Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/1998
07/21/1998US5783492 Plasma processing method, plasma processing apparatus, and plasma generating apparatus
07/21/1998US5783371 Process for manufacturing optical data storage disk stamper
07/21/1998US5783335 Fluidized bed deposition of diamond
07/21/1998US5783261 Using injector having steel surfaces coated with ion implanted stabilized amorphous carbon-based coating to reduce wear
07/21/1998US5783257 Method for forming doped polysilicon films
07/21/1998US5783255 Method for producing shaped article of silicon carbide
07/21/1998US5783253 Two barium strontium titanate layers, each with different composition, one serves as nucleation layer
07/21/1998US5782980 Semiconductor manufacture, reducing thermal expansions of the reactor thereby reducing flaking of deposits from the inner walls
07/21/1998US5782979 Substrate holder for MOCVD
07/21/1998US5782975 Method for providing a silicon and diamond substrate having a carbon to silicon transition layer and apparatus thereof
07/21/1998US5782974 Method of depositing a thin film using an optical pyrometer
07/21/1998CA2038072C Process for forming a folding or separation line in the manufacture of a composite material component
07/16/1998WO1998030731A1 Method and apparatus for reducing deposition of material in the exhaust pipe of a reaction furnace
07/16/1998WO1998030730A1 Vacuum coating system
07/16/1998WO1998030360A1 Abrasive body
07/16/1998WO1998030357A1 Abrasive body
07/16/1998WO1998030338A1 Modular coating fixture
07/16/1998DE19716560A1 Grinding body especially for glass grinding disc
07/16/1998DE19700408A1 Vakuum-Beschichtungsanlage Vacuum coating machine
07/15/1998EP0853138A1 Vapor-phase film growth apparatus and gas ejection head
07/15/1998EP0853137A1 High pressure MOCVD reactor system
07/15/1998EP0853134A1 Method for obtaining a coating with a uniform distribution of reactants
07/15/1998EP0852970A2 Vapor feed supply system
07/15/1998EP0852628A1 Process chamber with inner support
07/15/1998EP0826131A4 Unibody crucible
07/15/1998EP0748260A4 Ion beam process for deposition of highly abrasion-resistant coatings
07/15/1998EP0748259A4 Highly abrasion-resistant, flexible coatings for soft substrates
07/15/1998EP0737258A4 Process for deposition of diamondlike, electrically conductive and electron-emissive carbon-based films
07/15/1998EP0689619A4 Apparatus and method for delivering reagents in vapor form to a cvd reactor
07/15/1998EP0684908B1 Safety document and process for producing the same
07/15/1998EP0579756B1 Coated cutting tool
07/15/1998CA2227529A1 Process and installation for developing a gaseous mixture comprising a carrier gas, an oxidizing gas and a silane
07/14/1998US5781693 Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween
07/14/1998US5780851 Detection probe for scanning tunneling microscope
07/14/1998US5780713 Post-fabrication tuning of acoustic resonators
07/14/1998US5780360 Purge in silicide deposition processes dichlorosilane
07/14/1998US5780313 Method of fabricating semiconductor device
07/14/1998US5780163 A protective covering to prevent examination and analysis by competitors comprising silica ceramic, a silicon carbide coating, an opaque material-filled porous silica ceramic, a metal layer and another opaque silica ceramic
07/14/1998US5780157 Composite structure
07/14/1998US5780119 Treatments to reduce friction and wear on metal alloy components
07/14/1998US5780106 Method for low temperature aluminum coating of an article
07/14/1998US5780101 Method for producing encapsulated nanoparticles and carbon nanotubes using catalytic disproportionation of carbon monoxide
07/14/1998US5779848 Corrosion-resistant aluminum nitride coating for a semiconductor chamber window
07/14/1998US5779807 Electrically isolating the wafer-supporting grounded electrode in a vapor deposition enclosure and applying a bias voltage to launch electrostatically the particles into a suspension of gas flow
07/14/1998US5779804 Gas feeding device for controlled vaporization of an organanometallic compound used in deposition film formation
07/14/1998US5779797 Wafer boat for vertical diffusion and vapor growth furnace
07/14/1998US5778968 For stabilizing the temperature of semiconductor wafers
07/09/1998WO1998029901A1 Method and device for treating a semiconductor surface
07/09/1998WO1998029704A1 Thermally conductive chuck for vacuum processor
07/09/1998WO1998029211A1 Coated cutting insert or cutting insert blank and method for producing coated cutting inserts for chip-removal of metal
07/09/1998WO1998029181A1 Effluent gas stream treatment system for oxidation treatment of semiconductor manufacturing effluent gases
07/09/1998WO1998029178A1 Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system
07/08/1998EP0852393A2 Thermal reaction chamber for semiconductor wafer processing operations
07/08/1998EP0852229A2 Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same
07/08/1998EP0852223A1 Method of sealing open-pore ceramic coatings, in particular thermal barriers
07/08/1998CN1186873A Distribution plate for reaction chamber with multiple gas inlets and separate mass flow control loops
07/07/1998US5777372 Used to detect chemical substances and biosubstances in medical care, food processing, industrial processes or environmental monitoring
07/07/1998US5776819 Deposition of device quality, low hydrogen content, amorphous silicon films by hot filament technique using "safe" silicon source gas
07/07/1998US5776588 Coated hard alloy tool
07/07/1998US5776557 Method for forming a film on a substrate by activating a reactive gas
07/07/1998US5776553 Method for depositing diamond films by dielectric barrier discharge
07/07/1998US5776552 Gas mixture of hydrogen, inert with carbon compound and oxygen
07/07/1998US5776359 Giant magnetoresistive cobalt oxide compounds
07/07/1998US5776355 Method of preparing cutting tool substrate materials for deposition of a more adherent diamond coating and products resulting therefrom
07/07/1998US5776255 Chemical vapor deposition apparatus
07/07/1998US5776254 Apparatus for forming thin film by chemical vapor deposition
07/07/1998US5776253 Apparatus for forming single-crystalline thin film by beam irradiator and beam reflecting device
07/07/1998US5776246 Wide signel crystal; for semiconductors, surface acoustic lave devices
07/07/1998US5776236 Mixed metal oxide film having an accelerant
07/07/1998US5775889 Heat treatment process for preventing slips in semiconductor wafers
07/07/1998US5775579 Refuse airlock
07/07/1998CA2054050C Method and apparatus for making grit and abrasive media
07/02/1998WO1998028784A1 Integrated circuit electrode structure and process for fabricating same
07/02/1998WO1998028783A1 Method of nucleation used in semiconductor devices
07/02/1998WO1998028465A1 Inductively coupled plasma cvd
07/02/1998WO1998028464A1 Cubic boron nitride cutting tool
07/02/1998WO1998028463A1 Semiconducting devices and method of making thereof
07/02/1998WO1998028462A1 Composite body comprising a hard metal, cermet or ceramic substrate body and method of producing the same
07/02/1998DE19752637A1 Metallic wiring production for semiconductor device
07/02/1998DE19703848A1 Beschichteter Schneideinsatz oder Schneideinsatzrohling und Verfahren zur Herstellung von beschichteten Schneideinsätzen zum Zerspanen Coated cutting insert or cutting insert blank and method for producing coated cutting inserts for machining
07/02/1998DE19703338A1 Workpieces preheating for vacuum coating
07/01/1998EP0851467A2 Method and system for monocrystalline epitaxial deposition
07/01/1998EP0851042A2 Crucible of pyrolytic boron nitride for molecular beam epitaxy
07/01/1998EP0851040A1 Surface treatment apparatus using gas jet
07/01/1998EP0850324A1 Coated turning insert
07/01/1998EP0850323A1 Method and apparatus for cold wall chemical vapor deposition
07/01/1998EP0850266A1 Method for obtaining a floor covering and product thus obtained
07/01/1998CN2285301Y Vertical spraying chemical doposition device
07/01/1998CN1186347A Photovoltaic element and method of and apparatus for manufacturing the same
07/01/1998CN1186128A Dual vertical thermal processing furance
07/01/1998CN1038948C Process and apparatus for plasma CVD coating or handle substrates
06/1998
06/30/1998US5773841 Self aligning vacuum seal assembly
06/30/1998US5773830 CVD diamond radiation detector
06/30/1998US5773639 Layer forming material and wiring forming method
06/30/1998US5773363 Semiconductor processing method of making electrical contact to a node
06/30/1998US5773357 Method for producing silicon film to bury contact hole
06/30/1998US5773100 PECVD of silicon nitride films
06/30/1998US5773088 Thin film packaging
06/30/1998US5773086 Vapor depositing a gaseous mixture of a dialkylindium compound and oxygen onto the hot surface of gas
06/30/1998US5772771 Deposition chamber for improved deposition thickness uniformity