Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/1999
06/17/1999WO1999029920A1 Multilayered pvd coated cutting tool
06/17/1999WO1999029917A2 Material deposition
06/17/1999WO1999029477A1 Fluorine-doped diamond-like coatings
06/17/1999WO1999029439A1 Photoresist coating process control with solvent vapor sensor
06/17/1999CA2312777A1 Plasma reactor with a deposition shield
06/17/1999CA2312725A1 Material deposition
06/16/1999EP0922647A1 Process for coating elastomer components
06/16/1999EP0922122A1 Plasma cvd system with an array of microwave plasma electrodes and plasma cvd process
06/16/1999EP0922014A1 Unibody crucible and effusion source employing such a crucible
06/16/1999EP0713538B1 Method of rapidly densifying a porous structure
06/16/1999EP0537364B1 Apparatus and method for manufacturing semiconductor device
06/16/1999CN1219760A Apparatus and method for manufacturing semiconductor device
06/16/1999CN1219755A Method for boron contamination reduction in IC fabrication
06/16/1999CN1219614A Method and installation for GaN growth by light radiation-heated metallic organic chemical gas-state deposition
06/16/1999CN1219605A Apparatus for vaporizing and supplying material
06/16/1999CN1219604A Synthesis method of crystalline phase carbonitride film by microwave plasma chemical gas-phase deposition
06/15/1999US5913145 Forming titanium layer on patterned substrate, forming layer of tungsten nitride on titanium layer, annealing to form titanium nitride and tungsten
06/15/1999US5913144 Oxidized diffusion barrier surface for the adherence of copper and method for same
06/15/1999US5913140 Method for reduction of plasma charging damage during chemical vapor deposition
06/15/1999US5913131 Alternative process for BPTEOS/BPSG layer formation
06/15/1999US5912053 Carburizing surface of substrate of tungsten carbide in cobalt matrix to passivate; bonding strength; adhesion
06/15/1999US5912051 Coated cutting insert
06/15/1999US5911834 Gas delivery system
06/15/1999US5911833 Method of in-situ cleaning of a chuck within a plasma chamber
06/15/1999CA2173354C Diamond-coated tools and process for making
06/15/1999CA2146369C Microwave apparatus for depositing thin films
06/10/1999WO1999029146A1 Method and apparatus for monitoring and adjusting chamber impedance
06/10/1999WO1999028962A1 Method for forming plasma films
06/10/1999WO1999028961A1 Process for producing insulating film
06/10/1999WO1999028955A2 Chemical vapor deposition of titanium on a wafer comprising an in-situ precleaning step
06/10/1999WO1999028945A1 A processing chamber and method for confining plasma
06/10/1999WO1999028533A1 Mixed frequency cvd process and apparatus
06/10/1999WO1999028532A1 Vapor source for chemical vapor deposition
06/10/1999WO1999028531A1 Chemical vapor deposition hardware and process
06/10/1999WO1999028530A1 Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning
06/10/1999WO1999028529A1 Silicon based films formed from iodosilane precursors and method of making the same
06/10/1999WO1999028528A1 High rate deposition of amorphous silicon films
06/10/1999WO1999028527A1 Method and apparatus for forming a metal layer
06/10/1999WO1999028526A1 Low resistivity w using b2h6 nucleation step
06/10/1999WO1999028525A1 Substrate processing chamber with tunable impedance
06/10/1999WO1999028524A1 Use of an asymmetric waveform to control ion bombardment during substrate processing
06/10/1999WO1999028522A1 PROCESS FOR PREPARING A LiMO2 TYPE HETEROMETALLIC OXIDE FILM
06/10/1999WO1999028023A1 Method and apparatus for recovering rare gas
06/10/1999DE19854198A1 Substrate plasma processor with processing chamber for the substrate
06/10/1999DE19753092A1 Glass or ceramic cutting wheel with CVD polycrystalline diamond coating
06/09/1999EP0921557A2 Formation of non-homogenous device layer using an inert gas shield
06/09/1999EP0921556A2 Thin film forming apparatus
06/09/1999EP0921210A1 Method of preparing porous nickel-aluminium structures
06/09/1999EP0920542A1 Chemical vapor deposition of fluorocarbon polymer thin films
06/09/1999EP0920435A1 Platinum source compositions for chemical vapor deposition of platinum
06/09/1999EP0779939B1 Process for depositing pyrocarbon coatings in a fluidized bed
06/09/1999CN1218849A Growing method for antimony induced carbon 60 film and carbon 60 film
06/08/1999US5910342 Introducing separately a precursor or activated species formed in different decomposition spaces into the depsotion space where the film is formed on the substrate; quality uniform films for semiconductors, electrophotographic devices
06/08/1999US5910221 Bonded silicon carbide parts in a plasma reactor
06/08/1999US5910219 Can coating system
06/08/1999US5910218 Process chamber, means for depositing dielectric film on substrate, means for annealing film
06/08/1999US5909879 Corrosion resistance
06/03/1999WO1999027580A1 A novel hole-filling technique using cvd aluminum and pvd aluminum integration
06/03/1999WO1999027575A1 Method of forming film by plasma
06/03/1999WO1999027574A1 Method of plasma processing
06/03/1999WO1999027563A1 Rapid thermal processing (rtp) system with gas driven rotating substrate
06/03/1999WO1999027561A2 Stable hydride source compositions for manufacture of semiconductor devices and structures
06/03/1999WO1999027328A1 Liquid level pressure sensor and method
06/03/1999WO1999027158A1 Chemical vapor deposition of levitated objects
06/03/1999WO1999027157A1 Method and apparatus for coating diamond-like carbon onto particles
06/03/1999WO1999027156A1 Plasma polymerization on surface of material
06/03/1999WO1999027155A1 Method for depositing fine-grained alumina coatings on cutting tools
06/03/1999WO1999027154A1 Silicon nitrogen-based films and method of making the same
06/03/1999WO1999027152A1 Substrate edge seal and clamp for low-pressure processing equipment
06/03/1999WO1999027033A1 Diamond-like carbon coatings on inorganic phosphors
06/03/1999WO1999027030A1 Alkane/polyamine solvent compositions for liquid delivery cvd
06/03/1999WO1999026955A1 ANTIMONY/LEWIS BASE ADDUCTS FOR Sb-ION IMPLANTATION AND FORMATION OF ANTIMONIDE FILMS
06/03/1999WO1999026796A1 Plasma processing methods and apparatus
06/02/1999EP0919643A2 Method of forming microcrystalline silicon film, photovoltaic element, and method of producing same
06/02/1999EP0919066A1 Magnetron
06/02/1999EP0918887A1 Co-rotating edge ring extension for use in a semiconductor processing chamber
06/02/1999EP0918586A1 Tool, especially for machining
06/02/1999DE19801612C1 Apparatus for area treatment of workpieces by means of laser beams under vacuum
06/02/1999CN1218427A Diamond coated cutting member and method of making the same
06/02/1999CN1218282A Titanium film forming method
06/01/1999US5909637 Copper adhesion to a diffusion barrier surface and method for same
06/01/1999US5909042 Electrical component having low-leakage current and low polarization fatigue made by UV radiation process
06/01/1999US5908698 Encapsulated electroluminescent phosphor and method for making same
06/01/1999US5908672 Method and apparatus for depositing a planarized passivation layer
06/01/1999US5908671 Thin amorphous films
06/01/1999US5908662 Method and apparatus for reducing particle contamination
06/01/1999US5908602 Apparatus for generation of a linear arc discharge for plasma processing
06/01/1999US5908565 Line plasma vapor phase deposition apparatus and method
06/01/1999US5908508 Gas diffuser plate assembly and RF electrode
06/01/1999US5908507 Chemical vapor deposition reactor and method of producing oxide superconductive conductor using the same
06/01/1999US5908504 Method for tuning barrel reactor purge system
05/1999
05/27/1999WO1999026281A1 Uhv-compatible in-situ pre-metallization clean and metallization of semiconductor wafers
05/27/1999WO1999026267A1 A plasma generating apparatus having an electrostatic shield
05/27/1999WO1999025909A1 Epitaxial growth furnace
05/27/1999WO1999025896A1 Method and apparatus for misted deposition of thin films
05/27/1999WO1999025895A1 Method and apparatus for misted deposition of thin films
05/27/1999WO1999025894A1 Low pressure vapor phase deposition of organic thin films
05/27/1999WO1999025893A1 Rotating device for plasma immersion supported treatment of substrates
05/27/1999WO1999025494A1 All-surface biasable and/or temperature-controlled electrostatically-shielded rf plasma source
05/27/1999WO1999014390A3 Method for sputter coating surfaces
1 ... 593 594 595 596 597 598 599 600 601 602 603 604 605 606 607 608 609 610 611 612 613 ... 719