Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1999
11/23/1999US5989733 For turbines, aircraft engines
11/23/1999US5989722 Reduced pressure device and method of making
11/23/1999US5989652 Method of low temperature plasma enhanced chemical vapor deposition of tin film over titanium for use in via level applications
11/23/1999US5989635 High dielectric constant thin film structure, method for forming high dielectric constant thin film and apparatus for forming high dielectric constant thin film
11/23/1999US5989634 Process of manufacturing solid oxygen ion conducting oxide layers
11/23/1999US5989633 Process for overcoming CVD aluminum selectivity loss with warm PVD aluminum
11/23/1999US5989625 Injecting reactive gas with trifluorocarbon groups which bond chemically with the atoms in the surface of substrate
11/23/1999US5989511 Smooth diamond films as low friction, long wear surfaces
11/23/1999US5989346 Semiconductor processing apparatus
11/23/1999US5989345 Process-gas supply apparatus
11/23/1999US5989305 Feeder of a solid organometallic compound
11/23/1999US5988187 Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports
11/23/1999US5988104 Plasma treatment system
11/23/1999US5988103 Apparatus for plasma source ion implantation and deposition for cylindrical surfaces
11/18/1999WO1999059384A1 Processing system with dual ion sources
11/18/1999WO1999059197A1 Multiple step methods for forming conformal layers
11/18/1999WO1999059196A1 Temperature control system for a thermal reactor
11/18/1999WO1999058740A1 Thin film forming method and thin film forming apparatus
11/18/1999WO1999058739A1 Oxygen-argon gas mixture for precleaning in vacuum processing system
11/18/1999WO1999058738A1 Multilayered cvd coated article and process for producing same
11/18/1999WO1999058734A2 Corrosion-resistant multilayer coatings
11/18/1999CA2331383A1 Multilayered cvd coated article and process for producing same
11/17/1999EP0957511A1 Chemical vapor deposition method and chemical vapor deposition apparatus
11/17/1999EP0957185A2 Apparatus for fabrication of thin film
11/17/1999EP0956376A1 A susceptor for a device for epitaxially growing objects and such a device
11/17/1999EP0956373A1 Surface alloyed high temperature alloys
11/17/1999EP0956142A1 Liquid cooled trap patent application
11/17/1999CN1235647A Method and apparatus for depositing carbon-rich coating on moving substate
11/17/1999CN1235646A Coating for components and production thereof
11/17/1999CN1235367A Film forming apparatus and method of forming crystalline silicon film
11/17/1999CN1235207A Apparatus and process for controlled atmosphere chemical vapor deposition
11/17/1999CN1235206A Process for selective growth of diamond film by nano crystal introduction
11/16/1999US5986857 Thin film magnetic head including adhesion enhancing interlayers, and upper and lower gap insulative layers having different hydrogen contents and internal stress states
11/16/1999US5986329 Deposition of super thin PECVD SiO2 in multiple deposition station system
11/16/1999US5985770 Method of depositing silicon oxides
11/16/1999US5985451 Thermoplastic elastomer substrate and diamond-like carbon coating layer; follows deformation; wear resistant protective coating; brake cylinders
11/16/1999US5985427 Coated carbide alloy cutting member exhibiting excellent resistance against chipping
11/16/1999US5985378 Exciting gas; inclining linear array to uniformly coat
11/16/1999US5985375 Method for pulsed-plasma enhanced vapor deposition
11/16/1999US5985358 Reacting strontium, barium, and/or calcium with rare earth element and group vi gases to form intermetallic; dehydrating transport gas; decomposition by water; light emitters
11/16/1999US5985356 Screening
11/16/1999US5985328 Micromachined porous membranes with bulk support
11/16/1999US5985164 Method for forming a filter
11/16/1999US5985091 Microwave plasma processing apparatus and microwave plasma processing method
11/16/1999US5985033 Apparatus and method for delivering a gas
11/16/1999US5985032 Semiconductor manufacturing apparatus
11/16/1999US5984905 Non-irritating antimicrobial coating for medical implants and a process for preparing same
11/16/1999US5983906 Substrate processing apparatus with gas delivery, heaters, plasma system, vacuum and controllling
11/11/1999WO1999057758A1 A two-step borophosphosilicate glass deposition process and related devices and apparatus
11/11/1999WO1999057747A1 Cvd apparatus and process for depositing titanium films
11/11/1999WO1999057343A1 Injector for reactor
11/11/1999WO1999057331A1 Microchamber
11/11/1999WO1999057330A1 Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition
11/11/1999WO1999057329A1 A sub-atmospheric chemical vapor deposition system with dopant bypass
11/10/1999EP0955665A2 Plasma chemical vapor deposition apparatus
11/10/1999EP0955642A2 Formation of thin films resistors
11/10/1999EP0955393A1 Method of multifunctional surface treatment, and device for implementing same
11/10/1999EP0955392A1 Precision replication by chemical vapor deposition
11/10/1999EP0955278A2 Method and apparatus for producing free-standing silicon carbide articles
11/10/1999EP0954948A1 Model based temperature controller for semiconductor thermal processors
11/10/1999EP0954622A1 Composite body and production process
11/10/1999EP0954621A1 Method and apparatus for reducing deposition of material in the exhaust pipe of a reaction furnace
11/10/1999EP0954620A1 Vapor deposition components and corresponding methods
11/10/1999EP0954400A1 Coated cutting insert or cutting insert blank and method for producing coated cutting inserts for chip-removal of metal
11/10/1999EP0954366A1 Inlet structures for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system
11/10/1999CN1234588A Formation of thin-film resistance
11/09/1999US5981899 Capacitively coupled RF-plasma reactor
11/09/1999US5981388 Reducing titanium chloride with activated hydrogen on the surface of the substrate a metal film is formed; corrosion resistance, smoothness and uniformity
11/09/1999US5981387 Supplying a first source gas for silicon and second gas for metal on to a substrate positioning in a reaction chamber while maintaining constant flow rate of first source gas and varying flow rate of metal source gas to form silicide
11/09/1999US5981366 Forming a tunnel oxide layer used for writing information on a silicon substrate, forming polysilicon layer on oxide, forming tungsten silicide layer over polysilicon using tungsten fluoride and silane dichloride gas, patterning
11/09/1999US5981295 Ampule with integral filter
11/09/1999US5981081 Wear resistance, corrosion resistance
11/09/1999US5981078 Wear resistance; cutting tools
11/09/1999US5981060 Decorative member
11/09/1999US5981057 Diamond
11/09/1999US5981001 Processing method for selectively irradiating a surface in presence of a reactive gas to cause etching
11/09/1999US5981000 Method for fabricating a thermally stable diamond-like carbon film
11/09/1999US5980988 Alumina coated cutting tool
11/09/1999US5980983 Depositing a mixture of metal beta-diketonates in presence of oxygen, vaporizing to form high-purity inorganic oxide layer; electrical resistance, high transparency to light
11/09/1999US5980978 Reacting a grignard reagent with a metal halide in an amine solvent
11/09/1999US5980687 Plasma processing apparatus comprising a compensating-process-gas supply means in synchronism with a rotating magnetic field
11/09/1999US5979188 Method of fabricating a planar waveguide structure
11/04/1999WO1999056309A1 Protective member for inner surface of chamber and plasma processing apparatus
11/04/1999WO1999056307A1 Improved heater for use in substrate processing apparatus to deposit tungsten
11/04/1999WO1999056057A1 Fluid storage and dispensing system
11/04/1999WO1999055934A1 Energy transfer system and method for thermal processing applications
11/04/1999WO1999055933A1 Film growth system and method for spherical-shaped semiconductor integrated circuits
11/04/1999WO1999055931A1 Low pressure purging method
11/04/1999WO1999055712A1 Group ii mocvd source reagents, and method of forming group ii metal-containing films utilizing same
11/04/1999WO1999055526A1 LOW λ DIELECTRIC INORGANIC/ORGANIC HYBRID FILMS AND METHOD OF MAKING
11/04/1999WO1999055472A1 Device and method for alternating pressure flushing
11/04/1999WO1999055471A1 Process for the preparation of uv protective coatings by plasma-enhanced deposition
11/04/1999WO1999055466A1 Method and apparatus for thin film deposition on large area substrates
11/04/1999WO1999055188A1 Ornamental stones
11/04/1999CA2330040A1 Low kappa dielectric inorganic/organic hybrid films and method of making
11/04/1999CA2328975A1 Process for the preparation of uv protective coatings by plasma-enhanced deposition
11/04/1999CA2296702A1 Ornamental stones
11/03/1999EP0953659A2 Apparatus for thin film growth
11/03/1999EP0953214A1 Semiconductor having large volume fraction of intermediate range order material
11/03/1999EP0953204A1 Capacitively coupled rf-plasma reactor