Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/1998
06/30/1998US5772770 Substrate processing apparatus
06/30/1998US5772760 Method for the preparation of nanocrystalline diamond thin films
06/30/1998US5772757 Molecular beam epitaxy
06/30/1998US5772736 Device for removing dissolved gas from a liquid
06/30/1998US5772366 Diamond coated body
06/30/1998US5771873 Hydrogenated carbon
06/25/1998WO1998027568A1 Diamond surfaces
06/25/1998WO1998027247A1 Reagent supply vessel for chemical vapor deposition
06/25/1998WO1998027018A1 Organometallics for lightwave optical circuit applications
06/25/1998WO1998027005A1 Device and method for the storage, transportation and production of active fluorine
06/25/1998WO1998026721A1 Medical scissors with coating to reduce wear
06/25/1998DE19722728A1 Verbundkörper, bestehend aus einem Hartmetall-, Cermet-, oder Keramiksubstratkörper und Verfahren zu seiner Herstellung Composite body consisting of a hard metal, cermet or ceramic substrate body and process for its preparation
06/25/1998DE19715501C1 Method for structuring thin metal layers.
06/25/1998CA2274478A1 Organometallics for lightwave optical circuit applications
06/24/1998EP0849811A2 Apparatus for forming non-single-crystal semiconductor thin film, method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device
06/24/1998EP0849780A2 Method for manufacturing ferroelectric thin film, substrate covered with ferroelectric thin film, and capacitor
06/24/1998EP0849779A2 Process for forming a semiconductor structure comprising ion cleaning and depositing steps and integrated cluster tool for performiong the process
06/24/1998EP0849775A2 Vapor deposition apparatus and vapor deposition method
06/24/1998EP0849769A2 Process and device for externally coating lamps
06/24/1998EP0849766A2 Etch process
06/24/1998EP0849375A2 Liquid feed vaporization system and gas injection device
06/24/1998EP0849374A2 Low refractive index SiO2 film and process for producing the same
06/24/1998EP0848711A1 Method for the selective hydrogenation of vinyl oxirane to butylene oxide
06/24/1998EP0848658A1 Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions
06/23/1998US5770921 Plasma display panel with protective layer of an alkaline earth oxide
06/23/1998US5770547 Heating, cooling, crystallization for obtaining the highest glass transition temperature
06/23/1998US5770520 Method of making a barrier layer for via or contact opening of integrated circuit structure
06/23/1998US5770469 Alternately vapor depositing heavily doped and lightly doped glass layers over wafer substrate while reflowing layers in heated chemical reactor
06/23/1998US5770294 Injected nitrogen ions in carbon coating
06/23/1998US5770263 Method for in situ removal of particulate residues resulting from hydrofluoric acid cleaning treatments
06/23/1998US5770261 Method of manufacturing coated cutting tool and coated cutting tool made from
06/23/1998US5770076 Micromachined capsules having porous membranes and bulk supports
06/23/1998US5769952 Reduced pressure and normal pressure treatment apparatus
06/23/1998US5769951 Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus
06/23/1998US5769950 Device for forming deposited film
06/23/1998US5769942 Method for epitaxial growth
06/23/1998CA2073280C Process for an improved laminate of znse and zns
06/18/1998WO1998026459A1 Semiconductor having large volume fraction of intermediate range order material
06/18/1998WO1998026106A1 Low friction coating
06/17/1998EP0848434A2 Method of forming semiconductor thin film
06/17/1998EP0848223A1 Vertical heat treatment device
06/17/1998EP0848088A1 A method for treating a suface of a silicon single crystal and a method for manufacturing a silicon single crystal thin film
06/17/1998EP0848083A2 Protective inorganic and dlc coatings and method for making same at or close to room temperature
06/17/1998EP0848082A2 Protective inorganic and DLC coatings for plastic media such as plastic cards
06/17/1998EP0847790A1 Trapping device and method of operation therefor
06/17/1998EP0847789A1 Trapping device
06/17/1998EP0526468B1 Diamond-on-a-substrate for electronic applications
06/17/1998CN1184860A Metal organic chemical vapor deposition apparatus and deposition method
06/17/1998CA2224876A1 Process and apparatus for coating an exterior portion of a lamp
06/16/1998US5768046 VCR head drum coated with diamond-like hard carbon films and the method and apparatus for manufacturing the same
06/16/1998US5767486 Rapid thermal heating apparatus including a plurality of radiant energy sources and a source of processing gas
06/16/1998US5767302 High-purity TI complexes, methods for producing the same and BST film-forming liquid compositions
06/16/1998US5767301 Copper hexafluoroacetylacetonate with ethoxyvinylsilane ligand; chemical vapor deposition
06/16/1998US5766811 Improved chargeability and photo-response, reduced photo-memory and defects which cause spot image defects; films
06/16/1998US5766783 Boron-aluminum nitride coating and method of producing same
06/16/1998US5766782 Tool having outermost layer of alumina with controlled microstructure in contact with titanium oxycarbonitride layer; wear resistance
06/16/1998US5766696 Carbon film, magnetic layer
06/16/1998US5766683 Nickel deposition system with a vapor recovery system
06/16/1998US5766682 Process for chemical vapor deposition of a liquid raw material
06/16/1998US5766365 Removable ring for controlling edge deposition in substrate processing apparatus
06/16/1998US5766364 Plasma processing apparatus
06/16/1998US5766363 Heater for CVD apparatus
06/16/1998US5766362 Apparatus for depositing barrier film on three-dimensional articles
06/16/1998US5766360 Substrate processing apparatus and substrate processing method
06/16/1998US5766344 Method for forming a semiconductor
06/16/1998US5766342 Method for forming silicon film and silicon film forming apparatus
06/16/1998CA1339914C Method of creating a high flux of activated species for reaction with a remotely located substrate
06/11/1998WO1998025300A1 Apparatus and methods for minimizing as-deposited stress in tungsten silicide films
06/11/1998WO1998024943A1 An article having a superalloy substrate and an enrichment layer placed thereon, and methods of its manufacturing
06/10/1998EP0847082A2 Process of treating a semiconductor substrate comprising a surface treatment step
06/10/1998EP0846792A1 Method of synthesizing diamond
06/10/1998EP0846788A1 An article having a superalloy substrate and an enrichment layer placed thereon, and methods of its manufacturing
06/10/1998EP0846787A1 Apparatus for use with CVI/CVD processes
06/10/1998EP0846341A1 Metal insulator semiconductor structure with polarization-compatible buffer layer
06/10/1998EP0846335A1 Low mass susceptor
06/09/1998US5764849 Apparatus for vaporizing volatile solid precursor material
06/09/1998US5763856 Heat treatment apparatus and method
06/09/1998US5763072 Ceramic sliding member having pyrolytic carbon film and process of fabricating the same
06/09/1998US5763033 Blood collection tube assembly
06/09/1998US5763021 Plasma enhanced chemical vapor deposition with sources of silicon, oxygen and fluorine
06/09/1998US5763020 Process for evenly depositing ions using a tilting and rotating platform
06/09/1998US5763018 Depositing water molecules and plasma dissociated products of water molecule on one side of the substrate, on which a dielectric layer of silicon dioxide is formed by chemical vapor deposition of silicon containing gases with and oxidant
06/09/1998US5763017 Simultaneous chemical vapor deposition on surface and biasing of substrate in plasma of ionized gases to accelerate positive ions for implantation to desired depth, then heating for diffusion and more heating for expansion of gases
06/09/1998US5763010 Stabilizing the doping process by heating, degassing the extra fluorine
06/09/1998US5763008 Chemical vapor deposition of mullite coatings
06/09/1998US5763007 Transamination and nitriding
06/09/1998US5763006 Treating semiconductor wafers with hexamethyl-disilazane
06/09/1998US5762814 Plasma processing method and apparatus using plasma produced by microwaves
06/09/1998US5762750 Magnetic neutral line discharged plasma type surface cleaning apparatus
06/09/1998US5762715 Segmented substrate for improved ARC-JET diamond deposition
06/09/1998US5762714 Plasma guard for chamber equipped with electrostatic chuck
06/09/1998US5762713 RTP lamp design for oxidation and annealing
06/09/1998US5762110 Dents for reed in high-speed weaving machine, and method of manufacturing same
06/04/1998WO1998024117A1 Method for producing a titanium monophosphide layer and its use
06/04/1998WO1998023790A1 Oxidation protective coating for refractory metals
06/04/1998WO1998023788A1 Chemical vapor deposition apparatus
06/04/1998WO1998023787A1 Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions
06/04/1998WO1998023786A1 Method for production of pvd and/or pecvd hard material coatings
06/04/1998WO1998023389A1 Nitrogen-bearing cvd films from nf3, as a nitrogen source
06/03/1998EP0845802A2 Substrate support member for uniform heating of a substrate