Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/1999
10/19/1999US5968273 Wafer stage for manufacturing a semiconductor device
10/19/1999US5967755 Product with a metallic basic body and method for manufacturing a product
10/14/1999WO1999052126A1 Direct temperature control for a component of a substrate processing chamber
10/14/1999WO1999052125A1 Method and device for specifically manipulating and depositing particles
10/14/1999WO1999051797A1 A method and a device for epitaxial growth of objects by chemical vapour deposition
10/14/1999WO1999051473A1 Wiper blade rubber with a protective layer
10/14/1999WO1999051471A1 Method for coating a rubber wiper blade
10/14/1999DE19815677A1 Coated hard metal, cermet, steel, ceramic or metal alloy composite body e.g. a cutting tool such as a throwaway drill bit or cutter tip
10/13/1999EP0949352A1 Plasma CVD apparatus
10/13/1999EP0949351A1 Process for depositing magnesia
10/13/1999EP0949200A1 Method for forming conformal diamond-type carbon coatings, hard diamond-type carbon coating and porous filtration element using the same
10/13/1999EP0948807A1 Integrated circuit electrode structure and process for fabricating same
10/13/1999EP0948664A1 Liquid vaporizer system and method
10/13/1999EP0948661A1 Low friction coating
10/13/1999EP0948660A1 An article having a superalloy substrate and an enrichment layer placed thereon, and methods of its manufacturing
10/13/1999EP0948571A1 Gloss pigment based on reduced titanium dioxide-coated silicon dioxide platelets
10/13/1999CN1231510A Method for eliminating pin-hole on silicon nitride protective layer
10/13/1999CN1231502A Growth system and technology for uniformly growing film on semiconductor chip
10/12/1999US5966627 Method of integrated circuit fabrication
10/12/1999US5966499 System for delivering a substantially constant vapor flow to a chemical process reactor
10/12/1999US5965267 Method for producing encapsulated nanoparticles and carbon nanotubes using catalytic disproportionation of carbon monoxide and the nanoencapsulates and nanotubes formed thereby
10/12/1999US5965219 Misted deposition method with applied UV radiation
10/12/1999US5965217 Inserting an auxiliary electrode in the bore of the cylinder (bushing, bearing, piston reciprocate) and producing a plasma around it to form intermediate films and the diamondlike carbon film; adhesion; uniformity; wear resistance
10/12/1999US5965216 A radio frequency plasma chemical vapor deposition of diamondlike carbon films (dlc) using helium mixed with the hydrocarbon gas to effect cooling at high pressure; high refractive indices; high deposition rates
10/12/1999US5965212 Method of producing metal quantum dots
10/12/1999US5965203 Method for depositing a silicon oxide layer
10/12/1999US5965034 High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and the plasma are balanced
10/12/1999US5964948 Exhaust insert for barrel-type epitaxial reactors
10/12/1999US5964947 Removable pumping channel liners within a chemical vapor deposition chamber
10/12/1999US5964943 Method of producing boron-doped monocrystalline silicon carbide
10/12/1999US5964254 Delivery system and manifold
10/07/1999WO1999050899A1 Method for forming film
10/07/1999WO1999050886A1 Contamination controlling method and plasma processing chamber
10/07/1999WO1999050606A1 Substrate support for a thermal processing chamber
10/07/1999WO1999050475A1 A high temperature ceramic heater assembly with rf capability
10/07/1999WO1999050474A1 Chamber for reducing contamination during chemical vapor deposition
10/07/1999WO1999050473A1 Multi-ledge substrate support for a thermal processing chamber
10/07/1999WO1999049991A1 Container with material coating having barrier effect and method and apparatus for making same
10/07/1999DE19830842C1 Deposition apparatus, e.g., for CVD of metal oxide ceramics in the semiconductor industry
10/07/1999DE19829281C1 Hollow cylinder with reduced heat radiation for holding a substrate
10/07/1999DE19824040C1 Coating system especially for coating silicon wafers, particularly for plasma-enhanced CVD in solar cell production
10/07/1999DE19814871A1 Verfahren und Vorrichtung zur gezielten Teilchenmanipulierung und -deposition Method and device for particle manipulation and targeted -deposition
10/07/1999DE19814805A1 Beschichtungsverfahren eines Wischergummis Coating process of a rubber wiper
10/07/1999DE19814804A1 Wischergummi mit einer Schutzschicht Wiper rubber with a protective layer
10/07/1999DE19813523A1 CVD reactor having temperature-controlled fluid inlet unit
10/07/1999DE19756523A1 PECVD of layers on nonmetallic substrates e.g. of plastics, elastomers, glass, ceramics or silicon
10/07/1999CA2326052A1 Method for forming film
10/06/1999EP0947604A1 Method and apparatus for reforming a substrate surface
10/06/1999EP0947603A2 Film depositing method and apparatus
10/06/1999EP0946959A1 Diamond surfaces
10/06/1999EP0946783A1 Semiconducting devices and method of making thereof
10/06/1999EP0946782A1 Chemical vapor deposition apparatus
10/06/1999EP0946779A1 Process and device for coating the internal face of metal buildings components
10/06/1999EP0946461A1 Densification of substrates arranged in ring-shaped stacks by chemical infiltration in vapour phase with temperature gradient
10/06/1999EP0946459A1 Method for chemical vapour infiltration of refractory substances, especially carbon and silicon carbide
10/06/1999EP0946436A1 Organometallics for lightwave optical circuit applications
10/06/1999EP0946407A1 Device and method for the storage, transportation and production of active fluorine
10/05/1999US5963840 Methods for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions
10/05/1999US5963836 Methods for minimizing as-deposited stress in tungsten silicide films
10/05/1999US5963834 Method for forming a CVD film
10/05/1999US5963833 Method for cleaning semiconductor wafers and
10/05/1999US5963828 Method for tungsten nucleation from WF6 using titanium as a reducing agent
10/05/1999US5963336 Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use
10/05/1999US5962716 Methods for preparing ruthenium and osmium compounds
10/05/1999US5962194 Selectively irradiating a selected region of the deposited first film to be etched with light to modify a portion of the thickness of the first film to be etched to thereby form a first protective film; photoetching
10/05/1999US5962085 Misted precursor deposition apparatus and method with improved mist and mist flow
10/05/1999US5962084 Taking an emission spectrum of said plasma of said mixed gas; and adjusting a ratio of said metal halide and hydrogen in said mixed gas based on said emission spectrum.
10/05/1999US5962083 Methods of depositing films on polymer substrates
10/05/1999US5962071 Diamond coated body and method of its production
10/05/1999US5962065 Method of forming polysilicon having a desired surface roughness
10/05/1999US5961773 Plasma processing apparatus and plasma processing method using the same
10/05/1999US5961726 Deposited film forming apparatus and electrode for use in it
10/05/1999US5961725 Conical baffle for semiconductor furnaces
10/05/1999US5961719 Nucleation of diamond films using an electrode
10/05/1999US5961718 Process for selectively depositing diamond films
10/05/1999US5961361 Method for manufacturing electrode plate for plasma processing device
10/05/1999US5961323 Dual vertical thermal processing furnace
10/05/1999US5960762 For internal combustion engines
10/05/1999US5960555 Method and apparatus for purging the back side of a substrate during chemical vapor processing
09/1999
09/30/1999WO1999049501A2 A high temperature multi-layered alloy heater assembly and related methods
09/30/1999WO1999049102A1 Deposition resistant lining for cvd chamber
09/30/1999WO1999049101A1 Apparatus and method for cvd and thermal processing of semiconductor substrates
09/30/1999WO1999029922A8 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
09/30/1999DE19913123A1 Vapor phase crystal growth of bismuth-strontium-calcium-copper oxide thin film useful as a superconductor material
09/30/1999DE19810969A1 Flowable solids press tooling, especially punches for pressing powder to produce pharmaceutical tablets
09/29/1999EP0944557A1 Method of depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
09/29/1999CN1230015A Semiconductor device manufacturing apparatus and semiconductor device manufacturing method
09/28/1999US5958644 Process to form light-receiving member with outer layer made by alternately forming and etching
09/28/1999US5958569 Wear resistance, fatigue strength
09/28/1999US5958510 Method and apparatus for forming a thin polymer layer on an integrated circuit structure
09/28/1999US5958508 Dielectric with gradiant concentrtaion
09/28/1999US5958265 Substrate holder for a plasma processing system
09/28/1999US5958140 One-by-one type heat-processing apparatus
09/28/1999US5958138 Gas recovery unit
09/28/1999CA2085807C Synthetic diamond wear component and method
09/23/1999WO1999048138A1 Large area uniform laminar gas flow dispenser
09/23/1999WO1999047732A1 Apparatus for moving exhaust tube of barrel reactor
09/23/1999WO1999047728A1 Method and apparatus for deposition and etching of a dielectric layer
09/23/1999WO1999047346A1 Device for moulding flowable solids
09/23/1999DE19837851C1 Apparatus and method for transferring a sample from a reaction vessel into ultrahigh vacuum
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