Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1999
11/03/1999EP0953067A1 A process and apparatus for depositing a carbon-rich coating on a moving substrate
11/03/1999EP0953066A1 Inductively coupled plasma cvd
11/03/1999EP0953065A1 Coated cutting insert
11/03/1999EP0953064A1 Reagent supply vessel for chemical vapor deposition
11/03/1999EP0749352B1 Microfabricated particle filter
11/03/1999EP0734463B1 Gas diffuser plate assembly and rf electrode
11/03/1999CN1234014A Densification of substrate arranged in ring-shaped stacks by chemical infiltration in vapour phase with temp. gradient
11/03/1999CN1046143C Technology for proparing diamond membrane by hot-cathode glow PCVD
11/02/1999USRE36371 Method of forming polycrystalline silicon film in process of manufacturing LCD
11/02/1999US5977526 Heater for high vacuum optical view port
11/02/1999US5977519 Heating element with a diamond sealing material
11/02/1999US5976993 Method for reducing the intrinsic stress of high density plasma films
11/02/1999US5976992 Method of supplying excited oxygen
11/02/1999US5976991 Deposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino) silane
11/02/1999US5976990 Method for optimization of thin film deposition
11/02/1999US5976989 Thin film transistor fabrication method, active matrix substrate fabrication method, and liquid crystal display device
11/02/1999US5976976 Method of forming titanium silicide and titanium by chemical vapor deposition
11/02/1999US5976969 Multilayer; forming aperture in dielectric; coating with refractory; overcoating with aluminum
11/02/1999US5976900 Cleaning the chemical reactor; pretreating with glass; vapor deposition
11/02/1999US5976716 Substrate with a superhard coating containing boron and nitrogen and method of making the same
11/02/1999US5976637 Dielectric over metal
11/02/1999US5976624 Process for producing bismuth compounds, and bismuth compounds
11/02/1999US5976623 Vapor deposition
11/02/1999US5976328 Pattern forming method using charged particle beam process and charged particle beam processing system
11/02/1999US5976261 Multi-zone gas injection apparatus and method for microelectronics manufacturing equipment
11/02/1999US5976260 Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus
11/02/1999US5976259 Semiconductor device, manufacturing method, and system
11/02/1999US5976258 High temperature substrate transfer module
11/02/1999US5976257 Apparatus for continuously forming a large area deposited film by means of microwave plasma CVD process
11/02/1999US5976206 Method of making white diamond film
11/02/1999US5975912 Low temperature plasma-enhanced formation of integrated circuits
11/02/1999US5975014 Coaxial resonant multi-port microwave applicator for an ECR plasma source
11/02/1999US5975011 Apparatus for fabricating spherical shaped semiconductor integrated circuits
10/1999
10/28/1999WO1999054908A1 Crystalline gas distributor for semiconductor plasma etch chamber
10/28/1999WO1999054525A2 Method for producing metallized substrate materials
10/28/1999WO1999054522A1 Method of passivating a cvd chamber
10/28/1999WO1999054521A2 Method and apparatus for modifying the profile of high-aspect-ratio gaps using differential plasma power
10/28/1999WO1999054060A2 Loading especially metallic or metal-ceramic technical surfaces with a fluoro-organic compound
10/28/1999WO1999041423A3 Plasma processes for depositing low dielectric constant films
10/28/1999WO1999025006A3 Electrostatic chuck having improved gas conduits
10/28/1999DE19818306A1 Pressure swing inert gas purging of vessels and pipework
10/28/1999DE19817388A1 Metallizing a fluoropolymer substrate for forming conductor structures or a plasma etching mask on a circuit substrate
10/27/1999EP0952156A2 Aluminium complex derivatives for chemical vacuum evaporation and the method of producing the same
10/27/1999EP0952128A1 An anti-corrosion ceramic member
10/27/1999EP0951580A1 Coating for components and process for producing the same
10/27/1999EP0951394A1 Passivation of ink-jet printheads
10/27/1999EP0828867A4 Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities
10/27/1999EP0573639B1 Coating composition for glass
10/26/1999US5973785 Method of forming light beam, apparatus therefor, method of measuring sizes using the same, method of inspecting appearance, method of measuring height, method of exposure, and method of fabricating semiconductor integrated circuits
10/26/1999US5973447 Gridless ion source for the vacuum processing of materials
10/26/1999US5972790 Depositing titanium onto semiconductor interconnet to form self-aligned titanium silicide structure by plasma-enhanced chemical vapor deposition
10/26/1999US5972511 A stoichiometric vapor deposited coatings boron silicon nitride on low thermal expansion carbon, graphite or ceramic materials; a control process in a gaseous diluent
10/26/1999US5972495 Alumina coated tool and production method thereof
10/26/1999US5972436 Measuring the temperature inside of the body by igniting plasma within the body with atleast one ignition pulse and correlating the time between ignition pulse and pulse of light given off by plasma ignition
10/26/1999US5972430 Digital chemical vapor deposition (CVD) method for forming a multi-component oxide layer
10/26/1999US5972179 Sputtering titanium layer onto silicon surface, chemical vapor deposition of first titanium nitride (tin) layer with good step coverage, sputtering second titanium nitride layer to improve morphology, coating with aluminum contact layer
10/26/1999US5972160 Plasma reactor
10/26/1999US5972117 Method and apparatus for monitoring generation of liquid chemical vapor
10/26/1999US5972116 Method and apparatus for producing a semiconductor device
10/26/1999US5972114 Reduces build-up of metal film deposited on inner surface of process chamber; for manufacturing semiconductro integrated circuits
10/26/1999US5972096 Coating solutions for use in forming bismuth-based ferroelectric thin films
10/26/1999US5970907 Plasma processing apparatus
10/21/1999WO1999053567A1 Three dimensional micromachined electromagnetic device and associated methods
10/21/1999WO1999053540A1 A method of forming a silicon nitride layer on a semiconductor wafer
10/21/1999WO1999053537A1 Method for relaxing stress in blanket tungsten film formed by chemical vapor deposition
10/21/1999WO1999053536A1 Chemical vapor deposition fabrication of hybrid electrodes for ferroelectric device structures
10/21/1999WO1999053533A1 Apparatus for gas processing
10/21/1999WO1999053120A1 Reduced impedance chamber
10/21/1999WO1999053117A2 Film deposition system
10/21/1999WO1999053116A1 Stacked showerhead assembly for delivering gases and rf power to a reaction chamber
10/21/1999WO1999053115A1 Sieve like structure for fluid flow through structural arrangement
10/21/1999WO1999052647A1 Non-planar micro-optical structures
10/21/1999DE19917312A1 Unit for determining position eg. liquid level has magnetostrictive wire led through measurement zone and at least one magnet movable through zone to trigger disturbances in wire
10/21/1999DE19848611A1 Surface treatment solution for substrate, especially metal, e.g. for vapor deposition or plasma coating
10/21/1999DE19848591A1 Surface treatment of substrate containing metal, especially vehicle windscreen or headlamp
10/21/1999CA2332286A1 Sieve like structure for fluid flow through structural arrangement
10/21/1999CA2328708A1 Three dimensional micromachined electromagnetic device and associated methods
10/21/1999CA2328295A1 Film deposition system
10/20/1999EP0951052A2 Bubbler apparatus and condenser for use with the bubbler apparatus
10/20/1999EP0950725A2 Metal-containing barrier layer for packaging material and method for its manufacture
10/20/1999EP0950724A1 Method for producing uniform cylindrical tubes of CVD diamond
10/20/1999EP0950258A1 Method and device for treating a semiconductor surface
10/20/1999EP0950126A1 Cubic boron nitride cutting tool
10/20/1999EP0950125A1 Method for making a diamond-coated member
10/20/1999EP0950124A2 Flash evaporator
10/19/1999US5970384 Nitrogen concentration is increased, dinitrogen monoxide
10/19/1999US5970383 Method of manufacturing a semiconductor device with improved control of deposition layer thickness
10/19/1999US5970327 Liquid crystal display device of an active matrix type, introducing a metallic element capable of accelerating the crystallization of the amorphous silicon film
10/19/1999US5968620 Blood collection tube assembly
10/19/1999US5968611 Vapor deposition of silicon nitride films on a substrate by reaction of haloalkylsilane with nitrogen compound
10/19/1999US5968595 Alumina coating with crystal microstructure and oxide coated cutting tool
10/19/1999US5968594 Reacting with titanium tetraiodide to form titanium nitride; nitriding, vaporization
10/19/1999US5968588 Deposition with liquids and injection estimation and verification by sonic flow method
10/19/1999US5968587 Systems and methods for controlling the temperature of a vapor deposition apparatus
10/19/1999US5968383 Laser processing apparatus having beam expander
10/19/1999US5968379 High temperature ceramic heater assembly with RF capability and related methods
10/19/1999US5968324 Stabilization of plasma enhanced vapor deposition process by adding a flow of inert gas to deposition gases to form thin antireflective film on semiconductor wafer
10/19/1999US5968277 Susceptor apparatus for epitaxial deposition and method for reducing slip formation on semiconductor substrates
10/19/1999US5968276 Heat exchange passage connection
10/19/1999US5968274 Continuous forming method for functional deposited films and deposition apparatus
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