| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/10/2000 | WO2000007216A1 A ceramic composition for an apparatus and method for processing a substrate |
| 02/10/2000 | WO2000007215A2 A method of allowing a stable power transmission into a plasma processing chamber |
| 02/10/2000 | WO2000006795A1 Cvd tungsten deposition on oxide substrates |
| 02/10/2000 | WO2000006794A1 Hardcoats for flat panel display substrates |
| 02/10/2000 | WO1999057330A9 Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition |
| 02/10/2000 | DE19932640A1 Photovoltaic module for converting solar radiation into electrical energy, comprises substrate front and back dual layer contacts and at least one solar cell |
| 02/10/2000 | DE19853598A1 Manufacture of thin film by atomic layer deposition |
| 02/10/2000 | DE19835154A1 Apparatus for vacuum coating of substrates, in particular, those with spherical surfaces comprises two vacuum chambers which are located adjacent to one another and have rotating transport arms |
| 02/10/2000 | DE19833718A1 Verfahren zur Verringerung der Partikelabgabe und Partikelaufnahme einer Oberfläche A method for reducing the particle charge and particle of a surface |
| 02/09/2000 | EP0978491A2 Precision burners for oxidizing halide-free, silicon-containing compounds |
| 02/09/2000 | EP0977907A1 Combination antiabrasion layer |
| 02/09/2000 | EP0977906A1 Metered gas control in a substrate processing apparatus |
| 02/09/2000 | EP0787220B1 Packing element, in particular for shutting-off and regulating means, and process for producing the same |
| 02/09/2000 | CN1244186A Method for chemical vapour infiltration of refractory substances especially carbon and silicon carbide |
| 02/09/2000 | CN1244031A Method and apparatus for manufacturing semiconductor layers, and manufacture of photovoltaic solar cell |
| 02/08/2000 | US6023405 Electrostatic chuck with improved erosion resistance |
| 02/08/2000 | US6023025 Electric wire and manufacturing method thereof |
| 02/08/2000 | US6022812 Dielectric polysilicate films by vapor deposition of tetra-alkoxysilane(s) on a substrate; exposing to water and acid or base catalyst to gel; drying; high porosity; low dielectric constant; semiconductors; integrated circuits |
| 02/08/2000 | US6022811 Method of uniform CVD |
| 02/08/2000 | US6022806 Supplying process gases; vapor deposition; rotating wafer |
| 02/08/2000 | US6022622 Hard carbon film-coated substrate and method for fabricating the same |
| 02/08/2000 | US6022602 Plasma modification of lumen surface of tubing |
| 02/08/2000 | US6022595 Passing gaseous reactant through field with sufficient strength to polarize gaseous molecules of gaseous reactant, reacting molecules to deposit film |
| 02/08/2000 | US6022587 Prewafer reaction layer is deposited onto a susceptor placed in reaction chamber to form prewafer reaction layer coated susceptor prior to film deposition, deposition gas is fed into reaction chamber to flow over the prewafer to form film |
| 02/08/2000 | US6022586 Supplying first film-forming gases into process chamber of vessel while heating the chamber so as to form a first pre-coating film on the inner surface of the process vessel, loading semiconductor wafer into chamber, coating |
| 02/08/2000 | US6022460 Enhanced inductively coupled plasma reactor |
| 02/08/2000 | US6022418 Vacuum processing method |
| 02/08/2000 | US6022416 Point-of-use vaporization system and method |
| 02/08/2000 | US6022414 Single body injector and method for delivering gases to a surface |
| 02/08/2000 | US6022413 Thin-film vapor deposition apparatus |
| 02/08/2000 | US6022412 Epitaxial reactor, susceptor and gas-flow system |
| 02/08/2000 | US6021582 Temperature control of parylene dimer |
| 02/08/2000 | CA2192900C Methods of preparing cutting tool substrate materials for deposition of a more adherent diamond coating and products resulting therefrom |
| 02/03/2000 | WO2000005754A1 Semiconductor thin film and thin film device |
| 02/03/2000 | WO2000005753A1 Infra-red transparent thermal reactor cover member |
| 02/03/2000 | WO2000005752A1 Method and apparatus for processing wafers |
| 02/03/2000 | WO2000005751A1 Method and apparatus for reducing contamination of a substrate in a substrate processing system |
| 02/03/2000 | WO2000005431A1 Cvd apparatus |
| 02/03/2000 | WO2000005430A1 Chemical vapor deposition vaporizer |
| 02/03/2000 | WO2000005000A1 Surface coatings |
| 02/03/2000 | WO1999054521A3 Method and apparatus for modifying the profile of high-aspect-ratio gaps using differential plasma power |
| 02/03/2000 | DE19932247A1 Supplying user points with vaporized raw material containing silicon for glass production involves reduction of the gas pressure on the raw material to near zero in each participating vessel |
| 02/03/2000 | DE19834314A1 Application of a scratch resistant coating and an antireflective system onto a plastic substrate, in particular spectacle lenses by consecutive plasma and sputtering methods |
| 02/03/2000 | DE19833448A1 Cleaning a CVD apparatus used for depositing oxide ceramics on semiconductor substrates comprises contacting the residues with an etching medium containing free diketones |
| 02/02/2000 | EP0977249A2 An improved method of forming an arsenic silicon glass film onto a silicon structure |
| 02/02/2000 | EP0977246A2 Production process of semiconductor layer, fabrication process of photovoltaic cell and production apparatus of semiconductor layer |
| 02/02/2000 | EP0976847A2 Apparatus and process for controlled atmosphere chemical vapor deposition |
| 02/02/2000 | EP0976846A1 Thin film forming device for forming silicon thin film having crystallinity |
| 02/02/2000 | EP0975821A1 Cvd reactor and use thereof |
| 02/02/2000 | EP0975820A1 Hard material coating of a cemented carbide or carbide containing cermet substrate |
| 02/02/2000 | EP0975435A1 Modular coating fixture |
| 02/02/2000 | CN2361640Y Reaction chamber for vapor-phase growth of diamond film |
| 02/02/2000 | CN1049018C Diamond-phase carbon tubes and CVD process for their production |
| 02/01/2000 | US6021152 Reflective surface for CVD reactor walls |
| 02/01/2000 | US6020570 Plasma processing apparatus |
| 02/01/2000 | US6020511 Methods, complexes, and systems for forming metal-containing films |
| 02/01/2000 | US6020458 Precursors for making low dielectric constant materials with improved thermal stability |
| 02/01/2000 | US6020253 Decomposition; phosphiding |
| 02/01/2000 | US6020036 Method of forming hard carbon film over the inner surface of guide bush |
| 02/01/2000 | US6020035 Film to tie up loose fluorine in the chamber after a clean process |
| 02/01/2000 | US6019849 A number of air actuated valves are added to a conventional apparatus for treating semiconductor wafers with hexamethyldisilazane vapor to improve the adhesion between the wafers and resist layers. |
| 02/01/2000 | US6019848 Lid assembly for high temperature processing chamber |
| 01/27/2000 | WO2000004576A1 Method and apparatus for plasma processing |
| 01/27/2000 | WO2000004574A1 Improved gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitride |
| 01/27/2000 | WO2000004206A1 Method for depositing pyrolytic coatings on metallic articles |
| 01/27/2000 | WO2000004205A1 High throughput organometallic vapor phase epitaxy (omvpe) apparatus |
| 01/27/2000 | WO1999045167A8 Method of depositing silicon with high step coverage |
| 01/27/2000 | CA2334349A1 High throughput organometallic vapor phase epitaxy (omvpe) apparatus |
| 01/26/2000 | EP0975014A1 Enhanced CVD copper adhesion by two-step deposition process |
| 01/26/2000 | EP0975005A2 Method for controlling plasma-generating high frequency power, and plasma generating apparatus |
| 01/26/2000 | EP0974681A1 Method and apparatus for calibrating the gas pressure in a vacuum working chamber (vacuum coating chamber or recipient) |
| 01/26/2000 | EP0974615A1 Aliphatic polyester film and gas barrier film |
| 01/26/2000 | EP0973957A1 Method of making titania-doped fused silica |
| 01/26/2000 | EP0764221A4 Apparatus for deposition of thin-film, solid state batteries |
| 01/26/2000 | EP0667921B1 Microwave apparatus for depositing thin films |
| 01/26/2000 | EP0649479B1 Method and apparatus for coating a glass substrate |
| 01/26/2000 | CN2360422Y Automatic film coating appts for vapour phase deposition |
| 01/25/2000 | US6018065 Method of fabricating iridium-based materials and structures on substrates, iridium source reagents therefor |
| 01/25/2000 | US6017396 Plasma film forming apparatus that prevents substantial irradiation damage to the substrate |
| 01/25/2000 | US6017395 Gas pressure regulation in vapor deposition |
| 01/25/2000 | US6017144 Method and apparatus for depositing highly oriented and reflective crystalline layers using a low temperature seeding layer |
| 01/25/2000 | US6016766 Microwave plasma processor |
| 01/25/2000 | US6016765 Plasma processing apparatus |
| 01/25/2000 | US6016611 Gas flow control in a substrate processing system |
| 01/20/2000 | WO2000003566A1 Microwave discharge apparatus |
| 01/20/2000 | WO2000003425A1 Plasma process to deposit silicon nitride with high film quality and low hydrogen content |
| 01/20/2000 | WO2000003422A2 Gas flow control in a substrate processing system |
| 01/20/2000 | WO2000003421A2 Improved endpoint detection for substrate fabrication processes |
| 01/20/2000 | WO2000003420A2 Method for forming a copper film on a substrate |
| 01/20/2000 | WO2000003415A1 Rf matching network with distributed outputs |
| 01/20/2000 | WO2000003399A1 Primary target for forming fission products |
| 01/20/2000 | WO2000003169A2 Manifold system of removable components for distribution of fluids |
| 01/20/2000 | WO2000003065A1 Surface treatment apparatus |
| 01/20/2000 | WO2000003064A1 Gas distributor plate for a processing apparatus |
| 01/20/2000 | WO2000003063A1 Liquid precursor for chemical vapor deposition |
| 01/20/2000 | WO2000003062A1 Coated grooving or parting insert |
| 01/20/2000 | WO2000003061A1 Method and apparatus for forming amorphous and polycrystalline silicon germanium alloy films |
| 01/20/2000 | WO2000003060A1 Chemical vapor deposition apparatus employing linear injectors for delivering gaseous chemicals and method |
| 01/20/2000 | WO2000003058A1 Cvd photo resist and deposition |
| 01/20/2000 | WO2000003057A1 Multi-position load lock chamber |