| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/22/1999 | EP0943699A1 Load-lock device for transferring substrates in and out of a treatment chamber |
| 09/22/1999 | EP0793736B1 Process for preparing micromechanical components having free-standing microstructures or membranes |
| 09/22/1999 | EP0721514B1 Magnetically enhanced multiple capacitive plasma generation apparatus and related method |
| 09/22/1999 | EP0712447B1 Welded susceptor assembly |
| 09/22/1999 | EP0634501B1 Vacuum film forming method |
| 09/22/1999 | CN1229442A Coated cutting insert |
| 09/22/1999 | CN1229266A Manufacturing process for semiconductor device |
| 09/22/1999 | CN1229110A Interference pigments having blue mass tone |
| 09/22/1999 | CN1045218C System for conveying liquid at special speed using supersonic vibrator |
| 09/21/1999 | US5956616 Method of depositing thin films by plasma-enhanced chemical vapor deposition |
| 09/21/1999 | US5956613 Carbon is scavenged by introducing scavenger gases to react with carbon |
| 09/21/1999 | US5956602 Deposition of polycrystal Si film |
| 09/21/1999 | US5955754 Integrated circuits having mixed layered superlattice materials and precursor solutions for use in a process of making the same |
| 09/21/1999 | US5955212 Superhard film-coated member and method of manufacturing the same |
| 09/21/1999 | US5955197 Coating for carbon--carbon composites and method for producing same |
| 09/21/1999 | US5955161 Blood collection tube assembly |
| 09/21/1999 | US5955155 Forming a diamond coated layer on a substrate, with pretreatment, depositing and heat treatment |
| 09/21/1999 | US5955146 Heating alkylmagnesium alkoxide; coating, evaporation, vapor deposition, sublimation, pyrolysis, decomposition |
| 09/21/1999 | US5955139 Automatic film deposition control |
| 09/21/1999 | US5955037 Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| 09/21/1999 | US5954911 Semiconductor processing using vapor mixtures |
| 09/21/1999 | US5954887 Using a gas consisting essentially of ticl.sub.4 as a cleaning gas for removing a unnecessary portion of the ti film sticking to a process chamber in the film forming apparatus. |
| 09/21/1999 | US5954881 Ceiling arrangement for an epitaxial growth reactor |
| 09/16/1999 | WO1999046804A1 Thermal cycling module |
| 09/16/1999 | WO1999046417A1 Silicon steel sheet and method for producing the same |
| 09/16/1999 | WO1999030353A9 Surface modification of semiconductors using electromagnetic radiation |
| 09/16/1999 | WO1999029477A9 Fluorine-doped diamond-like coatings |
| 09/16/1999 | WO1999028955A3 Chemical vapor deposition of titanium on a wafer comprising an in-situ precleaning step |
| 09/16/1999 | WO1999023276A8 Long life high temperature process chamber |
| 09/15/1999 | EP0942473A2 Process for forming a microcrystalline silicon series thin film and apparatus suitable for practicing said process |
| 09/15/1999 | EP0942459A1 Method of growing nitride semiconductors, nitride semiconductor substrate and nitride semiconductor device |
| 09/14/1999 | USRE36295 Enables controlled growth of multicomponent metal oxide thin film including high temperature superconducting thin films which are uniform and reproducible using organometallic complexes as metal oxide source |
| 09/14/1999 | US5953634 Method of manufacturing semiconductor device |
| 09/14/1999 | US5953630 Suppression of tungsten film deposition on a semiconductor wafer bevel edge with a halogenide purge gas |
| 09/14/1999 | US5952108 Silicon oxide on a substrate |
| 09/14/1999 | US5952102 Vapor deposition |
| 09/14/1999 | US5952069 Blood collection tube assembly |
| 09/14/1999 | US5952063 Crucible of pyrolytic boron nitride for molecular beam epitaxy |
| 09/14/1999 | US5952060 Comprising interior surface of processing chamber having dimond-like carbon coating; extends durability of processing systems; prevents accumulation of residues; does not generate particulates and seals in impurities |
| 09/14/1999 | US5952047 CVD precursors and film preparation method using the same |
| 09/14/1999 | US5952046 Method for liquid delivery chemical vapor deposition of carbide films on substrates |
| 09/14/1999 | US5951923 Vaporizer apparatus and film deposition apparatus therewith |
| 09/14/1999 | US5951887 Plasma processing apparatus and plasma processing method |
| 09/14/1999 | US5951820 Compound is evaporated, passed through inner tube of heat exchanger to be precipitated, the heat exchanger is heated to re-evaporate compound, and the re-evaporated compound is precipitated in a filling container, cooled |
| 09/14/1999 | US5951791 Plating aluminum and nickel-aluminum in the form of a gaseous organoaluminum compound-onto preform, reactive sintering; controlled porosity |
| 09/14/1999 | US5951787 Polishing surface of ferrite-based stainless steel; baking in inert gas to remove moisture; heat treating to form chromium oxide that is free from iron oxide on the outermost surface |
| 09/14/1999 | US5951776 Positioning substrate in chemical reactor; lifting cycles |
| 09/14/1999 | US5951775 Apparatus for full wafer deposition |
| 09/14/1999 | US5951774 Cold-wall operated vapor-phase growth system |
| 09/14/1999 | US5951773 Inductively coupled plasma chemical vapor deposition apparatus |
| 09/14/1999 | US5951772 For semiconductors, integrated circuits |
| 09/14/1999 | US5951771 Plasma jet system |
| 09/14/1999 | US5951768 Flame stabilizer for stagnation flow reactor |
| 09/14/1999 | US5950925 Reactant gas ejector head |
| 09/14/1999 | US5950693 Bulk chemical delivery system |
| 09/14/1999 | US5950675 Backflow prevention apparatus for feeding a mixture of gases |
| 09/14/1999 | US5950646 Vapor feed supply system |
| 09/10/1999 | WO1999045585A1 Plasma processing apparatus and plasma processing method |
| 09/10/1999 | WO1999045578A1 Uniform heat trace and secondary containment for delivery lines for processing system |
| 09/10/1999 | WO1999045577A1 Prevention of ground fault interrupts in a semiconductor processing system |
| 09/10/1999 | WO1999045567A1 Method and apparatus for predicting plasma-process surface profiles |
| 09/10/1999 | WO1999045168A1 Plasma cvd method, plasma cvd apparatus, and electrode |
| 09/10/1999 | WO1999045167A1 Method of depositing silicon with high step coverage |
| 09/10/1999 | WO1999045166A1 Vacuum processing apparatus |
| 09/10/1999 | WO1999045165A1 Method of forming phosphosilicate glass having a high wet-etch rate |
| 09/10/1999 | WO1999045164A1 Method of coating and annealing large area glass substrates |
| 09/10/1999 | WO1999044760A1 In situ cleaning of the surface inside a vacuum processing chamber |
| 09/09/1999 | DE19808180A1 Kombinierte Verschleißschutzschicht, Verfahren zur Erzeugung derselben, die damit beschichteten Objekte und deren Verwendung Combination anti-abrasion layer, method of producing the same, the thus-coated objects and the use thereof |
| 09/08/1999 | EP0940845A2 Susceptor for semiconductor manufacturing equipment and process for producing the same |
| 09/08/1999 | EP0940839A2 Etching or coating devices |
| 09/08/1999 | EP0940378A1 Ceramic articles having a conductive surface and method for manufacturing the same |
| 09/08/1999 | CN1228067A Method of depositing tin oxide and titanium oxide coating on flat glass and resulting coated glass |
| 09/08/1999 | CN1227968A Susceptor for semiconductor manufacturing equipment and process for producing the same |
| 09/08/1999 | CN1045015C Dents for reed in high-speed weaving machine, and method of manufacturing same |
| 09/07/1999 | US5950083 Method for fabricating CMOS transistor with self-aligned silicide (salicide) structure |
| 09/07/1999 | US5948983 For measuring variations in deposit thickness in a deposit/etch chamber |
| 09/07/1999 | US5948921 Method for the selective hydrogenation of vinyl oxirane to butylene oxide |
| 09/07/1999 | US5948541 Boron and nitrogen containing coating and method for making |
| 09/07/1999 | US5948485 Plasma deposition method and an apparatus therefor |
| 09/07/1999 | US5948467 Enhanced CVD copper adhesion by two-step deposition process |
| 09/07/1999 | US5948379 Plasma-chemical deposition of very fine particles |
| 09/07/1999 | US5948255 Microfabricated particle thin film filter and method of making it |
| 09/07/1999 | US5948224 Method of controlling a treatment process and vacuum treatment apparatus |
| 09/07/1999 | US5948169 Apparatus for preventing particle deposition in a capacitance diaphragm gauge |
| 09/07/1999 | US5948168 Distributed microwave plasma reactor for semiconductor processing |
| 09/07/1999 | US5948166 Process and apparatus for depositing a carbon-rich coating on a moving substrate |
| 09/07/1999 | US5948165 Electrostatic chucking mechanism |
| 09/02/1999 | WO1999044221A1 A seal member and a vacuum chamber |
| 09/02/1999 | WO1999044219A1 Low pressure inductively coupled high density plasma reactor |
| 09/02/1999 | WO1999043875A1 Epitaxial growth apparatus |
| 09/02/1999 | WO1999043874A1 Ceiling arrangement for an epitaxial growth reactor |
| 09/02/1999 | WO1999043867A1 Deposition of copper with increased adhesion |
| 09/02/1999 | WO1999043866A1 Liquid vaporizer systems and methods for their use |
| 09/02/1999 | WO1999043865A1 Combination antiabrasion layer |
| 09/02/1999 | WO1999043445A1 Passivating a gas vessel and article produced |
| 09/02/1999 | DE19824440C1 Production of gold-containing pigments |
| 09/01/1999 | EP0939145A1 Continuous gas saturation system and method |
| 09/01/1999 | EP0939144A2 Surface-coated object |
| 09/01/1999 | EP0938741A1 Vacuum plasma processor having coil whth intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| 09/01/1999 | EP0938740A1 Particle controlling method and plasma processing chamber |