| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/12/1998 | EP0857700A1 Transparent substrate with at least one thin silicon nitride or oxynitride based layer and process for obtaining the same |
| 08/12/1998 | EP0857224A2 Durable plasma treatment apparatus and method |
| 08/12/1998 | EP0857095A1 Anchored oxide coatings on hard metal cutting tools |
| 08/12/1998 | EP0750688B1 Batch loading system for cvd |
| 08/12/1998 | EP0736110B1 Process and device for producing three-dimensional structures by the optically stimulated separation of material from a fluid compound |
| 08/12/1998 | CN1039482C Safety document and process for producing the same |
| 08/11/1998 | US5793479 Thin-film formation device and method |
| 08/11/1998 | US5792701 Used for mixing gases in the deposition/oxidations processes in furnaces to achieve uniform film growth and thickness |
| 08/11/1998 | US5792326 Method and apparatus for generating ozone and methods of its use |
| 08/11/1998 | US5792324 Sputtering with an inert gas, reactive etching to form a by-product and reactive sputtering; covering power; reduction of sputtering bias voltage; decreasing mechanical and electrostatic stresses on target |
| 08/11/1998 | US5792273 Secondary edge reflector for horizontal reactor |
| 08/11/1998 | US5792272 Plasma enhanced chemical processing reactor and method |
| 08/11/1998 | US5792269 Gas distribution for CVD systems |
| 08/11/1998 | US5792261 Plasma process apparatus |
| 08/11/1998 | US5792254 Production of diamond film |
| 08/06/1998 | WO1998034445A1 Method and apparatus for metallizing high aspect ratio silicon semiconductor device contacts |
| 08/06/1998 | WO1998033950A1 METHOD OF LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF TiN FILM OVER TITANIUM FOR USE IN VIA LEVEL APPLICATIONS |
| 08/06/1998 | WO1998033948A1 A coating comprising layers of diamond like carbon and diamond like nanocomposite compositions |
| 08/06/1998 | DE19800250A1 Grinding disc for optical lenses, fine stones, marble, wood, metal, plastics etc. |
| 08/05/1998 | EP0856883A2 Method for forming a metal contact |
| 08/05/1998 | EP0856878A2 Method of manufacturing a semiconductor structure comprising a precious metal |
| 08/05/1998 | EP0856595A2 Process for removing silicon-containing coatings |
| 08/05/1998 | EP0856594A1 Apparatus for plasma treatment of substrates |
| 08/05/1998 | EP0856592A1 A coating comprising layers of diamond like carbon and diamond like nanocomposite compositions |
| 08/05/1998 | EP0856070A1 Plasma chamber with separate process gas and cleaning gas injection ports |
| 08/05/1998 | CN1189859A Plasma enhanced chemical processing reactor and method |
| 08/05/1998 | CN1189685A Fabrication process of semiconductor device |
| 08/04/1998 | US5790751 Rapid thermal heating apparatus including a plurality of light pipes and a pyrometer for measuring substrate temperature |
| 08/04/1998 | US5790750 Profiled substrate heating utilizing a support temperature and a substrate temperature |
| 08/04/1998 | US5789867 Apparatus and method for igniting plasma in a process module |
| 08/04/1998 | US5789321 Low pressure vapor deposition of nitrogen compound and titanium chloride |
| 08/04/1998 | US5789312 Method of fabricating mid-gap metal gates compatible with ultra-thin dielectrics |
| 08/04/1998 | US5789309 Method and system for monocrystalline epitaxial deposition |
| 08/04/1998 | US5789086 Chromium oxide and iron oxide layers; ultrahigh vacuum, ultraclean reduced pressure semiconductors; corrosion resistance |
| 08/04/1998 | US5789040 Generation of plasma and transportation of substrate |
| 08/04/1998 | US5789030 Vapor deposition |
| 08/04/1998 | US5789028 Method for eliminating peeling at end of semiconductor substrate in metal organic chemical vapor deposition of titanium nitride |
| 08/04/1998 | US5789024 Subnanoscale composite, N2-permselective membrane for the separation of volatile organic compounds |
| 08/04/1998 | US5788870 Promotion of the adhesion of fluorocarbon films |
| 08/04/1998 | US5788823 Electroplating substrate with platimun; aluminizing |
| 08/04/1998 | US5788799 Apparatus and method for cleaning of semiconductor process chamber surfaces |
| 08/04/1998 | US5788778 For electronics |
| 08/04/1998 | US5788777 Susceptor for an epitaxial growth factor |
| 08/04/1998 | US5788747 Exhaust pipe passageways for forming films, pressure transferring, cooling and removing |
| 08/04/1998 | CA2045841C Method of producing nickel shell molds |
| 07/30/1998 | WO1998033362A1 Plasma device |
| 07/30/1998 | WO1998033077A2 Coatings, methods and apparatus for reducing reflection from optical substrates |
| 07/30/1998 | WO1998032893A2 Wafer support system |
| 07/30/1998 | WO1998032892A1 Method of multifunctional surface treatment, and device for implementing same |
| 07/30/1998 | DE19702311A1 Growth substrate with diamond or diamond-like carbon growth nuclei |
| 07/30/1998 | DE19701696A1 Substrate coating |
| 07/30/1998 | CA2279425A1 Coatings, methods and apparatus for reducing reflection from optical substrates |
| 07/30/1998 | CA2278478A1 Method of multifunctional surface treatment, and device for implementing same |
| 07/29/1998 | EP0855735A2 A high temperature, high flow rate chemical vapor deposition apparatus and related methods |
| 07/29/1998 | EP0855453A1 Methods and apparatus for cleaning using a chlorine containing gas plasma |
| 07/29/1998 | EP0855452A1 Process and apparatus for depositing titanium layers |
| 07/29/1998 | EP0855399A2 Precursor with alkylaminosilylolefin ligands to deposit copper and method for same |
| 07/29/1998 | EP0855087A1 Semiconductor processing using vapor mixtures |
| 07/29/1998 | EP0854891A1 Coated plastic substrate |
| 07/29/1998 | EP0792382B1 Apparatus for the relative vacuum deposition of a material on bulk parts |
| 07/29/1998 | EP0772875A4 Process for manufacturing optical data storage disk stamper |
| 07/29/1998 | EP0349633B1 Polysilicon thin film process |
| 07/28/1998 | US5786069 Coated turning insert |
| 07/28/1998 | US5786068 Electrically tunable coatings |
| 07/28/1998 | US5786027 Vapor deposition of polysilicon, heat treatment, evacuation pressurization, injection silicon source |
| 07/28/1998 | US5786025 Ba and/or Sr titanate films by organic chemical vapor deposition |
| 07/28/1998 | US5786023 Method and apparatus for the freeform growth of three-dimensional structures using pressurized precursor flows and growth rate control |
| 07/28/1998 | US5785902 Liquid vaporizing apparatus |
| 07/28/1998 | US5785876 Layer construction with an organic layer and a transparent cover layer which is harder than the organ layer and process for its production |
| 07/28/1998 | US5785871 Process for minute processing of diamonds |
| 07/28/1998 | US5785796 Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus |
| 07/28/1998 | US5785764 Susceptor for a gas phase growth apparatus |
| 07/28/1998 | US5785762 External combustion oxidation apparatus |
| 07/28/1998 | US5785755 Growing layers of different compositions; tributylphosphine in standby step |
| 07/23/1998 | WO1998032154A1 Capacitively coupled rf-plasma reactor |
| 07/23/1998 | WO1998031847A1 Crystal holder |
| 07/23/1998 | WO1998031846A1 Composite body and production process |
| 07/23/1998 | WO1998031845A1 Vapor deposition components and corresponding methods |
| 07/23/1998 | WO1998031844A2 Flash evaporator |
| 07/23/1998 | DE19737470A1 Verbundkörper und Verfahren zu seiner Herstellung Composite and process for its preparation |
| 07/23/1998 | DE19718737C1 Diamond deposition by low temperature plasma arc CVD |
| 07/23/1998 | DE19702124A1 Workpiece surface cleaning, activating, wetting and/or coating |
| 07/22/1998 | EP0854507A2 Precursor with (alkyloxy) (alkyl) silylolefin ligand to deposit copper and method for the same |
| 07/22/1998 | EP0854505A2 Process of depositing a TiN based film during the fabrication of a semiconductor device |
| 07/22/1998 | EP0854504A1 Coating solutions for use in forming bismuth-based ferro-electric thin films, and ferro-electric thin films, ferro-electric capacitors and ferro-electric memories formed with said coating solutions, as well as processes for production thereof |
| 07/22/1998 | EP0854503A1 Coating solutions for use in forming bismuth-based ferro-electric thin films, and ferro-electric thin films, ferro-electric capacitors and ferro-electric memories formed with said coating solutions, as well as processes for production thereof |
| 07/22/1998 | EP0854502A2 Iodofluorocarbon gas for the etching of dielectric layers and the cleaning of process chambers |
| 07/22/1998 | EP0854371A1 Specular surface body |
| 07/22/1998 | EP0854210A1 Vapor deposition apparatus and method for forming thin film |
| 07/22/1998 | EP0854205A1 Work surface treatment method and work surface treatment apparatus |
| 07/22/1998 | EP0854204A1 Process and apparatus for producing a gaseous mixture comprising a carrier gas, an oxidant gas and a silane |
| 07/22/1998 | EP0853686A1 Method and apparatus for deposition of diamond-like carbon on drills |
| 07/22/1998 | EP0729394B1 Making quantum dot particles of uniform size |
| 07/22/1998 | EP0549584B1 Cvd and pvd coated cutting tools |
| 07/22/1998 | CN1188160A Making of optical anti-reflection film by diamond-like and diamond compound film |
| 07/22/1998 | CN1188159A Carbon-coating method for quartz crucible or pipe |
| 07/22/1998 | CN1188158A Method for preparing metal-base composite material reinforced by non-continuous ceramics reinforcing agent |
| 07/21/1998 | US5784183 Semiconductor optical device and method for fabricating the same |
| 07/21/1998 | US5783716 Liquid solution of organoplatinum compound and solvent |
| 07/21/1998 | US5783641 Process for modifying surfaces of polymers, and polymers having surfaces modified by such process |