| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/10/1999 | US5935662 Unwinding of plastic film in the presence of a plasma |
| 08/10/1999 | US5935649 Vapor depositing a dielectric inorganic film for a semiconductor integrated circuit comprising tetraethyl silicate, hexafluorocarbon, and oxygen in presence of helium or argon inert gas |
| 08/10/1999 | US5935648 Vapor depositing film of molybdenum nitride onto heated substrate from molybdenum pentachloride and anhydrous ammonia source gases; high energy density storage capacitors for low voltage applications |
| 08/10/1999 | US5935647 Method of manufacturing an injector for chemical vapor deposition processing |
| 08/10/1999 | US5935641 Method of forming a piezoelectric layer with improved texture |
| 08/10/1999 | US5935454 Forming condensates at prescribed positions on a substrate and dry etching the substrate using the condensates thus formed as an etching mask |
| 08/10/1999 | US5935396 Method for depositing metal |
| 08/10/1999 | US5935391 Disposing rod-like and ring-like electrodes in vacuum container; tube to be processed is disposed continuous to ring-like electrode and predetermined vacuum is set; electric power and magnetic field are applied to supply plasma to tube |
| 08/10/1999 | US5935374 Electronic device fabrication apparatus |
| 08/10/1999 | US5935373 Plasma processing apparatus |
| 08/10/1999 | US5935351 Method for making a high temperature, high pressure, erosion and corrosion resistant composite structure |
| 08/10/1999 | US5935340 Method and apparatus for gettering fluorine from chamber material surfaces |
| 08/10/1999 | US5935338 Chemical vapor deposition chamber |
| 08/10/1999 | US5935337 Thin-film vapor deposition apparatus |
| 08/10/1999 | US5935336 Apparatus to increase gas residence time in a reactor |
| 08/10/1999 | US5935335 Film-forming apparatus and film-forming method |
| 08/10/1999 | US5935323 Articles with diamond coating formed thereon by vapor-phase synthesis |
| 08/10/1999 | US5935283 Clog-resistant entry structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system |
| 08/10/1999 | US5934856 Multi-chamber treatment system |
| 08/10/1999 | US5934321 Valve unit for water mixing valve |
| 08/10/1999 | CA2261394A1 Double wall reaction chamber glassware |
| 08/05/1999 | WO1999039183A1 Increasing the sensitivity of an in-situ particle monitor |
| 08/05/1999 | WO1999039144A1 Wafer carrier and semiconductor apparatus for processing a semiconductor substrate |
| 08/05/1999 | WO1999023691A3 Improved low mass wafer support system |
| 08/05/1999 | DE19803278A1 Workpiece carrier and installation for treatment and/or coating of workpieces |
| 08/05/1999 | CA2319636A1 Wafer carrier and semiconductor apparatus for processing a semiconductor substrate |
| 08/04/1999 | EP0933806A1 Method for cleaning plasma treatment device and method for plasma treatment |
| 08/04/1999 | EP0933803A1 Method of plasma treatment |
| 08/04/1999 | EP0933451A1 Film forming apparatus and method of forming a crystalline silicon film |
| 08/04/1999 | EP0933445A1 Method and apparatus for CVD coating of workpieces |
| 08/04/1999 | EP0933403A2 Blue interference pigments |
| 08/04/1999 | EP0933340A2 Process for the deposition of a metallic nitride layer on a transparent substrate |
| 08/04/1999 | EP0933120A1 Exhaust gas treatment installation |
| 08/04/1999 | EP0821744B1 Vapour phase chemical infiltration process for densifying porous substrates disposed in annular stacks |
| 08/04/1999 | EP0800489B1 Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
| 08/04/1999 | CN1224773A Method for supplying gas for epitaxial growth and its apparatus |
| 08/03/1999 | US5932905 Article comprising a capacitor with non-perovskite Sr-Ba-Ti oxide dielectric thin film |
| 08/03/1999 | US5932302 Method for fabricating with ultrasonic vibration a carbon coating |
| 08/03/1999 | US5932295 Method and apparatus for misted liquid source deposition of thin films with increased yield |
| 08/03/1999 | US5932294 This invention relates, generally, to apparatus used in the manufacture of components in the compound semiconductor and related industries. |
| 08/03/1999 | US5932286 Deposition of silicon nitride thin films |
| 08/03/1999 | US5932281 Method of manufacturing bi-layered ferroelectric thin film |
| 08/03/1999 | US5932014 Apparatus for producing semiconductor device |
| 08/03/1999 | US5932013 Apparatus for cleaning a semiconductor processing tool |
| 08/03/1999 | CA2092756C Plasma cvd method and apparatus therefor |
| 07/29/1999 | WO1999038202A1 Deposition of a siloxane containing polymer |
| 07/29/1999 | WO1999037655A1 Tantalum amide precursors for deposition of tantalum nitride on a substrate |
| 07/29/1999 | WO1999037437A1 Diamond cutting tool |
| 07/29/1999 | WO1999019537A9 Dual frequency excitation of plasma for film deposition |
| 07/29/1999 | DE19802506A1 Production of barrier layers for gaseous and/or liquid materials, especially hydrocarbons, oxygen and water vapor, on plastic substrates |
| 07/29/1999 | DE19802333A1 Forming barrier layers for gaseous or liquid substances on plastics substrate, useful for packaging material |
| 07/28/1999 | EP0932188A2 Glass formation on a semi-conductor wafer |
| 07/28/1999 | EP0931861A1 Method and apparatus for feeding a gas for epitaxial growth |
| 07/28/1999 | EP0931853A2 Method of depositing barrier coatings by plasma assisted chemical vapour deposition |
| 07/28/1999 | EP0931261A1 Improvements in or relating to sensors |
| 07/28/1999 | EP0931178A1 Composite body, production process and use |
| 07/28/1999 | EP0931177A1 Post treated diamond coated body |
| 07/28/1999 | EP0931176A1 Improved plasma jet system |
| 07/28/1999 | EP0931175A1 Conveyor and delivery device |
| 07/28/1999 | EP0792572B1 An apparatus for generation of a linear arc discharge for plasma processing |
| 07/28/1999 | CN1224085A Superhigh vacuum chemical vapor phase deposition epitoxy system |
| 07/28/1999 | CN1224077A Process for etching diamond film pattern with reactive ion beam |
| 07/28/1999 | CN1224073A Method for forming PZT thin film using seed layer |
| 07/28/1999 | CN1044336C Method and apparatus for control of deposition on base material in paticle fluid bed |
| 07/27/1999 | US5930673 Method for forming a metal contact |
| 07/27/1999 | US5930671 CVD titanium silicide for contract hole plugs |
| 07/27/1999 | US5930661 Substrate clamp design for minimizing substrate to clamp sticking during thermal processing of thermally flowable layers |
| 07/27/1999 | US5930657 Method of depositing an amorphous silicon film by APCVD |
| 07/27/1999 | US5930584 To fabricate electrodes for capacitor dielectrics of semiconductors |
| 07/27/1999 | US5929570 Micro-wave plasma device with a metal cooling wire wrapped around the insulating tube |
| 07/27/1999 | US5929487 Aluminum nitride film |
| 07/27/1999 | US5929267 Trimethyl(ethylcyclopentadienyl)platinum, process for producing the same and process for producing platinum-containing films with the use of the same |
| 07/27/1999 | US5928799 High temperature, high pressure, erosion and corrosion resistant composite structure |
| 07/27/1999 | US5928732 Method of forming silicon oxy-nitride films by plasma-enhanced chemical vapor deposition |
| 07/27/1999 | US5928725 Supplying an aluminum source gas to the passages with the coating gas flow rate to atleast two of the passages controlled to a different rate to deposit the coating of desired thickness on the internal surface of each passage |
| 07/27/1999 | US5928528 Plasma treatment method and plasma treatment system |
| 07/27/1999 | US5928428 Apparatus and method for manufacturing a semiconductor device |
| 07/27/1999 | US5928427 Apparatus for low pressure chemical vapor deposition |
| 07/27/1999 | US5928426 Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors |
| 07/27/1999 | US5927994 Method for manufacturing thin film |
| 07/27/1999 | US5927727 Sealing element, particularly for shut-off and regulating valves, and process for its production |
| 07/27/1999 | CA2077981C Blood collection tube assembly |
| 07/22/1999 | WO1999036955A1 Plasma annealing of substrates to improve adhesion |
| 07/22/1999 | WO1999036951A1 Method of eliminating edge effect in chemical vapor deposition of a metal |
| 07/22/1999 | WO1999036931A2 Low ceiling temperature process for a plasma reactor with heated source of a polymer-hardening precursor material |
| 07/22/1999 | WO1999036589A1 Method of cleaning a cvd cold-wall chamber and exhaust lines |
| 07/22/1999 | WO1999036588A1 Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
| 07/22/1999 | WO1999036587A1 Vertical plasma enhanced process apparatus and method |
| 07/22/1999 | WO1999036586A1 Apparatus and method for plasma enhanced chemical vapor deposition (pecvd) in a single wafer reactor |
| 07/22/1999 | WO1999036585A1 Free floating shield and semiconductor processing system |
| 07/22/1999 | WO1999036186A1 Spinning disk evaporator |
| 07/22/1999 | WO1999029917A3 Material deposition |
| 07/22/1999 | DE19802131A1 Production of a monocrystalline layer for semiconductor device |
| 07/22/1999 | CA2318147A1 Free floating shield and semiconductor processing system |
| 07/21/1999 | EP0930642A1 Apparatus and method for plasma-treating of a substrate |
| 07/21/1999 | EP0930378A1 Method of processing of CVD diamond coatings |
| 07/21/1999 | EP0930377A1 Bonding diamond to substrate |
| 07/21/1999 | EP0930376A1 Method of processing substrate |
| 07/20/1999 | US5926743 Process for chlorine trifluoride chamber cleaning |
| 07/20/1999 | US5926737 Use of TiCl4 etchback process during integrated CVD-Ti/TiN wafer processing |