| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/16/1999 | US5872065 Method for depositing low K SI-O-F films using SIF4 /oxygen chemistry |
| 02/16/1999 | US5872058 By reducing the inert gas concentration, sputtering or etching is reduced, resulting in reduced sidewall deposition from the sputtered material. consequently, gaps can be filled without the formation of voids and without damaging circuit elements. |
| 02/16/1999 | US5872054 Anti-reflection film and method of manufacturing |
| 02/16/1999 | US5871853 Metal oxide crystal for thin film capacitors |
| 02/16/1999 | US5871847 Carbon |
| 02/16/1999 | US5871813 Apparatus and method for controlling process chamber pressure |
| 02/16/1999 | US5871812 Apparatus and method for depositing molecular impurities on a semiconductor wafer |
| 02/16/1999 | US5871811 Method for protecting against deposition on a selected region of a substrate |
| 02/16/1999 | US5871805 Chemical vapor deposition and electron beam physical vapor deposition processes, using optical imaging sensors and/or laser interferometers or infrared ellipsometers |
| 02/16/1999 | US5871588 Programmable ultraclean electromagnetic substrate rotation apparatus and method for microelectronics manufacturing equipment |
| 02/16/1999 | US5871586 Chemical vapor deposition |
| 02/16/1999 | CA2067565C Deposition of tungsten |
| 02/16/1999 | CA2067145C Process for forming crack-free pyrolytic boron nitride on a carbon structure and article |
| 02/11/1999 | WO1999006611A1 Method and apparatus for chamber cleaning |
| 02/11/1999 | WO1999006610A1 Method and apparatus for detecting the endpoint of a chamber cleaning |
| 02/11/1999 | WO1999006609A1 Component with high temperature resistance and method for producing an anti-oxidation element |
| 02/11/1999 | WO1999006335A1 Transparent substrate provided with at least one reflecting coating and method for obtaining same |
| 02/11/1999 | WO1999006110A1 Cluster tool method and apparatus using plasma immersion ion implantation |
| 02/10/1999 | EP0760022B1 Apparatus and method for delivery of reactant gases |
| 02/10/1999 | CN1207581A Process for producing semiconductor device having hemispherical grains |
| 02/10/1999 | CN1207579A Method for manufacturing semiconductor device and semiconductor device manufacturing apparatus |
| 02/09/1999 | US5870526 Inflatable elastomeric element for rapid thermal processing (RTP) system |
| 02/09/1999 | US5869922 Vapor deposited inorganic coatings comprising an ultraviolet radiation raman band |
| 02/09/1999 | US5869803 Method of forming polycrystalline silicon layer on substrate and surface treatment apparatus thereof |
| 02/09/1999 | US5869149 Method for preparing nitrogen surface treated fluorine doped silicon dioxide films |
| 02/09/1999 | US5869147 Method of making a multilayer tool surface with PCNA interruption of CVD, and tool made by the process |
| 02/09/1999 | US5869135 Surface treatment without the use of plasma processing such as stamping self-assembled monolayers, to promote or inhibit nucleation of poly(p-phenylene vinylene) precursors; electronics with electroluminescent polymers |
| 02/09/1999 | US5869134 CVD of metals capable of receiving nickel or alloys thereof using iodide |
| 02/09/1999 | US5869133 Method of producing articles by chemical vapor deposition and the support mandrels used therein |
| 02/09/1999 | US5868897 Device and method for processing a plasma to alter the surface of a substrate using neutrals |
| 02/09/1999 | US5868850 Vapor phase growth apparatus |
| 02/09/1999 | US5868849 Surface processing device |
| 02/09/1999 | US5868848 Plasma processing apparatus |
| 02/09/1999 | US5868847 Clamp ring for shielding a substrate during film layer deposition |
| 02/08/1999 | CA2243869A1 Non-fouling, wettable coated devices |
| 02/04/1999 | WO1999005417A1 Hall-current ion source apparatus and method for processing materials |
| 02/04/1999 | WO1999004911A1 Pyrolytic chemical vapor deposition of silicone films |
| 02/04/1999 | WO1999004615A1 System for delivering a substantially constant vapor flow to a chemical process reactor |
| 02/03/1999 | EP0895291A2 Photovoltaic element and method of producing the same |
| 02/03/1999 | EP0894802A2 Silane compound |
| 02/03/1999 | EP0894766A1 Boron-doped isotopic diamond and process for producing the same |
| 02/02/1999 | US5867128 Multicontact for antenna window |
| 02/02/1999 | US5866252 Super conducting metal-ceramic composite |
| 02/02/1999 | US5866213 Method for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
| 02/02/1999 | US5866205 Process for titanium nitride deposition using five- and six-coordinate titanium complexes |
| 02/02/1999 | US5866198 Method of fabricating a compound semiconductor having a plurality of layers using a flow compensation technique |
| 02/02/1999 | US5866195 Elongated strip of metallic cable |
| 02/02/1999 | US5865888 Semiconductor device epitaxial layer lateral growth rate control method using CBr4 |
| 02/02/1999 | US5865421 Valve structure for use in a vaporizer |
| 02/02/1999 | US5865321 Slip free vertical rack design |
| 01/28/1999 | WO1999004418A1 Method for targeted production on n-type conductive areas in diamond layers by ion implantation |
| 01/28/1999 | WO1999004411A1 Plasma treater systems and treatment methods |
| 01/28/1999 | WO1999004067A1 Inflatable elastomeric element for rapid thermal processing (rtp) system |
| 01/28/1999 | WO1999004061A1 Liquid delivery system comprising upstream pressure control means |
| 01/28/1999 | WO1999004060A1 Fluid delivery apparatus and method |
| 01/28/1999 | WO1999004059A1 Single body injector and deposition chamber |
| 01/28/1999 | WO1999003599A1 Method and apparatus for gas phase coating complex internal surfaces of hollow articles |
| 01/28/1999 | DE19731018A1 Dental tool |
| 01/28/1999 | CA2295729A1 Plasma treater systems and treatment methods |
| 01/27/1999 | EP0893513A1 Method for preparing a titanium dioxide film |
| 01/27/1999 | EP0892861A1 Boron and nitrogen containing coating and method for making |
| 01/27/1999 | EP0892832A1 Goniochromatic gloss pigments based on coated silicon dioxide platelets |
| 01/27/1999 | EP0755460B1 Process to produce diamond films |
| 01/27/1999 | CN1206091A Vapor generating method and apparatus using same |
| 01/27/1999 | CN1041815C Coating composition for glass |
| 01/27/1999 | CN1041814C Coated article |
| 01/26/1999 | US5863842 Vacuum exhausting apparatus, semiconductor manufacturing apparatus, and vacuum processing method |
| 01/26/1999 | US5863836 Method of depositing thin metal films |
| 01/26/1999 | US5863706 Processing method for patterning a film |
| 01/26/1999 | US5863640 Coated cutting insert and method of manufacture thereof |
| 01/26/1999 | US5863607 For coating radiation-sensitive emulsions on photographic support |
| 01/26/1999 | US5863606 Method for producing diamond coated member |
| 01/26/1999 | US5863605 Diamond film deposition |
| 01/26/1999 | US5863604 The substrate being coated located in a zone proximate to the flame's end in an open-atmosphere environment |
| 01/26/1999 | US5863602 Coating silicon film onto inner wall of chamber using silicon-based gas, reducing pressure, causing silicon wafer to emit impurities, capture of inpurities by silicon film |
| 01/26/1999 | US5863598 Method of forming doped silicon in high aspect ratio openings |
| 01/26/1999 | US5863376 Cooling mechanism which cools dielectric member for minimization of process drift |
| 01/26/1999 | US5863340 Deposition ring anti-rotation apparatus |
| 01/26/1999 | US5863339 Chamber etching of plasma processing apparatus |
| 01/26/1999 | US5863338 Apparatus and method for forming thin film |
| 01/26/1999 | US5863337 Means for directing a coating composition vapor toward a substrate surface, tin oxide and silicon oxide |
| 01/26/1999 | US5863327 Apparatus for forming materials |
| 01/26/1999 | US5863324 Process for producing single crystal diamond film |
| 01/26/1999 | US5863023 Valved coupling for ultra high purtiy gas distribution system |
| 01/26/1999 | US5862605 Vaporizer apparatus |
| 01/26/1999 | CA2061944C A diamond and/or diamond-like carbon-coated hard material |
| 01/21/1999 | WO1999003312A1 Method for improved cleaning of substrate processing systems |
| 01/21/1999 | WO1999003308A1 Frequency selected, variable output inductor heater system and method |
| 01/21/1999 | WO1999003137A1 Fuel delivery system and method |
| 01/21/1999 | WO1999003133A1 Modular architecture for semiconductor wafer fabrication equipment |
| 01/21/1999 | WO1999003131A1 Apparatus and method for delivering a gas |
| 01/21/1999 | WO1999002952A1 Apparatus for measuring the temperature of wafers |
| 01/21/1999 | WO1999002757A1 Reflective surface for cvd reactor walls |
| 01/21/1999 | WO1999002756A1 Method and apparatus for fabrication of thin films by chemical vapor deposition |
| 01/21/1999 | WO1999002755A1 Chemical vapor deposition manifold |
| 01/21/1999 | WO1999002754A1 Remote plasma cleaning apparatus |
| 01/21/1999 | WO1999002753A1 Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma |
| 01/21/1999 | WO1999002752A1 Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer |
| 01/21/1999 | WO1999002751A1 Automatic positive pressure seal access door |
| 01/21/1999 | WO1999002276A1 Low temperature, high quality silicon dioxide thin films deposited using tetramethylsilane (tms) |