| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/20/1999 | US5926736 Forming barrier layer within hole, forming metal plug, forming cap layer over plug, heating so that metal in hole flows to eliminate void |
| 07/20/1999 | US5926689 Process for reducing circuit damage during PECVD in single wafer PECVD system |
| 07/20/1999 | US5926402 Simulation method with respect to trace object that event occurs in proportion to probability and computer program product for causing computer system to perform the simulation |
| 07/20/1999 | US5925429 Pyrolytic boron nitride container, and manufacture thereof |
| 07/20/1999 | US5925422 Diamond coating on carbon and diffusion |
| 07/20/1999 | US5925421 Laser irradiation method |
| 07/20/1999 | US5925413 Method of depositing a polycrystalline diamond layer on a nitride substrate |
| 07/20/1999 | US5925412 Bernex chemical vapor deposition; hardness, wear resistance, smoothness, nonporous |
| 07/20/1999 | US5925411 Vapor deposition of films on semiconductors |
| 07/20/1999 | US5925189 Liquid phosphorous precursor delivery apparatus |
| 07/20/1999 | US5925188 Film forming apparatus |
| 07/20/1999 | US5925167 Flowing exhaust gas from vapor deposition chamber into duct having three-way valve selectively adjusted to direct different fractions of gas to treatment/collection/exhaust points |
| 07/20/1999 | US5924447 Ultra high purity gas distribution component with integral valved coupling and methods for its use |
| 07/15/1999 | WO1999035684A1 Semiconductor device having insulating film of fluorine-added carbon film and method of producing the same |
| 07/15/1999 | WO1999035675A1 Method for forming titanium film by cvd |
| 07/15/1999 | WO1999035311A1 In situ growth of oxide and silicon layers |
| 07/15/1999 | WO1999035304A1 Pcvd apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 07/15/1999 | WO1999035303A1 Razor steel alloy |
| 07/15/1999 | WO1999035302A1 Coaxial resonant multiport microwave applicator for an ecr plasma source |
| 07/15/1999 | WO1999035297A1 Laser phase transformation and ion implantation in metals |
| 07/15/1999 | WO1999022878A3 Method for corrosion-resistant coating of metal substrates by means of plasma polymerisation |
| 07/15/1999 | DE4027472A1 Mfg. ultra-hard, dual band, antireflective coating for IR windows |
| 07/15/1999 | DE19840236A1 Tungsten silicide film formation on single crystal silicon or polysilicon in semiconductor device production |
| 07/15/1999 | DE19808163C1 Airlock system for transfer chamber of vacuum coating installation |
| 07/14/1999 | EP0929093A2 Plasma processor for large workpieces |
| 07/14/1999 | EP0928498A1 Method for producing a titanium monophosphide layer and its use |
| 07/14/1999 | EP0838084A4 Multilayer high vertical aspect ratio thin film structures |
| 07/14/1999 | EP0832311B1 Process for plasma enhanced anneal of titanium nitride |
| 07/14/1999 | CN1223009A Method of growing nitride semiconductors, nitride semiconductor substrate and nitride semiconductor device |
| 07/13/1999 | US5924012 From organometallic compounds |
| 07/13/1999 | US5923429 Apparatus for monitoring in-situ the thickness of a film during film deposition and a method thereof |
| 07/13/1999 | US5922418 Method of forming a DLC film over the inner surface of guide bush |
| 07/13/1999 | US5922405 Efficient and economical chemical vapor deposition for large scale production |
| 07/13/1999 | US5922133 Multiple edge deposition exclusion rings |
| 07/13/1999 | US5922100 Precision burners for oxidizing halide-free silicon-containing compounds |
| 07/13/1999 | US5921559 Sealing structure for an airtight chamber |
| 07/13/1999 | CA2054258C Process for the manufacture of a refractory composite material protected against corrosion |
| 07/08/1999 | WO1999034431A1 Method of producing silicon oxide film, method of manufacturing semiconductor device, semiconductor device, display, and infrared irradiating device |
| 07/08/1999 | WO1999034424A1 Precleaning step prior to metallization for sub-quarter micron application |
| 07/07/1999 | EP0928020A2 Deposition of planarizing phosphosilicate glass dielectric |
| 07/07/1999 | EP0928015A2 Method of preventing boron penetration |
| 07/07/1999 | EP0928014A2 An apparatus for manufacturing a semiconductor material |
| 07/07/1999 | EP0927706A2 Coating composition for glass |
| 07/07/1999 | EP0753082B1 Pcvd process and device for coating domed substrates |
| 07/07/1999 | EP0723600B1 Process for the preparation of silicon carbide films using single organosilicon compounds |
| 07/07/1999 | CN1221979A Method for forming conductive layer using atomic layer deposition process |
| 07/07/1999 | CN1221806A Method of combination laser chemistry for gas phase depositing diamond film |
| 07/07/1999 | CN1043988C Method for coating glass substrates |
| 07/06/1999 | US5920760 Coated hard alloy blade member |
| 07/06/1999 | US5919531 Chemical vapor deposition includes introducing into a deposition chamber: (i) a substrate; (ii) a source precursor in the vapor state; and (iii) at least one carrier gas |
| 07/06/1999 | US5919522 Growth of BaSrTiO3 using polyamine-based precursors |
| 07/06/1999 | US5919382 Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
| 07/06/1999 | US5919332 Plasma processing apparatus |
| 07/06/1999 | US5919328 Blood collection tube assembly |
| 07/06/1999 | US5919310 Continuously film-forming apparatus provided with improved gas gate means |
| 07/01/1999 | WO1999033087A1 Focus rings and methods therefor |
| 07/01/1999 | WO1999032686A1 Gas trap for cvd apparatus |
| 07/01/1999 | WO1999032685A1 Method for selectively depositing bismuth based ferroelectric films |
| 07/01/1999 | WO1999032684A1 Method for deposition of ferroelectric thin films |
| 06/30/1999 | EP0926259A2 Reactor for chemical vapour phase deposition |
| 06/30/1999 | EP0926109A1 SiC COMPOSITE AND METHOD OF PRODUCTION THEREOF |
| 06/30/1999 | EP0925383A1 Process for coating substrates with a silicium-containing protective layer by chemical vapour deposition |
| 06/30/1999 | EP0793735B1 Packing element, in particular for shutting-off and regulating means, and process for producing the same |
| 06/30/1999 | CN1221460A Temp. controlling method and apparatus for plasma processing chamber |
| 06/29/1999 | US5916820 Thin film forming method and apparatus |
| 06/29/1999 | US5916634 Refractory based thin film useful for diffusion barrier and micromachining applications |
| 06/29/1999 | US5916633 Fabrication of carbon/carbon composites by forced flow-thermal gradient chemical vapor infiltration |
| 06/29/1999 | US5916626 HMDS supplying apparatus |
| 06/29/1999 | US5916456 Diamond treatment for passivating stress surface defects |
| 06/29/1999 | US5916378 Method of reducing metal contamination during semiconductor processing in a reactor having metal components |
| 06/29/1999 | US5916369 Gas inlets for wafer processing chamber |
| 06/29/1999 | US5916365 Sequential chemical vapor deposition |
| 06/29/1999 | US5916359 Alkane and polyamine solvent compositions for liquid delivery chemical vapor deposition |
| 06/24/1999 | WO1999031306A1 Growth of very uniform silicon carbide epitaxial layers |
| 06/24/1999 | WO1999031292A1 Coated cemented carbide cutting tool and method of coating it with diamond |
| 06/24/1999 | WO1999031013A1 Chemical vapor deposition system for polycrystalline silicon rod production |
| 06/24/1999 | WO1999020086A3 Process for forming adherent coatings using plasma processing |
| 06/24/1999 | WO1999013545A3 Vaporization and deposition apparatus and process |
| 06/24/1999 | DE19757150A1 Low pressure device for distribution of gas over surface of workpiece |
| 06/24/1999 | DE19752889C1 Coating surfaces with indium-tin oxide while being argon ion bombarded to allow low temperature coating |
| 06/23/1999 | EP0924317A1 Corrosion-resistant member and a producing process thereof |
| 06/23/1999 | CN1220759A Process for manufacturing optical data storage disk stamper |
| 06/23/1999 | CN1220484A Method of forming microcrystalline sillicon film, photovoltaic element, and method of producing same |
| 06/23/1999 | CA2257513A1 Reactor for chemical vapour phase deposition |
| 06/22/1999 | US5915200 Film forming method and semiconductor device manufacturing method |
| 06/22/1999 | US5915162 High speed cutting tool |
| 06/22/1999 | US5914568 For processing a target substrate |
| 06/22/1999 | US5914050 Purged lower liner |
| 06/22/1999 | US5914001 In-situ etch of CVD chamber |
| 06/22/1999 | US5914000 Apparatus for manufacturing semiconductor device and method of removing silicon oxidation film |
| 06/22/1999 | US5913978 Apparatus and method for regulating pressure in two chambers |
| 06/22/1999 | US5913721 Ventilation hood with enhanced particle control and method of using |
| 06/17/1999 | WO1999030353A1 Surface modification of semiconductors using electromagnetic radiation |
| 06/17/1999 | WO1999030347A1 Method and device for improving surfaces |
| 06/17/1999 | WO1999029926A1 Process for low temperature cvd using bi amides |
| 06/17/1999 | WO1999029925A1 Process for low temperature cvd using bi carboxylates |
| 06/17/1999 | WO1999029924A1 Method for coating inner surfaces of equipment |
| 06/17/1999 | WO1999029923A1 Plasma reactor with a deposition shield |
| 06/17/1999 | WO1999029922A1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 06/17/1999 | WO1999029921A1 Multilayered pvd coated cutting tool |