| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/20/2000 | WO2000003056A1 System and method for reducing particles in epitaxial reactors |
| 01/20/2000 | WO2000002824A1 Heating a substrate support in a substrate handling chamber |
| 01/20/2000 | WO2000002674A1 Cleaning process for rapid thermal processing system |
| 01/20/2000 | DE19933213A1 Apparatus and method for surface treatment of semiconductor substrates, involving collection, detection, analysis and evaluation of infrared (or near infrared) radiation from substrates for purposes of control of treatment conditions |
| 01/19/2000 | EP0972092A1 Multipurpose processing chamber for chemical vapor deposition processes |
| 01/19/2000 | CN1241968A Passivation of ink-jet printheads |
| 01/18/2000 | US6016383 Rapid thermal heating apparatus and method including an infrared camera to measure substrate temperature |
| 01/18/2000 | US6016009 Integrated circuit with tungsten plug containing amorphization layer |
| 01/18/2000 | US6015918 Allyl-derived precursor and synthesis method |
| 01/18/2000 | US6015917 Precursors for liquid delivery chemical vapor deposition |
| 01/18/2000 | US6015762 Plasma CVD method |
| 01/18/2000 | US6015759 Surface modification of semiconductors using electromagnetic radiation |
| 01/18/2000 | US6015614 Cemented carbide body with high wear resistance and extra tough behavior |
| 01/18/2000 | US6015599 High vertical aspect ratio thin film structures |
| 01/18/2000 | US6015597 Depositing a diamond like structure onto particles, coupling and placing in an evacuation chamber |
| 01/18/2000 | US6015595 Multiple source deposition plasma apparatus |
| 01/18/2000 | US6015591 Deposition method |
| 01/18/2000 | US6015590 Surface with thin films on substrate of multilayer element with vapor deposition |
| 01/18/2000 | US6015464 Film growth system and method for spherical-shaped semiconductor integrated circuits |
| 01/18/2000 | US6015463 Method and system for trapping contaminants formed during chemical vapor deposition processing of semiconductor wafers |
| 01/18/2000 | US6014979 Sacrificial collar maintained around substrate to add or remove species from process gas |
| 01/18/2000 | CA2053180C Method and apparatus for producing synthetic diamond structures |
| 01/13/2000 | WO2000002241A1 Vapor deposition routes to nanoporous silica |
| 01/13/2000 | WO2000001867A1 Method for synthesizing n-type diamond having low resistance |
| 01/13/2000 | WO2000001615A1 Method and apparatus for the preparation of high purity phosphine or other gas |
| 01/13/2000 | WO1999049501A3 A high temperature multi-layered alloy heater assembly and related methods |
| 01/13/2000 | DE19830402A1 Medium to high frequency PECVD process for functional layer deposition on a moving substrate |
| 01/13/2000 | CA2336770A1 Vapor deposition routes to nanoporous silica |
| 01/12/2000 | EP0970267A1 Susceptor designs for silicon carbide thin films |
| 01/12/2000 | EP0883698B1 METHOD FOR FORMING Ti 1-xAlxN COATINGS |
| 01/12/2000 | CN1241120A Decorative stone |
| 01/12/2000 | CN1240841A High density plasma CVD process for making dielectric anti-reflective coatings |
| 01/12/2000 | CN1240771A Apparatus and method for manufacturing optical fiber preform by MCVD |
| 01/11/2000 | US6014082 Temperature monitoring and calibration system for control of a heated CVD chuck |
| 01/11/2000 | US6013984 Ion energy attenuation method by determining the required number of ion collisions |
| 01/11/2000 | US6013584 Methods and apparatus for forming HDP-CVD PSG film used for advanced pre-metal dielectric layer applications |
| 01/11/2000 | US6013583 Low temperature BPSG deposition process |
| 01/11/2000 | US6013576 Nitriding of titanium and treatment with hydrogen for multilayer film |
| 01/11/2000 | US6013575 Method of selectively depositing a metal film |
| 01/11/2000 | US6013338 CVD apparatus |
| 01/11/2000 | US6013337 Blood collection tube assembly |
| 01/11/2000 | US6013319 Method and apparatus for increasing deposition quality of a chemical vapor deposition system |
| 01/11/2000 | US6013318 Igniting reagent mixture to flame; flowing through plasma torch; coating with thin film metal or metal oxide |
| 01/11/2000 | US6013155 Gas injection system for plasma processing |
| 01/11/2000 | US6013134 Advance integrated chemical vapor deposition (AICVD) for semiconductor devices |
| 01/11/2000 | US6012509 Mechanism and method for holding a substrate on a substrate stage of a substrate treatment apparatus |
| 01/06/2000 | WO2000001012A1 Hydrogenated oxidized silicon carbon material |
| 01/06/2000 | WO2000001007A1 Plasma processing method |
| 01/06/2000 | WO2000001003A1 Device and method for plasma processing |
| 01/06/2000 | WO2000001002A1 Method and apparatus for vacuum processing |
| 01/06/2000 | WO2000000992A2 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
| 01/06/2000 | WO2000000767A1 System for supply of multiple chemicals to a process tool |
| 01/06/2000 | WO2000000664A1 Susceptor for barrel reactor |
| 01/06/2000 | WO2000000663A1 Method and device for displacing wafers in a deposition reactor |
| 01/06/2000 | WO2000000662A1 Material deposition |
| 01/06/2000 | WO2000000497A1 Precursors for growth of heterometal-oxide films by mocvd |
| 01/06/2000 | WO1999054060A3 Loading especially metallic or metal-ceramic technical surfaces with a fluoro-organic compound |
| 01/06/2000 | WO1999053117A3 Film deposition system |
| 01/06/2000 | CA2336342A1 Precursors for growth of heterometal-oxide films by mocvd |
| 01/06/2000 | CA2336116A1 Material deposition |
| 01/05/2000 | EP0969120A2 Method and apparatus for plasma deposition |
| 01/05/2000 | EP0969119A2 Method and device for coating of objects |
| 01/05/2000 | EP0968319A1 Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions |
| 01/05/2000 | EP0968154A1 Method for densifying a porous structure using an aromatic precursor |
| 01/05/2000 | EP0968142A1 Reactive ion etching of silica structures |
| 01/05/2000 | EP0792386A4 Method and apparatus for depositing a substance with temperature control |
| 01/05/2000 | DE19841777C1 Apparatus for plasma-technological precipitation of polycrystalline diamond on substrates with large plane areas |
| 01/05/2000 | CN1240486A Low friction coating |
| 01/05/2000 | CN1240302A Method for producing semiconductor film and the method for producing solar energy cell using said film |
| 01/04/2000 | US6011285 C-axis oriented thin film ferroelectric transistor memory cell and method of making the same |
| 01/04/2000 | US6010969 Method of depositing films on semiconductor devices by using carboxylate complexes |
| 01/04/2000 | US6010940 Methods for fabricating CVD TiN barrier layers for capacitor structures |
| 01/04/2000 | US6010756 Reflection of electromagnetic waves |
| 01/04/2000 | US6010755 Method and apparatus for forming thin films using dual ECR plasma generators |
| 01/04/2000 | US6010749 Process for the production of volatile metal |
| 01/04/2000 | US6010748 Mixture containing oxidizer, carriers |
| 01/04/2000 | US6010744 Dielectric of a capacitor |
| 01/04/2000 | US6009831 Apparatus for low pressure chemical vapor deposition |
| 01/04/2000 | US6009828 Method for forming a thin semiconductor film and a plasma CVD apparatus to be used in the method |
| 01/04/2000 | US6009827 Apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films |
| 12/30/1999 | DE19929312A1 Apparatus and method for manufacturing an optical fiber preform |
| 12/30/1999 | DE19929184A1 Radio frequency plasma enhanced chemical vapor deposition of diamond like films onto medical devices such as catheter wires |
| 12/30/1999 | DE19828843A1 Verfahren zur Herstellung von beschichteten Kurzfasern A process for the production of coated short fibers |
| 12/30/1999 | DE19827803A1 Wear resistant boron nitride layers are produced especially on cutting tools e.g. of titanium boride-based material or nickel-bonded hard metal |
| 12/29/1999 | WO1999067440A2 Substrate support member with a purge gas channel and pumping system |
| 12/29/1999 | WO1999067439A1 Method and device for producing boron nitride films |
| 12/29/1999 | WO1999056057B1 Fluid storage and dispensing system |
| 12/29/1999 | EP0967844A1 Method for ECR plasma deposition of electron emitting carbon layers under the effect of an applied electric field |
| 12/29/1999 | EP0967639A1 CVD/PVD method of filling structures using discontinuous CVD Al liner |
| 12/29/1999 | EP0967633A1 Gas inlets for wafer processing chamber |
| 12/29/1999 | EP0967632A1 Gas inlets for wafer processing chamber |
| 12/29/1999 | EP0967298A2 Electroless metal deposition on silyl hydride functional resin |
| 12/29/1999 | EP0967190A1 Process for producing coated short fibers |
| 12/29/1999 | EP0966553A1 Process for low temperature cvd using bi-amides |
| 12/29/1999 | EP0966552A1 Rotating device for plasma immersion supported treatment of substrates |
| 12/29/1999 | EP0966551A1 Multilayered pvd coated cutting tool |
| 12/29/1999 | EP0966474A1 Novel copper(i) precursors for chemical deposit in gas phase of metallic copper |
| 12/29/1999 | EP0966409A1 Photocatalytically-activated self-cleaning article and method of making same |
| 12/29/1999 | CN1047807C Fluidized bed reactor arrangement for forming metal carbide coating |
| 12/28/1999 | US6008503 Oxide film thickness standards |