Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
05/1999
05/04/1999CA2247818A1 Two piece diamond deposition mandrel having graphite ring
05/04/1999CA2155144C Diamond-coated composite cutting tool and method of making
04/1999
04/29/1999WO1999020925A1 Throttle valve providing cleaning
04/29/1999WO1999020812A1 Method for cleaning an etching chamber
04/29/1999WO1999020811A1 Lid assembly for a process chamber employing asymmetric flow geometries
04/29/1999WO1999020809A1 Deposition of coatings using an atmospheric pressure plasma jet
04/28/1999EP0911307A1 Corrosion-resistant member, method of manufacturing the same and apparatus for heating corrosive substance
04/28/1999EP0910686A1 Temperature controlling method and apparatus for a plasma processing chamber
04/28/1999EP0910685A1 Coated cutting insert
04/28/1999EP0910484A2 Chambers for promoting surface adhesion under vacuum and methods of using same
04/28/1999EP0910468A1 Electrically assisted synthesis of particles and films with precisely controlled characteristics
04/28/1999EP0737255B1 Flexible, corrosion-resistant coated aluminium-based strip
04/28/1999CN1215437A Substrate with a superhard coating containing boron and nitrogen and method of making the same
04/28/1999CN1215436A Boron and nitrogen containing coating and method for making
04/28/1999CN1215031A Method for making sythetic quartz glass
04/27/1999US5897942 Coated body, method for its manufacturing as well as its use
04/27/1999US5897924 Process for depositing adherent diamond thin films
04/27/1999US5897923 Plasma treatment device
04/27/1999US5897799 Laser processing apparatus
04/27/1999US5897740 Plasma processing system
04/27/1999US5897713 Plasma generating apparatus
04/27/1999US5897711 Method and apparatus for improving refractive index of dielectric films
04/27/1999US5897710 Substrate processing apparatus and substrate processing method
04/27/1999US5897380 Method for isolating a susceptor heating element from a chemical vapor deposition environment
04/27/1999US5897378 Method of monitoring deposit in chamber, method of plasma processing, method of dry-cleaning chamber, and semiconductor manufacturing apparatus
04/27/1999US5897311 Support boat for objects to be processed
04/22/1999WO1999020086A2 Process for forming adherent coatings using plasma processing
04/22/1999WO1999019537A1 Dual frequency excitation of plasma for film deposition
04/22/1999WO1999019536A1 Introducing process fluid over rotating substrates
04/22/1999WO1999019535A1 Method to improve adhesion of dielectric on metal
04/22/1999WO1999019534A1 Plasma enhanced chemical vapor deposition (pecvd) method of forming vanadium oxide films and vanadium oxide thin-films prepared thereby
04/22/1999WO1999019533A1 Method of depositing an amorphous fluorocarbon film using hdp-cvd
04/22/1999WO1999019532A1 Method of chemical vapor deposition of metal films
04/22/1999WO1999019531A1 Method to improve adhesion of dielectric on metal
04/22/1999WO1999019530A1 A vacuum processing system having improved substrate heating and cooling
04/22/1999WO1999019229A1 Packaging laminate with gas and aroma barrier properties
04/22/1999WO1999019050A1 Gas purification system with safety device and method for purifying gases
04/22/1999WO1999019049A2 Semiconductor manufacturing system with getter safety device
04/22/1999WO1999019048A1 Semiconductor manufacturing system with getter safety device
04/22/1999WO1999000530A9 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices
04/22/1999DE19810013A1 Extrusion tool
04/22/1999DE19802523A1 Process for producing a hemispherical grain silicon
04/22/1999DE19744060A1 Method for surface treating of substrates
04/21/1999EP0909989A1 Photolithographic processing method and apparatus
04/21/1999EP0909988A1 Photolithographic processing method
04/21/1999EP0909987A1 Photolithographic processing method and apparatus
04/21/1999EP0909986A1 Photolithographic processing method and apparatus
04/21/1999EP0909985A1 Photolithographic processing method and apparatus
04/21/1999EP0909837A2 Chemical vapor deposition apparatus and cleaning method thereof
04/21/1999EP0909836A2 Thin-film deposition apparatus
04/21/1999EP0909835A1 Superhard material film structure, process of making and use of same
04/21/1999EP0909445A1 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
04/21/1999EP0909343A1 Method for densifying and refurbishing brakes
04/21/1999EP0840809B1 Product with a metallic base body provided with cooling channels and its manufacture
04/21/1999EP0784861B1 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber
04/21/1999EP0738336B1 Oxide coated cutting tool
04/21/1999EP0734462B1 Process and apparatus for forming an excited gas
04/21/1999EP0734461B1 Process and apparatus for forming an excited gas
04/21/1999CN1214741A Barrier film having vapor coated EVOH surfaces
04/21/1999CN1214533A Formation of non-homogenous device layer using inert gas shield
04/20/1999US5895938 Semiconductor device using semiconductor BCN compounds
04/20/1999US5895596 Model based temperature controller for semiconductor thermal processors
04/20/1999US5895594 Silicon polyrods
04/20/1999US5895563 Immersion mixture of iron, fluoride, and acid compounds; cyanide-free; uniformity; electroplating
04/20/1999US5895530 Method and apparatus for directing fluid through a semiconductor processing chamber
04/20/1999US5895267 Method to obtain a low resistivity and conformity chemical vapor deposition titanium film
04/20/1999US5894887 Ceramic dome temperature control using heat pipe structure and method
04/15/1999WO1999018593A1 Method and device for surface-treating substrates
04/15/1999WO1999017892A1 Selective chemical vapor deposition of polymers
04/15/1999WO1999009586A3 Method for forming titanium silicide and titanium by cvd
04/15/1999DE19838063A1 New electrically insulating thin film system
04/15/1999DE19750909C1 Rotating unit for plasma immersion aided treatment of substrates
04/14/1999EP0908934A2 Method of manufacturing a gate electrode
04/14/1999EP0908782A1 Photolithographic processing method
04/14/1999EP0908781A2 Photolithographic processing method and apparatus
04/14/1999EP0908418A1 Manufacturing method of synthetic silica glass
04/14/1999EP0907764A1 Cutting tool and manufacturing method therefor
04/14/1999EP0907761A1 Method and apparatus for treating inside surfaces of containers
04/14/1999CN1213861A Photovoltaic element and method of producing same
04/14/1999CN1213707A System and method for controlled delivery of liquified gases
04/13/1999US5893974 Inorganic porous shell provoding a selective molecular barrier between interior and exterior
04/13/1999US5893962 Electrode unit for in-situ cleaning in thermal CVD apparatus
04/08/1999WO1999017335A1 Dual face shower head electrode for a magnetron plasma generating apparatus
04/08/1999WO1999017334A1 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
04/08/1999WO1999017333A1 Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process
04/08/1999WO1999016931A1 Plasma enhanced chemical deposition with low vapor pressure compounds
04/08/1999WO1999016930A1 Method and apparatus for deposition of carbon
04/08/1999WO1999016929A1 Liquid reagent delivery system
04/08/1999WO1999016928A1 Large area microwave plasma apparatus with adaptable applicator
04/08/1999WO1999016927A1 Vacuum coating installation and coupling device
04/08/1999WO1999016926A1 Two-stage sealing system for thermally conductive chuck
04/08/1999WO1999016328A1 Decorative stone
04/08/1999WO1998058097A9 A method of coating edges with diamond-like carbon
04/08/1999DE19754056C1 Production of coated elastomer components for medical use
04/08/1999CA2304613A1 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
04/08/1999CA2304224A1 Large area microwave plasma apparatus with adaptable applicator
04/07/1999EP0906966A2 Process and reactor system for CVD surface coating
04/07/1999EP0906965A2 Silicon nitride from bis (tertiarybutylamino) silane
04/07/1999EP0906636A1 Highly tetrahedral amorphous carbon films and methods for their production
04/07/1999EP0630994B1 Process for vapor-phase diamond synthesis