Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/1999
12/28/1999US6008143 Metal organic chemical vapor deposition apparatus and deposition method
12/28/1999US6007909 Useful for machining, e.g., turning, milling and drilling, of metal and alloys; insert is provided with at least one wear resistant layer free of cooling cracks
12/28/1999US6007878 Depositing the inorganic dielectric film on the substrate in plasma chamber; depositing the recording layer on the inorganic dielectric film
12/28/1999US6007871 Method of surface treatment for a fishing tackle part made of alloy steel containing chrome
12/28/1999US6007683 Hybrid deposition of thin film solid oxide fuel cells and electrolyzers
12/28/1999US6007675 Wafer transfer system and method of using the same
12/28/1999US6007635 Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing
12/28/1999US6007634 Decomposing gaseous metal carbonyls, e.g., nickel tetracarbonyl, and depositing the metal, e.g., nickel, on a mandrel; maintaining the mandrel at a predetermined temperature by using the heat transfer fluid flow; leakage
12/28/1999US6007633 Single-substrate-processing apparatus in semiconductor processing system
12/28/1999US6007624 Process for controlling autodoping during epitaxial silicon deposition
12/28/1999US6007330 Liquid precursor delivery system
12/28/1999US6006701 Vaporizer in a liquid material vaporizing and feeding apparatus
12/28/1999US6006694 Plasma reactor with a deposition shield
12/23/1999WO1999066769A1 Plasma processor
12/23/1999WO1999066532A1 Cleaning process end point determination using throttle valve position
12/23/1999WO1999066351A1 Method of organic film deposition
12/23/1999WO1999066286A1 Ellipsometric method and control device for making a thin-layered component
12/23/1999WO1999066101A1 Dual channel gas distribution plate
12/23/1999WO1999066096A1 Method and device for producing a powder aerosol and use thereof
12/23/1999WO1999065821A1 Free-standing and aligned carbon nanotubes and synthesis thereof
12/23/1999DE19848444A1 Method of forming a selective metal layer to fill contact hole in manufacture of semiconductor capacitor
12/23/1999DE19827587A1 Double-magnetron sputtering unit for large area reactive plasma-enhanced deposition of e.g. light absorbing layers on metal strips for solar absorbers or heat reflective layers on window glass
12/23/1999DE19826681A1 Gas-absorbent nonvolatile getter material thin films for high vacuum production or gas storage
12/23/1999DE19826550A1 Verfahren und Vorrichtung zum Erzeugen eines Pulveraerosols Method and apparatus for generating an aerosol powder
12/23/1999CA2335449A1 Free-standing and aligned carbon nanotubes and synthesis thereof
12/22/1999EP0966029A1 Method of producing silicon oxide film, method of manufacturing semiconductor device, semiconductor device, display, and infrared irradiating device
12/22/1999EP0965664A1 Method of producing semiconductor thin film and method of producing solar cell using same
12/22/1999EP0965655A2 High density plasma CVD for making dielectric anti-reflective coatings
12/22/1999EP0964741A1 Arrangement and method for improving vacuum in a very high vacuum system
12/22/1999CN1239320A Method of forming selective metal layer and method of forming capacitor and filling contact hole using the same
12/22/1999CN1239155A Deposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino) silane
12/21/1999US6005226 Rapid thermal processing (RTP) system with gas driven rotating substrate
12/21/1999US6005127 Antimony/Lewis base adducts for Sb-ion implantation and formation of antimonide films
12/21/1999US6004885 Thin film formation on semiconductor wafer
12/21/1999US6004877 Nitriding; high speed thermal annealing
12/21/1999US6004872 Vapor depositing titanium using high frequency plasma of low density; reacting with silicon substrate to form titanium silicide; siliciding; etching
12/21/1999US6004632 Method for increasing etch removal rate of silicon oxynitride
12/21/1999US6004618 Intense blue light, chemical vapor deposition.
12/21/1999US6004617 Combinatorial synthesis of novel materials
12/21/1999US6004392 Ferroelectric capacitor and manufacturing the same using bismuth layered oxides
12/21/1999CA2082432C Microwave plasma assisted gas jet deposition of thin film materials
12/21/1999CA2071582C Device and unit for coating cap-shaped substrates
12/16/1999WO1999065057A1 Gas distribution system
12/16/1999WO1999065056A1 Chamber having improved process monitoring window
12/16/1999WO1999064780A1 Chemical delivery system having purge system utilizing multiple purge techniques
12/16/1999WO1999064645A1 A method and apparatus for the formation of dielectric layers
12/16/1999WO1999064644A1 Ion energy attenuation
12/16/1999WO1999064643A1 A method and apparatus for forming a ti doped ta205 layer
12/16/1999WO1999054525A3 Method for producing metallized substrate materials
12/16/1999WO1997034320A9 Method and apparatus for fabricating silicon dioxide and silicon glass layers in integrated circuits
12/16/1999DE19825100A1 Mittel zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten Means for preparing water-repellent coatings on optical substrates
12/16/1999DE19603093C2 Stabförmige Elektrode mit einer Korrosionsschutzschicht und Verfahren zur Herstellung derselben Rod-shaped electrode with a corrosion protective layer and method of making same
12/15/1999EP0964441A2 Deposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino)silane
12/15/1999EP0964083A2 Method and apparatus for growing a compound semiconductor layer
12/15/1999EP0964077A2 A metallic article having a thermal barrier coating and a method of application thereof
12/15/1999EP0964075A1 Metal organic gas scrubber
12/15/1999EP0964043A1 Method for making long-life electroluminescent phosphor
12/15/1999EP0963459A2 Wafer support system
12/15/1999EP0963458A1 Process for low temperature cvd using bi-carboxylates
12/15/1999EP0963456A1 Multilayered pvd coated cutting tool
12/15/1999EP0963455A1 A coating comprising layers of diamond like carbon and diamond like nanocomposite compositions
12/15/1999EP0873343A4 Metal complex source reagents for chemical vapor deposition
12/15/1999EP0830708B1 Plasma processing system with reduced particle contamination
12/15/1999EP0792571B1 Method and device for measuring ion flow in a plasma
12/15/1999EP0504424B1 Hard material clad with diamond, throwaway chip, and method of making said material and chip
12/15/1999CN1047408C Laser chemical gas-phase deposition process of diamond film
12/14/1999US6002176 Differential copper deposition on integrated circuit surfaces
12/14/1999US6002109 System and method for thermal processing of a semiconductor substrate
12/14/1999US6002101 Method of manufacturing a semiconductor device by using a homogenized rectangular laser beam
12/14/1999US6001747 Process to improve adhesion of cap layers in integrated circuits
12/14/1999US6001746 Method of forming an undoped silicate glass layer on a semiconductor wafer
12/14/1999US6001728 Method and apparatus for improving film stability of halogen-doped silicon oxide films
12/14/1999US6001480 Amorphous hard carbon film and mechanical parts coated therewith
12/14/1999US6001432 Apparatus for forming films on a substrate
12/14/1999US6001431 Process for fabricating a magnetic recording medium
12/14/1999US6001429 Plasma enhanced vapor deposition, plasma polymerization or plasma treatment of barrier materials onto the interiors of containers, silica coating
12/14/1999US6001420 Filling high aspect ratio vias, holes and contacts in a substrate by deposition of a metal interconnect layer.
12/14/1999US6001419 Chemical vapor infiltration method with variable infiltration parameters
12/14/1999US6001267 Plasma enchanced chemical method
12/14/1999US6001224 Enhanced reactive DC sputtering system
12/14/1999US6001183 Wafer carriers for epitaxial growth processes
12/14/1999US6001172 Apparatus and method for the in-situ generation of dopants
12/14/1999CA2107242C An evaporation system for gas jet deposition on thin film materials
12/14/1999CA2048470C Plasma processing apparatus having an electrode enclosing the space between cathode and anode
12/14/1999CA2044543C Multi-layer superhard film structure
12/14/1999CA1340849C Preparation of superconducting oxides and oxide-metal composites
12/09/1999WO1999063593A1 Plasma treatment for ex-situ contact fill
12/09/1999WO1999063590A1 A method for treating a deposited film for resistivity reduction
12/09/1999WO1999063586A1 Plasma processing apparatus
12/09/1999WO1999063129A1 Method for applying a coating system to surfaces
12/09/1999WO1999063008A1 Method for producing a pigment containing gold
12/09/1999DE19922161A1 Anti-adhesion coating for e.g. soldering/welding tools and electric contacts
12/09/1999DE19825572A1 Hard metal, cermet, ceramic or steel tool especially a throwaway cutter tip for machining metal
12/09/1999DE19822904A1 Process for applying a lubricant layer to a surface of a stop plate using an adhesion promoter
12/08/1999EP0962957A2 Light-emitting displays
12/08/1999EP0962550A1 Plasma method for depositing surface layers
12/08/1999EP0962549A2 Multiple source plasma deposition apparatus
12/08/1999EP0962548A2 Method for deposition of a stressed film
12/08/1999EP0962545A1 Ceramic coating having a low thermal conductivity
12/08/1999EP0962511A1 Method for providing water repellent coatings on optical substrates
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