Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
07/2000
07/18/2000US6090188 Air intake apparatus of chemical vapor deposition equipment and method for removing ozone using the same
07/18/2000US6090167 Substrate processing system includes rf power, controller and memory storing a program for direction of chemical vapor deposition; helium added at increased rate to stabilize the deposited layer so no hydrofluoric acid outgasses
07/18/2000US6089548 Process and device for converting a liquid stream flow into a gas stream flow
07/18/2000US6089472 Shower head
07/18/2000US6089185 Thin film forming apparatus
07/18/2000US6089184 CVD apparatus and CVD method
07/18/2000US6089182 Plasma processing apparatus
07/18/2000US6089027 Fluid storage and dispensing system
07/18/2000CA2067309C Process and apparatus for plasma cvd coating or plasma treating substrates
07/13/2000WO2000041212A1 Gas injection system for plasma processing
07/13/2000WO2000040776A1 In situ chemical generator and method
07/13/2000WO2000040772A1 Processing chamber for atomic layer deposition processes
07/13/2000WO2000040771A1 Large area plasma source
07/13/2000WO2000040588A1 Lewis base adducts of anhydrous mononuclear tris(beta-diketonate) bismuth compositions for deposition of bismuth-containing films, and method of making the same
07/13/2000WO2000018518A8 A process for ultra smooth diamond coating on metals and uses thereof
07/12/2000EP1018567A2 Method of producing free standing articles
07/12/2000EP1018160A1 Hydrogenated oxidized silicon carbon material
07/12/2000EP1017877A1 Cvd chamber inner lining
07/12/2000EP1017876A1 Gas injection system for plasma processing apparatus
07/12/2000EP1017875A1 Remote plasma cleaning apparatus
07/12/2000EP1017874A1 Colorless diamond-like carbon coatings
07/12/2000EP1017873A1 Single body injector and deposition chamber
07/12/2000EP1017641A1 Method for lubricating glass molds, plungers and the like
07/12/2000EP1017613A2 Bulk chemical delivery system
07/12/2000EP1017510A1 Method and apparatus for gas phase coating complex internal surfaces of hollow articles
07/12/2000EP1017266A1 System for delivering a substantially constant vapor flow to a chemical process reactor
07/12/2000CN1260009A Method for producing coated workpieces, uses and installation for the method
07/11/2000US6088213 Bipolar electrostatic chuck and method of making same
07/11/2000US6087580 Semiconductor having large volume fraction of intermediate range order material
07/11/2000US6087249 Transistor fabrication process employing a common chamber for gate oxide and gate conductor formation
07/11/2000US6087025 Tool comprising a metal working surface comprising the following sequential gradient: cobalt-containing base material, intermetallic, interlayer, carbide layer, diamond layer; bonding strength
07/11/2000US6086962 Method for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source
07/11/2000US6086960 Method for improving the quality of a titanium nitride layer including carbon and oxygen
07/11/2000US6086959 Boron and nitrogen containing coating and method for making
07/11/2000US6086953 Ceramic-coated metal guide pin
07/11/2000US6086778 Muffle etch injector assembly
07/11/2000US6086711 Vapor generation system and process
07/11/2000US6086680 Low-mass susceptor
07/11/2000US6086679 Deposition systems and processes for transport polymerization and chemical vapor deposition
07/11/2000US6086677 Dual gas faceplate for a showerhead in a semiconductor wafer processing system
07/11/2000US6085690 Chemical vapor deposition apparatus
07/11/2000US6085689 Apparatus to increase gas residence time in a reactor
07/11/2000US6085548 Control vent system for ultra-high purity delivery system for liquefied compressed gases
07/11/2000CA2190231C Method and apparatus for coating a substance with diamond film
07/06/2000WO2000039840A1 Method for boron doping wafers using a vertical oven system
07/06/2000WO2000001615A8 Method and apparatus for the preparation of high purity phosphine or other gas
07/06/2000DE19963283A1 Two-phase ammonia, for metal organic chemical vapor deposition of gallium nitride based layers in production of semiconductor devices such as blue-emitting light emitting devices, has a liquid phase with a specified low water content
07/06/2000DE19956472A1 Flüssigkeits-Abgabesystem Liquid dispensing system
07/06/2000DE19849462A1 IR lamp heating for temp. over 1000 degrees C for rear side heating of substrate holders in installations for gas phase epitaxy
07/05/2000EP1017089A2 Method of manufacturing a gate electrode
07/05/2000EP1016736A1 Carbonaceous deposit-resistant coating for fuel injectors
07/05/2000EP1016666A2 Allyl-derived precursor and synthesis method
07/05/2000EP1016479A2 Cutting tool
07/05/2000EP1016130A1 Metal and metal silicide nitridization in a high density, low pressure plasma reactor
07/05/2000EP1015660A1 Method and apparatus for monitoring a vaporizer
07/05/2000EP1015659A1 Method and apparatus for monitoring generation of liquid chemical vapor
07/05/2000EP1015658A1 Vapor deposition apparatus
07/05/2000EP0989211A4 Process for obtaining diamond layers by gaseous-phase synthesis
07/05/2000EP0902961B1 Method for treating articles with a plasma jet
07/05/2000CN1259173A Plasma polymerization on surface of material
07/05/2000CN1258582A Manufacture of diamond film cutter and tool
07/05/2000CN1054235C Semiconductor device and method for mfg. same
07/04/2000US6084356 Plasma processing apparatus with a dielectric body in the waveguide
07/04/2000US6083852 Method for applying films using reduced deposition rates
07/04/2000US6083833 Method for forming conductive film for semiconductor device
07/04/2000US6083829 Use of a low resistivity Cu3 Ge interlayer as an adhesion promoter between copper and tin layers
07/04/2000US6083818 Electronic devices with strontium barrier film and process for making same
07/04/2000US6083572 Organic low-dielectric constant films deposited by plasma enhanced chemical vapor deposition
07/04/2000US6083569 Discharging a wafer after a plasma process for dielectric deposition
07/04/2000US6083568 Reducing organic material to form carbides for semiconductor wafers by injection of gas into reactors to form plasma :
07/04/2000US6083561 Low scatter, high quality water clear zinc sulfide
07/04/2000US6083560 Process for controlled deposition profile forced flow chemical vapor infiltration
07/04/2000US6083451 Method of producing a polycrystalline alumina ceramic which is resistant to a fluorine-comprising plasma
07/04/2000US6083355 Electrodes for plasma treater systems
07/04/2000US6083341 Method for making coatings of uniform thickness
07/04/2000US6083323 Controlling coolant flow proximate a reaction chamber within a cvd system such that the temperature of the walls is maintained at a predefined target temperature.
07/04/2000US6083321 Fluid delivery system and method
07/04/2000US6082714 Vaporization apparatus and process
07/04/2000US6082375 Method of processing internal surfaces of a chemical vapor deposition reactor
07/04/2000US6082297 Encapsulated thermofoil heater apparatus and associated methods
07/04/2000US6082294 Method and apparatus for depositing diamond film
07/04/2000US6082293 Plasma source
07/04/2000US6082292 Sealing roller system for surface treatment gas reactors
06/2000
06/29/2000WO2000038226A1 Reduced degradation of metal oxide ceramic due to diffusion of a mobile specie therefrom
06/29/2000WO2000037712A1 Liquid delivery mocvd process for deposition of high frequency dielectric materials
06/29/2000WO2000037711A1 Method for producing a heat insulating layer
06/29/2000WO2000037710A1 Indium source reagent compositions
06/29/2000WO2000003420A3 Method for forming a copper film on a substrate
06/29/2000DE19859695A1 Coating plastic substrates with light reflective layer, e.g. in headlight reflector manufacture by precoating with low carbon content thin crosslinked hydrocarbon, silicon oxide, silicon nitride or silicon oxynitride barrier layer
06/29/2000DE19858701A1 Verfahren zur Herstellung einer Wärmedämmschicht A method for manufacturing a heat insulating layer
06/28/2000EP1014462A2 A method of producing a graphite material for use as a negative electrode of a non-aqueous secondary battery
06/28/2000EP1014425A1 Mechanism and method for supporting substrate to be coated with film
06/28/2000EP1013794A2 Vapor phase process for making aluminide
06/28/2000EP1013786A1 Method for repairing a superalloy turbine component
06/28/2000EP1012635A2 Coatings, methods and apparatus for reducing reflection from optical substrates
06/28/2000EP1012358A1 Inflatable elastomeric element for rapid thermal processing (rtp) system
06/28/2000EP1011884A1 Extrusion die, production and use
06/28/2000CN1258324A Secondary edge reflector for horizontal reactor
06/28/2000CN1257940A Process for growing piezoelectric film of aluminium nitride on substrate of high-sound-velocity material
06/28/2000CN1053931C Method for depositing hard protective coating