Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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07/18/2000 | US6090188 Air intake apparatus of chemical vapor deposition equipment and method for removing ozone using the same |
07/18/2000 | US6090167 Substrate processing system includes rf power, controller and memory storing a program for direction of chemical vapor deposition; helium added at increased rate to stabilize the deposited layer so no hydrofluoric acid outgasses |
07/18/2000 | US6089548 Process and device for converting a liquid stream flow into a gas stream flow |
07/18/2000 | US6089472 Shower head |
07/18/2000 | US6089185 Thin film forming apparatus |
07/18/2000 | US6089184 CVD apparatus and CVD method |
07/18/2000 | US6089182 Plasma processing apparatus |
07/18/2000 | US6089027 Fluid storage and dispensing system |
07/18/2000 | CA2067309C Process and apparatus for plasma cvd coating or plasma treating substrates |
07/13/2000 | WO2000041212A1 Gas injection system for plasma processing |
07/13/2000 | WO2000040776A1 In situ chemical generator and method |
07/13/2000 | WO2000040772A1 Processing chamber for atomic layer deposition processes |
07/13/2000 | WO2000040771A1 Large area plasma source |
07/13/2000 | WO2000040588A1 Lewis base adducts of anhydrous mononuclear tris(beta-diketonate) bismuth compositions for deposition of bismuth-containing films, and method of making the same |
07/13/2000 | WO2000018518A8 A process for ultra smooth diamond coating on metals and uses thereof |
07/12/2000 | EP1018567A2 Method of producing free standing articles |
07/12/2000 | EP1018160A1 Hydrogenated oxidized silicon carbon material |
07/12/2000 | EP1017877A1 Cvd chamber inner lining |
07/12/2000 | EP1017876A1 Gas injection system for plasma processing apparatus |
07/12/2000 | EP1017875A1 Remote plasma cleaning apparatus |
07/12/2000 | EP1017874A1 Colorless diamond-like carbon coatings |
07/12/2000 | EP1017873A1 Single body injector and deposition chamber |
07/12/2000 | EP1017641A1 Method for lubricating glass molds, plungers and the like |
07/12/2000 | EP1017613A2 Bulk chemical delivery system |
07/12/2000 | EP1017510A1 Method and apparatus for gas phase coating complex internal surfaces of hollow articles |
07/12/2000 | EP1017266A1 System for delivering a substantially constant vapor flow to a chemical process reactor |
07/12/2000 | CN1260009A Method for producing coated workpieces, uses and installation for the method |
07/11/2000 | US6088213 Bipolar electrostatic chuck and method of making same |
07/11/2000 | US6087580 Semiconductor having large volume fraction of intermediate range order material |
07/11/2000 | US6087249 Transistor fabrication process employing a common chamber for gate oxide and gate conductor formation |
07/11/2000 | US6087025 Tool comprising a metal working surface comprising the following sequential gradient: cobalt-containing base material, intermetallic, interlayer, carbide layer, diamond layer; bonding strength |
07/11/2000 | US6086962 Method for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source |
07/11/2000 | US6086960 Method for improving the quality of a titanium nitride layer including carbon and oxygen |
07/11/2000 | US6086959 Boron and nitrogen containing coating and method for making |
07/11/2000 | US6086953 Ceramic-coated metal guide pin |
07/11/2000 | US6086778 Muffle etch injector assembly |
07/11/2000 | US6086711 Vapor generation system and process |
07/11/2000 | US6086680 Low-mass susceptor |
07/11/2000 | US6086679 Deposition systems and processes for transport polymerization and chemical vapor deposition |
07/11/2000 | US6086677 Dual gas faceplate for a showerhead in a semiconductor wafer processing system |
07/11/2000 | US6085690 Chemical vapor deposition apparatus |
07/11/2000 | US6085689 Apparatus to increase gas residence time in a reactor |
07/11/2000 | US6085548 Control vent system for ultra-high purity delivery system for liquefied compressed gases |
07/11/2000 | CA2190231C Method and apparatus for coating a substance with diamond film |
07/06/2000 | WO2000039840A1 Method for boron doping wafers using a vertical oven system |
07/06/2000 | WO2000001615A8 Method and apparatus for the preparation of high purity phosphine or other gas |
07/06/2000 | DE19963283A1 Two-phase ammonia, for metal organic chemical vapor deposition of gallium nitride based layers in production of semiconductor devices such as blue-emitting light emitting devices, has a liquid phase with a specified low water content |
07/06/2000 | DE19956472A1 Flüssigkeits-Abgabesystem Liquid dispensing system |
07/06/2000 | DE19849462A1 IR lamp heating for temp. over 1000 degrees C for rear side heating of substrate holders in installations for gas phase epitaxy |
07/05/2000 | EP1017089A2 Method of manufacturing a gate electrode |
07/05/2000 | EP1016736A1 Carbonaceous deposit-resistant coating for fuel injectors |
07/05/2000 | EP1016666A2 Allyl-derived precursor and synthesis method |
07/05/2000 | EP1016479A2 Cutting tool |
07/05/2000 | EP1016130A1 Metal and metal silicide nitridization in a high density, low pressure plasma reactor |
07/05/2000 | EP1015660A1 Method and apparatus for monitoring a vaporizer |
07/05/2000 | EP1015659A1 Method and apparatus for monitoring generation of liquid chemical vapor |
07/05/2000 | EP1015658A1 Vapor deposition apparatus |
07/05/2000 | EP0989211A4 Process for obtaining diamond layers by gaseous-phase synthesis |
07/05/2000 | EP0902961B1 Method for treating articles with a plasma jet |
07/05/2000 | CN1259173A Plasma polymerization on surface of material |
07/05/2000 | CN1258582A Manufacture of diamond film cutter and tool |
07/05/2000 | CN1054235C Semiconductor device and method for mfg. same |
07/04/2000 | US6084356 Plasma processing apparatus with a dielectric body in the waveguide |
07/04/2000 | US6083852 Method for applying films using reduced deposition rates |
07/04/2000 | US6083833 Method for forming conductive film for semiconductor device |
07/04/2000 | US6083829 Use of a low resistivity Cu3 Ge interlayer as an adhesion promoter between copper and tin layers |
07/04/2000 | US6083818 Electronic devices with strontium barrier film and process for making same |
07/04/2000 | US6083572 Organic low-dielectric constant films deposited by plasma enhanced chemical vapor deposition |
07/04/2000 | US6083569 Discharging a wafer after a plasma process for dielectric deposition |
07/04/2000 | US6083568 Reducing organic material to form carbides for semiconductor wafers by injection of gas into reactors to form plasma : |
07/04/2000 | US6083561 Low scatter, high quality water clear zinc sulfide |
07/04/2000 | US6083560 Process for controlled deposition profile forced flow chemical vapor infiltration |
07/04/2000 | US6083451 Method of producing a polycrystalline alumina ceramic which is resistant to a fluorine-comprising plasma |
07/04/2000 | US6083355 Electrodes for plasma treater systems |
07/04/2000 | US6083341 Method for making coatings of uniform thickness |
07/04/2000 | US6083323 Controlling coolant flow proximate a reaction chamber within a cvd system such that the temperature of the walls is maintained at a predefined target temperature. |
07/04/2000 | US6083321 Fluid delivery system and method |
07/04/2000 | US6082714 Vaporization apparatus and process |
07/04/2000 | US6082375 Method of processing internal surfaces of a chemical vapor deposition reactor |
07/04/2000 | US6082297 Encapsulated thermofoil heater apparatus and associated methods |
07/04/2000 | US6082294 Method and apparatus for depositing diamond film |
07/04/2000 | US6082293 Plasma source |
07/04/2000 | US6082292 Sealing roller system for surface treatment gas reactors |
06/29/2000 | WO2000038226A1 Reduced degradation of metal oxide ceramic due to diffusion of a mobile specie therefrom |
06/29/2000 | WO2000037712A1 Liquid delivery mocvd process for deposition of high frequency dielectric materials |
06/29/2000 | WO2000037711A1 Method for producing a heat insulating layer |
06/29/2000 | WO2000037710A1 Indium source reagent compositions |
06/29/2000 | WO2000003420A3 Method for forming a copper film on a substrate |
06/29/2000 | DE19859695A1 Coating plastic substrates with light reflective layer, e.g. in headlight reflector manufacture by precoating with low carbon content thin crosslinked hydrocarbon, silicon oxide, silicon nitride or silicon oxynitride barrier layer |
06/29/2000 | DE19858701A1 Verfahren zur Herstellung einer Wärmedämmschicht A method for manufacturing a heat insulating layer |
06/28/2000 | EP1014462A2 A method of producing a graphite material for use as a negative electrode of a non-aqueous secondary battery |
06/28/2000 | EP1014425A1 Mechanism and method for supporting substrate to be coated with film |
06/28/2000 | EP1013794A2 Vapor phase process for making aluminide |
06/28/2000 | EP1013786A1 Method for repairing a superalloy turbine component |
06/28/2000 | EP1012635A2 Coatings, methods and apparatus for reducing reflection from optical substrates |
06/28/2000 | EP1012358A1 Inflatable elastomeric element for rapid thermal processing (rtp) system |
06/28/2000 | EP1011884A1 Extrusion die, production and use |
06/28/2000 | CN1258324A Secondary edge reflector for horizontal reactor |
06/28/2000 | CN1257940A Process for growing piezoelectric film of aluminium nitride on substrate of high-sound-velocity material |
06/28/2000 | CN1053931C Method for depositing hard protective coating |