| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/09/2000 | WO2000012447A1 Process for the production of improved boron coatings onto graphite and article obtained in this process |
| 03/09/2000 | DE19934336A1 High temperature silicon carbide semiconductor substrate production and treatment apparatus, especially for silicon carbide epitaxy, has a susceptor completely covered by a cover plate and the substrate |
| 03/09/2000 | DE19921129A1 Titanium nitride film deposition, e.g. on semiconductor wafers, is carried out by CVD from both tetrakis-dimethylamido-titanium and tetrakis-diethylamido-titanium |
| 03/09/2000 | CA2341696A1 Method for applying a coating to a substrate |
| 03/08/2000 | EP0984077A2 Diamond-coated hard metal member |
| 03/08/2000 | EP0984076A1 Apparatus for coating substrates in a vacuum chamber |
| 03/08/2000 | EP0983791A1 Method and apparatus for recovering rare gas |
| 03/08/2000 | EP0763147B1 Method and apparatus for producing thin films |
| 03/08/2000 | CN1050158C Method and apparatus for treating surface |
| 03/07/2000 | US6035101 High temperature multi-layered alloy heater assembly and related methods |
| 03/07/2000 | US6034356 RTP lamp design for oxidation and annealing |
| 03/07/2000 | US6033732 Titanyl bis(dipivaloylmethane) |
| 03/07/2000 | US6033727 Method for strengthening and aging-prevention of TZP by formation of silica/zircon layer on the surface thereof |
| 03/07/2000 | US6033721 Image-based three-axis positioner for laser direct write microchemical reaction |
| 03/07/2000 | US6033533 Method of forming films over inner surface of cylindrical member |
| 03/07/2000 | US6033493 Process for coating a passivatable metal or alloy substrate with an oxide layer, and fuel assembly cladding and guide tubes and spacer grid coated with an oxide layer |
| 03/07/2000 | US6033481 Plasma processing apparatus |
| 03/07/2000 | US6033480 Wafer edge deposition elimination |
| 03/07/2000 | US6033479 Process gas delivery system for CVD having a cleaning subsystem |
| 03/07/2000 | US6032611 Apparatus for forming single-crystalline thin film by beam irradiator and beam reflecting device |
| 03/02/2000 | WO2000011726A1 Method for depositing layers of high quality semiconductor material |
| 03/02/2000 | WO2000011721A1 Electronic devices with barrier film and process for making same |
| 03/02/2000 | WO2000011667A1 Hard disk vapor lube |
| 03/02/2000 | DE19813523C2 CVD-Reaktor und dessen Verwendung CVD reactor and its use |
| 03/01/2000 | EP0982772A1 A semiconductor non-planar storage capacitor |
| 03/01/2000 | EP0982309A2 Volatile organic barium, strontium and calcium compounds and method for the preparation of layered materials with barium, strontium or calcium oxides or fluorides from these compounds |
| 03/01/2000 | EP0981656A1 Low resistivity w using b 2?h 6? |
| 03/01/2000 | EP0981655A2 Chemical vapour deposition precursors |
| 03/01/2000 | EP0981502A1 Method for depositing a coating layer on an optical fibre while it is being drawn and device for its implementation |
| 03/01/2000 | EP0784713A4 Conformal titanium-based films and method for their preparation |
| 03/01/2000 | EP0550630B1 Abrasion wear resistant coated substrate product |
| 03/01/2000 | CN1245835A Hydrogen inhibition method in silicon device with or without ferroelectric clad underlayer |
| 02/29/2000 | US6031211 Zone heating system with feedback control |
| 02/29/2000 | US6031198 Plasma processing method and apparatus |
| 02/29/2000 | US6030902 Apparatus and method for improving uniformity in batch processing of semiconductor wafers |
| 02/29/2000 | US6030900 Process for generating a space in a structure |
| 02/29/2000 | US6030893 Forming a dielectric layer covering the substrate containing a conductive area, patterning and etching the dielectric layer to form a hole in a portion of conductive area, forming conductive layer on dielectric layer to fill the hole |
| 02/29/2000 | US6030881 High throughput chemical vapor deposition process capable of filling high aspect ratio structures |
| 02/29/2000 | US6030666 Method for microwave plasma substrate heating |
| 02/29/2000 | US6030661 Device and a method for epitaxially growing objects by CVD |
| 02/29/2000 | US6030509 Apparatus and method for shielding a wafer holder |
| 02/29/2000 | US6030461 Portable cooling system for use with a semiconductor fabrication system |
| 02/29/2000 | US6030460 Chemical vapor deposition reactor having a support for substrate, and at least one inlet port, a source of ozone gas, a source of organometallic compound, a source of ultraviolet radiation |
| 02/29/2000 | US6030459 Low-pressure processing device |
| 02/29/2000 | US6030457 Substrate processing apparatus |
| 02/29/2000 | US6030456 Installation to supply gas |
| 02/29/2000 | US6030454 Composition and method for forming thin film ferrite layers on a substrate |
| 02/29/2000 | US6029718 Chemical delivery system employing containment crate |
| 02/29/2000 | US6029717 High aspect ratio containers for ultrahigh purity chemicals |
| 02/29/2000 | US6029680 Method for in situ removal of particulate residues resulting from cleaning treatments |
| 02/24/2000 | WO1999061371A8 New class of diamond-based materials and techniques for their synthesis |
| 02/24/2000 | DE19924174A1 Composite material, e.g. high speed milling tool insert, electrical component or wear or heat protective component, comprises a microwave sintered cermet or hard metal with a modified surface layer and a lower density core |
| 02/23/2000 | EP0981171A2 Process for fabricating device comprising lead zirconate titanate |
| 02/23/2000 | EP0980701A1 Gas recovery unit |
| 02/23/2000 | EP0980445A1 Processing insert, and production of same |
| 02/22/2000 | US6028393 E-beam/microwave gas jet PECVD method and apparatus for depositing and/or surface modification of thin film materials |
| 02/22/2000 | US6028014 Controlling selected parameter of the plasma to alter the ratio of molecular oxygen cations to atomic oxygen cations detected in the plasma, then supplying tetraethoxysilane into vapor deposition reactor to coat semiconductor with silica |
| 02/22/2000 | US6028012 Process for forming a gate-quality insulating layer on a silicon carbide substrate |
| 02/22/2000 | US6027826 Method for making ceramic-metal composites and the resulting composites |
| 02/22/2000 | US6027792 Coating film excellent in resistance to halogen-containing gas corrosion and halogen-containing plasma corrosion, laminated structure coated with the same, and method for producing the same |
| 02/22/2000 | US6027766 Annealing the a glass float ribbon having a protective coating of tin and a vapor-deposited overcoating of a titanium dioxide precursor to produce a dimensiaonally-stable oxidation catalyst |
| 02/22/2000 | US6027760 Photoresist coating process control with solvent vapor sensor |
| 02/22/2000 | US6027662 Materials processing by separately generated process medium constituents |
| 02/22/2000 | US6027629 Corrosion resistance; porous and non porous anodizing |
| 02/22/2000 | US6027569 Gas injection systems for a LPCVD furnace |
| 02/22/2000 | US6026764 Apparatus for low pressure chemical vapor deposition |
| 02/22/2000 | US6026762 Apparatus for improved remote microwave plasma source for use with substrate processing systems |
| 02/22/2000 | US6026589 Wafer carrier and semiconductor apparatus for processing a semiconductor substrate |
| 02/22/2000 | CA2195048C Blood collection tube assembly |
| 02/17/2000 | WO2000008681A1 Misted precursor deposition apparatus and method with improved mist and mist flow |
| 02/17/2000 | WO2000008680A1 Vapor growth method for metal oxide dielectric film and vapor growth device for metal oxide dielectric material |
| 02/17/2000 | WO2000008230A1 Copper precursor composition and process for manufacture of microelectronic device structures |
| 02/17/2000 | WO2000008229A1 Esrf chamber cooling system and process |
| 02/17/2000 | WO2000008225A2 Organocopper precursors for chemical vapor deposition |
| 02/17/2000 | WO2000007954A1 Process for coating glass |
| 02/17/2000 | WO2000007950A1 Creating silica soot with a plug-free system |
| 02/17/2000 | WO2000007688A1 Esrf coolant degassing process |
| 02/17/2000 | WO1999041424A3 Reflow chamber and process |
| 02/17/2000 | DE19836652A1 Installation for coating substrates comprises chambers which are arranged one after another at successively lower levels, and are supplied with substrates by means of a gravity conveyor unit |
| 02/17/2000 | CA2339576A1 Creating silica soot with a plug-free system |
| 02/16/2000 | EP0979316A1 Fluidized bed reactor to deposit a material on a surface by chemical vapour deposition, and methods of forming a coated substrate therewith |
| 02/16/2000 | CN1244598A Method for preparing film by using atom layer deposition |
| 02/15/2000 | US6025609 Laser synthesized ceramic electronic devices and circuits and method for making |
| 02/15/2000 | US6025575 Heating apparatus for chemical vapor deposition equipment |
| 02/15/2000 | US6025280 Use of SiD4 for deposition of ultra thin and controllable oxides |
| 02/15/2000 | US6025252 Semiconductor device and method of fabricating the same |
| 02/15/2000 | US6025222 Vapor phase growth of a dielectric film and a fabrication process of a semiconductor device having such a dielectric film |
| 02/15/2000 | US6025115 Selectively irradiating surface of substrate with light in gas atmosphere to form surface-modified layer, annealing to stabilize and make more etch resistant, dry etching non-modified portion |
| 02/15/2000 | US6025076 Vapor phase deposition and cutting edges, patterns and spacings for grooves and patterns |
| 02/15/2000 | US6025013 PICVD process and device for the coating of curved substrates |
| 02/15/2000 | US6024915 Metal base, coating of particles and dispersion |
| 02/15/2000 | US6024844 Enhanced reactive DC sputtering system |
| 02/15/2000 | US6024800 Plasma processing apparatus |
| 02/15/2000 | US6024799 Chemical vapor deposition manifold |
| 02/15/2000 | US6024105 Semiconductor manufacturing device and method of removing particles therefrom |
| 02/15/2000 | US6024044 Dual frequency excitation of plasma for film deposition |
| 02/14/2000 | CA2271282A1 Process for fabricating device comprising lead zirconate titanate |
| 02/10/2000 | WO2000007228A1 Epitaxial growth furnace |
| 02/10/2000 | WO2000007223A2 Method for reducing particle emission or absorption on a surface |
| 02/10/2000 | WO2000007221A2 Holographic, laser-induced fabrication of indium nitride quantum wires and quantum dots |