04/16/1998 | DE19641468A1 Composite body especially cutter insert or wear part |
| 04/16/1998 | CA2265617A1 Reactive ion etching of silica structures |
| 04/15/1998 | EP0835950A1 Reactant gas ejector head |
| 04/15/1998 | EP0835834A1 A drive mechanism for transporting a tow at constant speed |
| 04/15/1998 | EP0835332A1 Plasmapolymer surface coating, coating process therefor and heat exchanger coated therewith |
| 04/15/1998 | CN1179232A Integrated circuit having mixed layered superlattice materials and precruser solutions for use in process of making same |
| 04/15/1998 | CN1179231A Process for making electronic devices having low-leakage current and low-polarization fatigue |
| 04/15/1998 | CN1038076C Preparation of superconducting oxides of metal and its products |
| 04/14/1998 | US5740016 In a semiconductor processing system |
| 04/14/1998 | US5739069 Plasma process with radicals |
| 04/14/1998 | US5738920 Blood collection tube assembly |
| 04/14/1998 | US5738908 Placing substrate in infiltration chamber, injecting preheated gas comprising trichloromethylsilane and hydrogen at specified ratio to deposit silicon carbide within substrate, extracting residual gas, diluting |
| 04/14/1998 | US5738771 Used to form first metal oxide film by non-reactive sputtering and second metal oxide by reactive sputtering, and forming a semiconductor on second metal oxide |
| 04/14/1998 | US5738731 Solar cells |
| 04/14/1998 | US5738721 Liquid precursor and method for forming a cubic-phase passivating/buffer film |
| 04/09/1998 | WO1998014980A1 Particle controlling method and plasma processing chamber |
| 04/09/1998 | WO1998014636A1 Apparatus for reducing polymer deposition on substrate support |
| 04/09/1998 | WO1998014635A1 Method of treatment of a surface of an article |
| 04/09/1998 | WO1998014634A1 Improved plasma jet system |