Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/1998
06/03/1998EP0845546A2 A warm wall reaction chamber and a method for forming a hemi-spherical grain layer using the same
06/03/1998EP0845545A1 Coated deposition chamber equipment
06/03/1998EP0845151A1 Recessed coil for generating a plasma
06/03/1998EP0845053A1 Composite body and process for its production
06/03/1998EP0705149B1 Method for producing a polymer coating inside hollow plastic articles
06/03/1998EP0630424B1 Ferroelectric thin films made by metalorganic chemical vapor deposition
06/03/1998EP0594676B1 method for producing DIAMOND MEMBRANES FOR X-RAY LITHOGRAPHY
06/03/1998CN2283068Y Chemical vapour deposition silicon carbide fibre reactor
06/03/1998CN2283067Y Equipment for hot wire chemical vapour deposition diamond
06/03/1998CN1183854A Slip free vertical rack design
06/03/1998CN1183853A Plasma processor for large workpieces
06/02/1998US5760362 Apparatus for treating a material having a miniaturized photoionic head
06/02/1998US5759923 Flowing mist of liquid precursor to form layer on substrate; treating to solidify
06/02/1998US5759667 Diamond wire drawing die and process for manufacturing same
06/02/1998US5759635 Method for depositing substituted fluorocarbon polymeric layers
06/02/1998US5759634 Vacuum depositing cadmium-selenium intermetallic; semiconductors; nonlinear optical response
06/02/1998US5759623 Method for producing a high adhesion thin film of diamond on a Fe-based substrate
06/02/1998US5759621 Coating cutting tool inserts by chemical vapor deposition
06/02/1998US5759360 Wafer clean sputtering process
06/02/1998US5759334 Plasma processing apparatus
06/02/1998US5759287 Method of purging and passivating a semiconductor processing chamber
06/02/1998US5759282 Process for evenly depositing ions using a tilting and rotating platform
06/02/1998US5759281 CVD reactor for uniform heating with radiant heating filaments
06/02/1998US5759263 Arranging the heater to heat the susceptor so that at least a second wall opposite to the first wall receives a higher temperature than the temperature of the first wall to create a temperature gradient; purity; quality
06/02/1998US5759214 Nitrogen gas supply system
05/1998
05/28/1998WO1998022638A1 Method for adjusting semiconductor processing equipment
05/28/1998WO1998022637A1 Method for making a diamond-coated member
05/28/1998DE19751785A1 Filling recesses in a surface layer of a semiconductor wafer with conductive material
05/28/1998DE19751708A1 Mechanical component with functional coating
05/28/1998DE19749348A1 Muffle for installation for chemical precipitation from gas phase
05/28/1998DE19646094A1 Verfahren zur chemischen Gasphaseninfiltration von Kohlenstoff und refraktären Stoffen A method of chemical vapor infiltration of carbon and refractory materials
05/27/1998EP0844649A2 A method for boron contamination reduction in IC fabrication
05/27/1998EP0844469A1 Coated high-performance structural elements or components, method of manufacturing such elements or components and device for carrying out this method
05/27/1998EP0844431A2 System and method for controlled delivery of liquefied gases
05/27/1998EP0844319A1 Diamond film and process for preparing the same
05/27/1998EP0844314A2 Distribution plate for a reaction chamber
05/27/1998EP0843747A1 Treatment of cemented carbide substrate to receive cvd diamond film
05/27/1998EP0749354B1 Regulation of pyrocarbon coating
05/27/1998EP0682719B1 Device and process for depositing solid materials, in particular very fine-grained materials, and use of said process
05/27/1998CN1183020A Zone heating, system with feedback control
05/27/1998CN1182807A Coated hard carbon coating base and mfg. method
05/27/1998CN1182806A Hard carbon coating
05/26/1998US5756250 Electrophotographic method using a cleaning blade to remove residual toner
05/26/1998US5756222 Corrosion-resistant aluminum article for semiconductor processing equipment
05/26/1998US5755938 Single chamber for CVD and sputtering film manufacturing
05/26/1998US5755888 Method and apparatus of forming thin films
05/26/1998US5755887 Metal working apparatus comprising aluminum or aluminum alloy
05/26/1998US5755886 Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing
05/26/1998US5755885 Ultrasonically oscillated container for cavitating storage supply of dimethylaluminum hydride while carrier gas flows through to create starting gas mixture; uniformity, purity
05/26/1998US5755879 Methods for manufacturing substrates to form monocrystalline diamond films by chemical vapor deposition
05/26/1998US5755878 Method for vapor phase growth
05/22/1998WO1998021749A1 Method for cleaning plasma treatment device and method for plasma treatment
05/22/1998WO1998021748A1 Semiconductor device and its manufacturing method
05/22/1998WO1998021747A1 Plasma film forming method and plasma film forming apparatus
05/22/1998WO1998021746A1 Method of plasma treatment
05/22/1998WO1998021744A2 Gas panel
05/22/1998WO1998021163A1 Method for chemical vapour infiltration of refractory substances, especially carbon and silicon carbide
05/22/1998CA2271678A1 Method for chemical vapour infiltration of refractory substances, especially carbon and silicon carbide
05/20/1998EP0843348A2 Method and apparatus for processing a semiconductor substrate
05/20/1998EP0843347A2 Method and apparatus for processing a semiconductor substrate
05/20/1998EP0843339A2 Processing apparatus
05/20/1998EP0843023A2 Improved chemical vapor deposition chamber
05/20/1998EP0842913A1 Pyrolytic boron nitride container and manufacture thereof
05/20/1998EP0842532A1 Process for generating a spacer in a structure
05/20/1998EP0842307A2 System for the plasma treatment of large area substrates
05/20/1998EP0763144A4 Carbon-coated barrier films whith increased concentration
05/20/1998EP0682580B1 Cemented carbide with binder phase enriched surface zone and enhanced edge toughness behaviour
05/20/1998CN1182286A Method for manufacturing Bi layer structure strong electrolyte thin-film
05/19/1998US5754297 Method and apparatus for monitoring the deposition rate of films during physical vapor deposition
05/19/1998US5753564 Vapor depositing a silicon dioxide dielectric layer containing fluorine
05/19/1998US5753385 Hybrid deposition of thin film solid oxide fuel cells and electrolyzers
05/19/1998US5753379 Protective coatings for optical components
05/19/1998US5753320 Process for forming deposited film
05/19/1998US5753303 Process for the elimination of tungsten oxidation with inert gas stabilization in chemical vapor deposition processes
05/19/1998US5753300 Vapor deposition
05/19/1998US5753193 Device for creating a deposit of silicon oxide on a traveling solid substrate
05/19/1998US5753137 Dry cleaning of semiconductor processing chambers using non-metallic, carbon-comprising material
05/19/1998US5753045 Vacuum treatment system for homogeneous workpiece processing
05/19/1998CA2000269C Coating glass
05/14/1998WO1998020185A1 A process and apparatus for depositing a carbon-rich coating on a moving substrate
05/13/1998EP0841838A1 Plasma treatment apparatus and plasma treatment method
05/13/1998EP0841593A1 Method and apparatus for depositing a photoresist layer on a substrate
05/13/1998EP0840811A2 System and method for thermal processing of a semiconductor substrate
05/13/1998EP0840809A1 Product with a metallic base body provided with cooling channels and its manufacture
05/13/1998EP0840551A1 Microwave cvd method for deposition of robust barrier coatings
05/13/1998EP0794821B1 Process and device for transforming a liquid stream into a gas stream
05/13/1998EP0597103B1 Apparatus for neutralizing charged body
05/13/1998CN1181787A Modification of surfaces of polymers, metal or ceramic
05/12/1998US5751896 Method and apparatus to compensate for non-uniform film growth during chemical vapor deposition
05/12/1998US5750436 Thermal processing method and apparatus therefor
05/12/1998US5750403 Method of forming multi-layer wiring utilizing hydrogen silsesquioxane resin
05/12/1998US5750247 Coated cutting tool having an outer layer of TiC
05/12/1998US5750211 Process for depositing a SiOx film having reduced intrinsic stress and/or reduced hydrogen content
05/12/1998US5750210 Hydrogenated carbon composition
05/12/1998US5750209 Vapor deposition of magnetic layer and backing layer onto substrate in same apparatus whereby lubricant is introduced into the backing layer
05/12/1998US5750208 Method for plasma downstream processing
05/12/1998US5750206 Method of pretreating metal surfaces for subsequent polymer coating
05/12/1998US5750195 Deposition of diamond on oxidizable material
05/12/1998US5750013 Electrode membrane assembly and method for manufacturing the same
05/12/1998US5749974 Method of chemical vapor deposition and reactor therefor
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