Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2000
03/23/2000WO2000016388A1 High rate silicon dioxide deposition at low pressures
03/23/2000WO2000016387A1 High rate silicon nitride deposition method at low pressures
03/23/2000WO2000016385A1 Plasma reactor
03/23/2000WO2000016384A1 Apparatus for manufacturing semiconductor device and its manufacturing method
03/23/2000WO2000016380A1 Method and apparatus for cooling substrates
03/23/2000WO2000016377A2 Method for forming a three-component nitride film containing metal and silicon
03/23/2000WO2000016374A1 Device for the plasma deposition of a polycrystalline diamond
03/23/2000WO2000015881A2 Gas feeding system for chemical vapor deposition reactor and method of controlling the same
03/23/2000WO2000015870A1 Wafer processing reactor system with programmable processing parameters and method
03/23/2000WO2000015869A1 Part based on aluminium coated with amorphous hard carbon
03/23/2000WO2000015868A1 High rate silicon deposition method at low pressures
03/23/2000WO2000015866A1 Chemical deposition method using catalyst on surface
03/23/2000WO2000015865A1 Method for growing oxide thin films containing barium and strontium
03/23/2000WO2000015350A1 Reusable mask and method for coating substrate
03/23/2000WO2000003064A9 Gas distributor plate for a processing apparatus
03/23/2000DE19944071A1 Modified microwave plasma-CVD, e.g. of diamond layers on large surfaces such as window panes, involves using one or more separate electron sources for plasma stabilization by electron emission
03/23/2000CA2342930A1 Reusable mask and method for coating substrate
03/22/2000EP0987774A2 An electrode having enhanced hole injection
03/22/2000EP0987745A1 Metallization etching method using a hard mask layer
03/22/2000EP0987346A1 Copper deposition method using a precursor with (alkyloxy) (alkyl)silylolefin ligands
03/22/2000EP0987341A1 Silicon steel sheet and method for producing the same
03/22/2000EP0987270A2 Aluminum compound for forming aluminum films by chemical vapor depositions and their synthesis
03/22/2000EP0754248A4 An improved module in an integrated delivery system for chemical vapors from liquid sources
03/22/2000CN1247907A Method for manufacture of sewing machine and its parts
03/21/2000USRE36623 Performing single and in-situ multiple integrated circuit processing steps, including thermal vapor deposition, plasma-enhanced chemical vapor deposition, reactor self-cleaning, film etchback
03/21/2000US6040052 Magnetic recording medium
03/21/2000US6040022 PECVD of compounds of silicon from silane and nitrogen
03/21/2000US6040021 Vapor deposition process for metal films on substrates with metal halide gas, hydrogen and noble gas with metal halide reduction with hydrogen
03/21/2000US6040012 Process for the preparation by chemical vapor deposition (CVD) of a Ti-A1-N based multilayer coating
03/21/2000US6040011 Vapor deposition of a coating on a substrate, purging
03/21/2000US6040010 Vapor deposition of film on a semiconductor wafers, gas chambers, active gases and delivery
03/21/2000US6039854 Substrate clamp design for minimizing substrate to clamp sticking during thermal processing of thermally flowable layers
03/21/2000US6039836 Focus rings
03/21/2000US6039834 Apparatus and methods for upgraded substrate processing system with microwave plasma source
03/21/2000US6039812 Device for epitaxially growing objects and method for such a growth
03/21/2000US6039811 Apparatus for fabricating polysilicon film for semiconductor device
03/21/2000US6039810 High temperature vapor coating container
03/21/2000US6039809 Method and apparatus for feeding a gas for epitaxial growth
03/21/2000US6039808 CVD apparatus for Cu formation
03/21/2000US6039807 Apparatus for moving exhaust tube of barrel reactor
03/21/2000US6039511 Carrying apparatus for spherical objects
03/21/2000US6038999 Device for the relative vacuum deposition of a material on parts in a loose state
03/16/2000WO2000014778A1 Diffusion barrier layers and methods of forming same
03/16/2000WO2000014365A1 Free-wheeling lock
03/16/2000WO2000014323A1 Textile articles or clothing having super hydrophobic coating
03/16/2000WO2000014310A1 Device for producing and processing semiconductor substrates
03/16/2000WO2000014299A1 Raw materials or blanks having super hydrophobic coating
03/16/2000WO2000014298A1 Articles with hard surfaces having super hydrophobic coating
03/16/2000WO2000014297A1 Modulated plasma glow discharge treatments for making superhydrophobic substrates
03/16/2000WO2000014296A1 Super hydrophobic coated substrates
03/16/2000DE19840238C1 Doped silicon layer, e.g. a metal oxide semiconductor transistor gate electrode or a bipolar transistor connection is produced using a chemical vapor deposition gas containing disilane in addition to monosilane and dopant gas
03/16/2000CA2343160A1 Raw materials or blanks having super hydrophobic coating
03/16/2000CA2343154A1 Articles with hard surfaces having super hydrophobic coating
03/16/2000CA2342617A1 Super hydrophobic coated substrates
03/16/2000CA2342330A1 Textile articles or clothing having super hydrophobic coating
03/16/2000CA2340448A1 Modulated plasma glow discharge treatments for making superhydrophobic substrates
03/15/2000EP0985742A2 Plasma jet chemical vapor deposition system having a plurality of distribution heads
03/15/2000EP0985741A1 Modulated plasma glow discharge treatments for making super hydrophobic substrates
03/15/2000EP0985740A1 Super hydrophobic coated substrates
03/15/2000EP0985060A1 Secondary edge reflector for horizontal reactor
03/15/2000EP0985056A1 Film or coating deposition a substrate
03/15/2000EP0984877A1 Wiper blade rubber with a protective layer
03/15/2000EP0984876A1 Method for coating a rubber wiper blade
03/15/2000EP0865716B1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced
03/15/2000EP0789981A4 Thermal reactor optimization
03/14/2000US6037485 CVD precursors and film preparation method using the same
03/14/2000US6037274 Method for forming insulating film
03/14/2000US6037272 Apparatus and method for low pressure chemical vapor deposition using multiple chambers and vacuum pumps
03/14/2000US6037257 Sputter deposition and annealing of copper alloy metallization
03/14/2000US6037252 Method of titanium nitride contact plug formation
03/14/2000US6037241 Apparatus and method for depositing a semiconductor material
03/14/2000US6037240 Pretreating the substrate, arranging the substrate in a reactor, applying a bias voltage in the form of alternating voltage to the substrate, supplying hydrogen, methane, nitrogen and oxygen gases to the growth substrate
03/14/2000US6037068 Superconducting metal-ceramic laminate
03/14/2000US6037018 Forming shallow trench isolation regions having protective oxide liner layers on the trench walls
03/14/2000US6037017 Method for formation of multilayer film
03/14/2000US6037016 Coating a non-conductive fiber, especially an aramid fiber with diamond-like-carbon
03/14/2000US6037003 Vapor deposition of aluminum oxide from alkylaluminum alkoxide
03/14/2000US6037002 Process for producing thin films of oxide ceramic
03/14/2000US6037001 Method for the chemical vapor deposition of copper-based films
03/14/2000US6036877 Plasma reactor with heated source of a polymer-hardening precursor material
03/14/2000US6036784 Apparatus for holding substrates
03/14/2000US6036783 Liquid material vaporizer apparatus and gas ejection device
03/14/2000US6036782 Shower head
03/14/2000US6036781 Apparatus for guiding air current in a wafer loading chamber for chemical vapor deposition equipment
03/14/2000US6036780 Mechanism for detecting particulate formation and/or failures in the removal of gas from a liquid
03/14/2000US6035804 Process chamber apparatus
03/14/2000US6035803 Method and apparatus for controlling the deposition of a fluorinated carbon film
03/14/2000US6035609 Ultra high purity gas distribution component with integral valved coupling and methods for its use
03/14/2000CA2104591C Composition for coating glass containing an accelerant
03/14/2000CA2048872C Method of forming a nitride or carbonitride layer
03/09/2000WO2000013219A1 Apparatus for plasma processing
03/09/2000WO2000013216A1 Capacitors comprising roughened platinum layers, methods of forming roughened layers of platinum and methods of forming capacitors
03/09/2000WO2000013207A2 Method for forming a metal film
03/09/2000WO2000013202A1 Method and device for surface processing with plasma at atmospheric pressure
03/09/2000WO2000012945A1 Method and apparatus for thermal processing of semiconductor substrates
03/09/2000WO2000012779A1 Methods for preparing ruthenium oxide films
03/09/2000WO2000012778A1 Method for applying a coating to a substrate
03/09/2000WO2000012777A1 Methods for preparing ruthenium metal films
03/09/2000WO2000012776A1 Precursor chemistries for chemical vapor deposition of ruthenium and ruthenium oxide
03/09/2000WO2000012520A1 Methods for preparing ruthenium and osmium compounds
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