Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/1998
09/09/1998EP0863536A2 Method and apparatus for substrate processing
09/09/1998EP0863228A1 Vertical type CVD apparatus
09/09/1998EP0863227A1 Method and apparatus for forming laminated thin films or layers
09/09/1998EP0862664A2 Method and apparatus for the deposition of parylene af4 onto semiconductor wafers
09/09/1998EP0862663A1 Method and device for sterilising, deodorising and protecting the inner surfaces of containers and tubes
09/09/1998EP0862543A2 Cutting tool, process for coating a cutting tool, and use thereof
09/09/1998EP0647163B1 A plasma cleaning method for removing residues in a plasma treatment chamber
09/09/1998CN1192789A Treatment of cemented carbide substrate to receive CVD diamond film
09/09/1998CN1192788A System for plasma treatment of large area substrates
09/09/1998CN1192787A Electrically tunable coatings
09/09/1998CN1192538A Specular surface body
09/09/1998CN1192490A Method and system for monocrystalline epitaxial deposition
09/09/1998CN1192484A Plasma CVD device
09/09/1998CN1039727C Alumina coated cutting tool
09/08/1998US5805973 Coated articles and method for the prevention of fuel thermal degradation deposits
09/08/1998US5805380 Overcoat magnetic head slider having overcoat and magnetic disk device
09/08/1998US5804923 Plasma processing apparatus having a protected microwave transmission window
09/08/1998US5804509 Filling spaces the metal interconnectors by vapor depositing tetraethoxysilane and ozone gas
09/08/1998US5804259 Method and apparatus for depositing a multilayered low dielectric constant film
09/08/1998US5804249 Blanket depositing a first bulk layer of tungsten on dielectric layer and partially filling via; blanket depositing amorphous layer of tungsten followed by a second bulk layer of tungsten
09/08/1998US5804042 Reduces or eliminates secondary plasma around backplane
09/08/1998US5803977 Apparatus for full wafer deposition
09/08/1998US5803975 Microwave plasma processing apparatus and method therefor
09/08/1998US5803974 Chemical vapor deposition apparatus
09/08/1998US5803973 Apparatus for coating a substrate by chemical vapor deposition
09/08/1998US5803971 Modular coating fixture
09/08/1998US5803967 Repeatedly cycling between first and second growth parameters; etching at intermediate stages to remove defects
09/08/1998US5803961 Integrated circuits having mixed layered superlattice materials and precursor solutions for use in a process of making the same
09/08/1998US5803938 Liquid vaporizing apparatus
09/03/1998WO1998038674A1 Methods and apparatus for forming a high dielectric film and the dielectric film formed thereby
09/03/1998WO1998037958A1 Arrangement and method for improving vacuum in a very high vacuum system
09/03/1998DE19708341A1 Treatment of workpieces
09/02/1998EP0862352A2 A heating element with a diamond sealing material
09/02/1998EP0861922A1 Spinning rind and traveller for a ring spinning machine
09/02/1998EP0861683A2 Process and apparatus for abating effluent gases
09/02/1998EP0861338A1 Surface treatment method and device therefor
09/02/1998EP0778837B1 Preparation of metalorganic compounds
09/02/1998EP0419461B1 Wafer handling system with bernoulli pick-up
09/02/1998CN1192265A Passive gas substrate thermal conditioning apparatus and method
09/01/1998US5801915 For holding a substrate in a process chamber
09/01/1998US5801634 Signal tower controller
09/01/1998US5800880 Process for coating the interior wall of a container with a SiOx barrier layer
09/01/1998US5800879 Deposition of high quality diamond film on refractory nitride
09/01/1998US5800877 Method for forming a fluorine containing silicon oxide film
09/01/1998US5800868 Method for making a coated cutting tool
09/01/1998US5800753 Chemical vapor deposition method
09/01/1998US5800686 Chemical vapor deposition chamber with substrate edge protection
09/01/1998US5800623 Semiconductor wafer support platform
09/01/1998US5800622 Vapor-phase growth apparatus and compound semiconductor device fabricated thereby
09/01/1998US5800621 Plasma source for HDP-CVD chamber
09/01/1998US5800620 Plasma treatment apparatus
09/01/1998US5800618 Plasma-generating electrode device, an electrode-embedded article, and a method of manufacturing thereof
09/01/1998US5800617 Method to deposit highly conformal CVD films
09/01/1998US5800616 For depositing thin films on substrates
08/1998
08/27/1998WO1998037579A1 Process of tungsten chemical vapor deposition onto titanium nitride substrate
08/27/1998WO1998037259A1 Method and apparatus for producing plastic container having carbon film coating
08/27/1998WO1998037258A1 A rapid thermal processing barrel reactor for processing substrates
08/27/1998WO1998037254A2 Thin films
08/27/1998WO1998021744A9 Gas panel
08/27/1998DE19746332A1 Plasma=assisted chemical vapour deposition apparatus with reduced heating
08/26/1998EP0860855A1 Antenna for generating a plasma and HDP-CVD processing chamber having such antenna
08/26/1998EP0860640A1 Valved coupling for ultra high purity gas distribution systems
08/26/1998EP0860515A1 Diamond-coated body
08/26/1998EP0859669A1 Coating of glass
08/26/1998EP0800592B1 Method of producing boron-doped monocrystalline silicon carbide
08/26/1998CN2288975Y Equipment for preparing conductive film by using thermal atomizing adhesive method
08/26/1998CN1191243A Infrared anti-reflection filter window of diamond and its preparing method
08/25/1998US5798143 CVD process for making a hollow diamond tube
08/25/1998US5798142 CVD method of depositing a silica coating on a heated glass substrate
08/25/1998US5798139 Apparatus for and method of manufacturing plastic container coated with carbon film
08/25/1998US5798137 Chemical vapor deposition on seed particles generated in reactor having inlet zone where beads are maintained in submerged spouted bed, upper zone with bubbling fluidized bed
08/25/1998US5798042 Microfabricated filter with specially constructed channel walls, and containment well and capsule constructed with such filters
08/25/1998US5797195 Nitrogen trifluoride thermal cleaning apparatus and process
08/25/1998CA2010482C Process for the fabrication of devices; utilizing electrochemically generated gases
08/20/1998WO1998036106A1 OPTIMIZATION OF SiO2, FILM CONFORMALITY IN ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION
08/20/1998DE19718516C1 Diamond deposition by low temperature plasma arc CVD
08/19/1998EP0859355A1 Thin film magnetic head
08/19/1998EP0859155A2 Fluid control apparatus
08/19/1998EP0859070A1 Coating of inside of vacuum chambers
08/19/1998EP0858579A1 Modification of metal surfaces
08/19/1998EP0783599A4 Apparatus for growing metal oxides using organometallic vapor phase epitaxy
08/19/1998EP0723601A4 A method for chemical vapor deposition of titanium nitride films at low temperatures
08/19/1998CN1190774A Thin-film magnetic head
08/18/1998US5796074 Wafer heater assembly
08/18/1998US5795824 Method for nucleation of CVD tungsten films
08/18/1998US5795672 Diamond-like carbon based electrocatalytic coating for fuel cell electrodes
08/18/1998US5795653 Method for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film
08/18/1998US5795648 Method for preserving precision edges using diamond-like nanocomposite film coatings
08/18/1998US5795452 Dry process system
08/18/1998US5795399 Semiconductor device manufacturing apparatus, method for removing reaction product, and method of suppressing deposition of reaction product
08/18/1998US5795396 Apparatus for forming crystalline film
08/18/1998US5795385 Method of forming single-crystalline thin film by beam irradiator
08/18/1998US5794801 Material compositions
08/18/1998US5794659 Zero dead-leg valve structure
08/18/1998CA2118356C Method for preparation of silicon nitride gallium diffusion barrier for use in molecular beam epitaxial growth of gallium arsenide
08/13/1998WO1998035531A1 Model based temperature controller for semiconductor thermal processors
08/13/1998WO1998035071A1 Hard material coating of a cemented carbide or carbide containing cermet substrate
08/13/1998DE19706556C1 Plasma etching or cutting arrangement
08/12/1998EP0857796A2 Apparatus for the low temperature etching of cold-wall CVD reactors
08/12/1998EP0857795A1 Method for coating a surface