| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/27/2000 | US6081034 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 06/27/2000 | US6080970 Wafer heating apparatus |
| 06/27/2000 | US6080679 High-speed soft evacuation process and system |
| 06/27/2000 | US6080665 Integrated nitrogen-treated titanium layer to prevent interaction of titanium and aluminum |
| 06/27/2000 | US6080642 Method of manufacturing a semiconductor device and a device for applying such a method |
| 06/27/2000 | US6080611 Silicon thin film containing impurities |
| 06/27/2000 | US6080592 Computers |
| 06/27/2000 | US6080477 Cutters of cobalt enriched vapor deposited titanium carbonitride on carbide cement |
| 06/27/2000 | US6080470 Hard graphite-like material bonded by diamond-like framework |
| 06/27/2000 | US6080446 Method of depositing titanium nitride thin film and CVD deposition apparatus |
| 06/27/2000 | US6080445 Method of forming films over insulating material |
| 06/27/2000 | US6080444 Placing substrate on susceptor equipped with heating member and situated in chamber, forming film on substrate by heating substrate using heating member while controlling total rate of supplying gas, annealing |
| 06/27/2000 | US6080378 High quality diamond films characterized by their intensity ratio of cathodoluminescence measured at room temperature; chemical vapor deposition on substrates comprising platinum, iridium, nickel, their alloys, silicon or silicides |
| 06/27/2000 | US6080271 Plasma source for generating inductively coupled, plate-shaped plasma, having magnetically permeable core |
| 06/27/2000 | US6080246 Method of aluminising a superalloy |
| 06/27/2000 | US6080241 Chemical vapor deposition chamber having an adjustable flow flange |
| 06/27/2000 | US6079913 Cutting tool, process for coating a cutting tool and use thereof |
| 06/27/2000 | US6079874 Temperature probes for measuring substrate temperature |
| 06/27/2000 | US6079426 Method and apparatus for determining the endpoint in a plasma cleaning process |
| 06/27/2000 | US6079358 Apparatus for forming thin film |
| 06/27/2000 | US6079357 Plasma processing apparatus |
| 06/27/2000 | US6079356 Reactor optimized for chemical vapor deposition of titanium |
| 06/27/2000 | US6079354 Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers |
| 06/27/2000 | US6079353 Chamber for reducing contamination during chemical vapor deposition |
| 06/27/2000 | CA2122562C Inorganic skin film and process for forming the same |
| 06/27/2000 | CA2073651C Non-stoichiometric titanium nitride coating |
| 06/22/2000 | WO2000036877A1 Method and apparatus for temperature control of heater |
| 06/22/2000 | WO2000036640A1 Method of forming thin film |
| 06/22/2000 | WO2000036639A1 Silicon oxynitride film |
| 06/22/2000 | WO2000036631A1 Plasma processing apparatus |
| 06/22/2000 | WO2000036340A1 Burner manifold apparatus for use in a chemical vapor deposition process |
| 06/22/2000 | WO2000036179A2 High temperature chemical vapor deposition chamber |
| 06/22/2000 | WO2000036178A1 Planetary system workpiece support and method for surface treatment of workpieces |
| 06/22/2000 | WO2000035782A2 Distributed control system architecture and method for a material transport system |
| 06/22/2000 | WO2000035605A1 Conformal coating of a microtextured surface |
| 06/22/2000 | WO2000035604A1 Plasma enhanced polymer deposition onto fixtures |
| 06/22/2000 | WO2000035603A1 Plasma enhanced chemical deposition for high and/or low index of refraction polymers |
| 06/22/2000 | WO2000035573A1 Apparatus and method for point-of-use treatment of effluent gas streams |
| 06/22/2000 | CA2355941A1 Burner manifold apparatus for use in a chemical vapor deposition process |
| 06/22/2000 | CA2354624A1 Distributed control system architecture and method for a material transport system |
| 06/21/2000 | EP1010776A1 Caustic process for replacing thermal barrier coatings |
| 06/21/2000 | EP1010775A1 Improved coating for cutting tool used for steel |
| 06/21/2000 | EP1010773A1 Method and apparatus for producing plastic container having carbon film coating |
| 06/21/2000 | EP1010772A1 Method of repairing or manufacturing turbine airfoils |
| 06/21/2000 | EP1010474A2 Preparation of platinium coatings through plasma polymerization |
| 06/21/2000 | EP1009543A1 Application of diamond-like carbon coatings to cobalt-cemented tungsten carbide components |
| 06/21/2000 | DE19912737A1 Production of porous silicon oxide film useful as antireflection coating on glass or transparent plastics, involves using self-shading or atoms and molecules in plasma-enhanced chemical vapor deposition |
| 06/20/2000 | US6078133 Field emission device having an amorphous multi-layered structure |
| 06/20/2000 | US6078059 Fabrication of a thin film transistor and production of a liquid display apparatus |
| 06/20/2000 | US6077791 Method of forming passivation layers using deuterium containing reaction gases |
| 06/20/2000 | US6077781 Single step process for blanket-selective CVD aluminum deposition |
| 06/20/2000 | US6077775 Barrier film of metal ions left behind after annealing of metal halide film |
| 06/20/2000 | US6077764 Process for depositing high deposition rate halogen-doped silicon oxide layer |
| 06/20/2000 | US6077759 Method of producing semiconductor device |
| 06/20/2000 | US6077722 Producing thin film photovoltaic modules with high integrity interconnects and dual layer contacts |
| 06/20/2000 | US6077718 Method for forming deposited film |
| 06/20/2000 | US6077574 Plasma CVD process for forming a fluorine-doped SiO2 dielectric film |
| 06/20/2000 | US6077573 Doping, patterning; improving uniformity and memory cell capacitance in integrated circuits |
| 06/20/2000 | US6077572 Vapor deposition of conformal sheaths from hydrocarbon gas; high ion flux and controlled, low energy ion bombardment |
| 06/20/2000 | US6077571 Conformal pure and doped aluminum coatings and a methodology and apparatus for their preparation |
| 06/20/2000 | US6077569 Cleaning, etching, vacuum deposition; ion bombardment and ion beam sputtering |
| 06/20/2000 | US6077567 Method of making silica coated steel substrates |
| 06/20/2000 | US6077562 Method for depositing barium strontium titanate |
| 06/20/2000 | US6077561 Reacting nickel fluoride surface with hydrocarbon gas to form carbon layer; carbonization |
| 06/20/2000 | US6077404 Method and apparatus for reflowing a material layer; by layering various materials (i.e., films) on a wafer in a prescribed pattern, a solid state electronic device is formed |
| 06/20/2000 | US6077357 Orientless wafer processing on an electrostatic chuck |
| 06/20/2000 | US6077356 Reagent supply vessel for chemical vapor deposition |
| 06/20/2000 | US6077355 Apparatus and method for depositing a film on a substrate by chemical vapor deposition |
| 06/20/2000 | US6077157 Process chamber exhaust system |
| 06/20/2000 | US6076543 Gas handling device |
| 06/20/2000 | US6076483 Plasma processing apparatus using a partition panel |
| 06/20/2000 | US6076481 Plasma processing apparatus and plasma processing method |
| 06/20/2000 | US6076359 System and method for controlled delivery of liquified gases |
| 06/20/2000 | CA2204086C Production of diamond film |
| 06/15/2000 | WO2000034997A1 Plasma preclean with argon, helium, and hydrogen gases |
| 06/15/2000 | WO2000034550A2 Cvd processes using bi aryl |
| 06/15/2000 | WO2000034549A2 Cvd process using bi alcoxides |
| 06/15/2000 | WO2000014296A9 Super hydrophobic coated substrates |
| 06/15/2000 | DE19858933A1 Water- and dirt-repellent coating for glass, e.g. window, metal, plastics or other heat-resistant material is produced by flame coating with silicon tetrafluoride and/or titanium tetrachloride in e.g. natural gas oxygen flame |
| 06/15/2000 | DE19857527A1 End point of plasma treatment, used e.g. for carbon content reduction of a CVD titanium nitride barrier layer in VLSI manufacture, is determined by in-situ trace gas analysis |
| 06/15/2000 | DE19855637A1 Verfahren und System zur Halbleiterkristallherstellung mit Temperaturverwaltung Method and system for manufacturing semiconductor crystal with temperature management |
| 06/15/2000 | DE19852722C1 Verfahren zur Innenbeschichtung von Kapillaren und deren Verwendung A process for internal coating of capillaries, and their use |
| 06/14/2000 | EP1008674A1 Processor |
| 06/14/2000 | EP1008673A1 Improved coating for cutting tool applied for cast iron |
| 06/14/2000 | EP1008671A1 Regeneration of CVD precursors |
| 06/14/2000 | EP1008553A1 Surface functionalized diamond crystals and methods for producing same |
| 06/14/2000 | EP1007763A1 Method of reducing metal contamination during semiconductor processing in a reactor having metal components |
| 06/14/2000 | EP1007762A1 Method and apparatus for detecting the endpoint of a chamber cleaning |
| 06/14/2000 | EP1007761A1 Gas distribution system for a process reactor and method for processing semiconductor substrates |
| 06/14/2000 | EP1007760A1 Parylene deposition chamber including eccentric part tumbler |
| 06/14/2000 | EP1007757A1 Plastic containers with an external gas barrier coating |
| 06/14/2000 | EP1007351A4 Method for preserving precision edges using diamond-like nanocomposite film |
| 06/14/2000 | EP1007351A1 Method for preserving precision edges using diamond-like nanocomposite film |
| 06/14/2000 | CN1256717A 包装材料 Packaging Materials |
| 06/14/2000 | CN1256201A Improved hard alloy body for working steel products |
| 06/14/2000 | CN1256183A Improved hard alloy body for working cast-iron |
| 06/13/2000 | US6074945 Diene ruthenium carbon monoxide complex, vaporization and forming ruthenium metal film |
| 06/13/2000 | US6074696 Forming a thin film on the surface of a semiconductor wafer, etching the thin film formed on the surface of the substrate and etching the surface of the substrate. |
| 06/13/2000 | US6074691 Method for monitoring the flow of a gas into a vacuum reactor |
| 06/13/2000 | US6074538 Thin film forming equipment |