| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/01/1999 | EP0938634A2 Gas panel |
| 09/01/1999 | EP0938596A1 Apparatus for reducing polymer deposition on substrate support |
| 09/01/1999 | EP0871557B1 Method of producing metal quantum dots |
| 08/31/1999 | US5946587 Continuous forming method for functional deposited films |
| 08/31/1999 | US5946542 Multilayer element with passivation layer on semiconductor wafer, insulation layer and using plasma deposition chamber using nitrogen, oxygen and silicon wafers |
| 08/31/1999 | US5945354 Method for reducing particles deposited onto a semiconductor wafer during plasma processing |
| 08/31/1999 | US5945353 Plasma processing method |
| 08/31/1999 | US5945207 Cutter and process of making a cutter a coating including an innermost layer of tic.sub.x n.sub.y o.sub.z with columnar grains |
| 08/31/1999 | US5945177 Plasma vapor deposition using pulsed microwave power at or above threshold value at which plasma having reduced microwave permeability is ignited, for halogen lamps, thermal, optical and mechanical properties |
| 08/31/1999 | US5945162 Method and device for introducing precursors into chamber for chemical vapor deposition |
| 08/31/1999 | US5945155 Low dielectric constant amorphous fluorinated carbon and method of preparation |
| 08/31/1999 | US5945153 Non-irritating antimicrobial coating for medical implants and a process for preparing same |
| 08/31/1999 | US5944940 Wafer transfer system and method of using the same |
| 08/31/1999 | US5944902 Plasma source for HDP-CVD chamber |
| 08/31/1999 | US5944900 Protective gas shield for chemical vapor deposition apparatus |
| 08/31/1999 | US5944573 Method for manufacture of field emission array |
| 08/31/1999 | US5944422 Apparatus for measuring the processing temperature of workpieces particularly semiconductor wafers |
| 08/31/1999 | CA2136207C Pyrolytic deposition in a fluidized bed |
| 08/31/1999 | CA2015126C Process for depositing a ceramic coating on a filament |
| 08/26/1999 | WO1999043026A1 Method and apparatus for improving gap-fill capability using chemical and physical etchbacks |
| 08/26/1999 | WO1999043018A1 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 08/26/1999 | WO1999043017A1 Rf powered plasma enhanced chemical vapor deposition reactor and methods |
| 08/26/1999 | WO1999042637A1 Method and device for coating a substrate, and coated substrate |
| 08/26/1999 | WO1999042636A1 Cvd reactor and use thereof |
| 08/26/1999 | WO1999042635A1 Apparatus and method for depositing a semiconductor material |
| 08/26/1999 | WO1999042282A1 A-site and/or b-site modified pbzrtio3 materials and films |
| 08/26/1999 | WO1999002251A3 Bulk chemical delivery system |
| 08/26/1999 | DE19807086A1 Atmospheric pressure plasma deposition for adhesion promoting, corrosion protective, surface energy modification or mechanical, electrical or optical layers |
| 08/25/1999 | EP0605725B1 Apparatus for introducing gas, and apparatus and method for epitaxial growth |
| 08/24/1999 | US5943601 Depositing group 4a metal underlayer onto substrate; depositing aluminum or aluminum alloy layer which is in electrical contact with metal underlayer |
| 08/24/1999 | US5943571 Method for manufacturing fine structures |
| 08/24/1999 | US5943471 Solid precursor injector apparatus and method |
| 08/24/1999 | US5942769 Low dielectric constant amorphous fluorinated carbon and method of preparation |
| 08/24/1999 | US5942328 For electronic devices |
| 08/24/1999 | US5942318 Comprising fine-grained tungsten carbide-cobalt cemented carbide body and multiple coated layers of titanium carbonitride; useful for finishing operations in milling grey cast iron |
| 08/24/1999 | US5942284 Growth of electroluminescent phosphors by MOCVD |
| 08/24/1999 | US5942282 Method for depositing a titanium film |
| 08/24/1999 | US5942075 Plasma processing apparatus |
| 08/24/1999 | US5942049 Increasing stabilized performance of amorphous silicon based devices produced by highly hydrogen diluted lower temperature plasma deposition |
| 08/24/1999 | US5942041 Non-sticking semi-conductor wafer clamp and method of making same |
| 08/24/1999 | US5942039 Self-cleaning focus ring |
| 08/24/1999 | US5942038 Cooling element for a semiconductor fabrication chamber |
| 08/24/1999 | US5941647 Guide bush and method of forming hard carbon film over the inner surface of the guide bush |
| 08/24/1999 | CA2078612C Optical waveguide with a substantially planar substrate, and process for its production |
| 08/24/1999 | CA2051554C Thin film deposition method |
| 08/19/1999 | WO1999041773A1 Substrate support for a thermal processing chamber |
| 08/19/1999 | WO1999041766A1 Reactor for chemical vapor deposition of titanium |
| 08/19/1999 | WO1999041426A1 Reactor for chemical vapor deposition |
| 08/19/1999 | WO1999041424A2 Reflow chamber and process |
| 08/19/1999 | WO1999041423A2 Plasma processes for depositing low dielectric constant films |
| 08/19/1999 | WO1999029439A8 Photoresist coating process control with solvent vapor sensor |
| 08/19/1999 | WO1999019049A3 Semiconductor manufacturing system with getter safety device |
| 08/18/1999 | EP0936675A2 C-axis oriented thin film ferroelectric transistor memory cell and method of making the same |
| 08/18/1999 | EP0936661A2 Double wall reaction chamber glassware |
| 08/18/1999 | EP0936600A2 Magnetic recording medium, method for producing the same and method for forming film by plasma CVD |
| 08/18/1999 | EP0936284A2 Method and apparatus for producing thin films |
| 08/18/1999 | EP0936283A1 Barrier layer for packaging material and process for its manufacture |
| 08/18/1999 | EP0936282A2 Low-k fluorinated amorphous carbon dielectric and method of making the same |
| 08/18/1999 | EP0935590A1 Densification of a porous structure (ii) |
| 08/18/1999 | EP0935589A1 Transparent substrate provided with at least one reflecting coating and method for obtaining same |
| 08/18/1999 | EP0792385B1 Apparatus for use with cvi/cvd processes |
| 08/18/1999 | CN1226339A Magnetron |
| 08/18/1999 | CN1226079A Method of forming thin film for semiconductor device |
| 08/17/1999 | US5939886 Plasma monitoring and control method and system |
| 08/17/1999 | US5939831 Methods and apparatus for pre-stabilized plasma generation for microwave clean applications |
| 08/17/1999 | US5939333 Nitridating silicon substrate surface in an atmosphere of dimethylhydrazine; depositing a silicon nitride layer on nitridated surface |
| 08/17/1999 | US5939152 Applying direct current voltage in vacuum |
| 08/17/1999 | US5939150 Metallizing patterns on semiconductors and printed circuits; exposure to radiation beam |
| 08/17/1999 | US5939149 Method of forming hydrogen-free diamond like carbon (DLC) films |
| 08/17/1999 | US5939140 Preheating mixed gases of hydrocarbon and hydrogen by heated metal body; carburization; high bonding strength |
| 08/17/1999 | US5939132 Alignment chips positioned in the peripheral part of the semiconductor substrate and method of manufacturing thereof |
| 08/17/1999 | US5938853 For use in producing preforms which can be used to produce optical or acoustic waveguide fibers either directly or through intermediate production of core cane, silicon dioxide |
| 08/17/1999 | US5938852 Cap for vertical furnace |
| 08/17/1999 | US5938851 Exhaust vent assembly for chemical vapor deposition systems |
| 08/17/1999 | US5938850 Single wafer heat treatment apparatus |
| 08/17/1999 | US5938840 Method for vapor phase growth |
| 08/17/1999 | US5938838 VCR head drum coated with diamond-like hard carbon films and the method and apparatus for manufacturing the same |
| 08/17/1999 | CA2108845C Method of making synthetic diamond film |
| 08/12/1999 | WO1999040234A1 Method and apparatus for deposition of three dimensional object |
| 08/12/1999 | DE19904311A1 Carbon-doped silicon oxide thin film to produce an insulating thin film for a semiconductor device |
| 08/12/1999 | DE19839612A1 Plasma generator, esp. for processes such as etching, cleaning and thin film production on semiconducting surfaces |
| 08/12/1999 | DE19804592A1 Pressure system for a reactor chamber used in epitaxial processes, e.g. gas phase epitaxy |
| 08/12/1999 | CA2322803A1 Method and apparatus for deposition of three dimensional object |
| 08/11/1999 | EP0935284A1 CVD of silicon containing film using Si2H6 |
| 08/11/1999 | EP0935283A2 Silicone polymer insulation film on semiconductor substrate and method for forming the film |
| 08/11/1999 | EP0935281A1 Method and device for treating semiconductor with treating gas while substrate is heated |
| 08/11/1999 | EP0935265A2 Thermal spray coated substrate for use in an electrical energy storage device and method |
| 08/11/1999 | EP0935013A1 SiC product and manufacturing method thereof |
| 08/11/1999 | EP0935012A2 Process for producing zinc sulfide |
| 08/11/1999 | EP0934433A1 Method for depositing fluorine doped silicon dioxide films |
| 08/11/1999 | EP0792383A4 Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same |
| 08/11/1999 | CN1225504A Apparatus for forming thin film using microwave and method therefor |
| 08/10/1999 | US5937323 Sequencing of the recipe steps for the optimal low-k HDP-CVD processing |
| 08/10/1999 | US5937316 SiC member and a method of fabricating the same |
| 08/10/1999 | US5937142 Multi-zone illuminator for rapid thermal processing |
| 08/10/1999 | US5936829 Thermally conductive chuck for vacuum processor |
| 08/10/1999 | US5936481 System for impedance matching and power control for apparatus for high frequency plasma treatment |
| 08/10/1999 | US5936413 Method and device for measuring an ion flow in a plasma |
| 08/10/1999 | US5936334 Matrix body impregnated with an alkaline earth compound whose surface is provided with a top coat comprising a high melting point metal, such as particularly tungsten, and scandium. |
| 08/10/1999 | US5935705 Crystalline Six Cy Nz with a direct optical band gap of 3.8 eV |