| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 10/07/1998 | EP0760712A4 Method and apparatus for producing high purity and unagglomerated submicron particles |
| 10/07/1998 | EP0742848B1 Plasma treatment in electronic device manufacture |
| 10/07/1998 | EP0728044A4 Process and apparatus for water-based plasma cvd of diamond films |
| 10/07/1998 | CN2293566Y Conducting apparatus for circuit board electroplating and electrolytic degreasing |
| 10/07/1998 | CN1195342A Method for selective hydrogenation of vinyl oxirane to butylene oxide |
| 10/07/1998 | CN1195188A Method for depositing diffusion barrier |
| 10/07/1998 | CN1195036A Cooling system and method for epitaxial barrel reactor |
| 10/07/1998 | CN1040136C Method of drying metal for making inner surface of gaseous container and treated container |
| 10/06/1998 | US5818578 To detect gas phase molecular species in a sample by absorption spectroscopy |
| 10/06/1998 | US5817578 Method of cleaning vacuum processing apparatus |
| 10/06/1998 | US5817576 Utilization of SiH4 soak and purge in deposition processes |
| 10/06/1998 | US5817575 Injection hot gas |
| 10/06/1998 | US5817559 Production method for a semiconductor device |
| 10/06/1998 | US5817407 Organic layer for subsequent coating with a cover layer which is harder than the organic layer and process for surface treatment of an organic layer |
| 10/06/1998 | US5817406 Ceramic susceptor with embedded metal electrode and brazing material connection |
| 10/06/1998 | US5817368 Method for forming a thin film |
| 10/06/1998 | US5817367 Method of forming a thin film of copper |
| 10/06/1998 | US5817181 Process for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatus |
| 10/06/1998 | US5817179 GaAs anneal boat design and method for use |
| 10/06/1998 | US5817175 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organometallic precursor compounds |
| 10/06/1998 | CA2090854C Cvd and pvd coated cutting tools |
| 10/01/1998 | WO1998043284A1 Titanium metal treatment method, method of forming an electrically conductive interconnect, and method of reducing contact resistance of an elemental titanium contact |
| 10/01/1998 | WO1998042897A1 Susceptor designs for silicon carbide thin films |
| 10/01/1998 | WO1998042896A1 Process of diamond growth from c¿70? |
| 10/01/1998 | WO1998042891A1 Process for coating the interior wall of a container |
| 10/01/1998 | WO1998042887A1 High-temperature spray coated member and method of production thereof |
| 10/01/1998 | CA2284771A1 Susceptor designs for silicon carbide thin films |
| 10/01/1998 | CA2283268A1 Process of diamond growth from c70 |
| 09/30/1998 | EP0867941A2 An interconnect structure for use in an intergrated circuit |
| 09/30/1998 | EP0867933A2 Electrostatic chuck having a unidirectionally conducting coupler layer |
| 09/30/1998 | EP0867538A1 Heating apparatus |
| 09/30/1998 | EP0867537A1 Method for the production of low-cost isotopically engineered diamond anvils |
| 09/30/1998 | EP0867037A1 Method of forming dielectric films with reduced metal contamination |
| 09/30/1998 | EP0772699B1 Cvd process for the production of diamond-phase carbon tubes |
| 09/30/1998 | EP0562035B1 Minimization of particle generation in cvd reactors and methods |
| 09/29/1998 | US5815684 Configuration simulating method employing string model for simulating layer configuration of silicon wafer |
| 09/29/1998 | US5814849 Thin films of ABO3 with excess B-site modifiers and method of fabricating integrated circuits with same |
| 09/29/1998 | US5814583 Superconducting thin film and a method for preparing the same |
| 09/29/1998 | US5814377 Method and apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films |
| 09/29/1998 | US5814365 Vacuum deposition on surface in reactor and photon detectors |
| 09/29/1998 | US5814153 Semiconductor device manufacturing apparatus |
| 09/29/1998 | US5814150 Method of and apparatus for forming single-crystalline thin film, beam irradiator, beam irradiating method and beam reflecting device |
| 09/29/1998 | US5814149 Vapor deposition on platinum substrate |
| 09/29/1998 | US5813851 Heat treatment method |
| 09/24/1998 | WO1998041670A1 Internally heated pyrolysis zone and a method wherein use is made of this zone |
| 09/24/1998 | WO1998041480A1 Photocatalytically-activated self-cleaning article and method of making same |
| 09/23/1998 | EP0865716A1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced |
| 09/23/1998 | EP0865715A1 Process depending on plasma discharges sustained by inductive coupling |
| 09/23/1998 | EP0865663A1 HF-PLASMA COATING CHAMBER OR PECVD COATING CHAMBER, ITS USE AND METHOD OF PLATING CDs USING THE CHAMBER |
| 09/23/1998 | EP0865514A1 Process for the preparation of aluminum oxide film using dialkylaluminum alkoxide |
| 09/23/1998 | CN1194066A Electrostatic chuck assembly |
| 09/23/1998 | CN1194060A Metal insulator semiconductor structure with polarization-compatible buffer layer |
| 09/23/1998 | CN1194015A Coated turning insert |
| 09/23/1998 | CN1193812A Plasma treatment method and manufacturing method of semiconductor device |
| 09/23/1998 | CN1039925C Process for passivating metal surfaces to enhance the stability |
| 09/22/1998 | US5812403 Methods and apparatus for cleaning surfaces in a substrate processing system |
| 09/22/1998 | US5811762 Apparatus for changing the temperature of a semiconductor wafer |
| 09/22/1998 | US5811356 Reduction in mobile ion and metal contamination by varying season time and bias RF power during chamber cleaning |
| 09/22/1998 | US5811349 Method for growing a semiconductor layer |
| 09/22/1998 | US5811195 Corrosion-resistant aluminum article for semiconductor processing equipment |
| 09/22/1998 | US5811181 Ferroelectric thin film, ferroelectric thin film covering substrate and manufacturing method of ferroelectric thin film |
| 09/22/1998 | US5811022 Inductive plasma reactor |
| 09/22/1998 | US5811021 Plasma assisted chemical transport method and apparatus |
| 09/22/1998 | US5810963 Plasma processing apparatus and method |
| 09/22/1998 | US5810937 Using ceramic wafer to protect susceptor during cleaning of a processing chamber |
| 09/22/1998 | US5810936 Plasma-inert cover and plasma cleaning process and apparatus employing same |
| 09/22/1998 | US5810934 Silicon deposition reactor apparatus |
| 09/22/1998 | US5810930 Photo-chemical vapor deposition apparatus having exchange apparatus of optical window and method of exchanging optical window therewith |
| 09/22/1998 | US5810928 Method of measuring gas component concentrations of special material gases for semiconductor, a semiconductor equipment, and an apparatus for supplying special material gases for semiconductor |
| 09/22/1998 | US5810031 Ultra high purity gas distribution component with integral valved coupling and methods for its use |
| 09/22/1998 | CA2158958C Magnetic roller gas gate employing transonic sweep gas flow |
| 09/22/1998 | CA2041495C Cvd apparatus containing single u-shaped discharge electrode held in parallel with a substrate |
| 09/22/1998 | CA1340053C Method of plasma enhanced silicon oxide deposition |
| 09/17/1998 | WO1998040534A1 Method of reducing metal contamination during semiconductor processing in a reactor having metal components |
| 09/17/1998 | WO1998040533A1 Device and method for surface treatment |
| 09/17/1998 | WO1998040531A1 Plastic containers with an external gas barrier coating |
| 09/17/1998 | WO1998040387A1 Novel copper(i) precursors for chemical deposit in gas phase of metallic copper |
| 09/17/1998 | WO1998040327A1 Method for densifying a porous structure using an aromatic precursor |
| 09/17/1998 | WO1998040208A1 Packaging material |
| 09/17/1998 | CA2283148A1 Plastic containers with an external gas barrier coating |
| 09/16/1998 | EP0865074A2 Process of making doped polysilicon layers and structures and process of patterning layers and layer structures which contain polysilicon |
| 09/16/1998 | EP0864668A1 Superhard article with diamond coat and method of manufacturing same |
| 09/16/1998 | EP0864374A2 Process for treating surfaces |
| 09/16/1998 | EP0797689B1 Gas removal device |
| 09/16/1998 | EP0787224B1 Process for separating metal coatings |
| 09/16/1998 | EP0763145A4 Cold end glassware coating apparatus |
| 09/16/1998 | CN1193333A Plate-like titanium dioxide pigment |
| 09/15/1998 | US5807792 Rotation; alternating supplying segments |
| 09/15/1998 | US5807788 Method for selective deposition of refractory metal and device formed thereby |
| 09/15/1998 | US5807785 Low dielectric constant silicon dioxide sandwich layer |
| 09/15/1998 | US5807760 Method of despositing an aluminum-rich layer |
| 09/15/1998 | US5807615 Method and device for forming an excited gaseous treatment atmosphere lacking electrically charged species used for treating metallic substrates |
| 09/15/1998 | US5807614 Mixing activated gas with oxidizing or reducing agent |
| 09/15/1998 | US5807433 Multilayer system comprising a diamond layer, an interphase and a metallic substrate, and a method for obtaining these layers |
| 09/15/1998 | US5807432 Process for producing diamond covered member |
| 09/11/1998 | WO1998039497A1 Deposition of thin films |
| 09/11/1998 | WO1998039496A1 Method of making titania-doped fused silica |
| 09/11/1998 | WO1998039495A1 Multipurpose processing chamber for chemical vapor deposition processes |
| 09/11/1998 | WO1998033077A3 Coatings, methods and apparatus for reducing reflection from optical substrates |
| 09/10/1998 | DE19708808A1 Applying transparent protective coatings to objects |