| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/12/2000 | EP0992735A2 Control vent system for ultra-high purity delivery system for liquefied compressed gases |
| 04/12/2000 | EP0992611A2 Method for forming film or fabricating semiconductor device |
| 04/12/2000 | EP0992610A2 Barrier coating on plastic substrates and process for its deposition |
| 04/12/2000 | EP0992609A1 Process for depositing a barrier coating on plastic objects |
| 04/12/2000 | EP0992608A1 Light-impermeable, high purity silicon carbide material, a light shielding member for a semiconductor-treating apparatus, and a semiconductor-treating apparatus |
| 04/12/2000 | EP0992607A1 Substrate holder |
| 04/12/2000 | EP0992605A2 Support member, holder, process, and apparatus in the field of surface-treatment |
| 04/12/2000 | EP0992603A1 Thermal barrier coating systems and materials |
| 04/12/2000 | EP0992472A2 Corrosion-resistant members against a chlorine-based gas |
| 04/12/2000 | EP0992281A2 The combinatorial synthesis of novel materials |
| 04/12/2000 | EP0992072A1 Controlled conversion of metal oxyfluorides into superconducting oxides |
| 04/12/2000 | EP0991792A1 Gas injection disc assembly for cvd applications |
| 04/12/2000 | EP0991791A1 Packaging material |
| 04/12/2000 | EP0991337A1 Ornamental stones |
| 04/12/2000 | CN1250587A Model based temperature controller for semiconductor thermal processors |
| 04/12/2000 | CN1250490A Susceptor designs for silicon carbide thin films |
| 04/12/2000 | CN1250486A Plastic containers with an external gas barrier coating |
| 04/12/2000 | CN1051400C Method of forming a dielectric |
| 04/12/2000 | CN1051263C 氧化物涂层切削刀具 Oxide coated cutting tool |
| 04/11/2000 | US6049736 Implantable medical device with electrode lead having improved surface characteristics |
| 04/11/2000 | US6049661 Method of simulating shape of sample after surface reaction processing, apparatus and recording medium |
| 04/11/2000 | US6049131 Device formed by selective deposition of refractory metal of less than 300 Angstroms of thickness |
| 04/11/2000 | US6048793 Method and apparatus for thin film growth |
| 04/11/2000 | US6048792 Method for manufacturing an interconnection structure in a semiconductor device |
| 04/11/2000 | US6048578 Closed loop carbon monoxide self-contained nickel carbonyl deposition process |
| 04/11/2000 | US6048403 Multi-ledge substrate support for a thermal processing chamber |
| 04/11/2000 | US6047744 Delivery system and manifold |
| 04/11/2000 | US6047713 Flowing a cleaning gas into a vacuum chamber, positioning throttle valve so that deposited sufaces of valve are exposed to interior of the chamber, ingiting a plasma of cleaning gas to etch away unwanted film deposited on the throttle valve |
| 04/11/2000 | CA2082853C Process for the production of a thin film optical waveguide of tio2 |
| 04/06/2000 | WO2000019592A1 Dechucking method and apparatus for workpieces in vacuum processors |
| 04/06/2000 | WO2000019508A1 Silicon carbide deposition method and use as a barrier layer and passivation layer |
| 04/06/2000 | WO2000019507A1 Method of plasma-assisted film deposition |
| 04/06/2000 | WO2000019501A1 Method and apparatus for plasma processing |
| 04/06/2000 | WO2000019498A1 In situ deposition of low k si carbide barrier layer, etch stop, and anti-reflective coating for damascene applications |
| 04/06/2000 | WO2000019494A1 Method for manufacturing carbon nanotubes as functional elements of mems devices |
| 04/06/2000 | WO2000019491A1 Method for cleaning a process chamber |
| 04/06/2000 | WO2000019481A2 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 04/06/2000 | WO2000018982A1 Method and apparatus for forming polycrystalline and amorphous silicon films |
| 04/06/2000 | WO2000018981A1 Method for diamond-coating surfaces |
| 04/06/2000 | WO2000018980A1 An in-line sputter deposition system |
| 04/06/2000 | WO2000018518A1 A process for ultra smooth diamond coating on metals and uses thereof |
| 04/05/2000 | EP0990061A1 Method and device for vacuum-coating a substrate |
| 04/05/2000 | EP0990060A1 A method of coating edges with diamond-like carbon |
| 04/05/2000 | EP0990059A1 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices |
| 04/05/2000 | EP0989915A1 Passivating a gas vessel and article produced |
| 04/05/2000 | EP0783596B1 Composite body, use of this composite body and process for its preparation |
| 04/05/2000 | CN1051088C Process for preparing fluoride-bearing organotin compounds |
| 04/04/2000 | US6046439 System and method for thermal processing of a semiconductor substrate |
| 04/04/2000 | US6046364 Regeneration of metal CVD precursors |
| 04/04/2000 | US6046345 Barium strontium β-diketonates, processes for producing the same and processes for producing barium strontium-containing oxide dielectric films with the use of the same |
| 04/04/2000 | US6045916 Coating film and preparation method thereof |
| 04/04/2000 | US6045877 Pyrolytic chemical vapor deposition of silicone films |
| 04/04/2000 | US6045862 CVD film forming method in which a film formation preventing gas is supplied in a direction from a rear surface of an object to be processed |
| 04/04/2000 | US6045671 Systems and methods for the combinatorial synthesis of novel materials |
| 04/04/2000 | US6045667 Process and system for the treatment of substrates using ions from a low-voltage arc discharge |
| 04/04/2000 | US6045665 Efficiently prevents peeling of deposits formed on the surface of the inner walls of the thin-film formation apparatus and suppresses particle production without contaminating the inside of the thin-film forming device |
| 04/04/2000 | US6045619 Horizontal-type silicon-nitride furnace |
| 04/04/2000 | US6045618 Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| 04/04/2000 | US6045617 Method for CVD surface coating and CVD reactor system |
| 04/04/2000 | US6044981 Microfabricated filter with specially constructed channel walls, and containment well and capsule constructed with such filters |
| 04/04/2000 | US6044792 Plasma CVD apparatus |
| 03/30/2000 | WO2000018198A1 Substrate electrode plasma generator and substance/material processing method |
| 03/30/2000 | WO2000017920A1 Plasma processing method |
| 03/30/2000 | WO2000017917A1 Plasma film forming method |
| 03/30/2000 | WO2000017416A1 Composite material coating and a method for the production thereof |
| 03/30/2000 | WO2000017278A1 Method for the chemical vapor deposition of copper-based films and copper source precursors for the same |
| 03/30/2000 | WO1999067440A3 Substrate support member with a purge gas channel and pumping system |
| 03/30/2000 | DE19942303A1 Coated hard metal or cermet, especially for wear protected cutter inserts, has an aluminum oxide and zirconium and/or hafnium oxide layer containing finely dispersed titanium oxide, oxycarbide, oxy nitride or oxy carbonitride |
| 03/30/2000 | DE19844538A1 Verfahren zur Diamant-Beschichtung von Oberflächen A method for diamond coating of surfaces |
| 03/29/2000 | EP0989595A2 Device for processing a surface of a substrate |
| 03/29/2000 | EP0989211A1 Process for obtaining diamond layers by gaseous-phase synthesis |
| 03/29/2000 | EP0989204A1 Process for preparing nitride film |
| 03/29/2000 | EP0989203A1 Cu(hfac)TMVS precursor with water additive to increase the condcuctivity of Cu |
| 03/29/2000 | EP0989133A2 Solution of copper compound for the copper film deposition from chemical vapor deposition and the method of synthesis |
| 03/29/2000 | EP0988407A1 Method for producing coated workpieces, uses and installation for the method |
| 03/29/2000 | EP0988406A1 Method for making a non-sticking diamond like nanocomposite |
| 03/29/2000 | EP0987966A1 Decorative stone |
| 03/29/2000 | CN1249040A Coatings, methods and apparatus for reducing reflection from optical substrates |
| 03/29/2000 | CN1249012A Method of multifunctional surface treatment, and device for implementing same |
| 03/28/2000 | US6043460 System and method for thermal processing of a semiconductor substrate |
| 03/28/2000 | US6043450 Method to compensate for non-uniform film growth during chemical vapor deposition |
| 03/28/2000 | US6043177 Modification of zeolite or molecular sieve membranes using atomic layer controlled chemical vapor deposition |
| 03/28/2000 | US6043167 Method for forming low dielectric constant insulating film |
| 03/28/2000 | US6043149 Method of purifying a metal line in a semiconductor device |
| 03/28/2000 | US6043147 Method of prevention of degradation of low dielectric constant gap-fill material |
| 03/28/2000 | US6043140 Method for growing a nitride compound semiconductor |
| 03/28/2000 | US6042901 Suppling reactant gases of silicon tetrafluoride and silicon hydride in a temperature-controlled gas flow ratio, e,g, temperature of the growing film controlled as a function of the reactant gases ratio; stable moisture-resistant films |
| 03/28/2000 | US6042900 CVD method for forming diamond films |
| 03/28/2000 | US6042887 Chemical vapor deposition using tetraethoxysilane (teos) to form sub-atmospheric undoped silicon glass (sausg) dielectric over semiconductor structure, then etching aperture through dielectric with greater uniformity |
| 03/28/2000 | US6042886 Hot filament chemical vapor deposition (hf-cvd) of a rough diamond layer on a grinding tool |
| 03/28/2000 | US6042758 Precision replication by chemical vapor deposition |
| 03/28/2000 | US6042654 Thermally decomposing chlorine gas to form free radicals; reacting free radicals with said deposits formed inside process chamber on internal components made of quartz, silicon carbide coated graphite, stainless steel; removing by products |
| 03/28/2000 | US6042653 Susceptor for bearing an object to be processed thereon |
| 03/28/2000 | US6042652 Atomic layer deposition apparatus for depositing atomic layer on multiple substrates |
| 03/28/2000 | US6042650 Processing apparatus for fabricating LSI with protected beam damper |
| 03/28/2000 | US6042372 Heat treatment apparatus |
| 03/28/2000 | US6041735 Inductively coupled plasma powder vaporization for fabricating integrated circuits |
| 03/28/2000 | US6041734 Use of an asymmetric waveform to control ion bombardment during substrate processing |
| 03/28/2000 | US6041733 Plasma processing apparatus protected from discharges in association with secondary potentials |
| 03/28/2000 | CA2109198C Primary flow cvd apparatus and method |