Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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12/30/1998 | CN1203640A Capacitively coupled RF diamond-like-carbon reactor |
12/30/1998 | CN1203638A Coated milling insert and method of making it |
12/30/1998 | CN1203637A Coated cutting insert and method of making it |
12/30/1998 | CN1203636A Coated cutting insert and method of making it |
12/30/1998 | CN1041445C Method for gas phase synthetizing diamond |
12/29/1998 | US5854495 Preparation of nucleated silicon surfaces |
12/29/1998 | US5854138 Reduced-particle method of processing a semiconductor and/or integrated circuit |
12/29/1998 | US5854089 Semiconductor device by selectively controlling growth of an epitaxial layer without a mask |
12/29/1998 | US5853833 Sanitary container and production process thereof |
12/29/1998 | US5853804 Gas control technique for limiting surging of gas into a CVD chamber |
12/29/1998 | US5853799 Liquid methyltin halide compositions |
12/29/1998 | US5853607 CVD processing chamber |
12/29/1998 | US5853486 Treatment system and treatment apparatus with multi-stage carrier storage chambers |
12/29/1998 | US5853485 Pressure gradient CVI/CVD apparatus process and product |
12/29/1998 | US5853484 Gas distribution system and method for chemical vapor deposition apparatus |
12/29/1998 | US5853176 Vacuum chamber and method of manufacturing the vacuum chamber |
12/29/1998 | CA2042777C Diamond having multiple coatings and methods for their manufacture |
12/26/1998 | CA2582177A1 Protective coating by high rate arc plasma deposition |
12/26/1998 | CA2238158A1 Nozzle-injector for arc plasma deposition apparatus |
12/23/1998 | WO1998058415A1 Controlled conversion of metal oxyfluorides into superconducting oxides |
12/23/1998 | WO1998058406A1 High aspect ratio gapfill by using hdp |
12/23/1998 | WO1998058100A1 Method and device for vacuum-coating a substrate |
12/23/1998 | WO1998058099A1 Method for producing coated workpieces, uses and installation for the method |
12/23/1998 | WO1998058098A1 Magnetic parts and method for using same |
12/23/1998 | WO1998058097A1 A method of coating edges with diamond-like carbon |
12/23/1998 | WO1998058096A1 Liquid delivery system, heater apparatus for liquid delivery system, and vaporizer |
12/23/1998 | EP0885983A1 Method for coating a substrate with a diamond like nanocomposite composition |
12/23/1998 | EP0885981A2 Process and apparatus for treating substrates by means of ions produced by low voltage arc discharge |
12/23/1998 | EP0885315A1 Misted precursor deposition apparatus and method with improved mist and mist flow |
12/23/1998 | EP0763146B1 LOW TEMPERATURE PLASMA-ENHANCED FORMATION OF TiN FILMS |
12/23/1998 | CN1202852A Method for preserving precision edges using diamond-like nanocomposite film |
12/23/1998 | CN1202845A Anchored oxide coatings on hard metal cutting tools |
12/23/1998 | CA2295194A1 Controlled conversion of metal oxyfluorides into superconducting oxides |
12/22/1998 | US5852341 Diamond film with sharp field emission turn-on |
12/22/1998 | US5851904 Method of manufacturing microcrystalline layers and their utilization |
12/22/1998 | US5851842 Measurement system and measurement method |
12/22/1998 | US5851687 Alumina coated cutting tool |
12/22/1998 | US5851680 Boron-doped titanium nitride coatings and coated parts |
12/22/1998 | US5851658 Diamond coated article and process for producing thereof |
12/22/1998 | US5851602 Deposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistors |
12/22/1998 | US5851600 Plasma process method and apparatus |
12/22/1998 | US5851589 Method for thermal chemical vapor deposition |
12/22/1998 | US5851581 Semiconductor device fabrication method for preventing tungsten from removing |
12/22/1998 | US5851367 Differential copper deposition on integrated circuit surfaces and method for same |
12/22/1998 | US5851307 Method for in-situ cleaning of polysilicon-coated quartz furnaces |
12/22/1998 | US5851299 Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions |
12/22/1998 | US5851298 Susceptor structure for mounting processing object thereon |
12/22/1998 | US5851297 Method and apparatus for preparing crystalline thin-films for solid-state lasers |
12/22/1998 | US5851296 Vacuum processing apparatus and method |
12/22/1998 | US5851294 Gas injection system for semiconductor processing |
12/22/1998 | US5851293 Flow-stabilized wet scrubber system for treatment of process gases from semiconductor manufacturing operations |
12/22/1998 | CA2138096C Apparatus and method for depositing a substance on a rotating surface |
12/17/1998 | DE19826259A1 Plasma CVD process application |
12/17/1998 | DE19801558A1 Semiconductor wafer processing by film formation |
12/16/1998 | EP0884770A1 Method of depositing a polycristalline material layer on a silicon substrate |
12/16/1998 | EP0884401A1 Method and system for coating the inside of a processing chamber |
12/16/1998 | EP0883698A1 METHOD FOR FORMING Ti 1-xAlxN COATINGS |
12/16/1998 | EP0713429B1 Hydrophilic films by plasma polymerisation |
12/16/1998 | CN1202000A Method and apparatus for treating semiconductor wafer |
12/15/1998 | US5849644 Semiconductor processing methods of chemical vapor depositing SiO2 on a substrate |
12/15/1998 | US5849628 Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same |
12/15/1998 | US5849455 Plasma processing method and plasma processing apparatus |
12/15/1998 | US5849446 Light receiving member having a surface protective layer with a specific outermost surface and process for the production thereof |
12/15/1998 | US5849413 Oriented diamond film structures on nondiamond substrates |
12/15/1998 | US5849366 Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization |
12/15/1998 | US5849360 Tube chemical gas deposition method of preparing titanium nitride coated titanium carbide for titanium carbide/silicon nitride composites |
12/15/1998 | US5849228 Segmented substrate for improved arc-jet diamond deposition |
12/15/1998 | US5849206 Method of producing a biocompatible prosthesis |
12/15/1998 | US5849092 Process for chlorine trifluoride chamber cleaning |
12/15/1998 | US5849089 Evaporator for liquid raw material and evaporation method therefor |
12/15/1998 | US5849088 Free floating shield |
12/15/1998 | US5849079 Diamond film growth argon-carbon plasmas |
12/15/1998 | US5849078 Method for growing single-crystalline semiconductor film and apparatus used therefor |
12/15/1998 | US5849076 Cooling system and method for epitaxial barrel reactor |
12/10/1998 | WO1998055668A1 Method and apparatus for vapor generation and film deposition |
12/10/1998 | WO1998055667A1 Method and apparatus for measurement of cvd exhaust deposits |
12/10/1998 | WO1998055416A1 Method for lubricating glass molds, plungers and the like |
12/09/1998 | EP0883166A2 Deposition of fluorinated silicon glass |
12/09/1998 | EP0883164A2 Thermally stable dielectric coatings |
12/09/1998 | EP0883159A2 Plasma processing apparatus |
12/09/1998 | EP0882812A1 Method of manufacturing member for thin-film formation apparatus and the member for the apparatus |
12/09/1998 | CN1201023A Transparent matrix having at least a silicon nitride or silicon nitride oxide base thin layer and preparation method therefor |
12/08/1998 | US5846649 Highly durable and abrasion-resistant dielectric coatings for lenses |
12/08/1998 | US5846613 Method for depositing a hard protective coating |
12/08/1998 | US5846612 Process for forming high-quality deposited film utilizing plasma CVD |
12/08/1998 | US5846611 Chemical vapor infiltration process of a material within a fibrous substrate with creation of a temperature gradient in the latter |
12/08/1998 | US5846600 Processes for producing coated particles |
12/08/1998 | US5846373 Method for monitoring process endpoints in a plasma chamber and a process monitoring arrangement in a plasma chamber |
12/08/1998 | US5846332 Thermally floating pedestal collar in a chemical vapor deposition chamber |
12/08/1998 | US5846330 Gas injection disc assembly for CVD applications |
12/08/1998 | US5846320 Method for forming crystal and crystal article obtained by said method |
12/08/1998 | US5846275 Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system |
12/06/1998 | CA2239347A1 Thermally stable dielectric coatings |
12/03/1998 | WO1998054381A1 Secondary edge reflector for horizontal reactor |
12/03/1998 | WO1998054373A1 Film or coating deposition on a substrate |
12/03/1998 | DE19723729A1 Determining layer properties during deposition or etching |
12/02/1998 | EP0881197A2 Method and apparatus for coating glass or plastic containers using PCVD for coating |
12/02/1998 | EP0880607A1 Oxidation protective coating for refractory metals |
12/02/1998 | EP0839404A4 Electrostatic chuck assembly |
12/02/1998 | CN1200773A Gas injection system for semiconductor processing |