| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/21/1999 | WO1999002251A2 Bulk chemical delivery system |
| 01/21/1999 | DE19730083A1 Verfahren zur gezielten Herstellung von n-leitenden Bereichen in Diamantschichten mittels Ionenimplantation A process for the targeted production of n-type regions in diamond layers by ion implantation |
| 01/20/1999 | EP0892422A2 Improvements in or relating to plasma reactors |
| 01/20/1999 | EP0892083A1 Method and apparatus for seasoning a substrate processing chamber |
| 01/20/1999 | EP0892082A1 Process for producing thin films of oxide ceramic |
| 01/20/1999 | EP0891957A1 Corrosion-resistant member, wafer-supporting member, and method of manufacturing the same |
| 01/20/1999 | EP0891631A1 Method and apparatus for fabricating silicon dioxide and silicon glass layers in integrated circuits |
| 01/20/1999 | EP0891621A1 Process for manufacturing optical data storage disk stamper |
| 01/20/1999 | EP0891366A1 Volatile magnesium alkylaluminum alkoxide and deposition of magnesium aluminate film using same |
| 01/20/1999 | EP0731975B1 Stacked-type component and method for the manufacture of same |
| 01/20/1999 | CN1205444A Fabrication method for uniform planar optical waveguide |
| 01/19/1999 | US5861675 Tungsten nitride fluorine film having good step coverage for a fine hole |
| 01/19/1999 | US5861210 Aluminum oxide coated tool |
| 01/19/1999 | US5861197 Deposition of high quality conformal silicon oxide thin films on glass substrates |
| 01/19/1999 | US5861135 Produced by vapor synthesis in the form of free-standing filmhaving excellent transparency |
| 01/19/1999 | US5861065 Dissociation; flowing gas mixture containing oxygen source; etching; high speed by-product removal; semiconductors |
| 01/19/1999 | US5861063 Plasma CVD device |
| 01/19/1999 | US5860805 Effluent-gas-scavenger system for process tube, minimizing back diffusion and atmospheric contamination |
| 01/19/1999 | CA2104411C Chemical vapor deposition-production silicon carbide having improved properties |
| 01/14/1999 | WO1999001886A1 Plasma reactor with impingement flow for treating surfaces |
| 01/14/1999 | WO1999001595A1 Method and apparatus for growing thin films |
| 01/14/1999 | WO1999001589A1 Colorless diamond-like carbon coatings |
| 01/14/1999 | WO1999001588A1 Parylene deposition chamber including eccentric part tumbler |
| 01/14/1999 | WO1999001405A1 SiC COMPOSITE AND METHOD OF PRODUCTION THEREOF |
| 01/14/1999 | CA2296095A1 Colorless diamond-like carbon coatings |
| 01/13/1999 | EP0890980A2 Method of making integrated circuit capacitors |
| 01/13/1999 | EP0890185A1 Solid state temperature controlled substrate holder |
| 01/13/1999 | EP0889976A1 Showerhead for uniform distribution of process gas |
| 01/13/1999 | EP0889975A1 Deposition method and precursor therefor |
| 01/13/1999 | EP0644953B1 Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten cvd |
| 01/13/1999 | CN1205037A Method of forming hard carbon film on inner circumferential surface of guide bush |
| 01/13/1999 | CN1204974A Coating of glass |
| 01/13/1999 | CN1204865A Improved silica insulation film with reduced dielectric constant and method of forming same |
| 01/13/1999 | CN1204698A Tunable and removable plasma deposited antireflective coatings |
| 01/12/1999 | US5859408 Apparatus for uniformly heating a substrate |
| 01/12/1999 | US5859404 Method and apparatus for plasma processing a workpiece in an enveloping plasma |
| 01/12/1999 | US5858881 Using reaction vessel of silicon carbide and etching gas of chlorine fluoride |
| 01/12/1999 | US5858863 Fabricating various kinds of semiconductor devices for a short period of time. |
| 01/12/1999 | US5858539 Diamond coated body and method of its production |
| 01/12/1999 | US5858480 Ceramic-based substrate for coating diamond and method for preparing substrate for coating |
| 01/12/1999 | US5858476 Method and apparatus for making and depositing compounds |
| 01/12/1999 | US5858473 Forming transparent film covering semiconductor film over substrate, ion doping semiconductor film with phosphorus, irradiating with beam of excimer laser pulses to activate phosphorus |
| 01/12/1999 | US5858471 Selective plasma deposition |
| 01/12/1999 | US5858465 Combustion chemical vapor deposition of phosphate films and coatings |
| 01/12/1999 | US5858464 Methods and apparatus for minimizing excess aluminum accumulation in CVD chambers |
| 01/12/1999 | US5858463 Immersing worn die in a solution of nitric acid; forming fresh abrasion-resistant coating on surface; machining to adjust pattern of die |
| 01/12/1999 | US5858313 Aerosol generator and apparatus producing small particles |
| 01/12/1999 | US5858259 Plasma processing apparatus and method |
| 01/12/1999 | US5858162 Plasma processing apparatus |
| 01/12/1999 | US5858102 Apparatus of chemical vapor for producing layer variation by planetary susceptor rotation |
| 01/12/1999 | US5858100 Substrate holder and reaction apparatus |
| 01/12/1999 | US5858078 Platelet-shaped titanium dioxide pigment |
| 01/07/1999 | WO1999000830A1 Improved deposition of tungsten nitride using plasma pretreatment in a chemical vapor deposition chamber |
| 01/07/1999 | WO1999000829A1 Method of producing thin semiconductor film and apparatus therefor |
| 01/07/1999 | WO1999000533A1 Gas injection disc assembly for cvd applications |
| 01/07/1999 | WO1999000532A1 Gas injection system for plasma processing apparatus |
| 01/07/1999 | WO1999000531A1 Method and apparatus for reducing deposition of contaminants |
| 01/07/1999 | WO1999000530A1 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices |
| 01/07/1999 | EP0888213A1 Diamond film deposition |
| 01/07/1999 | DE19727346A1 Replaceable gas-tight tube assembly for supplying gas into a process chamber |
| 01/06/1999 | CN1204418A Method of forming dielectric films with reduced metal contamination |
| 01/06/1999 | CN1203961A Apparatus for manufacturing silica film and method for manufacturing silica film using the same |
| 01/05/1999 | US5856652 Radiant heating apparatus and method |
| 01/05/1999 | US5856240 Chemical vapor deposition of a thin film onto a substrate |
| 01/05/1999 | US5856237 Insitu formation of TiSi2/TiN bi-layer structures using self-aligned nitridation treatment on underlying CVD-TiSi2 layer |
| 01/05/1999 | US5856236 Method of depositing a smooth conformal aluminum film on a refractory metal nitride layer |
| 01/05/1999 | US5856206 Method for fabricating bragg reflector using in situ laser reflectometry |
| 01/05/1999 | US5856027 Gas turbine engines |
| 01/05/1999 | US5855998 Hard material-coated wafer, method of making same, polishing apparatus and polishing method of hard material-coated wafer |
| 01/05/1999 | US5855974 Method of producing CVD diamond coated scribing wheels |
| 01/05/1999 | US5855970 Chemical vapor deposition |
| 01/05/1999 | US5855967 Method of protecting surfaces on diamond, diamondlike carbon or carbon |
| 01/05/1999 | US5855957 Optimization of SiO2 film conformality in atmospheric pressure chemical vapor deposition |
| 01/05/1999 | US5855956 Condensation of hydrolyzed precursor reacted with water vapor mixed with a volatile organometallic compound; annealing |
| 01/05/1999 | US5855953 Aerogel composites and method of manufacture |
| 01/05/1999 | US5855828 Method of forming a composite structure such as a rocket combustion chamber |
| 01/05/1999 | US5855725 Vacuum processing system and method of removing film deposited on inner face of vacuum vessel in the vacuum processing system |
| 01/05/1999 | US5855689 Method for etching inside of tungsten CVD reaction room |
| 01/05/1999 | US5855687 Substrate support shield in wafer processing reactors |
| 01/05/1999 | US5855685 Plasma enhanced CVD apparatus, plasma enhanced processing apparatus and plasma enhanced CVD method |
| 01/05/1999 | US5855683 Thin film deposition apparatus |
| 01/05/1999 | US5855680 Apparatus for growing thin films |
| 01/05/1999 | US5855679 Semiconductor manufacturing apparatus |
| 01/05/1999 | US5855678 Fluidized bed reactor to deposit a material on a surface by chemical vapor deposition, and methods of forming a coated substrate therewith |
| 01/05/1999 | US5855677 Method and apparatus for controlling the temperature of reaction chamber walls |
| 01/05/1999 | US5855675 Multipurpose processing chamber for chemical vapor deposition processes |
| 01/05/1999 | US5855641 Mold for molding optical element |
| 01/05/1999 | CA2069694C Device for introducing reagents into an organometallic vapour phase deposition apparatus |
| 01/05/1999 | CA2058483C Process for the chemical vapor deposition of copper |
| 12/30/1998 | WO1998059366A1 Metal and metal silicide nitridization in a high density, low pressure plasma reactor |
| 12/30/1998 | WO1998059090A1 Method for producing a magnesia based deposit |
| 12/30/1998 | WO1998059089A1 Method for making a non-sticking diamond-like nanocomposite |
| 12/30/1998 | EP0887843A1 Method of manufacturing a transistor with a silicon-germanium gate |
| 12/30/1998 | EP0887836A2 Electronic device fabrication apparatus |
| 12/30/1998 | EP0887438A1 Process for improving the inner surface of hollow bodies and device for carrying out the process |
| 12/30/1998 | EP0887437A2 Protective coating by high rate arc plasma deposition |
| 12/30/1998 | EP0887436A1 Method and apparatus for growth of a nitride III-V compound semiconductor |
| 12/30/1998 | EP0887433A1 Silicon dioxide deposition by plasma activated evaporation process |
| 12/30/1998 | EP0887110A1 Nozzle-injector for arc plasma deposition apparatus |
| 12/30/1998 | CN1203641A Diamond-like-carbon coated aramid fibers having improved mechanical properties |