Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1998
11/03/1998US5832177 Method for controlling apparatus for supplying steam for ashing process
11/03/1998US5831335 Semiconductor device contains refractory metal or metal silicide with less than 1% weight of halogen atom
11/03/1998US5830579 Strip based on coated aluminum, which is resistant to corrosion and is deformable
11/03/1998US5830538 Vapor deposition; emiconductors
11/03/1998US5830530 From a tetraalkyl stannate
11/03/1998US5830310 Apparatus and method for detecting end point of post treatment
11/03/1998US5830277 Thermal processing system with supplemental resistive heater and shielded optical pyrometry
10/1998
10/29/1998WO1998048215A1 Gas supply facility
10/29/1998WO1998048074A1 Metered gas control in a substrate processing apparatus
10/29/1998WO1998047613A1 Systems and methods for the combinatorial synthesis of novel materials
10/29/1998WO1998031844A3 Flash evaporator
10/28/1998EP0874391A2 Process for depositing a Halogen-doped SiO2 layer
10/28/1998EP0874066A1 Carbonaceous deposit-resistant coating for engine components
10/28/1998EP0873443A1 Diamond-like-carbon coated aramid fibers having improved mechanical properties
10/28/1998EP0873432A1 Cvd-coated titanium based carbonitride cutting tool insert
10/28/1998EP0873343A1 Metal complex source reagents for chemical vapor deposition
10/28/1998EP0792384B1 Pressure gradient cvi/cvd apparatus, process and product
10/28/1998EP0763149B1 Method and apparatus for low temperature deposition of cvd and pecvd films
10/28/1998EP0712409B1 Organometallic complexes of aluminium, gallium and indium
10/28/1998CN1197486A Guide bush and method of forming film on guide bush
10/27/1998US5827786 Decomposing silicon dioxide source
10/27/1998US5827785 Introducing silicon tetrafluoride as first fluorine source, tetraethoxysilane as silicon source and fluorine and nitrogen trifloride as second halogen source in a chamber along with oxygen to form fluorine doped layer
10/27/1998US5827571 Hot-wall CVD method for forming a ferroelectric film
10/27/1998US5827570 Composite ceramic articles and method for making such articles
10/27/1998US5827371 Unibody crucible and effusion source employing such a crucible
10/27/1998US5827370 Method and apparatus for reducing build-up of material on inner surface of tube downstream from a reaction furnace
10/22/1998WO1998047170A1 Method of growing nitride semiconductors, nitride semiconductor substrate and nitride semiconductor device
10/22/1998WO1998046812A1 Process for obtaining diamond layers by gaseous-phase synthesis
10/22/1998WO1998046808A1 Processor
10/22/1998WO1998046617A1 Liquid precursor for formation of metal oxides
10/22/1998WO1998021744A3 Gas panel
10/22/1998DE19716330A1 Method for producing a coating on a grinding tool
10/21/1998EP0872771A2 Photosensitive member, process for its production, image forming apparatus having the photosensitive member, and image forming process
10/21/1998EP0872770A2 Light-receiving member, image forming apparatus having the member, and image forming method utilizing the member
10/21/1998EP0872574A2 Radiantly heated reactor
10/21/1998EP0871910A1 A method and apparatus for the construction of photosensitive waveguides
10/21/1998EP0871804A1 Rotatable susceptor with integrated ferromagnetic element
10/21/1998EP0871796A1 Coated milling insert and method of making it
10/21/1998EP0871795A1 A scalable helicon wave plasma processing device with a non-cylindrical source chamber
10/21/1998EP0871557A1 Method of producing metal quantum dots
10/21/1998CN2295273Y Device for on-line diposition of LPVCD polycrystalline silicon quartz system protection layers
10/21/1998CN2294963Y Heating apparatus for temp.-regulatable field
10/21/1998CN1196760A Method for forming tin oxide coating on glass
10/21/1998CN1196505A Light-receiving member, image forming apparatus and, and image forming method
10/21/1998CN1196504A Photosensitive member, process for its production, image forming apparatus having photosensitive member, and image forming process
10/21/1998CN1196401A Low-temp. method and device for preparation of large area eka-diamond carbon film
10/20/1998US5825057 Process for fabricating layered superlattice materials and making electronic devices including same
10/20/1998US5824607 Plasma confinement for an inductively coupled plasma reactor
10/20/1998US5824455 Processing method and apparatus
10/20/1998US5824375 Reducing sorbable contaminants in a reactor using a cleaning gas; integrated circuits, semiconductors
10/20/1998US5824368 From seed crystals and fullerenes, low temperature and pressure
10/20/1998US5824367 Method for the deposition of diamond film on an electroless-plated nickel layer
10/20/1998US5824365 Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor
10/20/1998US5824198 Process for barrier coating of plastic objects
10/20/1998US5824158 Chemical vapor deposition using inductively coupled plasma and system therefor
10/20/1998US5824150 Process for forming deposited film by use of alkyl aluminum hydride
10/20/1998CA2100132C Method of producing synthetic diamond
10/15/1998WO1998045501A1 Method of manufacturing a semiconductor device and a device for applying such a method
10/15/1998WO1998045500A1 Production of thin cubic boron nitride coatings
10/15/1998WO1998045499A1 GROWTH OF BaSrTiO3 USING POLYAMINE-BASED PRECURSORS
10/14/1998EP0871217A2 Nitrogen-treated titanium or silicon layer to prevent interaction of titanium or silicon and aluminum
10/14/1998EP0871212A1 Heat treatment apparatus
10/14/1998EP0871211A2 Plasma treatment method and manufacturing method of semiconductor device
10/14/1998EP0871159A2 Magnetic recording medium
10/14/1998EP0870852A1 Method and apparatus for preventing condensation in an exhaust passage
10/14/1998EP0870851A2 Methods and apparatus for minimizing excess aluminum accumulation in CVD chambers
10/14/1998EP0870744A1 Gas-tight article and a producing process thereof
10/14/1998EP0870324A1 Semiconductor structure using modulation doped silicate glasses
10/14/1998EP0870075A1 Film or coating deposition and powder formation
10/14/1998EP0870074A1 Process for coating a metal substrate
10/14/1998EP0870073A1 Coated cutting insert and method of making it
10/14/1998EP0870072A1 Gas injection system for semiconductor processing
10/14/1998EP0869926A1 A method of manufacturing germanium doped glasses and a use of the method
10/13/1998US5822171 For holding a substrate on a base
10/13/1998US5821603 Integrated circuit die comprising silicon nitride dielectric protective layer formed by chemical depositing with variable ammonia flow rate, resulting gradually decreasing hydrogen concentration; blocking the over-etching
10/13/1998US5821402 Thin film deposition method and gas sensor made by the method
10/13/1998US5821017 Method of deposition
10/13/1998US5821005 Ferroelectrics thin-film coated substrate and manufacture method thereof and nonvolatile memory comprising a ferroelectrics thinfilm coated substrate
10/13/1998US5820994 Laminate and method for preparing same
10/13/1998US5820971 Security document and method of producing it
10/13/1998US5820947 Plasma processing method and apparatus
10/13/1998US5820922 Method for localized deposition of noble metal catalysts with control of morphology
10/13/1998US5820686 A support for substrate
10/13/1998US5820685 Wafer support device
10/13/1998US5820683 Object-supporting boat
10/13/1998US5820681 Unibody crucible and effusion cell employing such a crucible
10/13/1998US5820679 Fabrication system and method having inter-apparatus transporter
10/13/1998US5820678 A controlled delivery system for feeding organometallic compounds as precursors for multicomponent chemical vapor deposition
10/13/1998US5820664 Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising same
10/13/1998US5820641 Fluid cooled trap
10/13/1998US5820366 Dual vertical thermal processing furnace
10/13/1998US5819684 Chemical vapor deposition apparatus
10/13/1998US5819683 Trap apparatus
10/13/1998US5819434 Etch enhancement using an improved gas distribution plate
10/08/1998WO1998044543A1 Method for microwave plasma substrate heating
10/08/1998WO1998044164A1 Method of forming metallic and ceramic thin film structures using metal halides and alkali metals
10/08/1998WO1998043988A1 Bismuth amide compounds and compositions, and method of forming bismuth-containing films therewith
10/08/1998WO1998043808A1 Composition and method for forming doped a-site deficient thin-film manganate layers on a substrate
10/08/1998DE19714014A1 Herstellung dünner Schichten aus kubischem Bornitrid Production of thin films of cubic boron nitride
10/07/1998EP0869544A2 Method for depositing a diffusion barrier
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