Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/1999
04/07/1999EP0590148B1 Method and apparatus for thin film formation, device, electro-magnetic apparatus, data recording/reproduction apparatus and signal processor
04/07/1999CN1213457A Method and apparatus for babricating silion dioxide and silicon glass layer in integrated circuits
04/06/1999USH1792 Vapor deposition of diamond from hydrogen and carbon-containing gas on refractory nitride
04/06/1999US5893050 Method for correcting thin-film formation program of semiconductor device and thickness measuring apparatus therefor
04/06/1999US5892886 Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes
04/06/1999US5892207 Heating and cooling apparatus for reaction chamber
04/06/1999US5892083 Magnesium complexes with amine ligands and hydrocarbons for magnesium deposition
04/06/1999US5891810 Process for supplying ozone (O3) to TEOS-O3 oxidizing film depositing system
04/06/1999US5891793 Transistor fabrication process employing a common chamber for gate oxide and gate conductor formation
04/06/1999US5891584 Coated article for hot hydrocarbon fluid and method of preventing fuel thermal degradation deposits
04/06/1999US5891575 Growing and releasing diamonds
04/06/1999US5891531 Process for producing a thin film of a flouride
04/06/1999US5891522 Composite article with adherent CVD diamond coating and method of making
04/06/1999US5891517 Fluidized bed with uniform heat distribution and multiple port nozzle
04/06/1999US5891349 Plasma enhanced CVD apparatus and process, and dry etching apparatus and process
04/06/1999US5891348 Process gas focusing apparatus and method
04/06/1999US5891253 Corrosion resistant apparatus
04/06/1999US5891252 Plasma processing apparatus
04/06/1999US5891251 CVD reactor having heated process chamber within isolation chamber
04/06/1999US5891250 Injector for reactor
04/06/1999CA2000076C Process for preparing superconductor of compound oxide of bi-sr-ca-cu system
04/01/1999WO1999016117A1 Method and apparatus for plasma processing, and method for manufacturing semiconductor substrate
04/01/1999WO1999015818A1 Modular fluid flow system with integrated pump-purge
04/01/1999WO1999015712A1 Cvd chamber inner lining
04/01/1999WO1999015711A1 Laminate comprising a barrier layer of silicon oxide
04/01/1999WO1999015710A1 Cell control method and apparatus
04/01/1999DE19740806A1 Microtitration plate in transparent plastic
04/01/1999DE19740792A1 Verfahren zur Erzeugung eines Plasmas durch Einstrahlung von Mikrowellen A method of generating a plasma by microwave irradiation
03/1999
03/31/1999EP0905420A2 Piston ring
03/31/1999EP0905419A2 Piston ring
03/31/1999EP0905276A2 Apparatus for vaporizing and supplying a material
03/31/1999EP0904826A2 An air intake apparatus for semiconductor fabricating equipment
03/31/1999EP0859669A4 Coating of glass
03/31/1999CN1212734A Misted precursor deposition apparatus and method with improved mist and mist flow
03/31/1999CN1212456A Plasma processing method and apparatus
03/30/1999US5888910 Method for forming interlayer insulating film of semiconductor devices
03/30/1999US5888907 Plasma processing method
03/30/1999US5888638 Sealing element, particularly for shut-off and regulating valves, and process for its production
03/30/1999US5888594 Process for depositing a carbon-rich coating on a moving substrate
03/30/1999US5888593 Ion beam process for deposition of highly wear-resistant optical coatings
03/30/1999US5888591 Chemical vapor deposition of fluorocarbon polymer thin films
03/30/1999US5888588 Process for forming a semiconductor device
03/30/1999US5888583 Misted deposition method of fabricating integrated circuits
03/30/1999US5888579 Flowing purge gas from chamber into contaminant purge system to carry contaminant particles deposited in conduit to exhaust system and away from chamber
03/30/1999US5888414 Plasma reactor and processes using RF inductive coupling and scavenger temperature control
03/30/1999US5888413 Plasma processing method and apparatus
03/30/1999US5888304 Heater with shadow ring and purge above wafer surface
03/30/1999US5888303 Gas inlet apparatus and method for chemical vapor deposition reactors
03/25/1999WO1999014789A1 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil
03/25/1999WO1999014787A2 Method for producing plasma by microwave irradiation
03/25/1999WO1999014746A1 Magnetic recording medium and method of producing the same
03/25/1999WO1999014396A1 Method and apparatus for monitoring a vaporizer
03/25/1999WO1999014390A2 Method for sputter coating surfaces
03/25/1999WO1999013974A1 Ampule with integral filter
03/25/1999DE19803487C1 Heating apparatus for wafer CVD coating unit
03/24/1999EP0903577A2 Acoustic consumption monitor
03/24/1999EP0903204A2 Sliding member, inner and outer blades of an electric shaver and film-forming method
03/24/1999EP0902970A1 Method and apparatus for misted liquid source deposition of thin films with increased yield
03/24/1999EP0902962A1 Apparatus for plasma jet treatment of substrates
03/24/1999EP0902961A1 Method for treating articles with a plasma jet
03/24/1999EP0797753B1 Rapid thermal processing apparatus and method
03/24/1999EP0787223B1 Chemical vapour deposition
03/24/1999EP0779940B1 Method for the deposition of a diamond film on an electroless-plated nickel layer
03/24/1999EP0757884A4 Method of forming a fluorinated silicon oxide layer using plasma chemical vapor deposition
03/24/1999EP0658219B1 Fluidized bed reactor arrangement for forming a metal carbide coating on a substrate containing graphite or carbon
03/24/1999CN1211636A Mono-crystal silicon-nm-crystal cubic boron nitride film like P-N node and its preparation method
03/24/1999CN1211635A Diamond-coated wire-drawing die
03/23/1999US5887117 Flash evaporator
03/23/1999US5886864 Substrate support member for uniform heating of a substrate
03/23/1999US5886473 Surface wave plasma processing apparatus
03/23/1999US5886203 Metalorganic compounds
03/23/1999US5885916 Molded window comprising low aluminum or aluminum-free silicon nitride sintered together with silicon oxide and a rare earth oxide; microwaves
03/23/1999US5885894 High density plasma chemical vapor deposition of thick undoped silicate glass layer over transistor on substrate, chemical-mechanical polishing, coating with a doped silicate glass layer
03/23/1999US5885884 Process for fabricating a microcrystalline silicon structure
03/23/1999US5885881 Planar wave guide cladding
03/23/1999US5885751 Method and apparatus for depositing deep UV photoresist films
03/23/1999US5885541 Technique for the fabrication of bulk porous diamond
03/23/1999US5885358 Gas injection slit nozzle for a plasma process reactor
03/23/1999US5885356 Method of reducing residue accumulation in CVD chamber using ceramic lining
03/23/1999US5885355 Semiconductor fabrication apparatus with a handler
03/23/1999US5885354 Method and apparatus for processing a specimen
03/23/1999US5885352 Vapor phase processing apparatus
03/23/1999US5884412 Method and apparatus for purging the back side of a substrate during chemical vapor processing
03/23/1999CA2022376C Process and apparatus for coating small solids
03/18/1999WO1999013545A2 Vaporization and deposition apparatus and process
03/18/1999WO1999013129A1 Combustion chemical vapor deposition of phosphate films and coatings
03/18/1999WO1999013128A1 A method of depositing an electrocatalyst and electrodes formed by such method
03/18/1999WO1999013126A1 Multiple edge deposition exclusion rings
03/18/1999WO1999012671A1 Extrusion die, production and use
03/18/1999DE19740793A1 Method for coating surfaces by means of an installation with sputter cathodes
03/18/1999DE19740610A1 Crack and peel resistant silicon carbide coating
03/18/1999CA2302580A1 Combustion chemical vapor deposition of phosphate films and coatings
03/17/1999EP0901532A1 Vacuum coating system
03/17/1999CN1210902A Nozzle-injector for arc plasma deposition apparatus
03/17/1999CN1210901A Protective coating by high rate arc plasma deposition
03/17/1999CN1210899A Silicon dioxide deposition by plasma activated evaporation process
03/16/1999US5883919 Diffusion furnace system for preventing gas leakage
03/16/1999US5883778 Electrostatic chuck with fluid flow regulator
03/16/1999US5883769 Aluminum head drum with a protective layer which smoothly and continuously varies in hardness for use in a videocassette recorder
03/16/1999US5883052 Mixing metals, alloying, oxidation to form superconductors
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